JP4092153B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP4092153B2
JP4092153B2 JP2002223386A JP2002223386A JP4092153B2 JP 4092153 B2 JP4092153 B2 JP 4092153B2 JP 2002223386 A JP2002223386 A JP 2002223386A JP 2002223386 A JP2002223386 A JP 2002223386A JP 4092153 B2 JP4092153 B2 JP 4092153B2
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JP
Japan
Prior art keywords
group
acid
hydrogen atom
general formula
atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002223386A
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English (en)
Japanese (ja)
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JP2004062049A (ja
JP2004062049A5 (enExample
Inventor
一良 水谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2002223386A priority Critical patent/JP4092153B2/ja
Priority to KR1020030026279A priority patent/KR100955006B1/ko
Priority to US10/422,789 priority patent/US7198880B2/en
Publication of JP2004062049A publication Critical patent/JP2004062049A/ja
Publication of JP2004062049A5 publication Critical patent/JP2004062049A5/ja
Application granted granted Critical
Publication of JP4092153B2 publication Critical patent/JP4092153B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2002223386A 2002-04-26 2002-07-31 ポジ型レジスト組成物 Expired - Fee Related JP4092153B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2002223386A JP4092153B2 (ja) 2002-07-31 2002-07-31 ポジ型レジスト組成物
KR1020030026279A KR100955006B1 (ko) 2002-04-26 2003-04-25 포지티브 레지스트 조성물
US10/422,789 US7198880B2 (en) 2002-04-26 2003-04-25 Positive resist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002223386A JP4092153B2 (ja) 2002-07-31 2002-07-31 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2004062049A JP2004062049A (ja) 2004-02-26
JP2004062049A5 JP2004062049A5 (enExample) 2005-09-22
JP4092153B2 true JP4092153B2 (ja) 2008-05-28

Family

ID=31943146

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002223386A Expired - Fee Related JP4092153B2 (ja) 2002-04-26 2002-07-31 ポジ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP4092153B2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7923192B2 (en) 2004-02-20 2011-04-12 Tokyo Ohka Kogyo Co., Ltd. Base material for pattern-forming material, positive resist composition and method of resist pattern formation
JP3946715B2 (ja) 2004-07-28 2007-07-18 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
JP4468119B2 (ja) 2004-09-08 2010-05-26 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
JP4837323B2 (ja) 2004-10-29 2011-12-14 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法および化合物
US7981588B2 (en) 2005-02-02 2011-07-19 Tokyo Ohka Kogyo Co., Ltd. Negative resist composition and method of forming resist pattern
JP5138157B2 (ja) 2005-05-17 2013-02-06 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
JP4813103B2 (ja) 2005-06-17 2011-11-09 東京応化工業株式会社 化合物、ポジ型レジスト組成物およびレジストパターン形成方法
JP4732038B2 (ja) 2005-07-05 2011-07-27 東京応化工業株式会社 化合物、ポジ型レジスト組成物およびレジストパターン形成方法
KR20150101074A (ko) * 2014-02-26 2015-09-03 삼성전자주식회사 포토레지스트 조성물, 이를 이용한 패턴 형성 방법 및 반도체 소자의 제조 방법
JP6417830B2 (ja) * 2014-09-30 2018-11-07 Jsr株式会社 感放射線性樹脂組成物、レジストパターン形成方法及び重合体
JP6451427B2 (ja) * 2015-03-13 2019-01-16 Jsr株式会社 感放射線性樹脂組成物及びレジストパターン形成方法

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Publication number Publication date
JP2004062049A (ja) 2004-02-26

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