JP4214005B2 - 光硬化性樹脂組成物及びプラズマディスプレイパネル用前面基板 - Google Patents
光硬化性樹脂組成物及びプラズマディスプレイパネル用前面基板 Download PDFInfo
- Publication number
- JP4214005B2 JP4214005B2 JP2003172344A JP2003172344A JP4214005B2 JP 4214005 B2 JP4214005 B2 JP 4214005B2 JP 2003172344 A JP2003172344 A JP 2003172344A JP 2003172344 A JP2003172344 A JP 2003172344A JP 4214005 B2 JP4214005 B2 JP 4214005B2
- Authority
- JP
- Japan
- Prior art keywords
- compound
- resin composition
- photocurable resin
- black
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/22—Electrodes, e.g. special shape, material or configuration
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Plasma & Fusion (AREA)
- Gas-Filled Discharge Tubes (AREA)
- Materials For Photolithography (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003172344A JP4214005B2 (ja) | 2003-06-17 | 2003-06-17 | 光硬化性樹脂組成物及びプラズマディスプレイパネル用前面基板 |
TW093117379A TW200502990A (en) | 2003-06-17 | 2004-06-16 | Photo-curable resin composition and front substrate for plasma display panel |
KR1020040044830A KR101113464B1 (ko) | 2003-06-17 | 2004-06-17 | 광경화성 수지 조성물 및 플라즈마 디스플레이 패널용전면 기판 |
CN2004100552022A CN1574163B (zh) | 2003-06-17 | 2004-06-17 | 光固化性树脂组合物及等离子体显示板用前面基板 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003172344A JP4214005B2 (ja) | 2003-06-17 | 2003-06-17 | 光硬化性樹脂組成物及びプラズマディスプレイパネル用前面基板 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005011584A JP2005011584A (ja) | 2005-01-13 |
JP4214005B2 true JP4214005B2 (ja) | 2009-01-28 |
Family
ID=34096530
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003172344A Expired - Fee Related JP4214005B2 (ja) | 2003-06-17 | 2003-06-17 | 光硬化性樹脂組成物及びプラズマディスプレイパネル用前面基板 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4214005B2 (zh) |
KR (1) | KR101113464B1 (zh) |
CN (1) | CN1574163B (zh) |
TW (1) | TW200502990A (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1754722B1 (en) * | 2005-08-17 | 2009-10-07 | LG Electronics Inc. | Black paste composite, upper plate of plasma display panel, and manufacturing method by using the same |
JP2008159360A (ja) * | 2006-12-22 | 2008-07-10 | Mitsubishi Materials Corp | プラズマディスプレイパネルの製造方法 |
WO2016158864A1 (ja) * | 2015-04-01 | 2016-10-06 | 東レ株式会社 | 感光性樹脂組成物、導電性パターンの製造方法、基板、タッチパネル及びディスプレイ |
WO2018029747A1 (ja) * | 2016-08-08 | 2018-02-15 | 東レ株式会社 | 感光性樹脂組成物、導電性パターンの製造方法、基板、タッチパネル及びディスプレイ |
EP3671341B1 (en) * | 2017-08-18 | 2022-07-20 | LG Chem, Ltd. | Substrate |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5525041A (en) * | 1978-08-11 | 1980-02-22 | Hitachi Ltd | Forming transparent conductive layer on substrate |
US4816496A (en) * | 1984-06-26 | 1989-03-28 | Kabushiki Kaisha Toshiba | Photocurable composition |
EP1012671B1 (en) * | 1998-07-14 | 2003-09-24 | Brewer Science, Inc. | Photosensitive black matrix composition and process of making it |
JP3479463B2 (ja) * | 1999-01-29 | 2003-12-15 | 太陽インキ製造株式会社 | 光硬化型導電性組成物及びそれを用いて電極形成したプラズマディスプレイパネル |
JP4771598B2 (ja) * | 2001-01-29 | 2011-09-14 | 太陽ホールディングス株式会社 | 光硬化性樹脂組成物及びそれを用いてブラックマトリックスを形成したプラズマディスプレイパネル |
-
2003
- 2003-06-17 JP JP2003172344A patent/JP4214005B2/ja not_active Expired - Fee Related
-
2004
- 2004-06-16 TW TW093117379A patent/TW200502990A/zh unknown
- 2004-06-17 CN CN2004100552022A patent/CN1574163B/zh not_active Expired - Fee Related
- 2004-06-17 KR KR1020040044830A patent/KR101113464B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR101113464B1 (ko) | 2012-03-20 |
JP2005011584A (ja) | 2005-01-13 |
TW200502990A (en) | 2005-01-16 |
KR20040111097A (ko) | 2004-12-31 |
CN1574163B (zh) | 2010-06-23 |
CN1574163A (zh) | 2005-02-02 |
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