JP4194249B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP4194249B2
JP4194249B2 JP2001080895A JP2001080895A JP4194249B2 JP 4194249 B2 JP4194249 B2 JP 4194249B2 JP 2001080895 A JP2001080895 A JP 2001080895A JP 2001080895 A JP2001080895 A JP 2001080895A JP 4194249 B2 JP4194249 B2 JP 4194249B2
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Japan
Prior art keywords
group
resin
structural unit
general formula
unit represented
Prior art date
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Expired - Fee Related
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JP2001080895A
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English (en)
Japanese (ja)
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JP2002278070A5 (enExample
JP2002278070A (ja
Inventor
亨 藤森
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Fujifilm Corp
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Fujifilm Corp
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Priority to JP2001080895A priority Critical patent/JP4194249B2/ja
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Publication of JP2002278070A5 publication Critical patent/JP2002278070A5/ja
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Publication of JP4194249B2 publication Critical patent/JP4194249B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2001080895A 2001-03-21 2001-03-21 ポジ型レジスト組成物 Expired - Fee Related JP4194249B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001080895A JP4194249B2 (ja) 2001-03-21 2001-03-21 ポジ型レジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001080895A JP4194249B2 (ja) 2001-03-21 2001-03-21 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2002278070A JP2002278070A (ja) 2002-09-27
JP2002278070A5 JP2002278070A5 (enExample) 2006-01-19
JP4194249B2 true JP4194249B2 (ja) 2008-12-10

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ID=18937093

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001080895A Expired - Fee Related JP4194249B2 (ja) 2001-03-21 2001-03-21 ポジ型レジスト組成物

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JP (1) JP4194249B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004059378A2 (en) * 2002-12-16 2004-07-15 E Ink Corporation Backplanes for electro-optic displays
JP2004220009A (ja) * 2002-12-28 2004-08-05 Jsr Corp 感放射線性樹脂組成物
EP1602975A4 (en) 2002-12-28 2009-12-02 Jsr Corp RESIN COMPOSITION SENSITIVE TO RADIATION
JP5081560B2 (ja) * 2007-09-28 2012-11-28 富士フイルム株式会社 ポジ型レジスト組成物およびこれを用いたパターン形成方法

Also Published As

Publication number Publication date
JP2002278070A (ja) 2002-09-27

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