JP4016402B2 - 気体または蒸気のイオンを発生するためのイオン源装置 - Google Patents

気体または蒸気のイオンを発生するためのイオン源装置 Download PDF

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Publication number
JP4016402B2
JP4016402B2 JP51543698A JP51543698A JP4016402B2 JP 4016402 B2 JP4016402 B2 JP 4016402B2 JP 51543698 A JP51543698 A JP 51543698A JP 51543698 A JP51543698 A JP 51543698A JP 4016402 B2 JP4016402 B2 JP 4016402B2
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JP
Japan
Prior art keywords
ion source
source device
electro
anode
ions
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP51543698A
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English (en)
Japanese (ja)
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JP2001501024A (ja
Inventor
バルナ，アルパード
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バルナ，アルパード
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Application filed by バルナ，アルパード filed Critical バルナ，アルパード
Publication of JP2001501024A publication Critical patent/JP2001501024A/ja
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Publication of JP4016402B2 publication Critical patent/JP4016402B2/ja
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Expired - Lifetime legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/04—Ion sources; Ion guns using reflex discharge, e.g. Penning ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3114—Machining

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Tubes For Measurement (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP51543698A 1996-09-27 1996-09-27 気体または蒸気のイオンを発生するためのイオン源装置 Expired - Lifetime JP4016402B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/HU1996/000054 WO1998013851A1 (en) 1996-09-27 1996-09-27 Ion source for generating ions of a gas or vapour

Publications (2)

Publication Number Publication Date
JP2001501024A JP2001501024A (ja) 2001-01-23
JP4016402B2 true JP4016402B2 (ja) 2007-12-05

Family

ID=10987700

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51543698A Expired - Lifetime JP4016402B2 (ja) 1996-09-27 1996-09-27 気体または蒸気のイオンを発生するためのイオン源装置

Country Status (7)

Country Link
US (1) US6236054B1 (de)
EP (1) EP0928495B1 (de)
JP (1) JP4016402B2 (de)
AT (1) ATE194724T1 (de)
AU (1) AU7092396A (de)
DE (1) DE69609358T2 (de)
WO (1) WO1998013851A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2426693A3 (de) * 1999-12-13 2013-01-16 Semequip, Inc. Ionenquelle
US7838850B2 (en) * 1999-12-13 2010-11-23 Semequip, Inc. External cathode ion source
US20070107841A1 (en) * 2000-12-13 2007-05-17 Semequip, Inc. Ion implantation ion source, system and method
US6525326B1 (en) * 2000-09-01 2003-02-25 Axcelis Technologies, Inc. System and method for removing particles entrained in an ion beam
JP5186347B2 (ja) * 2008-12-04 2013-04-17 ギガフォトン株式会社 差動排気システム
CA2755661C (en) * 2009-03-27 2017-09-26 Dh Technologies Development Pte. Ltd. Heated time of flight source
WO2011127394A1 (en) 2010-04-09 2011-10-13 E.A. Fischione Instruments, Inc. Improved ion source
US9362078B2 (en) 2012-12-27 2016-06-07 Schlumberger Technology Corporation Ion source using field emitter array cathode and electromagnetic confinement
US9633813B2 (en) * 2012-12-27 2017-04-25 Schlumberger Technology Corporation Ion source using heated cathode and electromagnetic confinement
US20140183349A1 (en) * 2012-12-27 2014-07-03 Schlumberger Technology Corporation Ion source using spindt cathode and electromagnetic confinement
EP2787523B1 (de) 2013-04-03 2016-02-10 Fei Company Niedrigenergieionendünnung oder -abscheidung
CN110676148B (zh) * 2019-10-12 2020-07-28 中国科学院地质与地球物理研究所 可控束斑离子发射装置及抛光蚀刻方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4423355A (en) 1980-03-26 1983-12-27 Tokyo Shibaura Denki Kabushiki Kaisha Ion generating apparatus
FR2514946A1 (fr) * 1981-10-21 1983-04-22 Commissariat Energie Atomique Source d'ions comprenant une chambre d'ionisation a gaz avec oscillations d'electrons
HU190855B (en) 1983-10-12 1986-11-28 Mta Mueszaki Fizikai Kutato Intezete,Hu Device for working solid samples by ion beam and ion source to the device

Also Published As

Publication number Publication date
JP2001501024A (ja) 2001-01-23
AU7092396A (en) 1998-04-17
EP0928495B1 (de) 2000-07-12
EP0928495A1 (de) 1999-07-14
US6236054B1 (en) 2001-05-22
DE69609358T2 (de) 2000-12-14
DE69609358D1 (de) 2000-08-17
ATE194724T1 (de) 2000-07-15
WO1998013851A1 (en) 1998-04-02

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