JP3901120B2 - 固相担体への低分子化合物の固定方法 - Google Patents

固相担体への低分子化合物の固定方法 Download PDF

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Publication number
JP3901120B2
JP3901120B2 JP2003104928A JP2003104928A JP3901120B2 JP 3901120 B2 JP3901120 B2 JP 3901120B2 JP 2003104928 A JP2003104928 A JP 2003104928A JP 2003104928 A JP2003104928 A JP 2003104928A JP 3901120 B2 JP3901120 B2 JP 3901120B2
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Prior art keywords
low molecular
compound
molecular weight
solid phase
phase carrier
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JP2003104928A
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English (en)
Japanese (ja)
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JP2004309372A5 (cg-RX-API-DMAC7.html
JP2004309372A (ja
Inventor
裕之 長田
直樹 叶
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RIKEN
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RIKEN
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Priority to JP2003104928A priority Critical patent/JP3901120B2/ja
Priority to PCT/JP2004/004175 priority patent/WO2004090540A1/ja
Priority to EP04723366A priority patent/EP1612556A4/en
Priority to US10/551,809 priority patent/US7713706B2/en
Publication of JP2004309372A publication Critical patent/JP2004309372A/ja
Publication of JP2004309372A5 publication Critical patent/JP2004309372A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/165—Monolayers, e.g. Langmuir-Blodgett
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
    • B05D1/185—Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Composite Materials (AREA)
  • Materials Engineering (AREA)
  • Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2003104928A 2003-04-09 2003-04-09 固相担体への低分子化合物の固定方法 Expired - Fee Related JP3901120B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2003104928A JP3901120B2 (ja) 2003-04-09 2003-04-09 固相担体への低分子化合物の固定方法
PCT/JP2004/004175 WO2004090540A1 (ja) 2003-04-09 2004-03-25 固相担体への低分子化合物の固定方法
EP04723366A EP1612556A4 (en) 2003-04-09 2004-03-25 METHOD FOR FIXING A LOW-MOLECULAR COMPOUND ON A SOLID PHASE CARRIER
US10/551,809 US7713706B2 (en) 2003-04-09 2004-03-25 Method of fixing low-molecular compound to solid-phase support

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003104928A JP3901120B2 (ja) 2003-04-09 2003-04-09 固相担体への低分子化合物の固定方法

Publications (3)

Publication Number Publication Date
JP2004309372A JP2004309372A (ja) 2004-11-04
JP2004309372A5 JP2004309372A5 (cg-RX-API-DMAC7.html) 2005-07-21
JP3901120B2 true JP3901120B2 (ja) 2007-04-04

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003104928A Expired - Fee Related JP3901120B2 (ja) 2003-04-09 2003-04-09 固相担体への低分子化合物の固定方法

Country Status (4)

Country Link
US (1) US7713706B2 (cg-RX-API-DMAC7.html)
EP (1) EP1612556A4 (cg-RX-API-DMAC7.html)
JP (1) JP3901120B2 (cg-RX-API-DMAC7.html)
WO (1) WO2004090540A1 (cg-RX-API-DMAC7.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010286481A (ja) * 2009-05-13 2010-12-24 Institute Of Physical & Chemical Research 光反応性化合物を有する磁気ビーズへの化合物の固定法
JP2013510864A (ja) * 2009-11-13 2013-03-28 ザ プロクター アンド ギャンブル カンパニー 光触媒導入組成物及び光触媒導入方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100173793A1 (en) * 2005-08-17 2010-07-08 University Of Warwick Peptide / protein identification using photoreactive carriers for the immobilisation of the ligands
JP4682828B2 (ja) * 2005-12-01 2011-05-11 住友ベークライト株式会社 バイオチップおよびその使用方法
JP4640150B2 (ja) * 2005-12-13 2011-03-02 住友ベークライト株式会社 バイオチップおよびその使用方法
JP7601324B2 (ja) * 2020-06-02 2024-12-17 公立大学法人福島県立医科大学 化合物を基板上に固定する方法および固定化した化合物の検出方法
US20240319093A1 (en) * 2021-02-26 2024-09-26 Kwansei Gakuin Educational Foundation Sensing chip, sensing chip manufacturing method, sensing kit, measuring method and measuring device
CN114324291A (zh) * 2021-12-27 2022-04-12 浙江工业大学 固定于特制玻片上的光交联分子探针及其制备方法、应用
CN114315721A (zh) * 2021-12-27 2022-04-12 浙江工业大学 一种光亲和连接链及其合成方法与应用
CN119269451A (zh) * 2024-11-01 2025-01-07 北京大学 一种光交联生物传感器及其制备方法和应用

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5679773A (en) * 1995-01-17 1997-10-21 Affymax Technologies N.V Reagants and methods for immobilized polymer synthesis and display
US5981180A (en) * 1995-10-11 1999-11-09 Luminex Corporation Multiplexed analysis of clinical specimens apparatus and methods
US5714360A (en) 1995-11-03 1998-02-03 Bsi Corporation Photoactivatable water soluble cross-linking agents containing an onium group
US6506895B2 (en) * 1997-08-15 2003-01-14 Surmodics, Inc. Photoactivatable nucleic acids
CN1402796A (zh) * 1999-11-02 2003-03-12 胡元徽 分子微阵列及其制备方法和用途
JP2001178472A (ja) * 1999-12-27 2001-07-03 Fuji Photo Film Co Ltd 固相担体表面へのｄｎａ断片の固定方法及びｄｎａチップ
AU2001288960A1 (en) * 2000-09-27 2002-04-08 Surmodics, Inc. High density arrays

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010286481A (ja) * 2009-05-13 2010-12-24 Institute Of Physical & Chemical Research 光反応性化合物を有する磁気ビーズへの化合物の固定法
US8901044B2 (en) 2009-05-13 2014-12-02 Riken Method to prepare magnetic beads conjugated with small compounds
JP2013510864A (ja) * 2009-11-13 2013-03-28 ザ プロクター アンド ギャンブル カンパニー 光触媒導入組成物及び光触媒導入方法

Also Published As

Publication number Publication date
WO2004090540A1 (ja) 2004-10-21
US7713706B2 (en) 2010-05-11
EP1612556A4 (en) 2007-03-21
EP1612556A1 (en) 2006-01-04
JP2004309372A (ja) 2004-11-04
US20060194251A1 (en) 2006-08-31

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