JP4011896B2 - 露光方法 - Google Patents

露光方法 Download PDF

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Publication number
JP4011896B2
JP4011896B2 JP2001361659A JP2001361659A JP4011896B2 JP 4011896 B2 JP4011896 B2 JP 4011896B2 JP 2001361659 A JP2001361659 A JP 2001361659A JP 2001361659 A JP2001361659 A JP 2001361659A JP 4011896 B2 JP4011896 B2 JP 4011896B2
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JP
Japan
Prior art keywords
pattern
line width
optical system
mask
pupil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001361659A
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English (en)
Japanese (ja)
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JP2003163153A5 (enExample
JP2003163153A (ja
Inventor
美代子 川島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2001361659A priority Critical patent/JP4011896B2/ja
Publication of JP2003163153A publication Critical patent/JP2003163153A/ja
Publication of JP2003163153A5 publication Critical patent/JP2003163153A5/ja
Application granted granted Critical
Publication of JP4011896B2 publication Critical patent/JP4011896B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2001361659A 2001-11-27 2001-11-27 露光方法 Expired - Fee Related JP4011896B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001361659A JP4011896B2 (ja) 2001-11-27 2001-11-27 露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001361659A JP4011896B2 (ja) 2001-11-27 2001-11-27 露光方法

Publications (3)

Publication Number Publication Date
JP2003163153A JP2003163153A (ja) 2003-06-06
JP2003163153A5 JP2003163153A5 (enExample) 2005-06-16
JP4011896B2 true JP4011896B2 (ja) 2007-11-21

Family

ID=19172275

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001361659A Expired - Fee Related JP4011896B2 (ja) 2001-11-27 2001-11-27 露光方法

Country Status (1)

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JP (1) JP4011896B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7331676B2 (en) * 2005-02-09 2008-02-19 Coherent, Inc. Apparatus for projecting a reduced image of a photomask using a schwarzschild objective

Also Published As

Publication number Publication date
JP2003163153A (ja) 2003-06-06

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