JP2002278070A5 - - Google Patents
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- Publication number
- JP2002278070A5 JP2002278070A5 JP2001080895A JP2001080895A JP2002278070A5 JP 2002278070 A5 JP2002278070 A5 JP 2002278070A5 JP 2001080895 A JP2001080895 A JP 2001080895A JP 2001080895 A JP2001080895 A JP 2001080895A JP 2002278070 A5 JP2002278070 A5 JP 2002278070A5
- Authority
- JP
- Japan
- Prior art keywords
- resin
- hydrogen atom
- general formulas
- group
- resist composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001080895A JP4194249B2 (ja) | 2001-03-21 | 2001-03-21 | ポジ型レジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001080895A JP4194249B2 (ja) | 2001-03-21 | 2001-03-21 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002278070A JP2002278070A (ja) | 2002-09-27 |
| JP2002278070A5 true JP2002278070A5 (enExample) | 2006-01-19 |
| JP4194249B2 JP4194249B2 (ja) | 2008-12-10 |
Family
ID=18937093
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001080895A Expired - Fee Related JP4194249B2 (ja) | 2001-03-21 | 2001-03-21 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4194249B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004059378A2 (en) * | 2002-12-16 | 2004-07-15 | E Ink Corporation | Backplanes for electro-optic displays |
| JP2004220009A (ja) * | 2002-12-28 | 2004-08-05 | Jsr Corp | 感放射線性樹脂組成物 |
| EP1602975A4 (en) | 2002-12-28 | 2009-12-02 | Jsr Corp | RESIN COMPOSITION SENSITIVE TO RADIATION |
| JP5081560B2 (ja) * | 2007-09-28 | 2012-11-28 | 富士フイルム株式会社 | ポジ型レジスト組成物およびこれを用いたパターン形成方法 |
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2001
- 2001-03-21 JP JP2001080895A patent/JP4194249B2/ja not_active Expired - Fee Related