JP4159453B2 - ナノインプリント方法、ナノインプリント装置、及び磁気記録媒体の製造方法 - Google Patents

ナノインプリント方法、ナノインプリント装置、及び磁気記録媒体の製造方法 Download PDF

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Publication number
JP4159453B2
JP4159453B2 JP2003392285A JP2003392285A JP4159453B2 JP 4159453 B2 JP4159453 B2 JP 4159453B2 JP 2003392285 A JP2003392285 A JP 2003392285A JP 2003392285 A JP2003392285 A JP 2003392285A JP 4159453 B2 JP4159453 B2 JP 4159453B2
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thin film
resin thin
mold
pressure
temperature
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Japanese (ja)
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JP2004235613A5 (enExample
JP2004235613A (ja
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敦 遊佐
寿紀 杉山
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Maxell Ltd
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Hitachi Maxell Energy Ltd
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  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2003392285A 2003-01-07 2003-11-21 ナノインプリント方法、ナノインプリント装置、及び磁気記録媒体の製造方法 Expired - Fee Related JP4159453B2 (ja)

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JP2003392285A JP4159453B2 (ja) 2003-01-07 2003-11-21 ナノインプリント方法、ナノインプリント装置、及び磁気記録媒体の製造方法

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JP2003001171 2003-01-07
JP2003392285A JP4159453B2 (ja) 2003-01-07 2003-11-21 ナノインプリント方法、ナノインプリント装置、及び磁気記録媒体の製造方法

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JP2008036560A Division JP4111997B1 (ja) 2003-01-07 2008-02-18 ナノインプリント方法

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JP2004235613A JP2004235613A (ja) 2004-08-19
JP2004235613A5 JP2004235613A5 (enExample) 2007-12-20
JP4159453B2 true JP4159453B2 (ja) 2008-10-01

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Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4611731B2 (ja) * 2004-12-22 2011-01-12 日立マクセル株式会社 成形品の製造方法
JP2006175755A (ja) * 2004-12-22 2006-07-06 Hitachi Maxell Ltd 成形品の製造装置
JP4641835B2 (ja) * 2005-03-16 2011-03-02 リコー光学株式会社 位相シフター光学素子の製造方法及び得られる素子
KR20060127811A (ko) * 2005-06-07 2006-12-13 오브듀캇 아베 분리 장치 및 방법
US7377764B2 (en) * 2005-06-13 2008-05-27 Asml Netherlands B.V. Imprint lithography
JP2008294009A (ja) * 2005-09-05 2008-12-04 Scivax Kk 圧力を制御した微細加工方法および微細加工装置
JP2007221096A (ja) * 2006-01-23 2007-08-30 Ryusyo Industrial Co Ltd リフトオフ加工方法およびリフトオフ加工装置
JP4802799B2 (ja) * 2006-03-24 2011-10-26 凸版印刷株式会社 インプリント法、レジストパターン及びその製造方法
NL2004685A (en) * 2009-07-27 2011-01-31 Asml Netherlands Bv Imprint lithography apparatus and method.
JP5364533B2 (ja) * 2009-10-28 2013-12-11 株式会社東芝 インプリントシステムおよびインプリント方法
US8138097B1 (en) * 2010-09-20 2012-03-20 Kabushiki Kaisha Toshiba Method for processing semiconductor structure and device based on the same
JP5691717B2 (ja) * 2010-10-20 2015-04-01 ダイキン工業株式会社 インプリント用樹脂モールド材料組成物
JP6115894B2 (ja) * 2013-03-28 2017-04-19 国立研究開発法人産業技術総合研究所 樹脂への形状転写方法及びその装置
CN110426267A (zh) * 2019-07-04 2019-11-08 齐鲁理工学院 安全加压转膜装置及其应用

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