JP4121961B2 - 走査型プローブ顕微鏡 - Google Patents
走査型プローブ顕微鏡 Download PDFInfo
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- JP4121961B2 JP4121961B2 JP2003568346A JP2003568346A JP4121961B2 JP 4121961 B2 JP4121961 B2 JP 4121961B2 JP 2003568346 A JP2003568346 A JP 2003568346A JP 2003568346 A JP2003568346 A JP 2003568346A JP 4121961 B2 JP4121961 B2 JP 4121961B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q20/00—Monitoring the movement or position of the probe
- G01Q20/02—Monitoring the movement or position of the probe by optical means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q10/00—Scanning or positioning arrangements, i.e. arrangements for actively controlling the movement or position of the probe
- G01Q10/02—Coarse scanning or positioning
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q10/00—Scanning or positioning arrangements, i.e. arrangements for actively controlling the movement or position of the probe
- G01Q10/04—Fine scanning or positioning
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
- G01Q70/02—Probe holders
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/724—Devices having flexible or movable element
- Y10S977/732—Nanocantilever
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
- Y10S977/86—Scanning probe structure
- Y10S977/868—Scanning probe structure with optical means
- Y10S977/869—Optical microscope
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
- Y10S977/86—Scanning probe structure
- Y10S977/868—Scanning probe structure with optical means
- Y10S977/87—Optical lever arm for reflecting light
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
- Y10S977/86—Scanning probe structure
- Y10S977/873—Tip holder
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/88—Manufacture, treatment, or detection of nanostructure with arrangement, process, or apparatus for testing
- Y10S977/881—Microscopy or spectroscopy, e.g. sem, tem
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- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Radiology & Medical Imaging (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
Description
1) 走査精度:x−y軸とz軸との間のクロストーク(cross talk)が全くないため、高い走査精度が得られる。
2) サンプルの大きさ:サンプルがx−y方向にのみ走査されるため、小形サンプルだけではなく大形サンプルも充分高速で走査することができる。
3) 走査速度:zスキャナは、大きい力の高い共振周波数を有すると共に、カンチレバーとPSPDだけを走査すればよいため、従来技術よりzサーボ周波数応答が遥かに大きい。
4) 便利性:レーザー光線調節器具は探針ヘッドに固定され、このようなレーザー光線調節器具を、別途の工具を使うことなく便利且つ正確に調節できるよう、充分大きくすることができる。
5) 光視覚:カンチレバーの上側に充分な空間が確保できるため、直立軸上光学顕微鏡(direct on-axis optical microscope)を収容することができる。
6) 焦点合わせ(panning):ブラケットを有する単一体光学顕微鏡を使用することにより、光学顕微鏡の像がさらに鮮明で明らかになる。
Claims (7)
- 固定フレーム;
前記固定フレームに取り付けられた第1スキャナ;
前記第1スキャナに取り付けられて、前記第1スキャナにより平面上に移動可能なサンプルチェック;
前記第1スキャナから物理的に分離されて、前記固定フレームに取り付けられたzステージ上に設けられた第2スキャナ;
前記第2スキャナに支持されて、前記サンプルチェックの移動平面に垂直な線に沿って、前記第2スキャナにより移動可能なカンチレバー;
前記カンチレバーの自由端に取り付けられた探針;
前記カンチレバー上に設けられた反射器;
前記反射器に向かって、前記zステージ上に設けられた光源;
前記zステージ上に設けられた第1ミラー:
前記光源からの光であって、前記反射器と前記第一ミラーにより反射された光の一部を受光するために、前記zステージ上に設けられた前記第2スキャナにより支持される光検出器;及び
前記zステージ上に支持されて、前記第1ミラーと平行な第2ミラーを含んでなり、
前記第1ミラーは、探針の移動線に対し角度を成して配向されて、前記第1ミラーと第2ミラーとは、前記移動線の両側面に配列される走査型プローブ顕微鏡。 - 前記探針の移動線に沿って配列された直立軸上光学顕微鏡(Direct on-axis optical microscope)をさらに含むことを特徴とすることを特徴とする、請求項1記載の走査型プローブ顕微鏡。
- 前記第2スキャナは静電圧アクチュエータ( stacked piezoelectric actuator )を含むことを特徴とする、請求項1に記載の走査型プローブ顕微鏡。
- 固定フレーム;
前記固定フレームに取り付けられた第1スキャナ;
前記第1スキャナに取り付けられて、前記第1スキャナにより平面上に移動可能なサンプルチェック;
前記第1スキャナから物理的に分離されて、前記固定フレームに取り付けられたzステージ上に設けられた第2スキャナ;
前記第2スキャナに支持されて、前記サンプルチェックの移動平面に垂直な線に沿って、前記第2スキャナにより移動可能なカンチレバー;
前記カンチレバーの自由端に取り付けられた探針;
前記カンチレバー上に設けられた反射器;
前記反射器に向かって、前記zステージ上に設けられた光源;
前記zステージ上に設けられた第1ミラー:
前記光源からの光であって、前記反射器と前記第一ミラーにより反射された光の一部を受光するために、前記zステージ上に設けられた前記第2スキャナにより支持される光検出器;及び
前記zステージ上に支持されて、前記第1ミラーと平行な第2ミラーを含んでなり、
前記第1ミラーは、探針の移動線に平行に配向されて、前記第1ミラーと第2ミラーとは、前記移動線の両側面に配列される走査型プローブ顕微鏡。 - 前記第1スキャナは、x−y屈曲ステージを含むことを特徴とする、請求項1に記載の走査型プローブ顕微鏡。
- 固定フレーム;
前記固定フレームに取り付けられた2次元屈曲ステージ;
前記2次元屈曲ステージに取り付けられて、前記2次元屈曲ステージにより、前記固定フレームに対して平面上に移動可能なサンプルチェック;
前記固定フレームに取り付けられた1次元移動ステージ上に設けられ、前記1次元移動ステージの移動方向への線形移動に制限されて、前記平面に垂直なスキャナ;
前記スキャナに支持されて、一つの自由端を有するカンチレバー;
前記1次元移動ステージにより支持されて、前記1次元移動ステージの移動方向に平行な軸を有する対物レンズ;
前記カンチレバーと前記対物レンズとの間に前記1次元移動ステージにより支持されて、前記軸に沿って配列されるプリズム;
前記軸から外側にオフセットされ、前記1次元移動ステージにより支持されて、プリズムに向かう光源;
前記カンチレバー上に配列された反射器:
前記軸からオフセットされて、前記光源に隣接し、前記1次元移動ステージにより支持される第1ミラー;及び
前記光源から一部の光を受光するように位置されて、前記1次元移動ステージ上に設けられた前記スキャナにより支持される光検出器を含んでなり、
前記光源からの光は、前記プリズムにより、前記軸に沿って反射されて、前記プリズムからの光は、前記反射器により、前記軸に対し斜めに反射されて、前記反射器からの光は、前記第1ミラーにより反射される走査型プローブ顕微鏡。 - 前記レンズの軸は、前記カンチレバーの移動線と一致し、前記平面に垂直であることを特徴とする、請求項6記載の走査型プローブ顕微鏡。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/077,835 US6677567B2 (en) | 2002-02-15 | 2002-02-15 | Scanning probe microscope with improved scan accuracy, scan speed, and optical vision |
PCT/KR2002/002222 WO2003069271A1 (en) | 2002-02-15 | 2002-11-27 | Improved scanning probe microscope |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005517911A JP2005517911A (ja) | 2005-06-16 |
JP4121961B2 true JP4121961B2 (ja) | 2008-07-23 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003568346A Expired - Lifetime JP4121961B2 (ja) | 2002-02-15 | 2002-11-27 | 走査型プローブ顕微鏡 |
Country Status (6)
Country | Link |
---|---|
US (3) | US6677567B2 (ja) |
EP (1) | EP1377794B1 (ja) |
JP (1) | JP4121961B2 (ja) |
KR (1) | KR100646441B1 (ja) |
AU (1) | AU2002356461A1 (ja) |
WO (1) | WO2003069271A1 (ja) |
Families Citing this family (34)
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EP4092425A4 (en) | 2020-01-14 | 2024-02-28 | Park Systems Corp. | METHOD FOR DETERMINING THE PROPERTIES OF A SURFACE TO BE MEASURED USING AN INCLINED TIP, NUCLEAR POWER MICROSCOPE FOR PERFORMING THE METHOD AND COMPUTER PROGRAM FOR PERFORMING THE METHOD |
WO2022065928A1 (ko) | 2020-09-24 | 2022-03-31 | 파크시스템스 주식회사 | 측정 장치에 의해 측정 대상의 표면의 특성을 측정하는 방법, 이 방법이 수행되기 위한 원자 현미경 및 이 방법이 수행되기 위해 저장 매체에 저장된 컴퓨터 프로그램 |
WO2022065926A1 (ko) | 2020-09-24 | 2022-03-31 | 파크시스템스 주식회사 | 가변적인 셋포인트 설정을 사용하여 측정 장치에 의해 측정 대상의 표면의 특성을 측정하는 방법, 이 방법이 수행되기 위한 원자 현미경 및 이 방법이 수행되기 위해 저장 매체에 저장된 컴퓨터 프로그램 |
EP4187259A1 (en) | 2021-11-26 | 2023-05-31 | Park Systems Corp. | Atomic force microscope equipped with optical measurement device and method of acquiring information on surface of measurement target using the same |
US11619649B1 (en) | 2021-11-26 | 2023-04-04 | Park Systems Corp. | Atomic force microscope equipped with optical measurement device and method of acquiring information on surface of measurement target using the same |
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-
2002
- 2002-02-15 US US10/077,835 patent/US6677567B2/en not_active Expired - Lifetime
- 2002-10-29 KR KR1020020066054A patent/KR100646441B1/ko active IP Right Grant
- 2002-11-27 AU AU2002356461A patent/AU2002356461A1/en not_active Abandoned
- 2002-11-27 EP EP02806801.3A patent/EP1377794B1/en not_active Expired - Lifetime
- 2002-11-27 JP JP2003568346A patent/JP4121961B2/ja not_active Expired - Lifetime
- 2002-11-27 WO PCT/KR2002/002222 patent/WO2003069271A1/en active Application Filing
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2003
- 2003-12-29 US US10/748,827 patent/US6945100B2/en not_active Expired - Lifetime
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KR100646441B1 (ko) | 2006-11-14 |
KR20030068375A (ko) | 2003-08-21 |
WO2003069271A1 (en) | 2003-08-21 |
US20040140424A1 (en) | 2004-07-22 |
US6951129B2 (en) | 2005-10-04 |
JP2005517911A (ja) | 2005-06-16 |
AU2002356461A1 (en) | 2003-09-04 |
US20030155481A1 (en) | 2003-08-21 |
US6677567B2 (en) | 2004-01-13 |
EP1377794A1 (en) | 2004-01-07 |
EP1377794B1 (en) | 2013-08-14 |
US6945100B2 (en) | 2005-09-20 |
US20040140426A1 (en) | 2004-07-22 |
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