JP4232105B2 - 原子層堆積方法 - Google Patents
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
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Description
なお、以下では「前駆体」という語句を使用する場合もあるが、これは「前駆ガス」と同じ意味である。
Claims (37)
- 原子層堆積方法であって、
堆積反応室内に半導体基板を供給する過程と、
前記基板上に第1単分子層を形成するのに有効なように、前記堆積反応室内の前記基板に第1前駆ガスを流す過程と、
前記第1単分子層を形成した後に、前記堆積反応室内の前記基板に反応中間ガスを流す過程であって、該反応中間ガスが、該反応中間ガスを流している状態の下で、前記第1前駆ガスを流すことから生ずる中間反応副生成物と反応可能である、反応中間ガスを流す過程と、
前記反応中間ガスを流した後に、前記第1単分子層上に第2単分子層を形成するのに有効なように、前記堆積反応室内の前記基板に第2前駆ガスを流す過程と、
を具備することを特徴とする原子層堆積方法。 - 前記第1前駆ガスを流している間に前記中間反応副生成物を形成する過程と、前記反応中間ガスを流している間に前記反応中間ガスを前記中間反応副生成物と反応させる過程と、を具備することを特徴とする請求項1に記載の原子層堆積方法。
- 前記第2前駆ガスは、前記第1前駆ガスと組成が異なることを特徴とする請求項1に記載の原子層堆積方法。
- 前記第1前駆ガスを流す過程と前記反応中間ガスを流す過程との間に、前記堆積反応室にガスが供給されない期間があることを特徴とする請求項1に記載の原子層堆積方法。
- 前記反応中間ガスを流す過程と前記第2前駆ガスを流す過程との間に、前記堆積反応室にガスが供給されない期間があることを特徴とする請求項1に記載の原子層堆積方法。
- 前記第1前駆ガスを流す過程と前記反応中間ガスを流す過程との間に、前記堆積反応室にガスが供給されない第1の期間があり、
前記反応中間ガスを流す過程と前記第2前駆ガスを流す過程との間に、前記堆積反応室にガスが供給されない第2の期間がある、
ことを特徴とする請求項1に記載の原子層堆積方法。 - 原子層堆積方法であって、
堆積反応室内に半導体基板を供給する過程と、
前記基板上に第1単分子層を形成するのに有効なように、前記堆積反応室内の前記基板に第1前駆ガスを流す過程と、
前記第1単分子層を形成した後に、前記堆積反応室内の前記基板に、Cl2からなる反応中間ガスを流す過程であって、該反応中間ガスが、該反応中間ガスを流している状態の下で、前記第1前駆ガスを流すことから生ずる中間反応副生成物と反応可能である、反応中間ガスを流す過程と、
前記反応中間ガスを流した後に、前記第1単分子層上に第2単分子層を形成するのに有効なように、前記堆積反応室内の前記基板に第2前駆ガスを流す過程と、
を具備することを特徴とする原子層堆積方法。 - 前記反応中間ガスがH2からなることを特徴とする請求項1に記載の原子層堆積方法。
- 前記反応中間ガスが前記状態の下において、前記第1前駆ガスと反応しないことを特徴とする請求項1に記載の原子層堆積方法。
- 前記反応中間ガスが前記状態の下において、前記第2前駆ガスと反応しないことを特徴とする請求項1に記載の原子層堆積方法。
- 前記第1前駆ガスがTiCl4からなり、前記第2前駆ガスがNH3からなることを特徴とする請求項1に記載の原子層堆積方法。
- 前記第1前駆ガスがNH3からなり、前記第2前駆ガスがTiCl4からなることを特徴とする請求項1に記載の原子層堆積方法。
- 前記第1前駆ガスを流す過程と前記第2前駆ガスを流す過程との間に、前記堆積反応室内の前記基板に、時間的に間隔を開けられた複数の不活性パージガスパルスを流す過程を有することを特徴とする請求項1に記載の原子層堆積方法。
- 前記第1前駆ガスを流す過程と、前記反応中間ガスを流す過程と、前記第2前駆ガスを流す過程とは、それら全体として、前記堆積反応室内の前記基板へ時間的に間隔を開けられた複数のガスパルスを流すことからなることを特徴とする請求項1に記載の原子層堆積方法。
- 前記第1前駆ガスを流す過程と前記第2前駆ガスを流す過程との間の総期間を有し、該総期間は、該総期間中に、前記反応中間ガスを流すことを除いて前記堆積反応室へガスが供給されないことにより特徴付けられることを特徴とする請求項14に記載の原子層堆積方法。
- 前記反応中間ガスを流す過程は、前記堆積反応室内のプラズマ発生によりプラズマ増強
されることを特徴とする請求項1に記載の原子層堆積方法。 - 前記反応中間ガスを流す過程は、前記堆積反応室とは離れたプラズマ発生によりプラズマ増強されることを特徴とする請求項1に記載の原子層堆積方法。
- 前記第2前駆ガスは第1前駆ガスとは組成が異なることを特徴とする請求項1に記載の原子層堆積方法。
- 前記反応中間ガスは、前記状態の下において、前記第1前駆ガスと反応できないことを特徴とする請求項18に記載の原子層堆積方法。
- 前記反応中間ガスは、前記状態の下において、前記第2前駆ガスと反応できないことを特徴とする請求項18に記載の原子層堆積方法。
- 前記第1前駆ガスを流す過程の間に前記中間反応副生成物を形成する過程と、前記反応中間ガスを流す過程の間に前記反応中間ガスを前記中間反応副生成物と反応させる過程とを具備することを特徴とする請求項18に記載の原子層堆積方法。
- 前記反応中間ガスを流した後であって前記第2前駆ガスを流す前に、前記堆積反応室内の前記基板に不活性パージガスを流す過程と、
前記不活性パージガスを流した後に、前記第2前駆ガスを前記基板に流す過程とを具備することを特徴とする請求項1に記載の原子層堆積方法。 - 前記第1単分子層を形成した後であって前記反応中間ガスを流す前に、前記堆積反応室内の前記基板に不活性パージガスを流す過程と、
前記不活性パージガスを流した後に、前記反応中間ガスを前記基板に流す過程とを具備することを特徴とする請求項1に記載の原子層堆積方法。 - 前記不活性パージガスを流す過程は、他のすべてのガスの流れから時間的に間隔を開けられたパルスであり、前記第1前駆ガスを流す過程と前記第2前駆ガスを流す過程との間に複数の不活性パージガスパルスを導く過程を有することを特徴とする請求項23に記載の原子層堆積方法。
- 原子層堆積方法であって、
堆積反応室内に半導体基板を供給する過程と、
前記基板上に第1単分子層を形成するのに有効なように、前記堆積反応室内の前記基板に第1前駆ガスを流す過程と、
前記第1単分子層を形成した後に、前記堆積反応室内の前記基板に複数の不活性パージガスパルスを流す過程であって、該複数の不活性パージガスパルスは、少なくとも2つの隣接する不活性パージガスパルスの間に、前記堆積反応室にガスを供給しない少なくともある期間を含む、複数の不活性パージガスパルスを流す過程と、
前記複数の不活性パージガスパルスの後に、前記第1単分子層上に第2単分子層を形成するのに有効なように、第2前駆ガスを前記堆積反応室内の前記基板に流す過程と、
を具備し、
前記2つの隣接する不活性パージガスパルスの間の総期間は、前記堆積反応室内の前記基板に反応中間ガスを流す過程を含み、該反応中間ガスは、該反応中間ガスが流れている状態の下で、前記第1前駆ガスを流すことから生ずる中間反応副生成物と反応可能である 、ことを特徴とする原子層堆積方法。 - 前記複数とは、2つであることを特徴とする請求項25に記載の原子層堆積方法。
- 前記複数とは、2つよりも多いことを特徴とする請求項25に記載の原子層堆積方法。
- 前記複数とは、前記複数のすべてに共通の不活性パージガスの組成により特徴付けられることを特徴とする請求項25に記載の原子層堆積方法。
- 前記反応中間ガスは、前記反応中間ガスが流れている前記状態の下で、前記基板の露出した如何なる部分とも反応できず、かつ、反応しないことを特徴とする請求項25に記載の原子層堆積方法。
- 前記第1前駆ガスを流している間に前記中間反応副生成物を形成する過程と、前記反応中間ガスを流している間に前記反応中間ガスを前記中間反応副生成物と反応させる過程とを具備することを特徴とする請求項25に記載の原子層堆積方法。
- 前記第1前駆ガスを流している間に前記中間反応副生成物を形成する過程と、前記反応中間ガスを流している間に前記反応中間ガスを前記中間反応副生成物と反応させる過程とを具備し、
前記反応中間ガスは、前記反応中間ガスが流れている状態の下で、前記基板の露出した如何なる部分とも反応できず、かつ、反応しないことを特徴とする請求項25に記載の原子層堆積方法。 - 前記第2前駆ガスは、前記第1前駆ガスと組成が異なることを特徴とする請求項25に記載の原子層堆積方法。
- 原子層堆積方法であって、
堆積反応室内に半導体基板を供給する過程と、
前記基板上に第1単分子層を形成するのに有効なように、前記堆積反応室内の前記基板に第1前駆ガスを流す過程と、
前記第1単分子層を形成した後に、前記堆積反応室内の前記基板に反応中間ガスを流す過程であって、該反応中間ガスが、該反応中間ガスを流している状態の下で、前記第1前駆ガスを流すことから生ずる中間反応副生成物と反応可能であり、かつ、前記反応中間ガスを流している間に前記第1単分子層と反応しない、反応中間ガスを流す過程と、
前記反応中間ガスを流した後に、前記堆積反応室内の前記基板に不活性パージガスを流す過程と、
前記不活性パージガスを流した後に、前記第1単分子層上に第2単分子層を形成するのに有効なように、前記堆積反応室内の前記基板に第2前駆ガスを流す過程と、
を具備することを特徴とする原子層堆積方法。 - 前記反応中間ガスを流す過程はプラズマ増強されることを特徴とする請求項33に記載の原子層堆積方法。
- 原子層堆積方法であって、
堆積反応室内に半導体基板を供給する過程と、
前記基板上に第1単分子層を形成するのに有効なように、前記堆積反応室内の前記基板に第1前駆ガスを流す過程と、
前記第1単分子層を形成した後に、前記堆積反応室内の前記基板に不活性パージガスを流す過程と、
前記不活性パージガスを流した後に、前記堆積反応室内の前記基板に反応中間ガスを流す過程であって、該反応中間ガスが、該反応中間ガスを流している状態の下で、前記第1前駆ガスを流すことから生ずる中間反応副生成物と反応可能であり、かつ、前記反応中間
ガスを流している間に前記第1単分子層と反応しない、反応中間ガスを流す過程と、
前記反応中間ガスを流した後に、前記第1単分子層上に第2単分子層を形成するのに有効なように、前記堆積反応室内の前記基板に第2前駆ガスを流す過程と、
を具備することを特徴とする原子層堆積方法。 - 前記反応中間ガスを流す過程はプラズマ増強されることを特徴とする請求項35に記載の原子層堆積方法。
- 前記反応中間ガスを流す過程はプラズマ増強され、前記反応中間ガスは、前記反応中間ガスを流している間に前記第1単分子層と反応しないことを特徴とする請求項1に記載の原子層堆積方法。
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WO2004011693A1 (en) | 2004-02-05 |
US7150789B2 (en) | 2006-12-19 |
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