JP4004820B2 - ポジ型電子線、ｘ線又はｅｕｖ用レジスト組成物 - Google Patents

ポジ型電子線、ｘ線又はｅｕｖ用レジスト組成物 Download PDF

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Publication number
JP4004820B2
JP4004820B2 JP2002060583A JP2002060583A JP4004820B2 JP 4004820 B2 JP4004820 B2 JP 4004820B2 JP 2002060583 A JP2002060583 A JP 2002060583A JP 2002060583 A JP2002060583 A JP 2002060583A JP 4004820 B2 JP4004820 B2 JP 4004820B2
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JP2003177537A5 (enExample
JP2003177537A (ja
Inventor
一良 水谷
昭一郎 安波
浩司 白川
表 高橋
亨 藤森
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Fujifilm Corp
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Fujifilm Corp
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2002060583A 2001-10-01 2002-03-06 ポジ型電子線、ｘ線又はｅｕｖ用レジスト組成物 Expired - Lifetime JP4004820B2 (ja)

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JP2002060583A JP4004820B2 (ja) 2001-10-01 2002-03-06 ポジ型電子線、ｘ線又はｅｕｖ用レジスト組成物

Applications Claiming Priority (3)

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JP2001305364 2001-10-01
JP2001-305364 2001-10-01
JP2002060583A JP4004820B2 (ja) 2001-10-01 2002-03-06 ポジ型電子線、ｘ線又はｅｕｖ用レジスト組成物

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JP2003177537A JP2003177537A (ja) 2003-06-27
JP2003177537A5 JP2003177537A5 (enExample) 2005-04-07
JP4004820B2 true JP4004820B2 (ja) 2007-11-07

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Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4429620B2 (ja) * 2002-10-15 2010-03-10 出光興産株式会社 感放射線性有機化合物
WO2005031464A1 (ja) * 2003-09-25 2005-04-07 Tokyo Ohka Kogyo Co., Ltd. 低加速電子線用ポジ型レジスト組成物、レジスト積層体およびパターン形成方法
JP4418659B2 (ja) * 2003-09-26 2010-02-17 富士フイルム株式会社 ポジ型電子線、ｘ線又はｅｕｖ光用レジスト組成物及びそれを用いたパターン形成方法
JP4347110B2 (ja) 2003-10-22 2009-10-21 東京応化工業株式会社 電子線又はｅｕｖ用ポジ型レジスト組成物
JP4347205B2 (ja) * 2004-01-23 2009-10-21 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
US7250246B2 (en) 2004-01-26 2007-07-31 Fujifilm Corporation Positive resist composition and pattern formation method using the same
JP2006078760A (ja) 2004-09-09 2006-03-23 Tokyo Ohka Kogyo Co Ltd 電子線またはｅｕｖ（極端紫外光）用レジスト組成物及びレジストパターン形成方法
JP5844613B2 (ja) 2010-11-17 2016-01-20 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ 感光性コポリマーおよびフォトレジスト組成物
JP5531034B2 (ja) * 2012-01-31 2014-06-25 富士フイルム株式会社 感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置及び液晶表示装置
JP6894364B2 (ja) * 2017-12-26 2021-06-30 信越化学工業株式会社 有機膜形成用組成物、半導体装置製造用基板、有機膜の形成方法、及びパターン形成方法

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