JP4136723B2 - 構造体及び構造体の製造方法 - Google Patents

構造体及び構造体の製造方法 Download PDF

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JP4136723B2
JP4136723B2 JP2003058697A JP2003058697A JP4136723B2 JP 4136723 B2 JP4136723 B2 JP 4136723B2 JP 2003058697 A JP2003058697 A JP 2003058697A JP 2003058697 A JP2003058697 A JP 2003058697A JP 4136723 B2 JP4136723 B2 JP 4136723B2
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layer
structure according
pores
protrusions
anodized
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JP2004027360A5 (enExample
JP2004027360A (ja
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彩 今田
透 田
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Canon Inc
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Canon Inc
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JP2003058697A 2002-03-27 2003-03-05 構造体及び構造体の製造方法 Expired - Fee Related JP4136723B2 (ja)

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JP2003058697A JP4136723B2 (ja) 2002-03-27 2003-03-05 構造体及び構造体の製造方法

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JP2002088206 2002-03-27
JP2002128465 2002-04-30
JP2003058697A JP4136723B2 (ja) 2002-03-27 2003-03-05 構造体及び構造体の製造方法

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JP2004027360A JP2004027360A (ja) 2004-01-29
JP2004027360A5 JP2004027360A5 (enExample) 2006-04-20
JP4136723B2 true JP4136723B2 (ja) 2008-08-20

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4621058B2 (ja) * 2005-03-31 2011-01-26 キヤノン株式会社 ナノ構造体の製造方法
JP5094208B2 (ja) * 2006-08-24 2012-12-12 キヤノン株式会社 構造体の製造方法
WO2010124301A2 (en) * 2009-04-24 2010-10-28 Wolf Oetting Methods and devices for an electrically non-resistive layer formed from an electrically insulating material
JP5626636B2 (ja) * 2009-09-28 2014-11-19 公益財団法人神奈川科学技術アカデミー 陽極酸化ポーラスアルミナの製造方法、装置、その方法により製造された陽極酸化ポーラスアルミナ、陽極酸化ポーラスアルミナを鋳型として製造された成形体、反射防止物品および撥水性物品
WO2025041470A1 (ja) * 2023-08-23 2025-02-27 富士フイルム株式会社 構造体の製造方法

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