JP3893765B2 - レビュー装置 - Google Patents

レビュー装置 Download PDF

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Publication number
JP3893765B2
JP3893765B2 JP27094498A JP27094498A JP3893765B2 JP 3893765 B2 JP3893765 B2 JP 3893765B2 JP 27094498 A JP27094498 A JP 27094498A JP 27094498 A JP27094498 A JP 27094498A JP 3893765 B2 JP3893765 B2 JP 3893765B2
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JP
Japan
Prior art keywords
abnormal part
reference image
sample
abnormal
image
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Expired - Fee Related
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JP27094498A
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English (en)
Japanese (ja)
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JP2000097871A5 (https=
JP2000097871A (ja
Inventor
久美 兼子
孝 飯泉
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Hitachi Ltd
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Hitachi Ltd
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Priority to JP27094498A priority Critical patent/JP3893765B2/ja
Publication of JP2000097871A publication Critical patent/JP2000097871A/ja
Publication of JP2000097871A5 publication Critical patent/JP2000097871A5/ja
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Publication of JP3893765B2 publication Critical patent/JP3893765B2/ja
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Expired - Fee Related legal-status Critical Current

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  • Image Processing (AREA)
  • Image Analysis (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP27094498A 1998-09-25 1998-09-25 レビュー装置 Expired - Fee Related JP3893765B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27094498A JP3893765B2 (ja) 1998-09-25 1998-09-25 レビュー装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27094498A JP3893765B2 (ja) 1998-09-25 1998-09-25 レビュー装置

Publications (3)

Publication Number Publication Date
JP2000097871A JP2000097871A (ja) 2000-04-07
JP2000097871A5 JP2000097871A5 (https=) 2005-01-13
JP3893765B2 true JP3893765B2 (ja) 2007-03-14

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ID=17493195

Family Applications (1)

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JP27094498A Expired - Fee Related JP3893765B2 (ja) 1998-09-25 1998-09-25 レビュー装置

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JP (1) JP3893765B2 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4526661B2 (ja) * 2000-06-28 2010-08-18 株式会社日立製作所 検査装置および検査方法
WO2003100405A1 (fr) * 2002-05-23 2003-12-04 Hitachi High-Technologies Corporation Procede de generation de dispositif de classification de defauts et procede de classification automatique des defauts
US7602962B2 (en) 2003-02-25 2009-10-13 Hitachi High-Technologies Corporation Method of classifying defects using multiple inspection machines
JP2007285880A (ja) * 2006-04-17 2007-11-01 Omron Corp 基板検査における見本画像の登録方法および見本画像作成装置
JP2008076242A (ja) * 2006-09-21 2008-04-03 Olympus Corp 目視マクロ検査装置、基板検査システム、基板処理システム、目視マクロ検査方法
JP2019053050A (ja) * 2017-09-13 2019-04-04 キヤノン株式会社 情報処理装置、情報処理方法、及びプログラム
WO2019054235A1 (ja) * 2017-09-13 2019-03-21 キヤノン株式会社 情報処理装置、情報処理方法、及びプログラム
JP7273556B2 (ja) * 2019-03-15 2023-05-15 株式会社東芝 分析システム、分析方法、プログラム、及び記憶媒体
CN116930207B (zh) * 2023-07-24 2024-04-12 上海感图网络科技有限公司 展示区与实时区视野同步放大的显示方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0891543A (ja) * 1994-09-28 1996-04-09 Omron Corp 画像処理方法およびその装置
US6542830B1 (en) * 1996-03-19 2003-04-01 Hitachi, Ltd. Process control system
US6148099A (en) * 1997-07-03 2000-11-14 Neopath, Inc. Method and apparatus for incremental concurrent learning in automatic semiconductor wafer and liquid crystal display defect classification
JP4220595B2 (ja) * 1998-08-10 2009-02-04 株式会社日立製作所 欠陥の分類方法並びに教示用データ作成方法

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Publication number Publication date
JP2000097871A (ja) 2000-04-07

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