JP4081580B2 - 表示装置の作製方法 - Google Patents
表示装置の作製方法 Download PDFInfo
- Publication number
- JP4081580B2 JP4081580B2 JP2005182123A JP2005182123A JP4081580B2 JP 4081580 B2 JP4081580 B2 JP 4081580B2 JP 2005182123 A JP2005182123 A JP 2005182123A JP 2005182123 A JP2005182123 A JP 2005182123A JP 4081580 B2 JP4081580 B2 JP 4081580B2
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- Prior art keywords
- semiconductor film
- wiring
- film
- light
- electrode
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Images
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- Recrystallisation Techniques (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Electroluminescent Light Sources (AREA)
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- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Thin Film Transistor (AREA)
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| JP2007233361A (ja) * | 2006-02-02 | 2007-09-13 | Semiconductor Energy Lab Co Ltd | 表示装置 |
| EP1816508A1 (en) | 2006-02-02 | 2007-08-08 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
| JP2008066216A (ja) * | 2006-09-11 | 2008-03-21 | Seiko Epson Corp | 有機エレクトロルミネッセンス装置とその製造方法及び電子機器 |
| US7960261B2 (en) * | 2007-03-23 | 2011-06-14 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing crystalline semiconductor film and method for manufacturing thin film transistor |
| JP5537102B2 (ja) * | 2009-09-11 | 2014-07-02 | 株式会社東芝 | 半導体装置の製造方法 |
| JP2012108291A (ja) * | 2010-11-17 | 2012-06-07 | Toppan Printing Co Ltd | カラーフィルタ基板の欠陥修正方法およびカラーフィルタ基板 |
| JP5741832B2 (ja) * | 2011-04-27 | 2015-07-01 | 大日本印刷株式会社 | アクティブマトリックス基板及びアクティブマトリックス基板の製造方法、液晶表示装置 |
| JP2012234864A (ja) * | 2011-04-28 | 2012-11-29 | Toshiba Corp | 半導体装置及びその製造方法 |
| WO2019106717A1 (ja) | 2017-11-28 | 2019-06-06 | 堺ディスプレイプロダクト株式会社 | 有機ｅｌ発光素子及びその製造方法 |
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