JP3960462B2 - 基板処理装置 - Google Patents

基板処理装置 Download PDF

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Publication number
JP3960462B2
JP3960462B2 JP2001282266A JP2001282266A JP3960462B2 JP 3960462 B2 JP3960462 B2 JP 3960462B2 JP 2001282266 A JP2001282266 A JP 2001282266A JP 2001282266 A JP2001282266 A JP 2001282266A JP 3960462 B2 JP3960462 B2 JP 3960462B2
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JP
Japan
Prior art keywords
processing
substrate
chamber
unit
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001282266A
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English (en)
Japanese (ja)
Other versions
JP2003092326A (ja
JP2003092326A5 (enExample
Inventor
祐介 村岡
龍治 北門
公続 斉藤
一国雄 溝端
久典 大柴
由彦 坂下
克充 渡邉
昌弘 山形
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Screen Holdings Co Ltd
Kobe Steel Ltd
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Screen Holdings Co Ltd
Kobe Steel Ltd
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd, Kobe Steel Ltd, Dainippon Screen Manufacturing Co Ltd filed Critical Screen Holdings Co Ltd
Priority to JP2001282266A priority Critical patent/JP3960462B2/ja
Publication of JP2003092326A publication Critical patent/JP2003092326A/ja
Publication of JP2003092326A5 publication Critical patent/JP2003092326A5/ja
Application granted granted Critical
Publication of JP3960462B2 publication Critical patent/JP3960462B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Liquid Crystal (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2001282266A 2001-09-17 2001-09-17 基板処理装置 Expired - Fee Related JP3960462B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001282266A JP3960462B2 (ja) 2001-09-17 2001-09-17 基板処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001282266A JP3960462B2 (ja) 2001-09-17 2001-09-17 基板処理装置

Publications (3)

Publication Number Publication Date
JP2003092326A JP2003092326A (ja) 2003-03-28
JP2003092326A5 JP2003092326A5 (enExample) 2005-03-17
JP3960462B2 true JP3960462B2 (ja) 2007-08-15

Family

ID=19105941

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001282266A Expired - Fee Related JP3960462B2 (ja) 2001-09-17 2001-09-17 基板処理装置

Country Status (1)

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JP (1) JP3960462B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI233147B (en) * 2003-03-31 2005-05-21 Lam Res Corp Chamber and associated methods for wafer processing
JP4418486B2 (ja) * 2007-08-30 2010-02-17 株式会社Ｍｔｋ ウエット処理装置
JP5293459B2 (ja) * 2009-07-01 2013-09-18 東京エレクトロン株式会社 基板処理装置
JP5477131B2 (ja) * 2010-04-08 2014-04-23 東京エレクトロン株式会社 基板処理装置
JP5471740B2 (ja) * 2010-04-08 2014-04-16 東京エレクトロン株式会社 基板処理装置
WO2020218815A1 (ko) * 2019-04-23 2020-10-29 주식회사 제우스 식각장치 및 그 식각방법

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Publication number Publication date
JP2003092326A (ja) 2003-03-28

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