JP4054234B2 - 薄膜デバイス用製造装置および薄膜デバイスの製造方法 - Google Patents

薄膜デバイス用製造装置および薄膜デバイスの製造方法 Download PDF

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JP4054234B2
JP4054234B2 JP2002249796A JP2002249796A JP4054234B2 JP 4054234 B2 JP4054234 B2 JP 4054234B2 JP 2002249796 A JP2002249796 A JP 2002249796A JP 2002249796 A JP2002249796 A JP 2002249796A JP 4054234 B2 JP4054234 B2 JP 4054234B2
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heating element
thin film
film
substrate
gas
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JP2004084040A (ja
JP2004084040A5 (enExample
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弘志 林
哲哉 川上
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Kyocera Corp
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Kyocera Corp
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JP2002249796A 2002-08-28 2002-08-28 薄膜デバイス用製造装置および薄膜デバイスの製造方法 Expired - Fee Related JP4054234B2 (ja)

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JP2002249796A JP4054234B2 (ja) 2002-08-28 2002-08-28 薄膜デバイス用製造装置および薄膜デバイスの製造方法

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JP2002249796A JP4054234B2 (ja) 2002-08-28 2002-08-28 薄膜デバイス用製造装置および薄膜デバイスの製造方法

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JP2004084040A JP2004084040A (ja) 2004-03-18
JP2004084040A5 JP2004084040A5 (enExample) 2005-09-02
JP4054234B2 true JP4054234B2 (ja) 2008-02-27

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Publication number Priority date Publication date Assignee Title
JP2016111101A (ja) * 2014-12-03 2016-06-20 株式会社ニューフレアテクノロジー 気相成長方法および気相成長装置
CN109860321A (zh) * 2019-03-08 2019-06-07 泸州金能移动能源科技有限公司 一种封装光伏组件用防错位防气泡装置及其使用方法

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