JP3818633B2 - 塗布膜形成装置及びその方法 - Google Patents

塗布膜形成装置及びその方法 Download PDF

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Publication number
JP3818633B2
JP3818633B2 JP2001155230A JP2001155230A JP3818633B2 JP 3818633 B2 JP3818633 B2 JP 3818633B2 JP 2001155230 A JP2001155230 A JP 2001155230A JP 2001155230 A JP2001155230 A JP 2001155230A JP 3818633 B2 JP3818633 B2 JP 3818633B2
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coating liquid
coating
substrate
discharge
discharge port
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Expired - Fee Related
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Japanese (ja)
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JP2002346451A5 (https=
JP2002346451A (ja
Inventor
朋秀 南
伸一 杉本
高広 北野
淳 大倉
啓聡 栗島
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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  • Coating Apparatus (AREA)
  • Materials For Photolithography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2001155230A 2001-05-24 2001-05-24 塗布膜形成装置及びその方法 Expired - Fee Related JP3818633B2 (ja)

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JP2001155230A JP3818633B2 (ja) 2001-05-24 2001-05-24 塗布膜形成装置及びその方法

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JP2001155230A JP3818633B2 (ja) 2001-05-24 2001-05-24 塗布膜形成装置及びその方法

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JP2002346451A JP2002346451A (ja) 2002-12-03
JP2002346451A5 JP2002346451A5 (https=) 2004-09-30
JP3818633B2 true JP3818633B2 (ja) 2006-09-06

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JP2001155230A Expired - Fee Related JP3818633B2 (ja) 2001-05-24 2001-05-24 塗布膜形成装置及びその方法

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004330136A (ja) * 2003-05-09 2004-11-25 Seiko Epson Corp 液状膜の乾燥方法、有機ｅｌパネルの製造方法、電気光学パネルの製造方法及び電子機器の製造方法、並びに液状膜の乾燥装置、電気光学パネル、電気光学装置及び電子機器
JP5537581B2 (ja) * 2012-03-08 2014-07-02 株式会社東芝 塗布装置及び塗布体の製造方法
CN114210501A (zh) * 2021-12-22 2022-03-22 东莞市嘉田电子科技有限公司 一种电脑机箱表面快速喷涂换色自动化生产线及换色方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1133471A (ja) * 1997-07-23 1999-02-09 Tokyo Electron Ltd 塗布装置
JP3527426B2 (ja) * 1998-01-09 2004-05-17 東京エレクトロン株式会社 現像処理方法および現像処理装置

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