JP4218816B2 - 針荷重測定方法、検査方法及び検査装置 - Google Patents

針荷重測定方法、検査方法及び検査装置 Download PDF

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Publication number
JP4218816B2
JP4218816B2 JP2000036361A JP2000036361A JP4218816B2 JP 4218816 B2 JP4218816 B2 JP 4218816B2 JP 2000036361 A JP2000036361 A JP 2000036361A JP 2000036361 A JP2000036361 A JP 2000036361A JP 4218816 B2 JP4218816 B2 JP 4218816B2
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Japan
Prior art keywords
mounting table
amount
overdrive
needle load
probes
Prior art date
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Expired - Fee Related
Application number
JP2000036361A
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English (en)
Japanese (ja)
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JP2001228212A5 (enExample
JP2001228212A (ja
Inventor
清 竹腰
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2000036361A priority Critical patent/JP4218816B2/ja
Priority to US09/776,686 priority patent/US20010013787A1/en
Priority to KR1020010007206A priority patent/KR100618747B1/ko
Publication of JP2001228212A publication Critical patent/JP2001228212A/ja
Priority to US10/360,811 priority patent/US6707310B2/en
Publication of JP2001228212A5 publication Critical patent/JP2001228212A5/ja
Application granted granted Critical
Publication of JP4218816B2 publication Critical patent/JP4218816B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L5/00Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2886Features relating to contacting the IC under test, e.g. probe heads; chucks
    • G01R31/2887Features relating to contacting the IC under test, e.g. probe heads; chucks involving moving the probe head or the IC under test; docking stations
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/06794Devices for sensing when probes are in contact, or in position to contact, with measured object
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00Material or article handling
    • Y10S414/135Associated with semiconductor wafer handling
    • Y10S414/136Associated with semiconductor wafer handling including wafer orienting means

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Engineering & Computer Science (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Measuring Leads Or Probes (AREA)
  • Tests Of Electronic Circuits (AREA)
JP2000036361A 2000-02-15 2000-02-15 針荷重測定方法、検査方法及び検査装置 Expired - Fee Related JP4218816B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2000036361A JP4218816B2 (ja) 2000-02-15 2000-02-15 針荷重測定方法、検査方法及び検査装置
US09/776,686 US20010013787A1 (en) 2000-02-15 2001-02-06 Needle load measuring method, needle load setting method and needle load detecting mechanism
KR1020010007206A KR100618747B1 (ko) 2000-02-15 2001-02-14 프로브 장치, 침 하중 측정 방법 및 피검사체의 전기 특성 검사 방법
US10/360,811 US6707310B2 (en) 2000-02-15 2003-02-10 Needle load measuring method, needle load setting method and needle load detecting mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000036361A JP4218816B2 (ja) 2000-02-15 2000-02-15 針荷重測定方法、検査方法及び検査装置

Publications (3)

Publication Number Publication Date
JP2001228212A JP2001228212A (ja) 2001-08-24
JP2001228212A5 JP2001228212A5 (enExample) 2007-04-19
JP4218816B2 true JP4218816B2 (ja) 2009-02-04

Family

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Family Applications (1)

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JP2000036361A Expired - Fee Related JP4218816B2 (ja) 2000-02-15 2000-02-15 針荷重測定方法、検査方法及び検査装置

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Country Link
US (2) US20010013787A1 (enExample)
JP (1) JP4218816B2 (enExample)
KR (1) KR100618747B1 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003168707A (ja) * 2001-11-30 2003-06-13 Tokyo Electron Ltd プローブ装置
US7368929B2 (en) * 2006-01-18 2008-05-06 Electroglas, Inc. Methods and apparatuses for improved positioning in a probing system
KR100981648B1 (ko) * 2006-02-23 2010-09-10 씨에스전자(주) 수동식 반도체 웨이퍼 검사장치
US7750657B2 (en) * 2007-03-15 2010-07-06 Applied Materials Inc. Polishing head testing with movable pedestal
JP2008272931A (ja) * 2007-04-30 2008-11-13 Suss Microtec Test Systems Gmbh 運動装置を制御する装置と方法
US7573283B2 (en) * 2007-06-19 2009-08-11 Suss Micro Tec Test Systems Gmbh Method for measurement of a device under test
JP4999615B2 (ja) * 2007-08-31 2012-08-15 東京エレクトロン株式会社 検査装置及び検査方法
JP5221118B2 (ja) * 2007-12-14 2013-06-26 東京エレクトロン株式会社 検査装置
KR101032959B1 (ko) * 2009-05-20 2011-05-09 주식회사 쎄믹스 웨이퍼 프로버의 니들 클리너 위치제어장치 및 위치제어방법
JP5213930B2 (ja) * 2010-09-27 2013-06-19 要一 手塚 ピックル液注入方法及びその装置
CN102721487A (zh) * 2011-03-31 2012-10-10 旺矽科技股份有限公司 探针针压监测方法
US8659308B1 (en) * 2012-10-09 2014-02-25 Rudolph Technolgies, Inc. Selective overtravel during electrical test of probe cards
KR20190052533A (ko) * 2017-11-08 2019-05-16 삼성전자주식회사 기판 지지 및 이송 장치, 기판 지지 및 이송 방법 및 이를 이용한 표시 장치의 제조 방법
JP7421990B2 (ja) * 2020-04-08 2024-01-25 株式会社日本マイクロニクス 電気的接続装置および検査方法
JP7714392B2 (ja) * 2021-07-01 2025-07-29 株式会社日本マイクロニクス 検査装置、位置調整ユニット及び位置調整方法
JP7773620B2 (ja) * 2022-03-10 2025-11-19 株式会社Fuji プラズマ照射装置及びプラズマ処理液体製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6465848A (en) 1987-09-04 1989-03-13 Canon Kk Alignment
JP3208734B2 (ja) 1990-08-20 2001-09-17 東京エレクトロン株式会社 プローブ装置
JPH06124982A (ja) * 1992-01-14 1994-05-06 Mitsubishi Electric Corp 半導体試験装置
JP3219844B2 (ja) 1992-06-01 2001-10-15 東京エレクトロン株式会社 プローブ装置
JP3163221B2 (ja) * 1993-08-25 2001-05-08 東京エレクトロン株式会社 プローブ装置
JP2818363B2 (ja) 1993-08-31 1998-10-30 株式会社東芝 半導体製造装置
KR100248569B1 (ko) 1993-12-22 2000-03-15 히가시 데쓰로 프로우브장치
JP3138908B2 (ja) * 1995-03-20 2001-02-26 東京エレクトロン株式会社 プローブ装置
US5777485A (en) 1995-03-20 1998-07-07 Tokyo Electron Limited Probe method and apparatus with improved probe contact
US5773987A (en) 1996-02-26 1998-06-30 Motorola, Inc. Method for probing a semiconductor wafer using a motor controlled scrub process
US5872458A (en) 1996-07-08 1999-02-16 Motorola, Inc. Method for electrically contacting semiconductor devices in trays and test contactor useful therefor
JP3639887B2 (ja) 1997-01-30 2005-04-20 東京エレクトロン株式会社 検査方法及び検査装置
JP3423979B2 (ja) 1997-07-11 2003-07-07 東京エレクトロン株式会社 プローブ方法及びプローブ装置
JP2000252304A (ja) 1999-03-02 2000-09-14 Toshiba Corp 半導体製造装置

Also Published As

Publication number Publication date
KR100618747B1 (ko) 2006-08-31
US20010013787A1 (en) 2001-08-16
US20030117160A1 (en) 2003-06-26
KR20010082618A (ko) 2001-08-30
JP2001228212A (ja) 2001-08-24
US6707310B2 (en) 2004-03-16

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