JP4188294B2 - フォトレジスト再生のプロセス - Google Patents

フォトレジスト再生のプロセス Download PDF

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Publication number
JP4188294B2
JP4188294B2 JP2004257737A JP2004257737A JP4188294B2 JP 4188294 B2 JP4188294 B2 JP 4188294B2 JP 2004257737 A JP2004257737 A JP 2004257737A JP 2004257737 A JP2004257737 A JP 2004257737A JP 4188294 B2 JP4188294 B2 JP 4188294B2
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JP
Japan
Prior art keywords
photoresist
viscosity
solid volume
released
waste
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004257737A
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English (en)
Japanese (ja)
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JP2005316355A (ja
JP2005316355A5 (enExample
Inventor
頼慶智
張芳誠
陳銘恩
朱榮祥
蕭光玲
姜玉玲
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Industrial Technology Research Institute ITRI
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Industrial Technology Research Institute ITRI
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Publication date
Application filed by Industrial Technology Research Institute ITRI filed Critical Industrial Technology Research Institute ITRI
Publication of JP2005316355A publication Critical patent/JP2005316355A/ja
Publication of JP2005316355A5 publication Critical patent/JP2005316355A5/ja
Application granted granted Critical
Publication of JP4188294B2 publication Critical patent/JP4188294B2/ja
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Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • H10P95/00—

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
JP2004257737A 2004-04-29 2004-08-09 フォトレジスト再生のプロセス Expired - Fee Related JP4188294B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW093112001A TWI255917B (en) 2004-04-29 2004-04-29 Monitoring method, process and system for photoresist regeneration

Publications (3)

Publication Number Publication Date
JP2005316355A JP2005316355A (ja) 2005-11-10
JP2005316355A5 JP2005316355A5 (enExample) 2008-07-24
JP4188294B2 true JP4188294B2 (ja) 2008-11-26

Family

ID=35187495

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004257737A Expired - Fee Related JP4188294B2 (ja) 2004-04-29 2004-08-09 フォトレジスト再生のプロセス

Country Status (4)

Country Link
US (1) US7052826B2 (enExample)
JP (1) JP4188294B2 (enExample)
KR (1) KR20050105089A (enExample)
TW (1) TWI255917B (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7844665B2 (en) * 2004-04-23 2010-11-30 Waratek Pty Ltd. Modified computer architecture having coordinated deletion of corresponding replicated memory locations among plural computers
TWI321703B (en) * 2006-02-21 2010-03-11 Ind Tech Res Inst Process for photoresist regeneration and system thereof
JP2008078503A (ja) * 2006-09-22 2008-04-03 Toshiba Corp 半導体製造工程における廃液処理方法、及び基板処理装置
JP5065121B2 (ja) * 2008-03-28 2012-10-31 東京エレクトロン株式会社 レジスト液供給装置、レジスト液供給方法、プログラム及びコンピュータ記憶媒体
JP5433279B2 (ja) * 2009-03-31 2014-03-05 東京応化工業株式会社 再生レジストの製造方法
TWI605075B (zh) * 2016-07-29 2017-11-11 羅文烽 廢光阻劑回收再生系統與方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11133619A (ja) * 1997-05-01 1999-05-21 Shipley Co Llc フォトレジストのリサイクリング方法

Also Published As

Publication number Publication date
JP2005316355A (ja) 2005-11-10
US20050244761A1 (en) 2005-11-03
TWI255917B (en) 2006-06-01
KR20050105089A (ko) 2005-11-03
TW200535414A (en) 2005-11-01
US7052826B2 (en) 2006-05-30

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