JP3890358B2 - ポジ型感光性樹脂組成物及びパターン形成方法 - Google Patents

ポジ型感光性樹脂組成物及びパターン形成方法 Download PDF

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Publication number
JP3890358B2
JP3890358B2 JP05522497A JP5522497A JP3890358B2 JP 3890358 B2 JP3890358 B2 JP 3890358B2 JP 05522497 A JP05522497 A JP 05522497A JP 5522497 A JP5522497 A JP 5522497A JP 3890358 B2 JP3890358 B2 JP 3890358B2
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Japan
Prior art keywords
group
acid
groups
carbon atoms
branched
Prior art date
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Expired - Fee Related
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JP05522497A
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English (en)
Japanese (ja)
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JPH10282669A (ja
JPH10282669A5 (enrdf_load_stackoverflow
Inventor
利明 青合
邦彦 児玉
一也 上西
司 山中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
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Publication date
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Priority to JP05522497A priority Critical patent/JP3890358B2/ja
Publication of JPH10282669A publication Critical patent/JPH10282669A/ja
Publication of JPH10282669A5 publication Critical patent/JPH10282669A5/ja
Application granted granted Critical
Publication of JP3890358B2 publication Critical patent/JP3890358B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP05522497A 1996-03-11 1997-03-10 ポジ型感光性樹脂組成物及びパターン形成方法 Expired - Fee Related JP3890358B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP05522497A JP3890358B2 (ja) 1996-03-11 1997-03-10 ポジ型感光性樹脂組成物及びパターン形成方法

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
JP5331696 1996-03-11
JP8-138918 1996-05-31
JP13891896 1996-05-31
JP16797696 1996-06-27
JP8-167976 1996-06-27
JP2711197 1997-02-10
JP8-53316 1997-02-10
JP9-27111 1997-02-10
JP05522497A JP3890358B2 (ja) 1996-03-11 1997-03-10 ポジ型感光性樹脂組成物及びパターン形成方法

Publications (3)

Publication Number Publication Date
JPH10282669A JPH10282669A (ja) 1998-10-23
JPH10282669A5 JPH10282669A5 (enrdf_load_stackoverflow) 2004-10-07
JP3890358B2 true JP3890358B2 (ja) 2007-03-07

Family

ID=27520898

Family Applications (1)

Application Number Title Priority Date Filing Date
JP05522497A Expired - Fee Related JP3890358B2 (ja) 1996-03-11 1997-03-10 ポジ型感光性樹脂組成物及びパターン形成方法

Country Status (1)

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JP (1) JP3890358B2 (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001125268A (ja) * 1999-10-28 2001-05-11 Sony Corp 露光方法
JP4177966B2 (ja) * 2001-01-25 2008-11-05 富士フイルム株式会社 ポジ型フォトレジスト組成物
JP2002229210A (ja) * 2001-02-06 2002-08-14 Fuji Photo Film Co Ltd ポジ型レジスト組成物
US7678528B2 (en) * 2005-11-16 2010-03-16 Az Electronic Materials Usa Corp. Photoactive compounds
JP2008120700A (ja) * 2006-11-08 2008-05-29 San Apro Kk スルホニウム塩
JP5514583B2 (ja) 2009-03-13 2014-06-04 富士フイルム株式会社 感活性光線性または感放射線性樹脂組成物及び該組成物を用いたパターン形成方法
JP2020015713A (ja) * 2018-07-11 2020-01-30 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
US20230013430A1 (en) * 2019-11-12 2023-01-19 Toyo Gosei Co., Ltd. Sulfonium salt, acid generator, resist composition, and method for producing device

Also Published As

Publication number Publication date
JPH10282669A (ja) 1998-10-23

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