JP3992882B2 - 遠紫外線露光用ポジ型フォトレジスト組成物 - Google Patents

遠紫外線露光用ポジ型フォトレジスト組成物 Download PDF

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Publication number
JP3992882B2
JP3992882B2 JP15869599A JP15869599A JP3992882B2 JP 3992882 B2 JP3992882 B2 JP 3992882B2 JP 15869599 A JP15869599 A JP 15869599A JP 15869599 A JP15869599 A JP 15869599A JP 3992882 B2 JP3992882 B2 JP 3992882B2
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group
substituent
carbon atoms
general formula
alkyl group
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JP15869599A
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Japanese (ja)
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JP2000347409A (ja
JP2000347409A5 (enExample
Inventor
健一郎 佐藤
邦彦 児玉
利明 青合
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Fujifilm Corp
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Fujifilm Corp
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Priority to JP15869599A priority Critical patent/JP3992882B2/ja
Priority to US09/577,884 priority patent/US6479211B1/en
Priority to KR1020000028523A priority patent/KR100684155B1/ko
Publication of JP2000347409A publication Critical patent/JP2000347409A/ja
Publication of JP2000347409A5 publication Critical patent/JP2000347409A5/ja
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Publication of JP3992882B2 publication Critical patent/JP3992882B2/ja
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JP15869599A 1999-05-26 1999-06-04 遠紫外線露光用ポジ型フォトレジスト組成物 Expired - Lifetime JP3992882B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP15869599A JP3992882B2 (ja) 1999-06-04 1999-06-04 遠紫外線露光用ポジ型フォトレジスト組成物
US09/577,884 US6479211B1 (en) 1999-05-26 2000-05-25 Positive photoresist composition for far ultraviolet exposure
KR1020000028523A KR100684155B1 (ko) 1999-05-26 2000-05-26 원자외선 노광용 포지티브 포토레지스트 조성물

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15869599A JP3992882B2 (ja) 1999-06-04 1999-06-04 遠紫外線露光用ポジ型フォトレジスト組成物

Publications (3)

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JP2000347409A JP2000347409A (ja) 2000-12-15
JP2000347409A5 JP2000347409A5 (enExample) 2005-07-07
JP3992882B2 true JP3992882B2 (ja) 2007-10-17

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JP15869599A Expired - Lifetime JP3992882B2 (ja) 1999-05-26 1999-06-04 遠紫外線露光用ポジ型フォトレジスト組成物

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JP (1) JP3992882B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002193895A (ja) * 2000-12-27 2002-07-10 Daicel Chem Ind Ltd 環式骨格を有する３−アクリロイルオキシプロピオン酸エステル誘導体、及びアクリル酸エステル混合物
JP4225699B2 (ja) 2001-03-12 2009-02-18 富士フイルム株式会社 ポジ型感光性組成物
JP4137406B2 (ja) * 2001-05-18 2008-08-20 富士フイルム株式会社 ポジ型レジスト組成物
JP2003186197A (ja) * 2001-12-19 2003-07-03 Sony Corp レジスト材料及び露光方法
JP4040536B2 (ja) * 2003-06-11 2008-01-30 東京応化工業株式会社 ネガ型レジスト組成物、及びそれを用いたレジストパターン形成方法
JP2011051989A (ja) * 2004-04-23 2011-03-17 Sumitomo Chemical Co Ltd 化学増幅型ポジ型レジスト組成物及び（メタ）アクリル酸誘導体とその製法
JP6531723B2 (ja) * 2016-06-29 2019-06-19 信越化学工業株式会社 レジスト材料及びパターン形成方法

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JP2000347409A (ja) 2000-12-15

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