JP4071861B2 - 薄膜形成装置 - Google Patents

薄膜形成装置 Download PDF

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Publication number
JP4071861B2
JP4071861B2 JP15301198A JP15301198A JP4071861B2 JP 4071861 B2 JP4071861 B2 JP 4071861B2 JP 15301198 A JP15301198 A JP 15301198A JP 15301198 A JP15301198 A JP 15301198A JP 4071861 B2 JP4071861 B2 JP 4071861B2
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JP
Japan
Prior art keywords
target
mask member
circuit unit
magnetic circuit
axis direction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP15301198A
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English (en)
Japanese (ja)
Other versions
JPH11350130A (ja
JPH11350130A5 (enExample
Inventor
裕一 中上
悌一 木村
貴博 滝澤
勇 青倉
匡史 岡本
壮一 長沼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP15301198A priority Critical patent/JP4071861B2/ja
Publication of JPH11350130A publication Critical patent/JPH11350130A/ja
Publication of JPH11350130A5 publication Critical patent/JPH11350130A5/ja
Application granted granted Critical
Publication of JP4071861B2 publication Critical patent/JP4071861B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP15301198A 1998-06-02 1998-06-02 薄膜形成装置 Expired - Fee Related JP4071861B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15301198A JP4071861B2 (ja) 1998-06-02 1998-06-02 薄膜形成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15301198A JP4071861B2 (ja) 1998-06-02 1998-06-02 薄膜形成装置

Publications (3)

Publication Number Publication Date
JPH11350130A JPH11350130A (ja) 1999-12-21
JPH11350130A5 JPH11350130A5 (enExample) 2005-08-11
JP4071861B2 true JP4071861B2 (ja) 2008-04-02

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ID=15553015

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15301198A Expired - Fee Related JP4071861B2 (ja) 1998-06-02 1998-06-02 薄膜形成装置

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JP (1) JP4071861B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11781210B2 (en) 2021-03-09 2023-10-10 Samsung Display Co., Ltd. Magnet assembly and deposition apparatus including the same

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4440563B2 (ja) * 2002-06-03 2010-03-24 三星モバイルディスプレイ株式會社 有機電子発光素子の薄膜蒸着用マスクフレーム組立体
KR20160042316A (ko) 2014-10-08 2016-04-19 삼성디스플레이 주식회사 마그넷 플레이트 조립체, 이를 포함하는 증착 장치 및 이를 이용한 유기 발광 표시 장치 제조 방법
CN109037120B (zh) * 2018-09-20 2023-11-28 长江存储科技有限责任公司 膜层沉积装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11781210B2 (en) 2021-03-09 2023-10-10 Samsung Display Co., Ltd. Magnet assembly and deposition apparatus including the same

Also Published As

Publication number Publication date
JPH11350130A (ja) 1999-12-21

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