JP3912024B2 - Pin構造のラテラル型半導体受光素子 - Google Patents
Pin構造のラテラル型半導体受光素子 Download PDFInfo
- Publication number
- JP3912024B2 JP3912024B2 JP2001110169A JP2001110169A JP3912024B2 JP 3912024 B2 JP3912024 B2 JP 3912024B2 JP 2001110169 A JP2001110169 A JP 2001110169A JP 2001110169 A JP2001110169 A JP 2001110169A JP 3912024 B2 JP3912024 B2 JP 3912024B2
- Authority
- JP
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- Prior art keywords
- layer
- electrode
- lateral
- pin structure
- dye
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 239000004065 semiconductor Substances 0.000 title claims description 23
- 239000000758 substrate Substances 0.000 claims description 21
- 238000006243 chemical reaction Methods 0.000 claims description 11
- 102000004330 Rhodopsin Human genes 0.000 claims description 2
- 108090000820 Rhodopsin Proteins 0.000 claims description 2
- 150000004032 porphyrins Chemical class 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 118
- 238000000034 method Methods 0.000 description 9
- 230000035945 sensitivity Effects 0.000 description 7
- 239000012535 impurity Substances 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 239000011241 protective layer Substances 0.000 description 4
- 239000002344 surface layer Substances 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 108010082845 Bacteriorhodopsins Proteins 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 150000003278 haem Chemical class 0.000 description 1
- -1 heme) Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001110169A JP3912024B2 (ja) | 2001-04-09 | 2001-04-09 | Pin構造のラテラル型半導体受光素子 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001110169A JP3912024B2 (ja) | 2001-04-09 | 2001-04-09 | Pin構造のラテラル型半導体受光素子 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002314117A JP2002314117A (ja) | 2002-10-25 |
| JP2002314117A5 JP2002314117A5 (enExample) | 2005-02-24 |
| JP3912024B2 true JP3912024B2 (ja) | 2007-05-09 |
Family
ID=18961992
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001110169A Expired - Fee Related JP3912024B2 (ja) | 2001-04-09 | 2001-04-09 | Pin構造のラテラル型半導体受光素子 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3912024B2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021103300A1 (zh) * | 2019-11-29 | 2021-06-03 | 武汉华星光电技术有限公司 | 光电二极管及其制备方法 |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7157686B2 (en) | 2002-12-06 | 2007-01-02 | Delta Electronics, Inc. | Optical receiver |
| US7012314B2 (en) * | 2002-12-18 | 2006-03-14 | Agere Systems Inc. | Semiconductor devices with reduced active region defects and unique contacting schemes |
| JP4232814B2 (ja) * | 2006-11-14 | 2009-03-04 | 沖電気工業株式会社 | フォトダイオードおよびそれを備えたフォトic |
| JP5295507B2 (ja) * | 2007-02-26 | 2013-09-18 | 株式会社ジャパンディスプレイウェスト | 半導体装置、表示装置および電子機器 |
| JP2008233399A (ja) * | 2007-03-19 | 2008-10-02 | Sony Corp | 画素回路および表示装置、並びに表示装置の製造方法 |
| JP2008235477A (ja) | 2007-03-19 | 2008-10-02 | Oki Electric Ind Co Ltd | フォトダイオードおよびそれを用いたフォトic |
| JP4413940B2 (ja) | 2007-03-22 | 2010-02-10 | 株式会社東芝 | 固体撮像素子、単板カラー固体撮像素子及び電子機器 |
| JP4324685B2 (ja) * | 2007-03-29 | 2009-09-02 | Okiセミコンダクタ株式会社 | 紫外線受光素子およびその製造方法、並びに紫外線量測定装置 |
| JP4530179B2 (ja) * | 2008-01-22 | 2010-08-25 | Okiセミコンダクタ株式会社 | フォトダイオードおよびそれを備えた紫外線センサ、並びにフォトダイオードの製造方法 |
| JP4530180B2 (ja) * | 2008-01-22 | 2010-08-25 | Okiセミコンダクタ株式会社 | 紫外線センサおよびその製造方法 |
| JP4924617B2 (ja) * | 2009-01-05 | 2012-04-25 | ソニー株式会社 | 固体撮像素子、カメラ |
| CN111668328B (zh) * | 2020-06-22 | 2022-03-15 | 三明学院 | 一种新型侧向pn结光电探测器 |
| CN111785807B (zh) * | 2020-08-11 | 2022-10-18 | 今上半导体(信阳)有限公司 | 一种pin光电器件及其制造方法 |
| WO2022219710A1 (ja) * | 2021-04-13 | 2022-10-20 | 日本電信電話株式会社 | 受光素子およびその製造方法 |
| WO2023132052A1 (ja) * | 2022-01-07 | 2023-07-13 | ソニーセミコンダクタソリューションズ株式会社 | 光検出素子 |
-
2001
- 2001-04-09 JP JP2001110169A patent/JP3912024B2/ja not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021103300A1 (zh) * | 2019-11-29 | 2021-06-03 | 武汉华星光电技术有限公司 | 光电二极管及其制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002314117A (ja) | 2002-10-25 |
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