JP3334817B2 - Polishing method of glass plate - Google Patents

Polishing method of glass plate

Info

Publication number
JP3334817B2
JP3334817B2 JP32760893A JP32760893A JP3334817B2 JP 3334817 B2 JP3334817 B2 JP 3334817B2 JP 32760893 A JP32760893 A JP 32760893A JP 32760893 A JP32760893 A JP 32760893A JP 3334817 B2 JP3334817 B2 JP 3334817B2
Authority
JP
Japan
Prior art keywords
polishing
center
glass plate
rotation
revolution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP32760893A
Other languages
Japanese (ja)
Other versions
JPH07178655A (en
Inventor
良弘 北川
妥夫 寺西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Electric Glass Co Ltd
Original Assignee
Nippon Electric Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Glass Co Ltd filed Critical Nippon Electric Glass Co Ltd
Priority to JP32760893A priority Critical patent/JP3334817B2/en
Publication of JPH07178655A publication Critical patent/JPH07178655A/en
Application granted granted Critical
Publication of JP3334817B2 publication Critical patent/JP3334817B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、ガラス板の表面を研磨
する方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for polishing a surface of a glass plate.

【0002】[0002]

【従来の技術】従来この種のガラス板の研磨方法とし
て、複数の研磨円板を自転させつつ公転させる方法が多
く採用されている。図3は、従来の研磨方法の平面説明
図であり、(2)は研磨円板(1)の自転中心を、
(3)は公転中心を示している。
2. Description of the Related Art Conventionally, as a method of polishing a glass plate of this kind, a method of revolving a plurality of polishing disks while rotating them has been adopted in many cases. FIG. 3 is an explanatory plan view of a conventional polishing method. FIG. 3 (2) shows the center of rotation of the polishing disk (1).
(3) indicates the center of revolution.

【0003】[0003]

【発明が解決しようとする課題】従来の研磨方法では、
複数の研磨円板間の相互干渉を回避するため、公転中心
部に研磨不能領域(4)が発生し、この部分のガラス板
の表面に研磨円板の外周軌跡が残り、研磨面の平坦度、
平面度が悪いという欠点があった。
In the conventional polishing method,
In order to avoid mutual interference between a plurality of polishing disks, a non-polishing region (4) is generated at the center of the revolution, and the outer peripheral locus of the polishing disk remains on the surface of the glass plate in this portion, and the flatness of the polishing surface ,
There was a disadvantage that the flatness was poor.

【0004】本発明の目的は、前記従来の研磨方法に比
べて、液晶用等の精度の高い平坦度、平面度を必要とす
るガラス板を均一に研磨し得る方法を提供することにあ
る。
An object of the present invention is to provide a method for uniformly polishing a glass plate which requires a high degree of flatness and flatness for a liquid crystal or the like as compared with the conventional polishing method.

【課題を解決するための手段】[Means for Solving the Problems]

【0005】上記目的を達成するため、本発明の1つ
は、複数の研磨円板を遊星回転機構により自転させつつ
公転させるガラス板の研磨方法において、研磨円板の中
心を遊星回転機構の自転中心から偏心させて取り付け、
かつ、研磨円板が公転中心を通過するように偏心回転さ
せて研磨するものである。
In order to achieve the above object, one aspect of the present invention is a method of polishing a glass plate in which a plurality of polishing disks revolve while rotating by a planetary rotating mechanism. Eccentrically mounted from the center,
In addition, the polishing is performed by eccentric rotation so that the polishing disk passes through the center of revolution.

【0006】本発明のもう1つは、複数の研磨板を遊星
回転機構により自転させつつ公転させるガラス板の研磨
方法において、研磨板を楕円形又は長方形とし、その回
転中心を遊星回転機構の自転中心と一致させて取り付
け、かつ、研磨板が公転中心を通過するように回転させ
て研磨するものである。
Another aspect of the present invention is a method of polishing a glass plate in which a plurality of polishing plates are revolved while rotating by a planetary rotating mechanism. The polishing plate is made elliptical or rectangular, and the center of rotation is rotated by the planetary rotating mechanism. It is mounted so that it is aligned with the center, and is polished by rotating so that the polishing plate passes through the center of revolution.

【0007】[0007]

【作用】本発明の第1の方法は、複数の研磨円板の中心
を遊星回転機構の自転中心から偏心させ、かつ、研磨円
板が公転中心を通過するように偏心回転させたから、複
数の研磨円板間の相互干渉を回避しつつ公転中心部に研
磨不能領域が発生することを防止できる。
According to the first method of the present invention, the center of the plurality of polishing disks is eccentric from the rotation center of the planetary rotation mechanism, and the eccentric rotation is performed so that the polishing disk passes through the center of revolution. It is possible to prevent the non-polishing area from being generated at the center of the revolution while avoiding mutual interference between the polishing disks.

【0008】本発明の第2の方法は、遊星回転する複数
の研磨板を楕円形又は長方形とし、その回転中心を遊星
回転機構の自転中心と一致させて取り付け、かつ、研磨
板が公転中心を通過するように回転させたから、複数の
研磨板間の相互干渉を回避しつつ公転中心部に研磨不能
領域が発生することを防止できる。
In a second method of the present invention, a plurality of planetary rotating polishing plates are formed into an elliptical or rectangular shape, the center of rotation of which is aligned with the center of rotation of the planetary rotation mechanism, and the polishing plate is set at the center of revolution. Since it is rotated so as to pass through, it is possible to prevent a non-polishing region from being generated at the center of the revolution while avoiding mutual interference between the plurality of polishing plates.

【0009】[0009]

【実施例】図1の(A)(B)は、第1発明の研磨方法
の平面説明図及び研磨ヘッドの実施例を示す縦断側面図
であって、複数(図は3個)の研磨円板(5)を遊星回
転機構(6)により自転させつつ公転させるガラス板の
研磨方法において、研磨円板(5)の中心を遊星回転機
構の自転中心(7)から偏心させて取り付け、かつ、研
磨円板(5)が公転中心(8)を通過するように偏心回
転させてガラス板(9)を研磨するものである。
1 (A) and 1 (B) are a plan explanatory view of a polishing method according to a first invention and a longitudinal sectional side view showing an embodiment of a polishing head. A plurality (three in the figure) of polishing circles are shown. In a method for polishing a glass plate in which a plate (5) is revolved while being rotated by a planetary rotation mechanism (6), the center of the polishing disk (5) is mounted eccentrically from the rotation center (7) of the planetary rotation mechanism, and The polishing disk (5) is eccentrically rotated so as to pass through the center of revolution (8) to polish the glass plate (9).

【0010】上記遊星回転機構(6)は、研磨ヘッド
(図示省略)に回転可能に軸受けされた公転軸(6a)
の周囲に基板(6c)及び軸受け筒(6d)を介して自
転軸(6b)を120度の間隔で同心円上に配置し、各
自転軸(6b)は、同一方向に同一速度で自転し、公転
軸(6a)は、自転軸(6b)と同一方向又は逆方向に
公転駆動される。
The planetary rotation mechanism (6) includes a revolving shaft (6a) rotatably supported by a polishing head (not shown).
, The rotation axes (6b) are arranged concentrically at intervals of 120 degrees via a substrate (6c) and a bearing cylinder (6d), and each rotation axis (6b) rotates in the same direction at the same speed, The revolving shaft (6a) is revolved in the same direction as the rotating shaft (6b) or in the opposite direction.

【0011】上記各自転軸(6b)には、研磨円板
(5)を図1の(A)及び(B)に示す関係位相に偏心
させて取り付ける。この研磨円板(5)の研磨面には、
研磨用フェルトや研磨用バフ等の研磨具(5a)を取り
付けるものである。また、各自転軸(6b)には、バラ
ンスウエイト(6e)を取り付けて、各研磨円板(5)
の偏心回転による軸振動の発生を相殺させるようにして
いる。なお、研磨ヘッドは、ガラス板(9)の研磨中、
図1の(A)に矢印(x)で示す方向にシリンダ等の往
復動手段で往復動可能とされている。また、ガラス板
(9)は、その研磨中、図1の(A)に矢印(y)で示
す方向に移動可能とされている。
A polishing disk (5) is mounted on each of the rotation shafts (6b) so as to be eccentric to the relative phases shown in FIGS. 1 (A) and 1 (B). On the polishing surface of this polishing disk (5),
A polishing tool (5a) such as a polishing felt or a polishing buff is attached. A balance weight (6e) is attached to each rotation shaft (6b), and each polishing disc (5)
The generation of the shaft vibration due to the eccentric rotation of the shaft is offset. During the polishing of the glass plate (9), the polishing head
The reciprocating unit such as a cylinder can reciprocate in a direction indicated by an arrow (x) in FIG. The glass plate (9) is movable in the direction shown by the arrow (y) in FIG.

【0012】上記第1発明の研磨方法によれば、図1の
(A)に示すような回転軌跡を描いて各研磨円板(5)
が相互干渉することなく自転しながら公転し、各研磨円
板(5)が公転中心(8)を通過するため、公転中心
(8)付近に研磨不能領域が発生せず、ガラス板(9)
を均一に研磨することができる。なお、ガラス板(9)
の研磨に際しては、適当な粒径の酸化セリウムやベンガ
ラ等を水その他の液体に混入した研磨剤をガラス板
(9)の表面と研磨円板(5)の研磨具(5a)との間
に供給する。この研磨剤の供給は、各自転軸(6b)の
中心孔、公転軸(6a)の中心孔、外部ノズルの何れか
を経由して行うものである。
According to the polishing method of the first aspect of the present invention, each polishing disk (5) is drawn by drawing a rotation trajectory as shown in FIG.
Revolve while rotating without interfering with each other, and each polishing disk (5) passes through the center of revolution (8), so that a non-polishing area does not occur near the center of revolution (8), and the glass plate (9)
Can be polished uniformly. In addition, the glass plate (9)
At the time of polishing, an abrasive obtained by mixing cerium oxide, red iron oxide or the like having an appropriate particle diameter into water or other liquid is applied between the surface of the glass plate (9) and the polishing tool (5a) of the polishing disk (5). Supply. The supply of the abrasive is performed via any one of the center hole of each rotation shaft (6b), the center hole of the revolution shaft (6a), and an external nozzle.

【0013】次に、図2の(A)(B)は、第2発明の
研磨方法の平面説明図及び研磨ヘッドの実施例を示す縦
断側面図であって、複数(図は2個)の研磨板(5’)
を楕円形とし、その回転中心を遊星回転機構(6)の自
転中心(7)に一致させて取り付け、かつ、研磨板
(5’)が遊星回転機構(6)の公転中心(8)を通過
するように回転させてガラス板(9)を研磨するもので
ある。
Next, FIGS. 2A and 2B are a plan explanatory view of a polishing method according to a second invention and a longitudinal sectional side view showing an embodiment of a polishing head, wherein a plurality (two in the figure) are shown. Polishing plate (5 ')
Into an elliptical shape, the rotation center of which is aligned with the rotation center (7) of the planetary rotation mechanism (6), and the polishing plate (5 ') passes through the revolution center (8) of the planetary rotation mechanism (6). Then, the glass plate (9) is polished by being rotated.

【0014】上記遊星回転機構(6)は、研磨ヘッド
(図示省略)に回転可能に軸受けされた公転軸(6a)
の周囲に基板(6c)及び軸受け筒(6d)を介して自
転軸(6b)を180度の間隔で同心円上に配置し、各
自転軸(6b)は、同一方向又は逆方向に同一速度で自
転し、公転軸(6a)は、自転軸(6b)と同一方向又
は逆方向に公転駆動される。
The planetary rotation mechanism (6) includes a revolving shaft (6a) rotatably supported by a polishing head (not shown).
, The rotation axes (6b) are arranged concentrically at 180 ° intervals via a substrate (6c) and a bearing cylinder (6d), and each rotation axis (6b) is at the same speed in the same direction or the opposite direction. It rotates, and the revolving shaft (6a) is revolved in the same direction as the revolving shaft (6b) or in the opposite direction.

【0015】上記各自転軸(6b)には、研磨板
(5’)を図2の(A)及び(B)に示す関係位相(9
0度の位相差)で取り付ける。この研磨板(5’)の研
磨面には、研磨用フェルトや研磨用バフ等の研磨具(5
a’)を取り付けるものである。なお、研磨ヘッドは、
ガラス板(9)の研磨中、図2の(A)に矢印(x)で
示す方向にシリンダ等の往復動手段で往復動可能とされ
ている。また、ガラス板(9)は、その研磨中、図2の
(A)に矢印(y)で示す方向に移動可能とされてい
る。
Each of the rotating shafts (6b) is provided with a polishing plate (5 ') having a relational phase (9) shown in FIGS. 2A and 2B.
(0 degree phase difference). A polishing tool (5) such as a polishing felt or a polishing buff is provided on the polishing surface of the polishing plate (5 ').
a ′). The polishing head is
While the glass plate (9) is being polished, the glass plate (9) can reciprocate in a direction indicated by an arrow (x) in FIG. The glass plate (9) is movable in the direction shown by the arrow (y) in FIG.

【0016】上記第2発明の研磨方法によれば、図2の
(A)に示すような回転軌跡を描いて各研磨板(5’)
が相互干渉することなく自転しながら公転し、各研磨板
(5’)が公転中心(8)を通過するため、公転中心
(8)付近に研磨不能領域が発生せず、ガラス板(9)
を均一に研磨することができる。なお、ガラス板(9)
の研磨に際しては、適当な研磨剤を供給して行うもので
ある。
According to the polishing method of the second aspect of the present invention, each polishing plate (5 ') is drawn by drawing a rotational trajectory as shown in FIG.
Revolve while rotating without interfering with each other, and each polishing plate (5 ') passes through the center of revolution (8), so that a non-polishing area does not occur near the center of revolution (8), and the glass plate (9)
Can be polished uniformly. In addition, the glass plate (9)
The polishing is performed by supplying an appropriate abrasive.

【0017】上記第2発明は、楕円形の研磨板(5’)
を用いて実施した場合を例示したが、これに代えて、長
方形の研磨板を使用しても同様な作用効果が得られる。
The second invention provides an elliptical polishing plate (5 ').
However, the same effect can be obtained by using a rectangular polishing plate instead.

【0018】また、第1発明及び第2発明の実施例は、
研磨ヘッド(図示省略)及びガラス板(9)を往復動及
び移動させる場合を例示したが、何れか一方を固定した
状態で実施することも可能である。
Further, the embodiments of the first invention and the second invention are as follows.
The case where the polishing head (not shown) and the glass plate (9) are reciprocated and moved has been described as an example, but it is also possible to carry out the operation with any one fixed.

【0019】[0019]

【発明の効果】請求項1の発明によれば、複数の研磨円
板の中心を遊星回転機構の自転中心から偏心させて取り
付け、かつ、研磨円板が公転中心を通過するように偏心
回転させたから、複数の研磨円板間の相互干渉を回避し
つつ公転中心部に研磨不能領域が発生することを防止で
き、均一で、最大外周跡が残らず、精度の高い平坦度、
平面度を必要とするガラス板製品を提供することができ
る。
According to the first aspect of the present invention, the centers of the plurality of polishing disks are mounted eccentrically from the rotation center of the planetary rotation mechanism, and the polishing disks are eccentrically rotated so as to pass through the center of revolution. Therefore, it is possible to prevent a non-polishing area from being generated at the center of the revolution while avoiding mutual interference between a plurality of polishing disks, and to ensure uniformity, no trace of the maximum outer periphery, high-precision flatness,
A glass sheet product requiring flatness can be provided.

【0020】請求項2の発明によれば、遊星回転する複
数の研磨板を楕円形又は長方形とし、その回転中心を遊
星回転機構の自転中心と一致させて取り付け、かつ、研
磨板が公転中心を通過するように回転させたから、複数
の研磨板間の相互干渉を回避しつつ公転中心部に研磨不
能領域が発生することを防止でき、均一で、最大外周跡
が残らず、精度の高い平坦度、平面度を必要とするガラ
ス板製品を提供することができる。
According to the second aspect of the present invention, the plurality of planetary rotating polishing plates are formed into elliptical or rectangular shapes, the rotation centers of which are aligned with the rotation centers of the planetary rotation mechanism, and the polishing plates are arranged so that the center of revolution is the center. Rotated so that it passes through, it is possible to prevent the occurrence of non-polishing areas at the center of revolution while avoiding mutual interference between multiple polishing plates, uniform, no trace of maximum outer circumference remains, and high-precision flatness A glass sheet product requiring flatness can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(A)は第1発明の研磨方法の平面説明図、
(B)はその研磨ヘッドの実施例を示す側面図で、左半
分は断面を示す。
FIG. 1A is an explanatory plan view of a polishing method according to a first invention,
(B) is a side view showing an embodiment of the polishing head, and the left half shows a cross section.

【図2】(A)は第2発明の研磨方法の平面説明図、
(B)はその研磨ヘッドの実施例を示す側面図で、左半
分は断面を示す。
FIG. 2A is an explanatory plan view of a polishing method according to a second invention,
(B) is a side view showing an embodiment of the polishing head, and the left half shows a cross section.

【図3】従来の研磨方法の平面説明図である。FIG. 3 is an explanatory plan view of a conventional polishing method.

【符号の説明】[Explanation of symbols]

5 研磨円板 5’ 研磨板 6 遊星回転機構 7 自転中心 8 公転中心 9 ガラス板 5 Polishing disk 5 'Polishing plate 6 Planetary rotation mechanism 7 Center of rotation 8 Center of revolution 9 Glass plate

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) B24B 7/00 B24B 7/04 B24B 7/07 B24B 7/24 B24B 41/04 B24B 41/053 B24D 7/00 B24D 11/00 ──────────────────────────────────────────────────の Continued on the front page (58) Field surveyed (Int.Cl. 7 , DB name) B24B 7/00 B24B 7/04 B24B 7/07 B24B 7/24 B24B 41/04 B24B 41/053 B24D 7 / 00 B24D 11/00

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 複数の研磨円板を遊星回転機構により自
転させつつ公転させるガラス板の研磨方法において、研
磨円板の中心を遊星回転機構の自転中心から偏心させて
取り付け、かつ、研磨円板が公転中心を通過するように
偏心回転させて研磨することを特徴とするガラス板の研
磨方法。
1. A polishing method for a glass plate in which a plurality of polishing disks are revolved while rotating by a planetary rotating mechanism, wherein the center of the polishing disk is mounted eccentrically from the rotation center of the planetary rotating mechanism, and the polishing disk is mounted. A glass plate being eccentrically rotated so as to pass through a center of revolution.
【請求項2】 複数の研磨板を遊星回転機構により自転
させつつ公転させるガラス板の研磨方法において、研磨
板を楕円形又は長方形とし、その回転中心を遊星回転機
構の自転中心と一致させて取り付け、かつ、研磨板が公
転中心を通過するように回転させて研磨することを特徴
とするガラス板の研磨方法。
2. A polishing method for a glass plate in which a plurality of polishing plates are revolved while rotating by a planetary rotation mechanism, wherein the polishing plate is made elliptical or rectangular, and the rotation center thereof is aligned with the rotation center of the planetary rotation mechanism. And polishing the glass plate by rotating the polishing plate so as to pass through the center of revolution.
JP32760893A 1993-12-24 1993-12-24 Polishing method of glass plate Expired - Fee Related JP3334817B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32760893A JP3334817B2 (en) 1993-12-24 1993-12-24 Polishing method of glass plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32760893A JP3334817B2 (en) 1993-12-24 1993-12-24 Polishing method of glass plate

Publications (2)

Publication Number Publication Date
JPH07178655A JPH07178655A (en) 1995-07-18
JP3334817B2 true JP3334817B2 (en) 2002-10-15

Family

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Application Number Title Priority Date Filing Date
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Country Link
JP (1) JP3334817B2 (en)

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CN108942490A (en) * 2018-09-03 2018-12-07 江苏亚太轻合金科技股份有限公司 A kind of profile deburring equipment
CN109571224B (en) * 2018-12-14 2024-03-22 东旭光电科技股份有限公司 Curved glass polishing machine
CN115091305A (en) * 2022-07-19 2022-09-23 苏州贝亚特精密自动化机械有限公司 Valve core grinding machine

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