JP4030867B2 - 調節されたアミン基密度と空間を提供する分子層を表面に含む基質及びその製造方法 - Google Patents

調節されたアミン基密度と空間を提供する分子層を表面に含む基質及びその製造方法 Download PDF

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JP4030867B2
JP4030867B2 JP2002525092A JP2002525092A JP4030867B2 JP 4030867 B2 JP4030867 B2 JP 4030867B2 JP 2002525092 A JP2002525092 A JP 2002525092A JP 2002525092 A JP2002525092 A JP 2002525092A JP 4030867 B2 JP4030867 B2 JP 4030867B2
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substrate
amine
producing
group
molecular layer
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JP2004508349A (ja
JP2004508349A5 (enExample
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ジュン−ウォン パク,
ジォ−ヨング シム,
ジュン−ホ ムン,
ボン−ジン ホン,
Original Assignee
ポハン アイアン アンド スチール カンパニー リミテッド
ポハン ユニヴァーシティ オブ サイエンス アンド テクノロジー
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C271/00Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/06Esters of carbamic acids
    • C07C271/08Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
    • C07C271/10Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
    • C07C271/12Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C271/00Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/06Esters of carbamic acids
    • C07C271/08Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
    • C07C271/10Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
    • C07C271/16Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by singly-bound oxygen atoms

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2002525092A 2000-09-05 2001-09-05 調節されたアミン基密度と空間を提供する分子層を表面に含む基質及びその製造方法 Expired - Fee Related JP4030867B2 (ja)

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Application Number Priority Date Filing Date Title
KR10-2000-0052504A KR100383080B1 (ko) 2000-09-05 2000-09-05 조절된 아민기 밀도와 공간을 제공하는 분자층을 표면에포함하는 기질 및 이의 제조방법
PCT/KR2001/001501 WO2002020469A1 (en) 2000-09-05 2001-09-05 Substrate with controlled amine density and regular spacing and method for preparing the same

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JP2004508349A JP2004508349A (ja) 2004-03-18
JP2004508349A5 JP2004508349A5 (enExample) 2005-03-17
JP4030867B2 true JP4030867B2 (ja) 2008-01-09

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US (1) US20030199577A1 (enExample)
EP (1) EP1317422A4 (enExample)
JP (1) JP4030867B2 (enExample)
KR (1) KR100383080B1 (enExample)
WO (1) WO2002020469A1 (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100383080B1 (ko) * 2000-09-05 2003-05-12 주식회사 포스코 조절된 아민기 밀도와 공간을 제공하는 분자층을 표면에포함하는 기질 및 이의 제조방법
WO2005040094A1 (en) * 2003-10-24 2005-05-06 Postech Foundation Novel dendrimer compound and a biochip using the same
US9201067B2 (en) * 2003-03-05 2015-12-01 Posco Size-controlled macromolecule
WO2005016869A1 (en) * 2003-08-19 2005-02-24 Postech Foundation Novel dendrimer compound, a biochip using the same and a fabricating method thereof
US9671396B2 (en) * 2001-09-05 2017-06-06 Joon Won Park Solid substrate comprising array of dendrons and methods for using the same
DE10161767A1 (de) * 2001-12-15 2003-06-26 Merck Patent Gmbh 2-Guanidino-4-heterocyclyl-chinazoline
KR100484640B1 (ko) * 2002-01-14 2005-04-20 삼성에스디아이 주식회사 생물분자 고정용 올리고머, 및 이를 포함하는 생물분자고정화 조성물
KR100499278B1 (ko) 2003-07-05 2005-07-01 학교법인 포항공과대학교 로텍산 화합물이 공유결합된 고체 기판 및 이를 이용한바이오칩
JP5095764B2 (ja) * 2003-09-18 2012-12-12 ポスコ サブストレート、製造方法、診断システム及び検出方法
US8673621B2 (en) * 2005-08-12 2014-03-18 Postech Foundation Biomolecule interaction using atomic force microscope
JP4706074B2 (ja) * 2005-03-29 2011-06-22 独立行政法人物質・材料研究機構 生体分子固定化用の三脚型機能性界面分子とこれを用いた遺伝子検出デバイス
US20070190537A1 (en) * 2005-07-22 2007-08-16 Postech Foundation Solid phase synthesis
US8841069B2 (en) * 2005-12-29 2014-09-23 Korea Materials & Analysis Corporation Dendron-mediated DNA virus detection
EP2199409A3 (en) * 2005-12-29 2010-09-29 University-Industry Cooperation Foundation Konkuk University One step diagnosis by DNA chip
BRPI0721795A2 (pt) * 2007-07-04 2014-06-17 Indian Inst Scient Macromolécula dendrítica e um processo da mesma.
KR101010022B1 (ko) * 2009-04-13 2011-01-21 김중권 모터 액추에이터
WO2014084743A1 (en) 2012-11-28 2014-06-05 Callaghan Innovation Research Limited Dendritic core compounds
KR102260014B1 (ko) * 2020-10-21 2021-06-03 주식회사 에이아이더뉴트리진 미생물 농축 또는 핵산 추출용 개질된 실리카 및 이를 이용한 미생물 농축 또는 핵산 추출 방법

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Publication number Priority date Publication date Assignee Title
JP4134351B2 (ja) * 1994-06-22 2008-08-20 Jsr株式会社 核酸結合用粒子担体
US5624711A (en) * 1995-04-27 1997-04-29 Affymax Technologies, N.V. Derivatization of solid supports and methods for oligomer synthesis
SE508953C2 (sv) * 1996-02-29 1998-11-16 Volvo Ab Larmsystem
JP2000210082A (ja) * 1999-01-22 2000-08-02 Aisin Seiki Co Ltd 標的dnaの固定化
DE19853242B4 (de) * 1998-11-18 2006-06-29 Deutsches Krebsforschungszentrum Stiftung des öffentlichen Rechts Derivatisierung von Trägeroberflächen
EP1026259B1 (en) * 1999-02-08 2002-11-27 Fuji Photo Film Co., Ltd. Process for preparing a dna chip
JP2001108683A (ja) * 1999-10-14 2001-04-20 Fuji Photo Film Co Ltd Dna断片固定固相担体、dna断片の固定方法および核酸断片の検出方法
JP3996307B2 (ja) * 1999-11-05 2007-10-24 富士フイルム株式会社 Dna断片の固定方法、dnaチップおよび核酸断片の検出方法
KR100383080B1 (ko) * 2000-09-05 2003-05-12 주식회사 포스코 조절된 아민기 밀도와 공간을 제공하는 분자층을 표면에포함하는 기질 및 이의 제조방법

Also Published As

Publication number Publication date
EP1317422A1 (en) 2003-06-11
KR20020019325A (ko) 2002-03-12
US20030199577A1 (en) 2003-10-23
JP2004508349A (ja) 2004-03-18
EP1317422A4 (en) 2004-06-30
KR100383080B1 (ko) 2003-05-12
WO2002020469A1 (en) 2002-03-14

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