JPH07178655A - Polishing method for glass sheet - Google Patents
Polishing method for glass sheetInfo
- Publication number
- JPH07178655A JPH07178655A JP32760893A JP32760893A JPH07178655A JP H07178655 A JPH07178655 A JP H07178655A JP 32760893 A JP32760893 A JP 32760893A JP 32760893 A JP32760893 A JP 32760893A JP H07178655 A JPH07178655 A JP H07178655A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- center
- rotating
- glass plate
- revolution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、ガラス板の表面を研磨
する方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for polishing the surface of a glass plate.
【０００２】[0002]
【従来の技術】従来この種のガラス板の研磨方法とし
て、複数の研磨円板を自転させつつ公転させる方法が多
く採用されている。図３は、従来の研磨方法の平面説明
図であり、（２）は研磨円板（１）の自転中心を、
（３）は公転中心を示している。2. Description of the Related Art Conventionally, as a method of polishing a glass plate of this type, a method of orbiting a plurality of polishing disks while revolving around them has been widely adopted. FIG. 3 is a plan view of a conventional polishing method, in which (2) is the center of rotation of the polishing disc (1),
(3) indicates the center of revolution.
【０００３】[0003]
【発明が解決しようとする課題】従来の研磨方法では、
複数の研磨円板間の相互干渉を回避するため、公転中心
部に研磨不能領域（４）が発生し、この部分のガラス板
の表面に研磨円板の外周軌跡が残り、研磨面の平坦度、
平面度が悪いという欠点があった。In the conventional polishing method,
In order to avoid mutual interference between a plurality of polishing discs, a non-polishing region (4) occurs at the center of the revolution, and the outer peripheral locus of the polishing disc remains on the surface of the glass plate in this portion, and the flatness of the polishing surface is ,
It had the drawback of poor flatness.
【０００４】本発明の目的は、前記従来の研磨方法に比
べて、液晶用等の精度の高い平坦度、平面度を必要とす
るガラス板を均一に研磨し得る方法を提供することにあ
る。An object of the present invention is to provide a method capable of uniformly polishing a glass plate for liquid crystal or the like, which requires high flatness and flatness as compared with the conventional polishing method.
【０００５】上記目的を達成するため、本発明の１つ
は、複数の研磨円板を遊星回転機構により自転させつつ
公転させるガラス板の研磨方法において、研磨円板の中
心を遊星回転機構の自転中心から偏心させて取り付け、
かつ、研磨円板が公転中心を通過するように偏心回転さ
せて研磨するものである。In order to achieve the above object, one of the present inventions is a method for polishing a glass plate in which a plurality of polishing discs are revolved while being rotated by a planetary rotating mechanism, and the center of the polishing discs is rotated by the planetary rotating mechanism. It is installed eccentrically from the center,
In addition, the polishing disk is eccentrically rotated so as to pass through the center of revolution, and polishing is performed.
【０００６】本発明のもう１つは、複数の研磨板を遊星
回転機構により自転させつつ公転させるガラス板の研磨
方法において、研磨板を楕円形又は長方形とし、その回
転中心を遊星回転機構の自転中心と一致させて取り付
け、かつ、研磨板が公転中心を通過するように回転させ
て研磨するものである。Another aspect of the present invention is a method for polishing a glass plate in which a plurality of polishing plates are revolved by a planetary rotation mechanism while revolving around them, and the polishing plates are elliptical or rectangular and the center of rotation is the rotation of the planetary rotation mechanism. It is attached so that it coincides with the center, and is rotated by polishing so that the polishing plate passes through the center of revolution.
【０００７】[0007]
【作用】本発明の第１の方法は、複数の研磨円板の中心
を遊星回転機構の自転中心から偏心させ、かつ、研磨円
板が公転中心を通過するように偏心回転させたから、複
数の研磨円板間の相互干渉を回避しつつ公転中心部に研
磨不能領域が発生することを防止できる。According to the first method of the present invention, the centers of the plurality of polishing discs are eccentric with respect to the rotation center of the planetary rotation mechanism, and the polishing discs are eccentrically rotated so as to pass through the revolution center. It is possible to prevent the occurrence of a non-polishable region at the center of the revolution while avoiding mutual interference between the polishing disks.
【０００８】本発明の第２の方法は、遊星回転する複数
の研磨板を楕円形又は長方形とし、その回転中心を遊星
回転機構の自転中心と一致させて取り付け、かつ、研磨
板が公転中心を通過するように回転させたから、複数の
研磨板間の相互干渉を回避しつつ公転中心部に研磨不能
領域が発生することを防止できる。According to the second method of the present invention, a plurality of planetary rotating polishing plates are formed into an elliptical shape or a rectangular shape, the center of rotation thereof is attached so as to coincide with the rotation center of the planetary rotating mechanism, and the polishing plate has the center of revolution. Since the rotation is performed so as to pass through, it is possible to prevent the non-polishing region from being generated in the revolution center while avoiding mutual interference between the plurality of polishing plates.
【０００９】[0009]
【実施例】図１の（Ａ）（Ｂ）は、第１発明の研磨方法
の平面説明図及び研磨ヘッドの実施例を示す縦断側面図
であって、複数（図は３個）の研磨円板（５）を遊星回
転機構（６）により自転させつつ公転させるガラス板の
研磨方法において、研磨円板（５）の中心を遊星回転機
構の自転中心（７）から偏心させて取り付け、かつ、研
磨円板（５）が公転中心（８）を通過するように偏心回
転させてガラス板（９）を研磨するものである。1 (A) and 1 (B) are plan explanatory views of a polishing method of the first invention and vertical side views showing an embodiment of a polishing head, wherein a plurality of polishing circles (three in the figure) are used. In a method for polishing a glass plate in which a plate (5) is revolved while being rotated by a planetary rotation mechanism (6), a center of a polishing disk (5) is attached so as to be eccentric from a rotation center (7) of the planetary rotation mechanism, and The polishing disc (5) is eccentrically rotated so as to pass the revolution center (8), and the glass plate (9) is polished.
【００１０】上記遊星回転機構（６）は、研磨ヘッド
（図示省略）に回転可能に軸受けされた公転軸（６ａ）
の周囲に基板（６ｃ）及び軸受け筒（６ｄ）を介して自
転軸（６ｂ）を１２０度の間隔で同心円上に配置し、各
自転軸（６ｂ）は、同一方向に同一速度で自転し、公転
軸（６ａ）は、自転軸（６ｂ）と同一方向又は逆方向に
公転駆動される。The planetary rotation mechanism (6) is a revolution shaft (6a) rotatably supported by a polishing head (not shown).
Rotating shafts (6b) are arranged concentrically around the circumference of the substrate via a substrate (6c) and a bearing cylinder (6d) at intervals of 120 degrees, and each rotating shaft (6b) rotates at the same speed in the same direction, The revolution shaft (6a) is driven to revolve in the same direction as the rotation shaft (6b) or in the opposite direction.
【００１１】上記各自転軸（６ｂ）には、研磨円板
（５）を図１の（Ａ）及び（Ｂ）に示す関係位相に偏心
させて取り付ける。この研磨円板（５）の研磨面には、
研磨用フェルトや研磨用バフ等の研磨具（５ａ）を取り
付けるものである。また、各自転軸（６ｂ）には、バラ
ンスウエイト（６ｅ）を取り付けて、各研磨円板（５）
の偏心回転による軸振動の発生を相殺させるようにして
いる。なお、研磨ヘッドは、ガラス板（９）の研磨中、
図１の（Ａ）に矢印（ｘ）で示す方向にシリンダ等の往
復動手段で往復動可能とされている。また、ガラス板
（９）は、その研磨中、図１の（Ａ）に矢印（ｙ）で示
す方向に移動可能とされている。A polishing disc (5) is attached to each of the rotating shafts (6b) so as to be eccentric to the relational phase shown in FIGS. 1 (A) and 1 (B). On the polishing surface of this polishing disc (5),
A polishing tool (5a) such as a polishing felt or a polishing buff is attached. Further, a balance weight (6e) is attached to each rotation shaft (6b), and each polishing disc (5) is attached.
The generation of shaft vibration due to the eccentric rotation of is canceled out. In addition, the polishing head, during polishing of the glass plate (9),
It can be reciprocated by a reciprocating means such as a cylinder in a direction indicated by an arrow (x) in FIG. Further, the glass plate (9) is movable in the direction shown by the arrow (y) in FIG.
【００１２】上記第１発明の研磨方法によれば、図１の
（Ａ）に示すような回転軌跡を描いて各研磨円板（５）
が相互干渉することなく自転しながら公転し、各研磨円
板（５）が公転中心（８）を通過するため、公転中心
（８）付近に研磨不能領域が発生せず、ガラス板（９）
を均一に研磨することができる。なお、ガラス板（９）
の研磨に際しては、適当な粒径の酸化セリウムやベンガ
ラ等を水その他の液体に混入した研磨剤をガラス板
（９）の表面と研磨円板（５）の研磨具（５ａ）との間
に供給する。この研磨剤の供給は、各自転軸（６ｂ）の
中心孔、公転軸（６ａ）の中心孔、外部ノズルの何れか
を経由して行うものである。According to the polishing method of the first aspect of the invention, each polishing disk (5) is drawn by drawing a rotation locus as shown in FIG. 1 (A).
Rotate while revolving without mutual interference, and each polishing disc (5) passes through the center of revolution (8), so no non-polishable region occurs near the center of revolution (8), and the glass plate (9)
Can be uniformly polished. The glass plate (9)
When polishing, the polishing agent (5a) of the polishing disc (5) and the surface of the glass plate (9) is coated with a polishing agent prepared by mixing cerium oxide, red iron oxide, etc. having an appropriate particle size with water or other liquid. Supply. The supply of the abrasive is performed through any of the center hole of each rotation shaft (6b), the center hole of the revolution shaft (6a), and the external nozzle.
【００１３】次に、図２の（Ａ）（Ｂ）は、第２発明の
研磨方法の平面説明図及び研磨ヘッドの実施例を示す縦
断側面図であって、複数（図は２個）の研磨板（５’）
を楕円形とし、その回転中心を遊星回転機構（６）の自
転中心（７）に一致させて取り付け、かつ、研磨板
（５’）が遊星回転機構（６）の公転中心（８）を通過
するように回転させてガラス板（９）を研磨するもので
ある。Next, FIGS. 2A and 2B are a plan explanatory view of the polishing method of the second invention and a vertical sectional side view showing an embodiment of the polishing head. Polishing plate (5 ')
Is an ellipse, the center of rotation of which is aligned with the rotation center (7) of the planetary rotation mechanism (6), and the polishing plate (5 ') passes through the revolution center (8) of the planetary rotation mechanism (6). The glass plate (9) is then rotated so as to polish the glass plate (9).
【００１４】上記遊星回転機構（６）は、研磨ヘッド
（図示省略）に回転可能に軸受けされた公転軸（６ａ）
の周囲に基板（６ｃ）及び軸受け筒（６ｄ）を介して自
転軸（６ｂ）を１８０度の間隔で同心円上に配置し、各
自転軸（６ｂ）は、同一方向又は逆方向に同一速度で自
転し、公転軸（６ａ）は、自転軸（６ｂ）と同一方向又
は逆方向に公転駆動される。The planetary rotating mechanism (6) is a revolution shaft (6a) rotatably supported by a polishing head (not shown).
Rotating shafts (6b) are arranged concentrically around the circumference of the substrate via a substrate (6c) and a bearing cylinder (6d) at intervals of 180 degrees, and the rotating shafts (6b) are at the same speed in the same direction or opposite directions. The rotation axis and the revolution axis (6a) are revolved in the same direction or the opposite direction to the rotation axis (6b).
【００１５】上記各自転軸（６ｂ）には、研磨板
（５’）を図２の（Ａ）及び（Ｂ）に示す関係位相（９
０度の位相差）で取り付ける。この研磨板（５’）の研
磨面には、研磨用フェルトや研磨用バフ等の研磨具（５
ａ’）を取り付けるものである。なお、研磨ヘッドは、
ガラス板（９）の研磨中、図２の（Ａ）に矢印（ｘ）で
示す方向にシリンダ等の往復動手段で往復動可能とされ
ている。また、ガラス板（９）は、その研磨中、図２の
（Ａ）に矢印（ｙ）で示す方向に移動可能とされてい
る。A polishing plate (5 ') is attached to each of the rotation shafts (6b) in a relational phase (9) shown in FIGS. 2 (A) and 2 (B).
Install with a phase difference of 0 degree). The polishing surface of the polishing plate (5 ') has a polishing tool (5) such as a polishing felt or a polishing buff.
a ') is attached. The polishing head is
During polishing of the glass plate (9), it can be reciprocated by a reciprocating means such as a cylinder in a direction indicated by an arrow (x) in FIG. Further, the glass plate (9) is movable in the direction indicated by the arrow (y) in FIG.
【００１６】上記第２発明の研磨方法によれば、図２の
（Ａ）に示すような回転軌跡を描いて各研磨板（５’）
が相互干渉することなく自転しながら公転し、各研磨板
（５’）が公転中心（８）を通過するため、公転中心
（８）付近に研磨不能領域が発生せず、ガラス板（９）
を均一に研磨することができる。なお、ガラス板（９）
の研磨に際しては、適当な研磨剤を供給して行うもので
ある。According to the polishing method of the second aspect of the invention, each polishing plate (5 ') is drawn with a rotation locus as shown in FIG.
Rotate while revolving without interfering with each other and each polishing plate (5 ') passes through the center of revolution (8), so no non-polishable region occurs near the center of revolution (8), and the glass plate (9)
Can be uniformly polished. The glass plate (9)
The polishing is performed by supplying an appropriate polishing agent.
【００１７】上記第２発明は、楕円形の研磨板（５’）
を用いて実施した場合を例示したが、これに代えて、長
方形の研磨板を使用しても同様な作用効果が得られる。The second invention is the elliptical polishing plate (5 ').
Although the case of using a rectangular polishing plate is used instead of this, the same effect can be obtained.
【００１８】また、第１発明及び第２発明の実施例は、
研磨ヘッド（図示省略）及びガラス板（９）を往復動及
び移動させる場合を例示したが、何れか一方を固定した
状態で実施することも可能である。The embodiments of the first and second inventions are as follows.
The case where the polishing head (not shown) and the glass plate (9) are reciprocated and moved has been illustrated, but it is also possible to carry out with either one fixed.
【００１９】[0019]
【発明の効果】請求項１の発明によれば、複数の研磨円
板の中心を遊星回転機構の自転中心から偏心させて取り
付け、かつ、研磨円板が公転中心を通過するように偏心
回転させたから、複数の研磨円板間の相互干渉を回避し
つつ公転中心部に研磨不能領域が発生することを防止で
き、均一で、最大外周跡が残らず、精度の高い平坦度、
平面度を必要とするガラス板製品を提供することができ
る。According to the first aspect of the present invention, the centers of the plurality of polishing discs are eccentrically mounted from the rotation center of the planetary rotation mechanism, and the polishing discs are eccentrically rotated so as to pass the revolution center. Therefore, while avoiding mutual interference between a plurality of polishing discs, it is possible to prevent the occurrence of a non-polishable region in the revolving center, uniform, no maximum outer peripheral trace, high-precision flatness,
A glass plate product that requires flatness can be provided.
【００２０】請求項２の発明によれば、遊星回転する複
数の研磨板を楕円形又は長方形とし、その回転中心を遊
星回転機構の自転中心と一致させて取り付け、かつ、研
磨板が公転中心を通過するように回転させたから、複数
の研磨板間の相互干渉を回避しつつ公転中心部に研磨不
能領域が発生することを防止でき、均一で、最大外周跡
が残らず、精度の高い平坦度、平面度を必要とするガラ
ス板製品を提供することができる。According to the second aspect of the present invention, the plurality of planetary rotating polishing plates are elliptical or rectangular, the center of rotation thereof is attached so as to be coincident with the rotation center of the planetary rotating mechanism, and the polishing plate serves as the center of revolution. Since it is rotated so that it passes through, it is possible to prevent the non-polishing region from occurring in the center of the revolution while avoiding mutual interference between multiple polishing plates, and to maintain a uniform, maximum outer peripheral trace and with high precision flatness. It is possible to provide a glass plate product that requires flatness.
【図１】（Ａ）は第１発明の研磨方法の平面説明図、
（Ｂ）はその研磨ヘッドの実施例を示す側面図で、左半
分は断面を示す。FIG. 1A is a plan explanatory view of a polishing method of a first invention,
(B) is a side view showing an embodiment of the polishing head, and the left half shows a cross section.
【図２】（Ａ）は第２発明の研磨方法の平面説明図、
（Ｂ）はその研磨ヘッドの実施例を示す側面図で、左半
分は断面を示す。FIG. 2A is an explanatory plan view of the polishing method of the second invention,
(B) is a side view showing an embodiment of the polishing head, and the left half shows a cross section.
【図３】従来の研磨方法の平面説明図である。FIG. 3 is an explanatory plan view of a conventional polishing method.
５ 研磨円板 ５’ 研磨板 ６ 遊星回転機構 ７ 自転中心 ８ 公転中心 ９ ガラス板 5 Polishing Disc 5'Grinding Plate 6 Planetary Rotation Mechanism 7 Rotation Center 8 Revolution Center 9 Glass Plate
Claims (2)
転させつつ公転させるガラス板の研磨方法において、研
磨円板の中心を遊星回転機構の自転中心から偏心させて
取り付け、かつ、研磨円板が公転中心を通過するように
偏心回転させて研磨することを特徴とするガラス板の研
磨方法。1. A method for polishing a glass plate in which a plurality of polishing discs are revolved while being rotated by a planetary rotation mechanism, wherein the center of the polishing discs is mounted eccentrically from the rotation center of the planetary rotation mechanism, and the polishing discs are mounted. A method for polishing a glass plate, which comprises eccentrically rotating so as to pass through the center of revolution, and polishing.
させつつ公転させるガラス板の研磨方法において、研磨
板を楕円形又は長方形とし、その回転中心を遊星回転機
構の自転中心と一致させて取り付け、かつ、研磨板が公
転中心を通過するように回転させて研磨することを特徴
とするガラス板の研磨方法。2. A method for polishing a glass plate in which a plurality of polishing plates are revolved while being rotated by a planetary rotation mechanism, wherein the polishing plates are elliptical or rectangular, and the rotation center of the polishing plate is aligned with the rotation center of the planetary rotation mechanism. And a method for polishing a glass plate, which comprises rotating the polishing plate such that the polishing plate passes through the center of revolution, and polishing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32760893A JP3334817B2 (en) | 1993-12-24 | 1993-12-24 | Polishing method of glass plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32760893A JP3334817B2 (en) | 1993-12-24 | 1993-12-24 | Polishing method of glass plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07178655A true JPH07178655A (en) | 1995-07-18 |
| JP3334817B2 JP3334817B2 (en) | 2002-10-15 |
Family
ID=18200963
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32760893A Expired - Fee Related JP3334817B2 (en) | 1993-12-24 | 1993-12-24 | Polishing method of glass plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3334817B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007083438A1 (en) * | 2006-01-20 | 2007-07-26 | Asahi Glass Company, Limited | Method and device for polishing plate-like body |
| CN108942490A (en) * | 2018-09-03 | 2018-12-07 | 江苏亚太轻合金科技股份有限公司 | A kind of profile deburring equipment |
| CN109571224A (en) * | 2018-12-14 | 2019-04-05 | 东旭科技集团有限公司 | curved glass polishing machine |
| CN110860955A (en) * | 2018-08-28 | 2020-03-06 | 中核苏阀科技实业股份有限公司 | Double-eccentric automatic 8-shaped plane grinding device for large-diameter gate valve flashboard |
| CN115091305A (en) * | 2022-07-19 | 2022-09-23 | 苏州贝亚特精密自动化机械有限公司 | Valve core grinding machine |
-
1993
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Cited By (9)
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|---|---|---|---|---|
| WO2007083438A1 (en) * | 2006-01-20 | 2007-07-26 | Asahi Glass Company, Limited | Method and device for polishing plate-like body |
| JP2007190657A (en) * | 2006-01-20 | 2007-08-02 | Asahi Glass Co Ltd | Polishing method and device for platy body |
| KR101143290B1 (en) * | 2006-01-20 | 2012-05-11 | 아사히 가라스 가부시키가이샤 | Method and device for polishing plate-like body |
| KR101273729B1 (en) * | 2006-01-20 | 2013-06-12 | 아사히 가라스 가부시키가이샤 | Method and device for polishing plate-like body |
| CN110860955A (en) * | 2018-08-28 | 2020-03-06 | 中核苏阀科技实业股份有限公司 | Double-eccentric automatic 8-shaped plane grinding device for large-diameter gate valve flashboard |
| CN108942490A (en) * | 2018-09-03 | 2018-12-07 | 江苏亚太轻合金科技股份有限公司 | A kind of profile deburring equipment |
| CN109571224A (en) * | 2018-12-14 | 2019-04-05 | 东旭科技集团有限公司 | curved glass polishing machine |
| CN109571224B (en) * | 2018-12-14 | 2024-03-22 | 东旭光电科技股份有限公司 | Curved glass polishing machine |
| CN115091305A (en) * | 2022-07-19 | 2022-09-23 | 苏州贝亚特精密自动化机械有限公司 | Valve core grinding machine |
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| Publication number | Publication date |
|---|---|
| JP3334817B2 (en) | 2002-10-15 |
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