JP3913350B2 - 光学的造形用樹脂組成物 - Google Patents

光学的造形用樹脂組成物 Download PDF

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Publication number
JP3913350B2
JP3913350B2 JP01806698A JP1806698A JP3913350B2 JP 3913350 B2 JP3913350 B2 JP 3913350B2 JP 01806698 A JP01806698 A JP 01806698A JP 1806698 A JP1806698 A JP 1806698A JP 3913350 B2 JP3913350 B2 JP 3913350B2
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Japan
Prior art keywords
compound
resin composition
optical
modeling
polymerizable organic
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP01806698A
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English (en)
Japanese (ja)
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JPH11199647A5 (enExample
JPH11199647A (ja
Inventor
恒夫 萩原
順一 田村
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Nabtesco Corp
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Nabtesco Corp
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Priority to JP01806698A priority Critical patent/JP3913350B2/ja
Publication of JPH11199647A publication Critical patent/JPH11199647A/ja
Publication of JPH11199647A5 publication Critical patent/JPH11199647A5/ja
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Publication of JP3913350B2 publication Critical patent/JP3913350B2/ja
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Expired - Lifetime legal-status Critical Current

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  • Polyethers (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
JP01806698A 1998-01-13 1998-01-13 光学的造形用樹脂組成物 Expired - Lifetime JP3913350B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP01806698A JP3913350B2 (ja) 1998-01-13 1998-01-13 光学的造形用樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP01806698A JP3913350B2 (ja) 1998-01-13 1998-01-13 光学的造形用樹脂組成物

Publications (3)

Publication Number Publication Date
JPH11199647A JPH11199647A (ja) 1999-07-27
JPH11199647A5 JPH11199647A5 (enExample) 2005-07-28
JP3913350B2 true JP3913350B2 (ja) 2007-05-09

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JP01806698A Expired - Lifetime JP3913350B2 (ja) 1998-01-13 1998-01-13 光学的造形用樹脂組成物

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Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI251123B (en) * 1999-09-17 2006-03-11 Hitachi Chemical Co Ltd Photosensitive resin composition, photosensitive element using the resin composition, method of manufacturing resist pattern, and method of manufacturing printed wiring board
KR20050007372A (ko) * 2002-05-03 2005-01-17 디에스엠 아이피 어셋츠 비.브이. 방사선 경화성 수지 조성물 및 이를 이용한 쾌속 성형법
US20040077745A1 (en) * 2002-10-18 2004-04-22 Jigeng Xu Curable compositions and rapid prototyping process using the same
US20040137368A1 (en) * 2003-01-13 2004-07-15 3D Systems, Inc. Stereolithographic resins containing selected oxetane compounds
PL1727663T3 (pl) * 2004-03-22 2012-04-30 Huntsman Adv Mat Switzerland Kompozycje fotoutwardzalne
JP5111774B2 (ja) * 2006-04-04 2013-01-09 シーメット株式会社 光学的立体造形用樹脂組成物
JP5280615B2 (ja) * 2006-06-16 2013-09-04 シーメット株式会社 光学的立体造形用樹脂組成物
JP2008063514A (ja) * 2006-09-11 2008-03-21 Cmet Inc 光学的立体造形用樹脂組成物
WO2009001420A1 (ja) * 2007-06-25 2008-12-31 Cmet Inc. 光学的立体造形用重合性樹脂組成物
KR101422203B1 (ko) * 2007-08-07 2014-07-30 삼성전자주식회사 포토레지스트 조성물, 상기 포토레지스트 조성물을 이용한 패턴 형성 방법 및 잉크젯 프린트 헤드
US10604659B2 (en) 2015-06-08 2020-03-31 Dsm Ip Assets B.V. Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication
WO2016200972A1 (en) * 2015-06-08 2016-12-15 Dsm Ip Assets B.V. Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication
CA3138958A1 (en) * 2019-05-03 2020-11-12 Lensar, Inc. Cloud based system cataract treatment database and algorithm system

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Publication number Publication date
JPH11199647A (ja) 1999-07-27

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