JP4256124B2 - パターン形成体の製造方法 - Google Patents

パターン形成体の製造方法 Download PDF

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Publication number
JP4256124B2
JP4256124B2 JP2002227442A JP2002227442A JP4256124B2 JP 4256124 B2 JP4256124 B2 JP 4256124B2 JP 2002227442 A JP2002227442 A JP 2002227442A JP 2002227442 A JP2002227442 A JP 2002227442A JP 4256124 B2 JP4256124 B2 JP 4256124B2
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Prior art keywords
photocatalyst
layer
containing layer
energy
pattern
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Japanese (ja)
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JP2004069918A5 (enExample
JP2004069918A (ja
Inventor
弘典 小林
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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Priority to JP2002227442A priority Critical patent/JP4256124B2/ja
Publication of JP2004069918A publication Critical patent/JP2004069918A/ja
Publication of JP2004069918A5 publication Critical patent/JP2004069918A5/ja
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  • Optical Filters (AREA)
JP2002227442A 2002-08-05 2002-08-05 パターン形成体の製造方法 Expired - Fee Related JP4256124B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002227442A JP4256124B2 (ja) 2002-08-05 2002-08-05 パターン形成体の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002227442A JP4256124B2 (ja) 2002-08-05 2002-08-05 パターン形成体の製造方法

Related Child Applications (1)

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JP2008327082A Division JP4873003B2 (ja) 2008-12-24 2008-12-24 パターン形成体の製造方法

Publications (3)

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JP2004069918A JP2004069918A (ja) 2004-03-04
JP2004069918A5 JP2004069918A5 (enExample) 2005-10-20
JP4256124B2 true JP4256124B2 (ja) 2009-04-22

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JP2002227442A Expired - Fee Related JP4256124B2 (ja) 2002-08-05 2002-08-05 パターン形成体の製造方法

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Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4451193B2 (ja) 2004-04-12 2010-04-14 大日本印刷株式会社 パターン形成体の製造方法
JP4526029B2 (ja) * 2005-03-29 2010-08-18 大日本印刷株式会社 光触媒組成物および光触媒含有層
JP2007044596A (ja) * 2005-08-08 2007-02-22 Dainippon Printing Co Ltd 光触媒含有層
JP4668000B2 (ja) * 2005-08-08 2011-04-13 大日本印刷株式会社 有機エレクトロルミネッセント素子用基板、および有機エレクトロルミネッセント素子
JP4694300B2 (ja) * 2005-08-08 2011-06-08 大日本印刷株式会社 光触媒含有層の製造方法
JP4667999B2 (ja) * 2005-08-08 2011-04-13 大日本印刷株式会社 有機エレクトロルミネッセント素子用基板、および有機エレクトロルミネッセント素子
JP4752392B2 (ja) * 2005-08-11 2011-08-17 大日本印刷株式会社 パターン形成体の製造方法
JP4752391B2 (ja) * 2005-08-11 2011-08-17 大日本印刷株式会社 パターン形成体の製造方法
JP2007061745A (ja) * 2005-08-31 2007-03-15 Dainippon Printing Co Ltd 表面処理方法
JP5076298B2 (ja) * 2005-09-16 2012-11-21 大日本印刷株式会社 パターン形成体の製造方法、および有機薄膜トランジスタ
JP4830547B2 (ja) * 2006-03-07 2011-12-07 大日本印刷株式会社 パターン形成体の製造方法およびパターン形成体製造用装置

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JP2004069918A (ja) 2004-03-04

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