JP3767552B2 - 感放射線性組成物、ブラックマトリクス、カラーフィルタおよびカラー液晶表示装置 - Google Patents

感放射線性組成物、ブラックマトリクス、カラーフィルタおよびカラー液晶表示装置 Download PDF

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Publication number
JP3767552B2
JP3767552B2 JP2002375761A JP2002375761A JP3767552B2 JP 3767552 B2 JP3767552 B2 JP 3767552B2 JP 2002375761 A JP2002375761 A JP 2002375761A JP 2002375761 A JP2002375761 A JP 2002375761A JP 3767552 B2 JP3767552 B2 JP 3767552B2
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JP
Japan
Prior art keywords
acid
radiation
weight
sensitive composition
pigment
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Expired - Fee Related
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JP2002375761A
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English (en)
Japanese (ja)
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JP2004205862A (ja
Inventor
亘史 伊藤
美里 森尾
慈 阿部
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JSR Corp
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JSR Corp
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Priority to JP2002375761A priority Critical patent/JP3767552B2/ja
Priority to TW092135272A priority patent/TWI285792B/zh
Priority to KR1020030096239A priority patent/KR100807495B1/ko
Priority to CNB2003101147166A priority patent/CN1282901C/zh
Publication of JP2004205862A publication Critical patent/JP2004205862A/ja
Application granted granted Critical
Publication of JP3767552B2 publication Critical patent/JP3767552B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Optical Elements Other Than Lenses (AREA)
JP2002375761A 2002-12-26 2002-12-26 感放射線性組成物、ブラックマトリクス、カラーフィルタおよびカラー液晶表示装置 Expired - Fee Related JP3767552B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2002375761A JP3767552B2 (ja) 2002-12-26 2002-12-26 感放射線性組成物、ブラックマトリクス、カラーフィルタおよびカラー液晶表示装置
TW092135272A TWI285792B (en) 2002-12-26 2003-12-12 Radiation-sensitive compound, black matrix, color filter and color LCD device
KR1020030096239A KR100807495B1 (ko) 2002-12-26 2003-12-24 감방사선성 조성물, 블랙 매트릭스, 컬러 필터 및 컬러액정 표시 장치
CNB2003101147166A CN1282901C (zh) 2002-12-26 2003-12-26 放射线敏感性组合物、黑色矩阵、颜色滤光片以及彩色液晶显示装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002375761A JP3767552B2 (ja) 2002-12-26 2002-12-26 感放射線性組成物、ブラックマトリクス、カラーフィルタおよびカラー液晶表示装置

Publications (2)

Publication Number Publication Date
JP2004205862A JP2004205862A (ja) 2004-07-22
JP3767552B2 true JP3767552B2 (ja) 2006-04-19

Family

ID=32813394

Family Applications (1)

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JP2002375761A Expired - Fee Related JP3767552B2 (ja) 2002-12-26 2002-12-26 感放射線性組成物、ブラックマトリクス、カラーフィルタおよびカラー液晶表示装置

Country Status (4)

Country Link
JP (1) JP3767552B2 (ko)
KR (1) KR100807495B1 (ko)
CN (1) CN1282901C (ko)
TW (1) TWI285792B (ko)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4407410B2 (ja) * 2004-07-15 2010-02-03 Ｊｓｒ株式会社 カラーフィルタ用感放射線性組成物およびその調製法
KR101119818B1 (ko) * 2004-12-07 2012-03-06 주식회사 동진쎄미켐 컬러필터용 감광성 수지 조성물 및 이를 이용한액정디스플레이 컬러필터의 제조방법
KR101314033B1 (ko) * 2005-06-15 2013-10-01 제이에스알 가부시끼가이샤 감광성 수지 조성물, 표시 패널용 스페이서의 형성 방법
KR101266564B1 (ko) * 2005-08-03 2013-05-22 제이에스알 가부시끼가이샤 도금 조형물 제조용 포지티브형 감방사선성 수지 조성물,전사 필름 및 도금 조형물의 제조 방법
JP4815952B2 (ja) * 2005-08-26 2011-11-16 Ｊｓｒ株式会社 重合体、カラーフィルタ用感放射線性組成物、カラーフィルタおよびカラー液晶表示パネル
JP5191201B2 (ja) * 2006-10-26 2013-05-08 富士フイルム株式会社 カラーフィルタ用着色硬化性組成物、カラーフィルタ、及びその製造方法
KR100895352B1 (ko) * 2006-11-15 2009-04-29 다이요 잉키 세이조 가부시키가이샤 흑색 페이스트 조성물, 및 그것을 이용한 블랙 매트릭스패턴의 형성 방법, 및 그 블랙 매트릭스 패턴
KR100865684B1 (ko) * 2006-12-21 2008-10-29 제일모직주식회사 고 내에칭성 반사방지 하드마스크 조성물, 패턴화된 재료형상의　제조방법 및 그 제조방법으로 제조되는 반도체집적회로 디바이스
JP4947294B2 (ja) * 2007-02-23 2012-06-06 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
JP5114979B2 (ja) * 2007-03-13 2013-01-09 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
CN102692661B (zh) * 2011-03-24 2016-01-06 Jsr株式会社 彩色滤光片、彩色滤光片的制造方法及液晶显示元件
JP5786451B2 (ja) * 2011-05-19 2015-09-30 Jsr株式会社 カラーフィルタ、液晶表示素子およびカラーフィルタの製造方法
JP5884325B2 (ja) * 2011-07-15 2016-03-15 Jsr株式会社 カラーフィルタ、液晶表示素子およびカラーフィルタの製造方法
JP2018188525A (ja) * 2017-04-28 2018-11-29 株式会社ブリヂストン ゴムセメント組成物及びコンベアベルト
JP2019179111A (ja) 2018-03-30 2019-10-17 Jsr株式会社 表示素子用積層体、及び隔壁形成用組成物
JP2019182899A (ja) 2018-04-02 2019-10-24 Jsr株式会社 硬化性組成物、及び硬化膜の形成方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100550933B1 (ko) * 1999-03-11 2006-02-13 제일모직주식회사 감광성 수지 조성물 및 블랙매트릭스
JP2001154013A (ja) 1999-12-01 2001-06-08 Jsr Corp カラー液晶表示装置用感放射線性組成物
JP3852107B2 (ja) 2000-11-14 2006-11-29 Ｊｓｒ株式会社 反射防止膜形成組成物

Also Published As

Publication number Publication date
CN1282901C (zh) 2006-11-01
KR20040058003A (ko) 2004-07-02
JP2004205862A (ja) 2004-07-22
TW200415403A (en) 2004-08-16
TWI285792B (en) 2007-08-21
CN1512269A (zh) 2004-07-14
KR100807495B1 (ko) 2008-02-25

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