JP3851640B2 - マニピュレータおよびそれを用いたプローブ装置、試料作製装置 - Google Patents

マニピュレータおよびそれを用いたプローブ装置、試料作製装置 Download PDF

Info

Publication number
JP3851640B2
JP3851640B2 JP2004171000A JP2004171000A JP3851640B2 JP 3851640 B2 JP3851640 B2 JP 3851640B2 JP 2004171000 A JP2004171000 A JP 2004171000A JP 2004171000 A JP2004171000 A JP 2004171000A JP 3851640 B2 JP3851640 B2 JP 3851640B2
Authority
JP
Japan
Prior art keywords
probe
sample
sample preparation
vacuum chamber
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2004171000A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004295146A (ja
JP2004295146A5 (enExample
Inventor
勝 松島
馨 梅村
聡 富松
英巳 小池
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2004171000A priority Critical patent/JP3851640B2/ja
Publication of JP2004295146A publication Critical patent/JP2004295146A/ja
Publication of JP2004295146A5 publication Critical patent/JP2004295146A5/ja
Application granted granted Critical
Publication of JP3851640B2 publication Critical patent/JP3851640B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Landscapes

  • Sampling And Sample Adjustment (AREA)
  • Microscoopes, Condenser (AREA)
JP2004171000A 2004-06-09 2004-06-09 マニピュレータおよびそれを用いたプローブ装置、試料作製装置 Expired - Lifetime JP3851640B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004171000A JP3851640B2 (ja) 2004-06-09 2004-06-09 マニピュレータおよびそれを用いたプローブ装置、試料作製装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004171000A JP3851640B2 (ja) 2004-06-09 2004-06-09 マニピュレータおよびそれを用いたプローブ装置、試料作製装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP05660299A Division JP3851464B2 (ja) 1999-03-04 1999-03-04 マニピュレータおよびそれを用いたプローブ装置、試料作製装置

Publications (3)

Publication Number Publication Date
JP2004295146A JP2004295146A (ja) 2004-10-21
JP2004295146A5 JP2004295146A5 (enExample) 2005-12-22
JP3851640B2 true JP3851640B2 (ja) 2006-11-29

Family

ID=33411337

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004171000A Expired - Lifetime JP3851640B2 (ja) 2004-06-09 2004-06-09 マニピュレータおよびそれを用いたプローブ装置、試料作製装置

Country Status (1)

Country Link
JP (1) JP3851640B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101861823B1 (ko) * 2011-09-16 2018-05-29 삼성디스플레이 주식회사 유기 발광 표시 장치 검사 장비, 및 이를 이용한 유기 발광 표시 장치 제조 시스템

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4752080B2 (ja) * 2005-02-15 2011-08-17 株式会社三友製作所 電子顕微鏡微細作業用マニピュレーション装置
JP4597045B2 (ja) * 2005-12-13 2010-12-15 株式会社日立ハイテクノロジーズ 微小試料移送装置及び方法
JP2009139865A (ja) * 2007-12-10 2009-06-25 Olympus Corp チップ駆動装置
JP5152111B2 (ja) * 2009-06-22 2013-02-27 新日鐵住金株式会社 集束イオンビーム加工装置用プローブ、プローブ装置、及びプローブの製造方法
EP2378342A1 (de) * 2010-04-15 2011-10-19 Mmi Ag Mikromanipulationssystem mit Schutzvorrichtung für Kapillaren
KR102383571B1 (ko) 2014-06-30 2022-04-06 가부시키가이샤 히다치 하이테크 사이언스 자동 시료 제작 장치
JP6629502B2 (ja) * 2014-08-29 2020-01-15 株式会社日立ハイテクサイエンス 自動試料片作製装置
US9620333B2 (en) 2014-08-29 2017-04-11 Hitachi High-Tech Science Corporation Charged particle beam apparatus
CN107102066B (zh) * 2017-03-27 2020-06-30 河海大学 一种室内超声检测气泡混合轻质土强度的装置及方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101861823B1 (ko) * 2011-09-16 2018-05-29 삼성디스플레이 주식회사 유기 발광 표시 장치 검사 장비, 및 이를 이용한 유기 발광 표시 장치 제조 시스템

Also Published As

Publication number Publication date
JP2004295146A (ja) 2004-10-21

Similar Documents

Publication Publication Date Title
JP4178741B2 (ja) 荷電粒子線装置および試料作製装置
JP3851464B2 (ja) マニピュレータおよびそれを用いたプローブ装置、試料作製装置
JP4200665B2 (ja) 加工装置
US7582885B2 (en) Charged particle beam apparatus
JP6586261B2 (ja) 大容量ｔｅｍグリッド及び試料取り付け方法
JP4185604B2 (ja) 試料解析方法、試料作成方法およびそのための装置
JP3633325B2 (ja) 試料作製装置および試料作製方法
US20080296498A1 (en) In-situ STEM sample preparation
JP3965761B2 (ja) 試料作製装置および試料作製方法
JP5094788B2 (ja) 電子顕微鏡及びその試料ホルダ
JP3851640B2 (ja) マニピュレータおよびそれを用いたプローブ装置、試料作製装置
JP2002033366A (ja) プローブユニットおよびそれを用いた試料操作装置
JP2005142561A (ja) マニピュレータおよびそれを用いたプローブ装置、試料作製装置、試料観察装置
JP3652144B2 (ja) プローブ装置
JP2009037910A (ja) 複合荷電粒子ビーム装置及び加工観察方法
JP3695181B2 (ja) 基板抽出方法及びそれを用いた電子部品製造方法
JP3771926B2 (ja) 試料作製装置
JP4300211B2 (ja) マニピュレータ
JP5024468B2 (ja) 試料加工装置
JP4048210B2 (ja) 試料作製方法
JP4016969B2 (ja) 試料作製装置および試料作製方法
JP4747952B2 (ja) 試料加工装置および試料加工方法
JP4428369B2 (ja) 荷電粒子線装置および試料作製装置
JP4016970B2 (ja) 試料作製装置および試料作製方法
JP4826680B2 (ja) はり部材

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20051101

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20051101

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20051101

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20060808

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20060901

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090908

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100908

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100908

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110908

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120908

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120908

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130908

Year of fee payment: 7

EXPY Cancellation because of completion of term