JP3587343B2 - 面位置検出方法、露光装置およびデバイス製造方法 - Google Patents

面位置検出方法、露光装置およびデバイス製造方法 Download PDF

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Publication number
JP3587343B2
JP3587343B2 JP35405297A JP35405297A JP3587343B2 JP 3587343 B2 JP3587343 B2 JP 3587343B2 JP 35405297 A JP35405297 A JP 35405297A JP 35405297 A JP35405297 A JP 35405297A JP 3587343 B2 JP3587343 B2 JP 3587343B2
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JP
Japan
Prior art keywords
detection
exposure apparatus
surface position
exposure
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP35405297A
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English (en)
Japanese (ja)
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JPH11176735A5 (enExample
JPH11176735A (ja
Inventor
雄一 山田
淳 河原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP35405297A priority Critical patent/JP3587343B2/ja
Priority to US09/205,173 priority patent/US6163369A/en
Publication of JPH11176735A publication Critical patent/JPH11176735A/ja
Application granted granted Critical
Publication of JP3587343B2 publication Critical patent/JP3587343B2/ja
Publication of JPH11176735A5 publication Critical patent/JPH11176735A5/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP35405297A 1997-12-09 1997-12-09 面位置検出方法、露光装置およびデバイス製造方法 Expired - Fee Related JP3587343B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP35405297A JP3587343B2 (ja) 1997-12-09 1997-12-09 面位置検出方法、露光装置およびデバイス製造方法
US09/205,173 US6163369A (en) 1997-12-09 1998-12-04 Plane position detecting method and exposing method and exposure apparatus using same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35405297A JP3587343B2 (ja) 1997-12-09 1997-12-09 面位置検出方法、露光装置およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JPH11176735A JPH11176735A (ja) 1999-07-02
JP3587343B2 true JP3587343B2 (ja) 2004-11-10
JPH11176735A5 JPH11176735A5 (enExample) 2004-12-09

Family

ID=18434979

Family Applications (1)

Application Number Title Priority Date Filing Date
JP35405297A Expired - Fee Related JP3587343B2 (ja) 1997-12-09 1997-12-09 面位置検出方法、露光装置およびデバイス製造方法

Country Status (2)

Country Link
US (1) US6163369A (enExample)
JP (1) JP3587343B2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4365908B2 (ja) 1998-09-04 2009-11-18 キヤノン株式会社 面位置検出装置、露光装置およびデバイス製造方法
JP2000124122A (ja) * 1998-10-19 2000-04-28 Canon Inc 半導体露光装置および同装置を用いるデバイス製造方法
JP2001075294A (ja) * 1999-07-08 2001-03-23 Nikon Corp 面位置検出方法及び装置、並びに露光方法及び装置、露光装置の製造方法、半導体デバイス製造方法
TWI231405B (en) * 1999-12-22 2005-04-21 Asml Netherlands Bv Lithographic projection apparatus, position detection device, and method of manufacturing a device using a lithographic projection apparatus
US6504611B2 (en) * 2000-05-17 2003-01-07 Coretek, Inc. Two stage optical alignment device and method of aligning optical components
KR100524194B1 (ko) 2003-06-30 2005-10-26 삼성전자주식회사 웨이퍼의 표면 검사 방법 및 장치
WO2008007765A1 (en) * 2006-07-14 2008-01-17 Nikon Corporation Surface position detecting apparatus, exposure apparatus and device manufacturing method
JP2008218839A (ja) * 2007-03-06 2008-09-18 Canon Inc 検査装置、露光装置及びデバイス製造方法
JP6327861B2 (ja) * 2014-01-07 2018-05-23 キヤノン株式会社 リソグラフィ装置、リソグラフィ方法、および物品の製造方法
KR101986161B1 (ko) 2014-03-04 2019-06-05 에이에스엠엘 네델란즈 비.브이. 데이터 처리 장치를 갖는 리소그래피 장치
JP7625636B2 (ja) * 2023-05-24 2025-02-03 キヤノン株式会社 基板処理装置、制御方法、および物品製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2622573B2 (ja) * 1988-01-27 1997-06-18 キヤノン株式会社 マーク検知装置及び方法
JP2785146B2 (ja) * 1990-02-09 1998-08-13 キヤノン株式会社 自動焦点調整制御装置
JP2886957B2 (ja) * 1990-09-06 1999-04-26 キヤノン株式会社 自動焦点合せ装置
US5361122A (en) * 1990-09-06 1994-11-01 Canon Kabushiki Kaisha Autofocusing device and projection exposure apparatus with the same
JP3158446B2 (ja) * 1990-12-13 2001-04-23 株式会社ニコン 表面位置検出装置及び表面位置検出方法、並びに露光装置、露光方法及び半導体製造方法
US5777722A (en) * 1994-04-28 1998-07-07 Nikon Corporation Scanning exposure apparatus and method
US6018384A (en) * 1994-09-07 2000-01-25 Nikon Corporation Projection exposure system
JPH09320933A (ja) * 1996-05-28 1997-12-12 Nikon Corp 走査型露光装置
US5825043A (en) * 1996-10-07 1998-10-20 Nikon Precision Inc. Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus

Also Published As

Publication number Publication date
US6163369A (en) 2000-12-19
JPH11176735A (ja) 1999-07-02

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