JP4048600B2 - レジストの基板依存性改善剤 - Google Patents

レジストの基板依存性改善剤 Download PDF

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Publication number
JP4048600B2
JP4048600B2 JP13434398A JP13434398A JP4048600B2 JP 4048600 B2 JP4048600 B2 JP 4048600B2 JP 13434398 A JP13434398 A JP 13434398A JP 13434398 A JP13434398 A JP 13434398A JP 4048600 B2 JP4048600 B2 JP 4048600B2
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Japan
Prior art keywords
group
atom
general formula
hydroxystyrene
poly
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Expired - Lifetime
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JP13434398A
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English (en)
Japanese (ja)
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JPH1144950A (ja
JPH1144950A5 (enExample
Inventor
啓利 藤江
徹 左右木
有紀子 上原
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Fujifilm Wako Pure Chemical Corp
Original Assignee
Wako Pure Chemical Industries Ltd
Fujifilm Wako Pure Chemical Corp
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Application filed by Wako Pure Chemical Industries Ltd, Fujifilm Wako Pure Chemical Corp filed Critical Wako Pure Chemical Industries Ltd
Priority to JP13434398A priority Critical patent/JP4048600B2/ja
Publication of JPH1144950A publication Critical patent/JPH1144950A/ja
Publication of JPH1144950A5 publication Critical patent/JPH1144950A5/ja
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Publication of JP4048600B2 publication Critical patent/JP4048600B2/ja
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Expired - Lifetime legal-status Critical Current

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  • Materials For Photolithography (AREA)
JP13434398A 1997-04-30 1998-04-28 レジストの基板依存性改善剤 Expired - Lifetime JP4048600B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13434398A JP4048600B2 (ja) 1997-04-30 1998-04-28 レジストの基板依存性改善剤

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP12628397 1997-04-30
JP9-126283 1997-05-26
JP9-151570 1997-05-26
JP15157097 1997-05-26
JP13434398A JP4048600B2 (ja) 1997-04-30 1998-04-28 レジストの基板依存性改善剤

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007232489A Division JP2007334370A (ja) 1997-04-30 2007-09-07 レジスト組成物及びこれを用いたパターン形成方法

Publications (3)

Publication Number Publication Date
JPH1144950A JPH1144950A (ja) 1999-02-16
JPH1144950A5 JPH1144950A5 (enExample) 2005-07-07
JP4048600B2 true JP4048600B2 (ja) 2008-02-20

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ID=27315299

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13434398A Expired - Lifetime JP4048600B2 (ja) 1997-04-30 1998-04-28 レジストの基板依存性改善剤

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JP (1) JP4048600B2 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3931484B2 (ja) * 1999-06-03 2007-06-13 住友化学株式会社 ポジ型フォトレジスト組成物
TW502133B (en) 1999-06-10 2002-09-11 Wako Pure Chem Ind Ltd Resist composition, agent and method for reducing substrate dependence thereof
JP4710193B2 (ja) * 2001-08-01 2011-06-29 Ｊｓｒ株式会社 感放射線性樹脂組成物
US7521168B2 (en) 2002-02-13 2009-04-21 Fujifilm Corporation Resist composition for electron beam, EUV or X-ray
JP4857138B2 (ja) 2006-03-23 2012-01-18 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法
JP4703674B2 (ja) 2008-03-14 2011-06-15 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法
JP5047030B2 (ja) * 2008-03-26 2012-10-10 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法
JP5617505B2 (ja) * 2010-10-01 2014-11-05 住友ベークライト株式会社 ポジ型感光性樹脂組成物、硬化膜、保護膜、絶縁膜、半導体装置、および表示体装置

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Publication number Publication date
JPH1144950A (ja) 1999-02-16

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