JP4007303B2 - 基板のラビング方法及びラビング装置 - Google Patents
基板のラビング方法及びラビング装置 Download PDFInfo
- Publication number
- JP4007303B2 JP4007303B2 JP2003350799A JP2003350799A JP4007303B2 JP 4007303 B2 JP4007303 B2 JP 4007303B2 JP 2003350799 A JP2003350799 A JP 2003350799A JP 2003350799 A JP2003350799 A JP 2003350799A JP 4007303 B2 JP4007303 B2 JP 4007303B2
- Authority
- JP
- Japan
- Prior art keywords
- rubbing
- substrate
- suction
- rubbing roller
- suction port
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims description 189
- 238000000034 method Methods 0.000 title claims description 45
- 239000000428 dust Substances 0.000 claims description 98
- 230000002093 peripheral effect Effects 0.000 claims description 93
- 239000004973 liquid crystal related substance Substances 0.000 claims description 32
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 239000004744 fabric Substances 0.000 description 42
- 239000000463 material Substances 0.000 description 39
- 230000000694 effects Effects 0.000 description 23
- 239000012811 non-conductive material Substances 0.000 description 12
- 238000005507 spraying Methods 0.000 description 12
- 239000003566 sealing material Substances 0.000 description 8
- 230000003749 cleanliness Effects 0.000 description 7
- 238000004140 cleaning Methods 0.000 description 6
- 238000007664 blowing Methods 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 4
- 239000012530 fluid Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000004677 Nylon Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 229920000297 Rayon Polymers 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000002964 rayon Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 241001206158 Blepsias cirrhosus Species 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Landscapes
- Liquid Crystal (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003350799A JP4007303B2 (ja) | 1997-01-08 | 2003-10-09 | 基板のラビング方法及びラビング装置 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP157797 | 1997-01-08 | ||
| JP2003350799A JP4007303B2 (ja) | 1997-01-08 | 2003-10-09 | 基板のラビング方法及びラビング装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP189498A Division JP3792384B2 (ja) | 1997-01-08 | 1998-01-07 | 基板のラビング方法、液晶電気光学素子の製造方法及び基板のラビング装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004078244A JP2004078244A (ja) | 2004-03-11 |
| JP2004078244A5 JP2004078244A5 (enrdf_load_stackoverflow) | 2005-07-07 |
| JP4007303B2 true JP4007303B2 (ja) | 2007-11-14 |
Family
ID=32031928
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003350799A Expired - Fee Related JP4007303B2 (ja) | 1997-01-08 | 2003-10-09 | 基板のラビング方法及びラビング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4007303B2 (enrdf_load_stackoverflow) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010112968A (ja) * | 2008-11-04 | 2010-05-20 | Suzuki Ritsuko | ラビング処理装置 |
| KR100987662B1 (ko) | 2009-03-20 | 2010-10-21 | (주) 태영이엔지 | 액정표시장치의 배향막 인쇄장치용 애니록스 롤 상의 이물질 제거장치 |
| CN103676329B (zh) * | 2013-12-20 | 2016-03-30 | 深圳市华星光电技术有限公司 | 液晶光配向设备 |
| CN105032875A (zh) * | 2015-08-12 | 2015-11-11 | 柳州利元光电技术有限公司 | 具有pi摩擦、除静电条纹和清洗功能的pi摩擦一体机 |
| US10421105B2 (en) | 2017-06-19 | 2019-09-24 | Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd | Light alignment device, assembly and method for removing light alignment impurities |
| CN107121845A (zh) * | 2017-06-19 | 2017-09-01 | 深圳市华星光电技术有限公司 | 光配向装置及其去除光配向杂质的组件和方法 |
-
2003
- 2003-10-09 JP JP2003350799A patent/JP4007303B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2004078244A (ja) | 2004-03-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20080066780A1 (en) | Substrate cleaning apparatus and substrate cleaning method using the same | |
| JP4289102B2 (ja) | 組立装置および組立方法ならびに端子洗浄装置 | |
| CN110227686A (zh) | 清洗装置 | |
| JP4007303B2 (ja) | 基板のラビング方法及びラビング装置 | |
| JP3792384B2 (ja) | 基板のラビング方法、液晶電気光学素子の製造方法及び基板のラビング装置 | |
| JP3966267B2 (ja) | 基板のラビング方法及びラビング装置 | |
| TW201714676A (zh) | 清掃頭及清掃方法 | |
| JP2000107715A (ja) | 基板クリーニング装置 | |
| JP3966266B2 (ja) | 基板のラビング方法及びラビング装置 | |
| JP2005238109A (ja) | 基板洗浄装置、基板洗浄方法及び電気光学装置の製造方法 | |
| JP2004105848A (ja) | 基板洗浄装置とその洗浄方法 | |
| JP4650058B2 (ja) | 異物除去装置、電気光学装置の製造方法 | |
| US7725975B2 (en) | Device for cleaning LCD panel | |
| JP3050957B2 (ja) | 液晶表示素子製造方法 | |
| JP4402579B2 (ja) | 基板の清掃装置及び清掃方法 | |
| KR20150027600A (ko) | 세정 장치 및 이를 이용한 세정을 포함하는 디스플레이 소자의 제조 방법 | |
| JP6657275B2 (ja) | 液晶パネル用基板の製造方法 | |
| JP3864738B2 (ja) | 液晶装置の製造装置及び製造方法 | |
| JP3136068B2 (ja) | 液晶表示装置の製造装置 | |
| KR20050066267A (ko) | 액정 표시 장치의 세정 장비 | |
| JPH06250162A (ja) | 液晶表示素子の製造方法 | |
| KR20070060713A (ko) | 기판 세정 장치 및 방법 | |
| KR20070120389A (ko) | 기판 세정용 롤 브러쉬 및 이를 이용한 브러쉬 세정유닛 | |
| KR100824417B1 (ko) | 필름 타입 터치패널 일체형 평판 디스플레이 패널의합착장치 및 방법 | |
| KR100987674B1 (ko) | 노즐 세정장치 및 방법 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050107 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050107 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20070308 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070508 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070705 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20070807 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20070820 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100907 Year of fee payment: 3 |
|
| R150 | Certificate of patent (=grant) or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100907 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110907 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120907 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130907 Year of fee payment: 6 |
|
| LAPS | Cancellation because of no payment of annual fees |