JP4250252B2 - 投影露光装置、投影露光方法、及びそれを用いたデバイスの製造方法 - Google Patents

投影露光装置、投影露光方法、及びそれを用いたデバイスの製造方法 Download PDF

Info

Publication number
JP4250252B2
JP4250252B2 JP10929299A JP10929299A JP4250252B2 JP 4250252 B2 JP4250252 B2 JP 4250252B2 JP 10929299 A JP10929299 A JP 10929299A JP 10929299 A JP10929299 A JP 10929299A JP 4250252 B2 JP4250252 B2 JP 4250252B2
Authority
JP
Japan
Prior art keywords
shot
projection exposure
mark
stage
measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP10929299A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000299278A5 (enExample
JP2000299278A (ja
Inventor
容三 深川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP10929299A priority Critical patent/JP4250252B2/ja
Publication of JP2000299278A publication Critical patent/JP2000299278A/ja
Publication of JP2000299278A5 publication Critical patent/JP2000299278A5/ja
Application granted granted Critical
Publication of JP4250252B2 publication Critical patent/JP4250252B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP10929299A 1999-04-16 1999-04-16 投影露光装置、投影露光方法、及びそれを用いたデバイスの製造方法 Expired - Fee Related JP4250252B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10929299A JP4250252B2 (ja) 1999-04-16 1999-04-16 投影露光装置、投影露光方法、及びそれを用いたデバイスの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10929299A JP4250252B2 (ja) 1999-04-16 1999-04-16 投影露光装置、投影露光方法、及びそれを用いたデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2000299278A JP2000299278A (ja) 2000-10-24
JP2000299278A5 JP2000299278A5 (enExample) 2006-06-01
JP4250252B2 true JP4250252B2 (ja) 2009-04-08

Family

ID=14506487

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10929299A Expired - Fee Related JP4250252B2 (ja) 1999-04-16 1999-04-16 投影露光装置、投影露光方法、及びそれを用いたデバイスの製造方法

Country Status (1)

Country Link
JP (1) JP4250252B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10059045B2 (en) 2014-06-02 2018-08-28 Canon Kabushiki Kaisha Imprint apparatus, imprint method, and method of manufacturing article

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3977302B2 (ja) 2003-08-13 2007-09-19 キヤノン株式会社 露光装置及びその使用方法並びにデバイス製造方法
JP4410202B2 (ja) * 2005-03-02 2010-02-03 エーエスエムエル ネザーランズ ビー．ブイ． ２重計量サンプリングを使用したオーバレイ制御のための処理方法
JP5062992B2 (ja) * 2005-11-22 2012-10-31 ルネサスエレクトロニクス株式会社 半導体装置の製造方法
JP5111213B2 (ja) * 2008-04-15 2013-01-09 キヤノン株式会社 計測方法、ステージ移動特性の調整方法、露光方法及びデバイス製造方法
JP5554906B2 (ja) * 2008-07-31 2014-07-23 ラピスセミコンダクタ株式会社 露光装置のアライメント方法
JP2014022467A (ja) * 2012-07-13 2014-02-03 Canon Inc 露光装置、校正方法および物品の製造方法
JP6774269B2 (ja) * 2016-08-26 2020-10-21 キヤノン株式会社 計測方法、計測装置、露光装置及び物品の製造方法
JP6860353B2 (ja) * 2017-01-18 2021-04-14 キヤノン株式会社 評価方法、物品製造方法およびプログラム
JP6978926B2 (ja) * 2017-12-18 2021-12-08 キヤノン株式会社 計測方法、計測装置、露光装置、および物品製造方法
JP2022027020A (ja) * 2020-07-31 2022-02-10 キヤノン株式会社 決定方法、露光方法、露光装置、および物品製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10059045B2 (en) 2014-06-02 2018-08-28 Canon Kabushiki Kaisha Imprint apparatus, imprint method, and method of manufacturing article

Also Published As

Publication number Publication date
JP2000299278A (ja) 2000-10-24

Similar Documents

Publication Publication Date Title
JP3977302B2 (ja) 露光装置及びその使用方法並びにデバイス製造方法
JP4250252B2 (ja) 投影露光装置、投影露光方法、及びそれを用いたデバイスの製造方法
JP3962648B2 (ja) ディストーション計測方法と露光装置
US6061119A (en) Method of measuring image-forming error of projection optical system, method of manufacturing exposure apparatus, and method of manufacturing semiconductor device
JP3826042B2 (ja) ステージ装置、それを用いた半導体露光装置および位置計測方法
US8149385B2 (en) Alignment unit and exposure apparatus
US8072579B2 (en) Measuring method, adjustment method for stage movement characteristics, exposure method, and device manufacturing method
JP3005139B2 (ja) 半導体製造方法
US5638179A (en) Method for measuring amount of bend of moving mirror
JP3530692B2 (ja) 走査型露光装置及びそれを用いたデバイスの製造方法
JP6860353B2 (ja) 評価方法、物品製造方法およびプログラム
JP2008021748A (ja) 露光装置
JP3337921B2 (ja) 投影露光装置および位置合せ方法
JP7034771B2 (ja) 露光装置、露光方法、及び半導体装置の製造方法
JP2007096069A (ja) 位置合わせ方法、重ね合わせ精度計測方法、露光方法、位置合わせ装置、露光装置、及び重ね合わせ精度計測装置
US7782441B2 (en) Alignment method and apparatus of mask pattern
JP2011035009A (ja) ディストーション及び基板ステージの移動特性の計測方法、露光装置並びにデバイス製造方法
JPH0353770B2 (enExample)
JP2012225907A (ja) 測定装置、露光装置及びデバイスの製造方法
JP3374456B2 (ja) 位置合わせ方法及び露光方法
JP2010114164A (ja) 露光方法及び露光装置、並びにリソグラフィシステム
JP5146663B2 (ja) 基板表裏面パターン位置測定方法及びその方法を用いた測定装置
JP2006228890A (ja) 位置合わせ方法及び露光装置
JP3624920B2 (ja) 露光方法
JP2000100704A (ja) 走査型露光装置と走査型露光方法

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060412

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060412

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20080208

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080507

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080704

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090106

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090119

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120123

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 4250252

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130123

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140123

Year of fee payment: 5

LAPS Cancellation because of no payment of annual fees