JP3288153B2 - 表面をパターンに従って化学的に変性する方法 - Google Patents

表面をパターンに従って化学的に変性する方法

Info

Publication number
JP3288153B2
JP3288153B2 JP22244093A JP22244093A JP3288153B2 JP 3288153 B2 JP3288153 B2 JP 3288153B2 JP 22244093 A JP22244093 A JP 22244093A JP 22244093 A JP22244093 A JP 22244093A JP 3288153 B2 JP3288153 B2 JP 3288153B2
Authority
JP
Japan
Prior art keywords
pattern
group
silane
carboxylic acid
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP22244093A
Other languages
English (en)
Japanese (ja)
Other versions
JPH06202343A (ja
Inventor
ペトルス ウィラルド ニコラス
ゴッドフリード ヨゼフ カムプス イボ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips NV
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips NV, Koninklijke Philips Electronics NV filed Critical Koninklijke Philips NV
Publication of JPH06202343A publication Critical patent/JPH06202343A/ja
Application granted granted Critical
Publication of JP3288153B2 publication Critical patent/JP3288153B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Chemically Coating (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP22244093A 1992-09-09 1993-09-07 表面をパターンに従って化学的に変性する方法 Expired - Fee Related JP3288153B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP92202730 1992-09-09
NL92202730:5 1992-09-09

Publications (2)

Publication Number Publication Date
JPH06202343A JPH06202343A (ja) 1994-07-22
JP3288153B2 true JP3288153B2 (ja) 2002-06-04

Family

ID=8210902

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22244093A Expired - Fee Related JP3288153B2 (ja) 1992-09-09 1993-09-07 表面をパターンに従って化学的に変性する方法

Country Status (4)

Country Link
US (1) US5378502A (https=)
JP (1) JP3288153B2 (https=)
DE (1) DE69319517T2 (https=)
TW (1) TW273601B (https=)

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US6882782B2 (en) * 2000-11-01 2005-04-19 Schott Glas Photonic devices for optical and optoelectronic information processing
US6899999B2 (en) 2001-03-28 2005-05-31 Kabushiki Kaisha Toshiba Method of manufacturing composite member, photosensitive composition, porous base material, insulating body and composite member
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KR100473799B1 (ko) * 2001-09-12 2005-03-07 학교법인 포항공과대학교 나노미터 수준의 고정밀 패턴 형성방법
KR100845256B1 (ko) * 2001-12-24 2008-07-10 엘지디스플레이 주식회사 액정표시소자의 제조방법
JP3698138B2 (ja) * 2001-12-26 2005-09-21 セイコーエプソン株式会社 撥水化処理の方法、薄膜形成方法及びこの方法を用いた有機ｅｌ装置の製造方法、有機ｅｌ装置、電子機器
US6955725B2 (en) * 2002-08-15 2005-10-18 Micron Technology, Inc. Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
US7581511B2 (en) * 2003-10-10 2009-09-01 Micron Technology, Inc. Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes
JP3949118B2 (ja) * 2004-03-12 2007-07-25 ジーエルサイエンス株式会社 マイクロチップ
US8133554B2 (en) * 2004-05-06 2012-03-13 Micron Technology, Inc. Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces
US7699932B2 (en) 2004-06-02 2010-04-20 Micron Technology, Inc. Reactors, systems and methods for depositing thin films onto microfeature workpieces
US20060135028A1 (en) * 2004-12-07 2006-06-22 Andreas Klyszcz Substrate for a display and method for manufacturing the same
EP1670298A1 (en) * 2004-12-07 2006-06-14 Samsung SDI Germany GmbH Substrate for a display and method for manufacturing the same
JP4797701B2 (ja) * 2006-03-02 2011-10-19 日立化成工業株式会社 感放射線性組成物
JP2007246417A (ja) * 2006-03-14 2007-09-27 Canon Inc 感光性シランカップリング剤、表面修飾方法、パターン形成方法およびデバイスの製造方法
US7416991B2 (en) * 2006-05-11 2008-08-26 Hitachi Global Storage Technologies Netherlands B. V. High resolution patterning of surface energy utilizing high resolution monomolecular resist for fabrication of patterned media masters
JP5132117B2 (ja) * 2006-10-10 2013-01-30 キヤノン株式会社 パターン形成方法
JP2008244139A (ja) * 2007-03-27 2008-10-09 Hioki Ee Corp 金属パターンの電気回路板
EP2293842B1 (en) * 2008-05-02 2020-08-12 Civatech Oncology Brachytherapy devices and related methods
DE102008046707A1 (de) * 2008-09-11 2010-03-18 Universität Bielefeld Vollständig vernetzte chemisch strukturierte Monoschichten
JP5318217B2 (ja) * 2009-09-28 2013-10-16 株式会社東芝 パターン形成方法
US8354333B2 (en) 2010-02-03 2013-01-15 International Business Machines Corporation Patterned doping of semiconductor substrates using photosensitive monolayers
CN102782580B (zh) * 2010-02-26 2015-04-22 株式会社尼康 图案形成方法
ITMI20110363A1 (it) * 2011-03-09 2012-09-10 Cretec Co Ltd Metodo per ricavare un percorso conduttivo mediante irradiazione laser
JP2015089951A (ja) * 2013-11-05 2015-05-11 キヤノン・コンポーネンツ株式会社 金属皮膜付物品及びその製造方法並びに配線板
US10787574B2 (en) 2014-02-28 2020-09-29 Melior Innovations, Inc. Polymer derived ceramic effects particles, uses and methods of making
WO2018049231A1 (en) * 2016-09-09 2018-03-15 Melior Innovations, Inc. Surface effect polymer derived ceramics, methods, materials and uses
TWI550131B (zh) * 2015-09-18 2016-09-21 Triumphant Gate Ltd The circuit of the substrate directly forms the system
CN107708320A (zh) * 2016-08-08 2018-02-16 凯基有限公司 基板的电路直接形成系统

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Also Published As

Publication number Publication date
DE69319517D1 (de) 1998-08-13
JPH06202343A (ja) 1994-07-22
TW273601B (https=) 1996-04-01
US5378502A (en) 1995-01-03
DE69319517T2 (de) 1999-02-25

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