JP4248275B2 - 光スイッチ - Google Patents
光スイッチ Download PDFInfo
- Publication number
- JP4248275B2 JP4248275B2 JP2003069541A JP2003069541A JP4248275B2 JP 4248275 B2 JP4248275 B2 JP 4248275B2 JP 2003069541 A JP2003069541 A JP 2003069541A JP 2003069541 A JP2003069541 A JP 2003069541A JP 4248275 B2 JP4248275 B2 JP 4248275B2
- Authority
- JP
- Japan
- Prior art keywords
- trench
- waveguide
- bubble
- substrate
- heater
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 claims description 71
- 239000000758 substrate Substances 0.000 claims description 63
- 239000007788 liquid Substances 0.000 claims description 37
- 230000004888 barrier function Effects 0.000 claims description 23
- 230000036961 partial effect Effects 0.000 claims description 2
- 239000006260 foam Substances 0.000 claims 1
- 239000000463 material Substances 0.000 description 25
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 20
- 238000000034 method Methods 0.000 description 19
- 230000008859 change Effects 0.000 description 12
- 239000011162 core material Substances 0.000 description 11
- 239000012530 fluid Substances 0.000 description 8
- 239000000377 silicon dioxide Substances 0.000 description 8
- 239000003989 dielectric material Substances 0.000 description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 7
- 239000010931 gold Substances 0.000 description 7
- 229910052737 gold Inorganic materials 0.000 description 7
- 238000005253 cladding Methods 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 230000002209 hydrophobic effect Effects 0.000 description 5
- 238000000059 patterning Methods 0.000 description 5
- 235000012239 silicon dioxide Nutrition 0.000 description 5
- 239000005046 Chlorosilane Substances 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 238000001338 self-assembly Methods 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000001737 promoting effect Effects 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000033228 biological regulation Effects 0.000 description 2
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 229920002313 fluoropolymer Polymers 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- -1 hydrocarbon chlorosilanes Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000009623 Bosch process Methods 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052605 nesosilicate Inorganic materials 0.000 description 1
- 150000004762 orthosilicates Chemical class 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 230000000452 restraining effect Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/35—Optical coupling means having switching means
- G02B6/3538—Optical coupling means having switching means based on displacement or deformation of a liquid
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/35—Optical coupling means having switching means
- G02B6/3564—Mechanical details of the actuation mechanism associated with the moving element or mounting mechanism details
- G02B6/3568—Mechanical details of the actuation mechanism associated with the moving element or mounting mechanism details characterised by the actuating force
- G02B6/3576—Temperature or heat actuation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Micromachines (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/099116 | 2002-03-14 | ||
| US10/099,116 US6798939B2 (en) | 2002-03-14 | 2002-03-14 | Bubble stability in an optical switch |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003315706A JP2003315706A (ja) | 2003-11-06 |
| JP2003315706A5 JP2003315706A5 (https=) | 2006-05-11 |
| JP4248275B2 true JP4248275B2 (ja) | 2009-04-02 |
Family
ID=27765441
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003069541A Expired - Fee Related JP4248275B2 (ja) | 2002-03-14 | 2003-03-14 | 光スイッチ |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6798939B2 (https=) |
| EP (1) | EP1345055B1 (https=) |
| JP (1) | JP4248275B2 (https=) |
| DE (1) | DE60212564T2 (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7274840B2 (en) * | 2003-07-23 | 2007-09-25 | Avago Technologies Fiber Ip (Singapore) Pte. Ltd. | Clean and test for fluid within a reflection optical switch system |
| US7024062B2 (en) * | 2004-02-25 | 2006-04-04 | John Julian Uebbing | Optical switch with low pressure bubble |
| KR100674866B1 (ko) * | 2005-05-16 | 2007-01-30 | 삼성전기주식회사 | 가변 초점 렌즈 및 그 제조 방법 |
| US20060263613A1 (en) * | 2005-05-20 | 2006-11-23 | General Electric Company | Temperature dependent transparent optical coatings for high temperature absorption |
| US8121487B2 (en) * | 2008-02-05 | 2012-02-21 | Honeywell International Inc. | System and method for free space micro machined optical bench |
| DE102017123522A1 (de) * | 2017-10-10 | 2019-04-11 | Carl Zeiss Meditec Ag | Schaltbare Strahlteilervorrichtung |
| US11733468B2 (en) * | 2021-12-08 | 2023-08-22 | Viavi Solutions Inc. | Photonic structure using optical heater |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2660440B1 (fr) * | 1990-04-03 | 1992-10-16 | Commissariat Energie Atomique | Composant optique integre protege contre l'environnement et son procede de fabrication. |
| JP2828216B2 (ja) | 1990-10-09 | 1998-11-25 | 日立電線株式会社 | 光スイッチ及びその製造方法 |
| JP2871879B2 (ja) | 1991-03-28 | 1999-03-17 | 日立電線株式会社 | 導波路型光スイッチ |
| JP2994807B2 (ja) | 1991-08-29 | 1999-12-27 | 日立電線株式会社 | 導波路型光スイッチ |
| JP2871911B2 (ja) | 1991-09-30 | 1999-03-17 | 日立電線株式会社 | 導波路型光スイッチ |
| US5699462A (en) * | 1996-06-14 | 1997-12-16 | Hewlett-Packard Company | Total internal reflection optical switches employing thermal activation |
| US5852689A (en) * | 1997-04-09 | 1998-12-22 | Hewlett-Packard Company | Method for making fluid optical switches |
| US5960131A (en) * | 1998-02-04 | 1999-09-28 | Hewlett-Packard Company | Switching element having an expanding waveguide core |
| US6195478B1 (en) * | 1998-02-04 | 2001-02-27 | Agilent Technologies, Inc. | Planar lightwave circuit-based optical switches using micromirrors in trenches |
| US6171652B1 (en) * | 1998-05-26 | 2001-01-09 | Brij P. Singh | Method for modifying surfaces with ultra thin films |
| US6062681A (en) * | 1998-07-14 | 2000-05-16 | Hewlett-Packard Company | Bubble valve and bubble valve-based pressure regulator |
| US6389189B1 (en) * | 1998-10-23 | 2002-05-14 | Corning Incorporated | Fluid-encapsulated MEMS optical switch |
| US6360775B1 (en) | 1998-12-23 | 2002-03-26 | Agilent Technologies, Inc. | Capillary fluid switch with asymmetric bubble chamber |
| US6487333B2 (en) * | 1999-12-22 | 2002-11-26 | Agilent Technologies, Inc. | Total internal reflection optical switch |
| US6327397B1 (en) * | 2000-02-22 | 2001-12-04 | Agilent Technologies, Inc. | System and method for providing temperature control for a thermally activated optical switch using constant total power |
| US6563973B1 (en) * | 2000-06-27 | 2003-05-13 | Corning Incorporated | Low-index waveguide liquid crystal cross-connect |
| EP1267194A1 (en) | 2001-06-14 | 2002-12-18 | STMicroelectronics S.r.l. | Optical switch |
| US6674933B2 (en) * | 2001-09-27 | 2004-01-06 | Agilent Technologies, Inc. | Optical switch controlled by selective activation and deactivation of an optical source |
| US6718085B1 (en) * | 2002-10-07 | 2004-04-06 | Agilent Technologies, Inc. | Stable optical switch with reduced power consumption |
-
2002
- 2002-03-14 US US10/099,116 patent/US6798939B2/en not_active Expired - Fee Related
- 2002-10-16 DE DE60212564T patent/DE60212564T2/de not_active Expired - Lifetime
- 2002-10-16 EP EP02023226A patent/EP1345055B1/en not_active Expired - Lifetime
-
2003
- 2003-03-14 JP JP2003069541A patent/JP4248275B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| DE60212564D1 (de) | 2006-08-03 |
| US20030174930A1 (en) | 2003-09-18 |
| US6798939B2 (en) | 2004-09-28 |
| DE60212564T2 (de) | 2007-05-03 |
| JP2003315706A (ja) | 2003-11-06 |
| EP1345055B1 (en) | 2006-06-21 |
| EP1345055A2 (en) | 2003-09-17 |
| EP1345055A3 (en) | 2004-01-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4078898B2 (ja) | 熱光学位相シフタ及びその製造方法 | |
| US7693354B2 (en) | Salicide structures for heat-influenced semiconductor applications | |
| US10437081B2 (en) | Integrated-optics-based stress-optic phase modulator and method for forming | |
| JPH11271651A5 (https=) | ||
| WO2001038910A1 (en) | Optical waveguide having a weakly-confining waveguide section and a strongly-confining waveguide section optically coupled by a tapered neck | |
| JP4248275B2 (ja) | 光スイッチ | |
| JP2010517113A (ja) | 熱光学導波路装置 | |
| US20090003754A1 (en) | Silicon structure and method of manufacturing the same | |
| JPH11287962A (ja) | スイッチング素子 | |
| EP2015116A2 (en) | Silicon structure, in particular including an optical waveguide, and method of manufacturing the same | |
| WO2000010039A1 (en) | Electro optic modulator | |
| KR100326046B1 (ko) | 열광학 스위치 및 그 제작방법 | |
| US6415066B1 (en) | Thermally isolated silicon layer | |
| JP2002006244A (ja) | 効率的な反射結合を行なうための導波路の配置と角度の決定 | |
| JP2003149564A (ja) | 圧力動作する双安定光スイッチング | |
| JP2000206476A (ja) | 温度制御型光導波路 | |
| Imoto et al. | Sputtered silica waveguides with an embedded three-dimensional structure | |
| JP2003084252A (ja) | 導波路型光部品及びその製造方法 | |
| JP2000187192A (ja) | 温度制御型光導波路 | |
| JP2004133451A (ja) | 光スイッチ | |
| EP1406114A1 (en) | Optical device | |
| JP3749932B2 (ja) | 効率のよい熱活性化光スイッチ及びその製作方法 | |
| US12493152B2 (en) | Optical device and fabrication method thereof | |
| KR100429225B1 (ko) | 열광학 스위치 | |
| KR20020064908A (ko) | 통합 평면 광학 도파관 및 셔터 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060310 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060310 |
|
| A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20070320 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20070409 |
|
| RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20070409 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20081121 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20081210 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20090106 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20090113 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120123 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120123 Year of fee payment: 3 |
|
| RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: R3D02 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130123 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130123 Year of fee payment: 4 |
|
| RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: R3D02 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130123 Year of fee payment: 4 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| LAPS | Cancellation because of no payment of annual fees |