JP4036986B2 - 遠紫外線露光用ポジ型フォトレジスト組成物 - Google Patents

遠紫外線露光用ポジ型フォトレジスト組成物 Download PDF

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Publication number
JP4036986B2
JP4036986B2 JP32705698A JP32705698A JP4036986B2 JP 4036986 B2 JP4036986 B2 JP 4036986B2 JP 32705698 A JP32705698 A JP 32705698A JP 32705698 A JP32705698 A JP 32705698A JP 4036986 B2 JP4036986 B2 JP 4036986B2
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Japan
Prior art keywords
group
acid
alicyclic hydrocarbon
positive photoresist
carbon atoms
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Expired - Fee Related
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JP32705698A
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Japanese (ja)
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JP2000187327A5 (enExample
JP2000187327A (ja
Inventor
健一郎 佐藤
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Fujifilm Corp
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Fujifilm Corp
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Priority to JP32705698A priority Critical patent/JP4036986B2/ja
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  • Materials For Photolithography (AREA)
JP32705698A 1998-10-15 1998-11-17 遠紫外線露光用ポジ型フォトレジスト組成物 Expired - Fee Related JP4036986B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32705698A JP4036986B2 (ja) 1998-10-15 1998-11-17 遠紫外線露光用ポジ型フォトレジスト組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP10-293986 1998-10-15
JP29398698 1998-10-15
JP32705698A JP4036986B2 (ja) 1998-10-15 1998-11-17 遠紫外線露光用ポジ型フォトレジスト組成物

Publications (3)

Publication Number Publication Date
JP2000187327A JP2000187327A (ja) 2000-07-04
JP2000187327A5 JP2000187327A5 (enExample) 2005-02-24
JP4036986B2 true JP4036986B2 (ja) 2008-01-23

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JP32705698A Expired - Fee Related JP4036986B2 (ja) 1998-10-15 1998-11-17 遠紫外線露光用ポジ型フォトレジスト組成物

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JP (1) JP4036986B2 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4503109B2 (ja) * 1999-02-09 2010-07-14 ダイセル化学工業株式会社 重合性脂環式化合物
KR101038621B1 (ko) 2002-11-15 2011-06-03 이 아이 듀폰 디 네모아 앤드 캄파니 전자 소자 제조에 보호층을 사용하는 방법
KR101115224B1 (ko) * 2004-02-04 2012-02-14 가부시끼가이샤 다이셀 불포화 카르복실산 헤미아세탈 에스테르, 고분자 화합물 및포토레지스트용 수지 조성물
JP4651283B2 (ja) * 2004-02-04 2011-03-16 ダイセル化学工業株式会社 不飽和カルボン酸ヘミアセタールエステル、高分子化合物及びフォトレジスト用樹脂組成物
JP4780945B2 (ja) * 2004-02-04 2011-09-28 ダイセル化学工業株式会社 不飽和カルボン酸ヘミアセタールエステル、高分子化合物及びフォトレジスト用樹脂組成物
US7402373B2 (en) 2004-02-05 2008-07-22 E.I. Du Pont De Nemours And Company UV radiation blocking protective layers compatible with thick film pastes
JP4866237B2 (ja) * 2004-05-18 2012-02-01 出光興産株式会社 アダマンタン誘導体、その製造方法及びフォトレジスト用感光材料
WO2005116761A2 (en) * 2004-05-27 2005-12-08 E.I. Dupont De Nemours And Company Uv radiation blocking protective layers compatible with thick film pastes
JP4511383B2 (ja) 2005-02-23 2010-07-28 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP2007079552A (ja) * 2005-08-17 2007-03-29 Jsr Corp 感放射線性樹脂組成物
JP4397418B2 (ja) 2005-10-26 2010-01-13 旭化成イーマテリアルズ株式会社 ポジ型感光性樹脂組成物
JP4635031B2 (ja) * 2007-08-06 2011-02-16 三菱レイヨン株式会社 アダマンタン誘導体の製造方法

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