JP4064992B2 - ベンゼン検出素子およびその製造方法 - Google Patents
ベンゼン検出素子およびその製造方法 Download PDFInfo
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- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 title claims description 380
- 238000001514 detection method Methods 0.000 title claims description 86
- 238000004519 manufacturing process Methods 0.000 title claims description 21
- 239000011148 porous material Substances 0.000 claims description 137
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 86
- 239000002105 nanoparticle Substances 0.000 claims description 53
- 125000000524 functional group Chemical group 0.000 claims description 50
- 239000000377 silicon dioxide Substances 0.000 claims description 43
- 230000000737 periodic effect Effects 0.000 claims description 17
- -1 dimethylphenylsilyloxy group Chemical group 0.000 claims description 16
- 125000005372 silanol group Chemical group 0.000 claims description 13
- 239000002244 precipitate Substances 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 9
- 239000002243 precursor Substances 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 6
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims description 4
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 claims description 4
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 3
- 238000005245 sintering Methods 0.000 claims description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 41
- 239000007789 gas Substances 0.000 description 36
- 125000001424 substituent group Chemical group 0.000 description 22
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 20
- 238000000034 method Methods 0.000 description 14
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
- 229940078552 o-xylene Drugs 0.000 description 10
- 239000012298 atmosphere Substances 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 8
- 238000005259 measurement Methods 0.000 description 7
- 230000035945 sensitivity Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 239000003463 adsorbent Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
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- 239000000203 mixture Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000003929 acidic solution Substances 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
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- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000004847 absorption spectroscopy Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- DALDUXIBIKGWTK-UHFFFAOYSA-N benzene;toluene Chemical compound C1=CC=CC=C1.CC1=CC=CC=C1 DALDUXIBIKGWTK-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- DVYUOQXRGHUWKE-UHFFFAOYSA-N dimethyl(2-phenylethoxy)silane Chemical compound C[SiH](C)OCCC1=CC=CC=C1 DVYUOQXRGHUWKE-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 description 1
- XEMZLVDIUVCKGL-UHFFFAOYSA-N hydrogen peroxide;sulfuric acid Chemical compound OO.OS(O)(=O)=O XEMZLVDIUVCKGL-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 238000011896 sensitive detection Methods 0.000 description 1
- 230000005476 size effect Effects 0.000 description 1
- 230000003335 steric effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
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Description
[図2]本発明の検出素子の特徴を示す図である。
[図3]本発明材料の製造方法のフローを示す図である。
[図4]実施例1において、本発明に使用する装置を説明する図である。
[図5A]実施例1において、図4に示す装置を使用して、ベンゼンガスの従来法による検出を行ったときのベンゼン、トルエン、およびo−キシレンの信号強度を比較した図である。
[図5B]実施例1において、図4に示す装置を使用して、ベンゼンガスの本発明による検出を行ったときのベンゼン、トルエン、およびo−キシレンの信号強度を比較した図である。
[図6A]実施例2において、ベンゼンの従来法による信号強度を示す図である。
[図6B]実施例2において、ベンゼンの本発明による信号強度を示す図である。
本発明のベンゼン検出素子は以下のように製造した。製造方法のフローを図3に示す。
実施例1と同様に、自動車排気ガスの検出を行った。排気ガスは湿度が80%以上となる場合もあり、気体中に含まれる分子の数では水が圧倒的に多く、従来の吸着剤を用いる検出法においては水の妨害が深刻な問題となる。しかし、本発明を用いた場合は、湿度に関わらずベンゼンのシグナルが極めて強く検出された(図6A−6B)。図6Aは従来のベンゼン検出素子の信号強度を表すグラフであり、図6Bは本発明のベンゼン検出素子の信号強度を表すグラフである。以上から、本発明を用いて、大気中の微量ベンゼンを選択的に高感度検出できることが示された。
本実験では、SBA−16とこれを修飾する有機官能基の組み合わせにより、ベンゼンの選択性の変化を検討した。
Claims (9)
- ベンゼンを選択的かつ高感度に検出するためのメソポーラスシリカからなるベンゼン検出素子であって、前記検出素子は、高秩序な周期的細孔構造を持ったナノサイズの細孔を有し、前記ナノサイズの細孔の壁面にサブナノサイズの細孔を有するものであり、前記ナノサイズの細孔は、半径0.15nmから50nmの孔径を有し、前記サブナノサイズの細孔は半径0.05から0.5nmの孔径を有し、かつ、前記細孔のうちの少なくともサブナノサイズの細孔は、フェニル基を有する有機ケイ素官能基またはシラノール基により修飾されていることを特徴とするベンゼン検出素子。
- 前記有機ケイ素官能基が、ジメチルフェニルシリルオキシ基(Me2PhSi−)であることを特徴とする請求項1に記載のベンゼン検出素子。
- 前記サブナノサイズの細孔は、立方晶構造を有し、半径1.5nmから2.0nmを有するナノサイズの細孔の壁面に、該ナノサイズの細孔を連結するような構造で存在すること特徴とする請求項1または2に記載のベンゼン検出素子。
- 細孔の鋳型となる物質としてEO100−PO65−EO100(EO:エチレンオキシド、PO:プロピレンオキシドであり、数字はブロックあたりの各分子の数である)を含む溶液を加熱し、これにシリカの前駆体を添加して沈殿を形成させ、前記沈殿を乾燥した後、焼結して、高秩序な周期的細孔構造を持ったナノサイズの細孔を有し、前記ナノサイズの細孔の壁面にサブナノサイズの細孔を有するベンゼン検出素子を得ることを特徴とするベンゼン検出素子の製造方法。
- 前記加熱が30℃〜130℃の温度範囲で行われることを特徴とする請求項4に記載のベンゼン検出素子の製造方法。
- 前記焼結が450℃〜600℃の温度で行われることを特徴とする請求項4に記載のベンゼン検出素子の製造方法。
- 前記ナノサイズの細孔は、半径0.15nmから50nmの孔径を有し、前記サブナノサイズの細孔は半径0.05から0.5nmの孔径を有することを特徴とする請求項4に記載のベンゼン検出素子の製造方法。
- 前記ベンゼン検出素子にフェニル基を有するシランカップリング剤を反応させ、少なくとも前記サブナノサイズの細孔にフェニル基を有する有機ケイ素官能基を導入することをさらに含む請求項4に記載のベンゼン検出素子の製造方法。
- 前記有機ケイ素官能基が、ジメチルフェニルシリル基であることを特徴とする請求項8に記載のベンゼン検出素子の製造方法。
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JP2004030556 | 2004-02-06 | ||
JP2004030556 | 2004-02-06 | ||
PCT/JP2004/018932 WO2005075954A1 (ja) | 2004-02-06 | 2004-12-17 | ベンゼン検出素子およびその製造方法 |
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JPWO2005075954A1 JPWO2005075954A1 (ja) | 2007-08-02 |
JP4064992B2 true JP4064992B2 (ja) | 2008-03-19 |
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US (1) | US7682564B2 (ja) |
EP (1) | EP1712889B1 (ja) |
JP (1) | JP4064992B2 (ja) |
CN (1) | CN100549658C (ja) |
WO (1) | WO2005075954A1 (ja) |
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WO2007065268A1 (en) | 2005-12-08 | 2007-06-14 | Queen's University At Kingston | Optical sensor using functionalized composite materials |
CN100529754C (zh) * | 2006-11-10 | 2009-08-19 | 中国科学院山西煤炭化学研究所 | 一种分离苯及其同系物的方法 |
JP4874946B2 (ja) * | 2007-12-18 | 2012-02-15 | 日本電信電話株式会社 | ガス濃縮セルおよびガス濃縮方法 |
FR2933703B1 (fr) | 2008-07-11 | 2012-08-17 | Commissariat Energie Atomique | Detecteurs nanoporeux de composes aromatiques monocycliques et autres polluants |
EP2743681A1 (en) | 2012-12-13 | 2014-06-18 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Fluorescence detector system for detection of an aromatic hydrocarbon |
JP6736048B2 (ja) * | 2016-03-08 | 2020-08-05 | Eneos株式会社 | 触媒層、膜電極接合体、電解セル及び触媒層の製造方法 |
JP6624515B2 (ja) * | 2016-06-30 | 2019-12-25 | 日本電信電話株式会社 | 揮発性有機化合物の検出方法及び検出装置 |
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US5334368A (en) * | 1990-01-25 | 1994-08-02 | Mobil Oil Corp. | Synthesis of mesoporous oxide |
US5364797A (en) * | 1993-05-20 | 1994-11-15 | Mobil Oil Corp. | Sensor device containing mesoporous crystalline material |
US5849258A (en) * | 1996-06-06 | 1998-12-15 | Intevep, S.A. | Material with microporous crystalline walls defining a narrow size distribution of mesopores, and process for preparing same |
JPH1062401A (ja) * | 1996-06-10 | 1998-03-06 | Toyota Central Res & Dev Lab Inc | 液体クロマトグラフ用充填剤 |
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JP2000088827A (ja) * | 1998-09-11 | 2000-03-31 | Hiroki Ri | 光学異性体分離用クロマトグラフィー用担体及びその製造法 |
JP3583739B2 (ja) | 2000-08-22 | 2004-11-04 | 日本電信電話株式会社 | ガス分光分析用微小フローセルおよびその製造方法 |
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US7682564B2 (en) | 2010-03-23 |
EP1712889A1 (en) | 2006-10-18 |
JPWO2005075954A1 (ja) | 2007-08-02 |
CN100549658C (zh) | 2009-10-14 |
EP1712889A4 (en) | 2010-10-27 |
EP1712889B1 (en) | 2012-12-05 |
US20060258015A1 (en) | 2006-11-16 |
WO2005075954A1 (ja) | 2005-08-18 |
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