JP4246732B2 - リソグラフィ装置、デバイス製造方法、及びそれによって製造されたデバイス - Google Patents

リソグラフィ装置、デバイス製造方法、及びそれによって製造されたデバイス Download PDF

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Publication number
JP4246732B2
JP4246732B2 JP2005347566A JP2005347566A JP4246732B2 JP 4246732 B2 JP4246732 B2 JP 4246732B2 JP 2005347566 A JP2005347566 A JP 2005347566A JP 2005347566 A JP2005347566 A JP 2005347566A JP 4246732 B2 JP4246732 B2 JP 4246732B2
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Japan
Prior art keywords
substrate table
support
scanning
substrate
path
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2005347566A
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English (en)
Japanese (ja)
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JP2006165549A5 (enExample
JP2006165549A (ja
Inventor
ゲールテ クルイユスヴユク シュテファン
ロエロフ ロープシュトラ エリック
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エーエスエムエル ネザーランズ ビー．ブイ．
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Publication of JP2006165549A5 publication Critical patent/JP2006165549A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70083—Non-homogeneous intensity distribution in the mask plane

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005347566A 2004-12-02 2005-12-01 リソグラフィ装置、デバイス製造方法、及びそれによって製造されたデバイス Expired - Fee Related JP4246732B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/001,083 US7230675B2 (en) 2004-12-02 2004-12-02 Lithographic apparatus, device manufacturing method and device manufactured therewith

Publications (3)

Publication Number Publication Date
JP2006165549A JP2006165549A (ja) 2006-06-22
JP2006165549A5 JP2006165549A5 (enExample) 2007-08-23
JP4246732B2 true JP4246732B2 (ja) 2009-04-02

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Family Applications (1)

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JP2005347566A Expired - Fee Related JP4246732B2 (ja) 2004-12-02 2005-12-01 リソグラフィ装置、デバイス製造方法、及びそれによって製造されたデバイス

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US (1) US7230675B2 (enExample)
JP (1) JP4246732B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007004552A1 (ja) * 2005-06-30 2007-01-11 Nikon Corporation 露光装置及び方法、露光装置のメンテナンス方法、並びにデバイス製造方法
US9529275B2 (en) * 2007-02-21 2016-12-27 Taiwan Semiconductor Manufacturing Company, Ltd. Lithography scanner throughput
US20090027648A1 (en) * 2007-07-25 2009-01-29 Asml Netherlands B.V. Method of reducing noise in an original signal, and signal processing device therefor
JP5797454B2 (ja) * 2011-05-20 2015-10-21 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG110121A1 (en) * 2003-09-10 2005-04-28 Asml Netherlands Bv Method for exposing a substrate and lithographic projection apparatus

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Publication number Publication date
US7230675B2 (en) 2007-06-12
US20060119812A1 (en) 2006-06-08
JP2006165549A (ja) 2006-06-22

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