JP4236397B2 - 縮小光学系 - Google Patents

縮小光学系 Download PDF

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Publication number
JP4236397B2
JP4236397B2 JP2001221852A JP2001221852A JP4236397B2 JP 4236397 B2 JP4236397 B2 JP 4236397B2 JP 2001221852 A JP2001221852 A JP 2001221852A JP 2001221852 A JP2001221852 A JP 2001221852A JP 4236397 B2 JP4236397 B2 JP 4236397B2
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JP
Japan
Prior art keywords
lens
aspheric
wave plate
quarter
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001221852A
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English (en)
Japanese (ja)
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JP2002090626A5 (US06486940-20021126-M00001.png
JP2002090626A (ja
Inventor
エム ウィリアムソン デイヴィッド
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ASML Holding NV
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ASML Holding NV
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Publication date
Application filed by ASML Holding NV filed Critical ASML Holding NV
Publication of JP2002090626A publication Critical patent/JP2002090626A/ja
Publication of JP2002090626A5 publication Critical patent/JP2002090626A5/ja
Application granted granted Critical
Publication of JP4236397B2 publication Critical patent/JP4236397B2/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
JP2001221852A 2000-07-21 2001-07-23 縮小光学系 Expired - Fee Related JP4236397B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/620886 2000-07-21
US09/620,886 US6486940B1 (en) 2000-07-21 2000-07-21 High numerical aperture catadioptric lens

Publications (3)

Publication Number Publication Date
JP2002090626A JP2002090626A (ja) 2002-03-27
JP2002090626A5 JP2002090626A5 (US06486940-20021126-M00001.png) 2006-02-16
JP4236397B2 true JP4236397B2 (ja) 2009-03-11

Family

ID=24487824

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001221852A Expired - Fee Related JP4236397B2 (ja) 2000-07-21 2001-07-23 縮小光学系

Country Status (6)

Country Link
US (1) US6486940B1 (US06486940-20021126-M00001.png)
EP (2) EP1174749B1 (US06486940-20021126-M00001.png)
JP (1) JP4236397B2 (US06486940-20021126-M00001.png)
KR (1) KR100751446B1 (US06486940-20021126-M00001.png)
CA (1) CA2352088A1 (US06486940-20021126-M00001.png)
DE (1) DE60131603T2 (US06486940-20021126-M00001.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105467563A (zh) * 2014-09-11 2016-04-06 玉晶光电(厦门)有限公司 便携设备之小型窄视场光学成像镜头

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0989434B1 (en) * 1998-07-29 2006-11-15 Carl Zeiss SMT AG Catadioptric optical system and exposure apparatus having the same
US6661580B1 (en) * 2000-03-10 2003-12-09 Kla-Tencor Technologies Corporation High transmission optical inspection tools
TW575904B (en) * 2001-08-21 2004-02-11 Asml Us Inc Optical projection for microlithography
DE10210899A1 (de) 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
US7551361B2 (en) * 2003-09-09 2009-06-23 Carl Zeiss Smt Ag Lithography lens system and projection exposure system provided with at least one lithography lens system of this type
US7712905B2 (en) 2004-04-08 2010-05-11 Carl Zeiss Smt Ag Imaging system with mirror group
US7511798B2 (en) * 2004-07-30 2009-03-31 Asml Holding N.V. Off-axis catadioptric projection optical system for lithography
WO2006078843A1 (en) * 2005-01-19 2006-07-27 Litel Instruments Method and apparatus for determination of source polarization matrix
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20070264581A1 (en) * 2006-05-09 2007-11-15 Schwarz Christian J Patterning masks and methods
US7799486B2 (en) * 2006-11-21 2010-09-21 Infineon Technologies Ag Lithography masks and methods of manufacture thereof
CN117031695B (zh) * 2023-08-21 2024-02-09 东莞锐视光电科技有限公司 光刻镜头装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3917399A (en) 1974-10-02 1975-11-04 Tropel Catadioptric projection printer
US4896952A (en) 1988-04-22 1990-01-30 International Business Machines Corporation Thin film beamsplitter optical element for use in an image-forming lens system
US4953960A (en) 1988-07-15 1990-09-04 Williamson David M Optical reduction system
JP2913725B2 (ja) * 1990-01-31 1999-06-28 株式会社ニコン 露光装置
US5220454A (en) 1990-03-30 1993-06-15 Nikon Corporation Cata-dioptric reduction projection optical system
JP2847883B2 (ja) 1990-03-30 1999-01-20 株式会社ニコン 反射屈折縮小投影光学系
US5089913A (en) 1990-07-11 1992-02-18 International Business Machines Corporation High resolution reduction catadioptric relay lens
DE4203464B4 (de) 1991-02-08 2007-02-01 Carl Zeiss Smt Ag Katadioptrisches Reduktionsobjektiv
JP3235077B2 (ja) 1991-09-28 2001-12-04 株式会社ニコン 露光装置、該装置を用いた露光方法、及び該装置を用いた半導体素子製造方法
US5212593A (en) 1992-02-06 1993-05-18 Svg Lithography Systems, Inc. Broad band optical reduction system using matched multiple refractive element materials
US5317794A (en) * 1992-09-08 1994-06-07 Automated Label Systems Company Method of delabelling
US5537260A (en) 1993-01-26 1996-07-16 Svg Lithography Systems, Inc. Catadioptric optical reduction system with high numerical aperture
JPH06310400A (ja) * 1993-04-12 1994-11-04 Svg Lithography Syst Inc 軸上マスクとウェーハ直線配列システム
DE4417489A1 (de) * 1994-05-19 1995-11-23 Zeiss Carl Fa Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie
KR960002671A (ko) * 1994-06-20 1996-01-26 김주용 반도체 소자의 금속층간 절연막 형성방법
JPH08203806A (ja) * 1995-01-25 1996-08-09 Sony Corp 露光照明装置
JPH0969491A (ja) * 1995-08-31 1997-03-11 Canon Inc 投影光学系及びそれを用いた半導体デバイスの製造方法
EP1079253A4 (en) * 1998-04-07 2004-09-01 Nikon Corp DEVICE AND PROCESS FOR PROJECTION EXPOSURE, AND OPTICAL SYSTEM WITH REFLECTION AND REFRACTION

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105467563A (zh) * 2014-09-11 2016-04-06 玉晶光电(厦门)有限公司 便携设备之小型窄视场光学成像镜头

Also Published As

Publication number Publication date
KR20020008756A (ko) 2002-01-31
DE60131603D1 (de) 2008-01-10
US6486940B1 (en) 2002-11-26
JP2002090626A (ja) 2002-03-27
EP1903370A1 (en) 2008-03-26
DE60131603T2 (de) 2008-04-10
EP1174749A2 (en) 2002-01-23
EP1174749B1 (en) 2007-11-28
CA2352088A1 (en) 2002-01-21
EP1174749A3 (en) 2003-12-17
KR100751446B1 (ko) 2007-08-23

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