JP3129140B2 - Composition and method for forming conductive film - Google Patents

Composition and method for forming conductive film

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Publication number
JP3129140B2
JP3129140B2 JP07057288A JP5728895A JP3129140B2 JP 3129140 B2 JP3129140 B2 JP 3129140B2 JP 07057288 A JP07057288 A JP 07057288A JP 5728895 A JP5728895 A JP 5728895A JP 3129140 B2 JP3129140 B2 JP 3129140B2
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JP
Japan
Prior art keywords
conductive film
composition
forming
resin
fluorine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP07057288A
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Japanese (ja)
Other versions
JPH08255521A (en
Inventor
明 西原
行也 山下
年治 林
正弘 萩原
昌宏 関口
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Mitsubishi Materials Corp
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Mitsubishi Materials Corp
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、電子写真記録、透明電
極、帯電防止、熱線反射、面発熱体等の分野において利
用可能な導電膜形成用組成物に関する。本発明の組成物
は、絶縁体上に塗布或いは印刷することにより、透明な
電極回路を容易に形成することができる。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a composition for forming a conductive film which can be used in fields such as electrophotographic recording, transparent electrodes, antistatic, heat ray reflection, and surface heating elements. The composition of the present invention can easily form a transparent electrode circuit by coating or printing on an insulator.

【0002】[0002]

【従来の技術】酸化物半導体の透明膜は、一般に可視光
に対して高い透過率を示し、低抵抗で且つ膜強度が強い
ために、液晶ディスプレイ等の透明電極や太陽電池の窓
材料、熱線反射膜、電子写真記録その他における帯電防
止膜、面発熱体などとして多方面に利用されている。こ
のような酸化物半導体の代表例に、錫を含有する酸化イ
ンジウム (以下、ITOという) がある。
2. Description of the Related Art A transparent film of an oxide semiconductor generally shows a high transmittance to visible light, and has a low resistance and a high film strength. It is widely used as a reflection film, an antistatic film in electrophotographic recording, and as a surface heating element. A typical example of such an oxide semiconductor is indium oxide containing tin (hereinafter, referred to as ITO).

【0003】便宜上、以下の説明では、主に要求性能の
最も厳しい透明電極の分野を例として取り上げる。従来
の透明導電膜の形成方法としては、絶縁体上に金属また
は無機物 (特にITO) を真空蒸着、スパッタリング、
イオンプレーティングなどのドライプロセスにより付着
させる方法、有機金属化合物溶液を基板上に塗布し、乾
燥後に焼成する方法 (ゾル−ゲル法) 、分散剤で処理し
たITO粉末を樹脂液中に分散させて塗料化またはイン
ク化し、塗布または印刷により被膜を形成する方法 (粉
末法) 等がある。
[0003] For convenience, the following description will focus mainly on the field of transparent electrodes, which have the strictest required performance. As a conventional method for forming a transparent conductive film, a metal or an inorganic substance (particularly, ITO) is vacuum-deposited, sputtered,
A method of applying by a dry process such as ion plating, a method of applying an organometallic compound solution on a substrate, baking after drying (sol-gel method), dispersing ITO powder treated with a dispersant in a resin liquid, There is a method (powder method) of forming a coating by coating or printing into a coating or ink and forming the coating.

【0004】蒸着やスパッタリングなどのドライプロセ
スは、従来より最も広く用いられてきた膜形成方法であ
るが、電極の大面積化に限界がある上、異常放電による
ターゲットの劣化や成膜時の付着効率の低さから、IT
Oの有効利用効率が40〜50%と非常に低い。また、エッ
チング法により回路を描く場合には、基板に付着したI
TOの大半が取り除かれるという無駄や、設備費が高価
であるという欠点もある。
[0004] Dry processes such as evaporation and sputtering are the most widely used film forming methods in the past. However, there is a limit to the enlargement of the electrode area. Due to low efficiency, IT
The effective utilization efficiency of O is very low at 40 to 50%. When a circuit is drawn by the etching method, the I
There are also disadvantages that most of the TO is removed and that the equipment cost is high.

【0005】これに対し、有機金属化合物溶液を基板上
に塗布して乾燥後に焼成するゾル−ゲル法は、焼成温度
が高いため、基板の材質が限定されるほか、1回の塗布
で形成される膜厚が非常に薄いため、1コート1ベーク
では適当な膜特性が得にくく、塗布と焼成を何回も反復
するため、操作が煩雑になるという欠点もある。
On the other hand, in the sol-gel method in which an organometallic compound solution is applied onto a substrate, dried and then fired, the firing temperature is high, so that the material of the substrate is limited and the sol-gel method is formed by one application. Since the film thickness is very thin, it is difficult to obtain appropriate film characteristics by one coat and one bake, and the application and baking are repeated many times, so that the operation becomes complicated.

【0006】ITO粉末を湿潤剤または顔料分散剤で表
面処理した後、樹脂液中に分散させるか、或いは分散剤
と樹脂を含有する溶媒中にITO粉末を分散させ、得ら
れた分散液を塗料またはインクとして使用して透明導電
膜を形成する粉末法は、スクリーン印刷などの手法によ
り回路を直接描けるため、材料の無駄がない。また、乾
燥は溶媒の除去または樹脂の熱硬化に必要な比較的低温
でよいので、樹脂などの耐熱性の低い基板にも適用可能
である。
After the ITO powder is surface-treated with a wetting agent or a pigment dispersant, it is dispersed in a resin solution, or the ITO powder is dispersed in a solvent containing a dispersant and a resin. Alternatively, in the case of the powder method in which a transparent conductive film is formed using ink, a circuit can be directly drawn by a method such as screen printing, so that there is no waste of material. In addition, since drying can be performed at a relatively low temperature required for removing the solvent or thermally curing the resin, the present invention can be applied to a substrate having low heat resistance such as a resin.

【0007】[0007]

【発明が解決しようとする課題】しかし、粉末法におい
ては、ITO粉末の分散および結合のために分散剤およ
び結合用の樹脂(例、熱可塑性、熱硬化性、または紫外
線硬化性樹脂)などの高分子物質が必要である。しか
し、このような高分子物質は一般に絶縁体として作用す
るため、ITO粉末の表面に高分子物質が密に吸着する
と、形成された塗膜中におけるITO粉末同士の接触が
悪くなり、ITO粉末の表面に絶縁層が形成され、導電
性が低下する。
However, in the powder method, a dispersing agent and a resin for binding (eg, a thermoplastic, thermosetting, or ultraviolet curable resin) for dispersing and binding the ITO powder are used. High molecular substances are required. However, since such a polymer material generally acts as an insulator, if the polymer material is densely adsorbed on the surface of the ITO powder, contact between the ITO powders in the formed coating film becomes poor, and the An insulating layer is formed on the surface, and the conductivity is reduced.

【0008】この点に関して、塗布および乾燥 (溶媒の
除去) 後に、スチールロールで圧延処理してボイド発生
の抑制と表面の平滑化を図ることによりITO透明導電
膜の電気的特性と光学特性を改善することが提案されて
いる (特開平4−237908号、同4−237909号各公報) 。
しかし、このような圧延処理を行っても、十分な電気特
性および光学特性がなお得られていない。
[0008] In this regard, after coating and drying (removal of the solvent), rolling treatment with a steel roll is performed to suppress the generation of voids and smooth the surface, thereby improving the electrical and optical characteristics of the ITO transparent conductive film. (Japanese Unexamined Patent Publication Nos. 4-237908 and 4-237909).
However, even if such a rolling treatment is performed, sufficient electric characteristics and optical characteristics have not yet been obtained.

【0009】本発明の目的は、上記問題点を解消し、耐
熱性の低い樹脂基板にも適用でき、低抵抗かつ光透過率
の高い導電膜を形成できる導電膜形成用組成物、および
導電膜の形成方法を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to solve the above problems, apply to a resin substrate having low heat resistance, and form a conductive film forming composition and a conductive film capable of forming a conductive film having low resistance and high light transmittance. It is an object of the present invention to provide a forming method.

【0010】[0010]

【課題を解決するための手段】本発明によれば、上記目
的は、ITO粉末を予めフッ素含有不活性有機液体で表
面処理してこの液体を粉末表面に含浸させておくことに
より解決される。
According to the present invention, the above object is achieved by preliminarily treating a surface of an ITO powder with a fluorine-containing inert organic liquid and impregnating the surface of the powder with the liquid.

【0011】ここに、本発明は、ITO粉末が樹脂液中
に分散している導電膜形成用組成物であって、前記IT
O粉末が、粉末に対して 0.1〜5重量%の量のフッ素含
有不活性有機液体で予め表面処理されたものであること
を特徴とする導電膜形成用組成物である。
Here, the present invention relates to a composition for forming a conductive film in which ITO powder is dispersed in a resin solution,
A composition for forming a conductive film, wherein the O powder has been surface-treated in advance with a fluorine-containing inert organic liquid in an amount of 0.1 to 5% by weight based on the powder.

【0012】別の側面からは、本発明は、上記の導電膜
形成用組成物を基板上に印刷または塗布し、次いで乾
燥、熱硬化、および/または紫外線照射により基板上に
導電膜を形成する、導電膜形成方法である。この方法に
おいて、乾燥後であって熱硬化もしくは紫外線照射の
前、熱硬化中もしくは紫外線照射中、または基板上に導
電膜を形成した後、基板上の膜を熱加圧処理してもよ
い。
From another aspect, the present invention provides a method for printing or coating the above-mentioned composition for forming a conductive film on a substrate, and then forming the conductive film on the substrate by drying, thermosetting, and / or ultraviolet irradiation. And a conductive film forming method. In this method, the film on the substrate may be subjected to heat and pressure treatment after drying and before heat curing or irradiation with ultraviolet light, during heat curing or irradiation with ultraviolet light, or after forming a conductive film on the substrate.

【0013】以下、本発明を詳しく説明する。本発明の
導電膜形成用組成物は、樹脂液中にITO粉末 (錫を含
有する酸化インジウム粉末) が分散している、塗布また
は印刷可能な塗料もしくはインク様の組成物である。
Hereinafter, the present invention will be described in detail. The composition for forming a conductive film according to the present invention is a paint or ink-like composition in which ITO powder (tin-containing indium oxide powder) is dispersed in a resin solution, and which can be applied or printed.

【0014】ITO粉末は、(In+Sn) の合計量に対する
Snの含有量が1〜15モル%、平均一次粒子径が0.2 μm
以下、特に0.1 μm以下の超微粒子状の粉末が好まし
い。Sn含有量が上記範囲外では導電性が低下し、平均一
次粒子径が0.2 μmを超えると導電膜の透明性が低下す
る。
The ITO powder is based on the total amount of (In + Sn).
Sn content is 1 to 15 mol%, average primary particle size is 0.2 μm
Hereinafter, particularly, ultrafine powder having a particle size of 0.1 μm or less is preferable. If the Sn content is outside the above range, the conductivity will be reduced, and if the average primary particle diameter exceeds 0.2 μm, the transparency of the conductive film will be reduced.

【0015】本発明の組成物中のITO粉末の割合は、
不揮発分 (樹脂液中の溶媒を除いた組成物の全重量) に
基づいて15〜80重量%の範囲であるのが好ましい。より
好ましいITO粉末の割合は、不揮発分に基づいて20〜
80重量%、特に好ましくは40〜75重量%である。15重量
%未満では得られた膜の導電性が低く、80重量%を超え
ると膜の強度が低下する傾向がある。
The proportion of the ITO powder in the composition of the present invention is as follows:
It is preferably in the range of 15 to 80% by weight based on the nonvolatile content (total weight of the composition excluding the solvent in the resin solution). A more preferable ratio of the ITO powder is 20 to
It is 80% by weight, particularly preferably 40-75% by weight. If the amount is less than 15% by weight, the conductivity of the obtained film is low, and if it exceeds 80% by weight, the strength of the film tends to decrease.

【0016】本発明によれば、ITO粉末は、樹脂液中
に分散させる前に、予めフッ素含有不活性有機液体で表
面処理をしておき、表面にフッ素含有不活性有機液体を
含浸させる。それにより、導電膜中にITO粉末が密に
充填されるようになり、電気的特性のみならず、光学的
特性 (透明性) も向上する。このフッ素含有不活性有機
液体は、本発明の組成物を塗布または印刷した後の乾燥
または硬化中に蒸発により除去される。
According to the present invention, the surface of the ITO powder is preliminarily treated with a fluorine-containing inert organic liquid before being dispersed in the resin liquid, and the surface is impregnated with the fluorine-containing inert organic liquid. As a result, the ITO powder is densely filled in the conductive film, and not only the electrical characteristics but also the optical characteristics (transparency) are improved. The fluorine-containing inert organic liquid is removed by evaporation during drying or curing after applying or printing the composition of the present invention.

【0017】フッ素含有不活性有機液体としては、ク
ロロフルオロカーボン、芳香族フッ化物、ならびに
ペルフルオロアルキル基を有するエーテル型化合物、ア
ミン型化合物、およびアルコール型化合物よりなる群か
ら選ばれた1種もしくは2種以上の化合物を使用するこ
とができる。このようなフッ素含有有機液体は、クロロ
カーボンとフッ酸との反応、エチレンとクロロフルオロ
カーボンとのテロメリゼーション、電解フッ素化法等の
常法により製造することが出来る。
As the fluorine-containing inert organic liquid, one or two kinds selected from the group consisting of chlorofluorocarbons, aromatic fluorides, ether compounds having a perfluoroalkyl group, amine compounds, and alcohol compounds The above compounds can be used. Such a fluorine-containing organic liquid can be produced by a conventional method such as a reaction between chlorocarbon and hydrofluoric acid, telomerization of ethylene and chlorofluorocarbon, and an electrolytic fluorination method.

【0018】「不活性」とは、フッ素含有有機液体が組
成物中の樹脂液 (即ち、樹脂成分および溶媒) およびI
TO粉末のいずれとも実質的な反応性を持たないことを
意味する。例えば、カルボン酸基、スルホン酸基などの
酸基を含有する有機フッ素化合物は、一般に強酸として
作用し、高い反応性を示すので、不活性とは言えない。
このような活性なフッ素含有有機液体は、樹脂成分、溶
媒、またはITO粉末と反応する可能性があり、それに
より形成された導電膜の光学特性および/または電気特
性を低下させる恐れがある。また、場合によっては、毒
性を示すものもある。
"Inert" means that the fluorine-containing organic liquid contains the resin liquid (ie, resin component and solvent) and I
It means that it has no substantial reactivity with any of the TO powders. For example, an organic fluorine compound containing an acid group such as a carboxylic acid group or a sulfonic acid group generally acts as a strong acid and exhibits high reactivity, and thus cannot be said to be inert.
Such an active fluorine-containing organic liquid may react with the resin component, the solvent, or the ITO powder, and may reduce the optical and / or electrical properties of the conductive film formed thereby. In some cases, it is toxic.

【0019】フッ素含有不活性有機液体は、沸点 (1気
圧での沸点) が250 ℃以下、即ち、室温から250 ℃の範
囲内であるものを使用することが好ましい。沸点が室温
より低いと、室温で揮発するので、ITO粉末に十分に
含浸させることが困難となる。一方、沸点が250 ℃より
高い高沸点のフッ素含有不活性有機液体は、揮発性が低
すぎ、塗膜乾燥後も塗膜中に残留し、形成された導電膜
の電気特性および/または光学特性を低下させる。この
沸点は、より好ましくは200 ℃以下である。
It is preferable to use a fluorine-containing inert organic liquid having a boiling point (boiling point at 1 atm) of 250 ° C. or less, that is, in the range of room temperature to 250 ° C. If the boiling point is lower than room temperature, it will volatilize at room temperature, making it difficult to sufficiently impregnate the ITO powder. On the other hand, a high-boiling fluorine-containing inert organic liquid having a boiling point higher than 250 ° C. has too low volatility and remains in the coating film even after the coating film is dried, and the electrical and / or optical properties of the formed conductive film are high. Lower. This boiling point is more preferably at most 200 ° C.

【0020】使用するフッ素含有不活性有機液体は、塗
膜を形成する樹脂液の性質に応じて適当な沸点のものを
選択することが有利である。例えば、樹脂液が室温乾燥
または紫外線硬化のように加熱を必要とせずに硬化する
場合には、比較的沸点が低く、揮発性の高いフッ素含有
不活性有機液体を用いることが好ましい。一方、樹脂液
が熱硬化または加熱乾燥のように加熱により硬化する場
合には、この加熱中にフッ素含有不活性有機液体も蒸発
するように、比較的沸点の高いフッ素含有不活性有機液
体を用いることが好ましい。
As the fluorine-containing inert organic liquid to be used, it is advantageous to select one having an appropriate boiling point depending on the properties of the resin liquid for forming the coating film. For example, when the resin liquid is cured without requiring heating such as drying at room temperature or ultraviolet curing, it is preferable to use a fluorine-containing inert organic liquid having a relatively low boiling point and high volatility. On the other hand, when the resin liquid is cured by heating such as heat curing or heat drying, a fluorine-containing inert organic liquid having a relatively high boiling point is used so that the fluorine-containing inert organic liquid also evaporates during this heating. Is preferred.

【0021】加熱を必要としない硬化方法において、高
沸点のフッ素含有不活性有機液体を使用すると、この液
体の蒸発が遅く、ITO粒子表面を絶縁層が覆う形にな
り、電気特性の低下の原因となる。一方、加熱により硬
化する場合、ITO粉末に含浸させたフッ素含有不活性
有機液体が低沸点であると、この液体の蒸発が急激に生
じて塗膜表面に微細なポアが発生し、光学特性の低下に
結びつく。
When a high boiling point fluorine-containing inert organic liquid is used in a curing method that does not require heating, the evaporation of this liquid is slow, the surface of the ITO particles is covered with an insulating layer, and the electrical characteristics are reduced. Becomes On the other hand, in the case of curing by heating, if the fluorine-containing inert organic liquid impregnated in the ITO powder has a low boiling point, the evaporation of this liquid occurs rapidly, and fine pores are generated on the coating film surface, and the optical characteristics are reduced. Leads to a decline.

【0022】本発明において使用可能なフッ素含有不活
性有機液体の具体例としては、フロン113 、ヘキサフル
オロベンゼン、トリフルオロエタノール、ペルフルオロ
トリブチルアミン、ペルフルオロテトラヒドロフラン等
が挙げられるが、これらは代表例にすぎず、他のフッ素
含有有機液体も不活性であれば使用できる。
Specific examples of the fluorine-containing inert organic liquid that can be used in the present invention include Freon 113, hexafluorobenzene, trifluoroethanol, perfluorotributylamine, perfluorotetrahydrofuran, etc., but these are only representative examples. However, other fluorine-containing organic liquids can also be used if they are inert.

【0023】ITO粉末の表面処理は、ITO粉末に対
して 0.1〜5 重量%の量のフッ素含有不活性有機液体を
用いて行う。表面処理は、ITO粉末に十分にフッ素含
有不活性有機液体が含浸するように両者を均一に接触さ
せることができる任意の方法で実施できる。例えば、密
閉容器内でITO粉末を攪拌して流動状態に保持し、こ
の容器内に所定量のフッ素含有不活性有機液体を滴下ま
たは噴霧し、さらに攪拌を続けることで、ITO粉末に
液体を含浸させることができる。処理温度は特に制限さ
れないが、通常は室温で十分である。処理 (接触) 時間
は一般に15秒〜30分間、特に30秒〜10分間の範囲内が好
ましい。
The surface treatment of the ITO powder is carried out using a fluorine-containing inert organic liquid in an amount of 0.1 to 5% by weight based on the ITO powder. The surface treatment can be performed by any method capable of uniformly contacting the ITO powder so that the ITO powder is sufficiently impregnated with the fluorine-containing inert organic liquid. For example, the ITO powder is stirred and held in a fluidized state in a closed container, a predetermined amount of a fluorine-containing inert organic liquid is dropped or sprayed into the container, and the stirring is continued to further impregnate the ITO powder with the liquid. Can be done. Although the treatment temperature is not particularly limited, room temperature is usually sufficient. The treatment (contact) time is generally preferably in the range of 15 seconds to 30 minutes, particularly preferably in the range of 30 seconds to 10 minutes.

【0024】表面処理に用いるフッ素含有不活性有機液
体の量がITO粉末の5重量%を超えると、この液体を
含浸したITO粉末が固体として存在しなくなるか、あ
るいはITO粉末を樹脂液中に分散させたときに凝集が
起こり、結果的に導電膜の不均一化を生じて、光透過率
の低下を引き起こす。一方、この量が0.1 重量%未満で
あると、表面処理しない場合と比べて導電膜の特性に顕
著な優位性が得られない。
When the amount of the fluorine-containing inert organic liquid used for the surface treatment exceeds 5% by weight of the ITO powder, the ITO powder impregnated with the liquid no longer exists as a solid, or the ITO powder is dispersed in the resin liquid. Aggregation occurs when this is performed, resulting in non-uniformity of the conductive film, which causes a decrease in light transmittance. On the other hand, if this amount is less than 0.1% by weight, remarkable superiority in the properties of the conductive film cannot be obtained as compared with the case where no surface treatment is performed.

【0025】本発明の透明導電膜形成用組成物は、上記
のように表面処理したITO粉末を樹脂液 (樹脂を溶媒
に溶解させた溶液、または場合によっては樹脂自体が液
状である場合には樹脂そのもの) 中に分散させたもので
ある。樹脂液中に存在させる樹脂は、熱可塑性樹脂、熱
硬化性樹脂、および紫外線硬化性樹脂のいずれでもよ
く、1種もしくは2種以上を使用できる。使用する樹脂
は、適当な溶媒への溶解性を持ち、十分な透明性を有す
るものであればよく、特にその種類、分子量、酸価等は
限定されない。また、熱または紫外線硬化性樹脂の場合
には、モノマー、オリゴマー、ポリマーのいずれも使用
可能である。本発明で用いるのに好適な樹脂の具体例を
例示すると、熱可塑性樹脂としてはポリ塩化ビニル、ポ
リ酢酸ビニル、ポリエステル、熱可塑性アクリル樹脂な
どが、熱硬化性樹脂としてはエポキシ樹脂、熱硬化性ア
クリル樹脂などが、紫外線硬化性樹脂としてはエポキシ
アクリレート、ウレタンアクリレート等が挙げられる。
The composition for forming a transparent conductive film of the present invention is obtained by coating the ITO powder surface-treated as described above with a resin solution (a solution obtained by dissolving the resin in a solvent, or, in some cases, when the resin itself is liquid). (Resin itself). The resin to be present in the resin liquid may be any of a thermoplastic resin, a thermosetting resin, and an ultraviolet-curable resin, and one or more of them may be used. The resin used has only to have solubility in an appropriate solvent and have sufficient transparency, and the type, molecular weight, acid value and the like are not particularly limited. In the case of a heat or ultraviolet curable resin, any of monomers, oligomers and polymers can be used. Illustrative examples of resins suitable for use in the present invention include thermoplastic resins such as polyvinyl chloride, polyvinyl acetate, polyester, and thermoplastic acrylic resins, and thermosetting resins such as epoxy resins and thermosetting resins. Acrylic resins and the like, and ultraviolet curable resins include epoxy acrylate and urethane acrylate.

【0026】樹脂を溶解させるための溶媒は、使用する
樹脂を溶解し、かつ乾燥または加熱後に実質的に完全に
蒸発し、塗膜の透明性を阻害しないものであれば特に制
限されない。極性溶媒と非極性溶媒のいずれも使用で
き、また2種以上の溶媒を混合した混合溶媒も使用でき
る。溶媒の使用量は、使用する塗布または印刷法に適し
た粘度の組成物が得られる量であればよく、特に制限さ
れない。
The solvent for dissolving the resin is not particularly limited as long as it dissolves the resin to be used and substantially completely evaporates after drying or heating and does not hinder the transparency of the coating film. Both a polar solvent and a non-polar solvent can be used, and a mixed solvent obtained by mixing two or more solvents can also be used. The amount of the solvent used is not particularly limited as long as a composition having a viscosity suitable for the coating or printing method to be used is obtained.

【0027】本発明においては、少なくとも1種の極性
溶媒と少なくとも1種の非極性溶媒との混合溶媒を使用
することが好ましい。極性溶媒はITO粉末との親和性
が強く、絶縁層を形成する高分子物質 (樹脂) がITO
粉末の表面に吸着されるのを阻止する作用が強い。一
方、非極性溶媒はITO粉末との親和性が弱いので、こ
の作用が弱い。この両者を共存させることで、ITO粉
末の表面に吸着される高分子物質の量が制御され、結合
に必要な適度の量の高分子物質が吸着される結果、導電
膜の電気特性および光学特性が向上する。
In the present invention, it is preferable to use a mixed solvent of at least one polar solvent and at least one non-polar solvent. Polar solvents have a strong affinity for ITO powder, and the polymer material (resin) that forms the insulating layer is ITO.
It has a strong effect of preventing it from being adsorbed on the surface of the powder. On the other hand, the non-polar solvent has a weak affinity for the ITO powder, so that this effect is weak. By coexisting the two, the amount of the polymer substance adsorbed on the surface of the ITO powder is controlled, and an appropriate amount of the polymer substance required for bonding is adsorbed. Is improved.

【0028】極性溶媒の例としては、メタノール、エタ
ノール、ブタノール、ジアセトンアルコール、ジエチレ
ングリコール、ブチルカルビトール、イソホロンおよび
シクロヘキサノン等の水酸基またはケトン基を有する溶
媒が挙げられる。非極性溶媒としては、キシレン、トル
エン等の芳香族系炭化水素、シクロヘキサン等の脂環式
炭化水素、ヘキサン、オクタン等の脂肪族炭化水素等の
炭化水素類が挙げられる。混合溶媒における極性溶媒と
非極性溶媒との割合は特に限定されないが、極性/非極
性溶媒の重量比が5/95〜95/5、特に30/50〜50/30
の範囲内が好ましい。使用する極性溶媒と非極性溶媒
は、溶媒同士の相溶性が良く、均質に混合しうる組合わ
せのものである必要がある。
Examples of the polar solvent include solvents having a hydroxyl group or a ketone group such as methanol, ethanol, butanol, diacetone alcohol, diethylene glycol, butyl carbitol, isophorone and cyclohexanone. Examples of the non-polar solvent include hydrocarbons such as aromatic hydrocarbons such as xylene and toluene, alicyclic hydrocarbons such as cyclohexane, and aliphatic hydrocarbons such as hexane and octane. The ratio between the polar solvent and the non-polar solvent in the mixed solvent is not particularly limited, but the weight ratio of the polar / non-polar solvent is 5/95 to 95/5, particularly 30/50 to 50/30.
Is preferably within the range. The polar solvent and the non-polar solvent to be used need to be a combination having good compatibility between the solvents and being homogeneously mixed.

【0029】樹脂液中へのITO粉末の分散は、常法に
よりペイントシェーカー、ボールミル、セントリミル、
サンドグラインドミル等の強力な混合装置を用いて行う
ことができ、それにより本発明の導電膜形成用組成物が
得られる。得られた組成物中のITO粉末の量は、前述
したように不揮発分に基づいて15〜80重量%の範囲内が
好ましい。
The dispersion of the ITO powder in the resin solution can be performed by a conventional method using a paint shaker, ball mill, sentry mill,
It can be performed using a powerful mixing device such as a sand grind mill, whereby the composition for forming a conductive film of the present invention can be obtained. The amount of the ITO powder in the obtained composition is preferably in the range of 15 to 80% by weight based on the nonvolatile content as described above.

【0030】本発明の導電膜形成用組成物は、樹脂、I
TO粉末、有機溶媒、フッ素含有不活性有機液体のほか
に、必要に応じて、架橋剤、硬化触媒、光重合開始剤、
湿潤剤、分散剤、酸化防止剤、レベリング剤等の添加剤
をさらに含有することができる。
The composition for forming a conductive film of the present invention comprises a resin, I
In addition to TO powder, organic solvent, and fluorine-containing inert organic liquid, if necessary, a crosslinking agent, a curing catalyst, a photopolymerization initiator,
Additives such as wetting agents, dispersants, antioxidants, and leveling agents can be further included.

【0031】この組成物を塗料またはインクとして適当
な基板上に塗布またはスクリーン印刷し、必要であれば
加熱、紫外線照射或いはその両者を行うことにより膜を
硬化させると、透明導電膜が形成される。膜の硬化は、
樹脂種により乾燥 (自然乾燥もしくは熱乾燥) 、熱硬
化、または紫外線硬化により起こる。基板材料は特に制
限されず、ガラス、プラスチックなどの透明絶縁性材料
が好ましいが、用途によってはセラミックなどの不透明
絶縁性材料、さらには金属などの導電性材料でもよい。
This composition is applied or screen-printed on a suitable substrate as a paint or ink, and if necessary, the film is cured by heating, irradiating with ultraviolet light, or both, to form a transparent conductive film. . The curing of the film
Occurs by drying (natural or thermal drying), heat curing, or UV curing depending on the resin type. The substrate material is not particularly limited, and a transparent insulating material such as glass and plastic is preferable, but an opaque insulating material such as ceramic or a conductive material such as metal may be used depending on the application.

【0032】塗布方法は特に限定されないが、例えば、
ディッピング法、スピンコート法、スプレー法、バーコ
ート法、ロールコート法等の方法が挙げられる。絶縁基
板上に印刷すれば、導電膜回路を基板上に直接描くこと
ができ、フォトレジストを利用した回路形成が不要とな
るため、操作が著しく簡略化し、材料の無駄も避けられ
る。硬化条件は、使用した樹脂および溶媒に応じて異な
るが、当業者であれば硬化条件は容易に設定できる。
The coating method is not particularly limited.
Examples include a dipping method, a spin coating method, a spray method, a bar coating method, and a roll coating method. By printing on an insulating substrate, the conductive film circuit can be drawn directly on the substrate, and the circuit formation using a photoresist is not required. Therefore, the operation is greatly simplified, and waste of material can be avoided. Curing conditions vary depending on the resin and solvent used, but those skilled in the art can easily set the curing conditions.

【0033】本発明において、フッ素含有不活性有機液
体は多くの作用を発揮する。まず、フッ素含有不活性有
機液体は、表面張力が低いため、ITO粉末間の隙間に
容易に入り込み、その表面を均一に覆う。そして、フッ
素含有不活性有機液体は分子同士の相互作用力がきわめ
て小さいので、これを含浸したITO粉末は、塗布後に
粉末同士の反発が抑えられ、塗膜中に密に充填すること
ができる。
In the present invention, the fluorine-containing inert organic liquid exerts many effects. First, since the fluorine-containing inert organic liquid has a low surface tension, it easily penetrates into the gaps between the ITO powders and uniformly covers the surface. In addition, since the fluorine-containing inert organic liquid has a very small interaction force between molecules, the impregnated ITO powder can suppress the repulsion between the powders after being applied, and can be densely filled in the coating film.

【0034】また、フッ素含有不活性有機液体は、一般
の有機溶媒にはほとんど溶解しないため、これを含浸し
たITO粉末を樹脂液中に分散させても、樹脂あるいは
有機溶媒中へ溶解しずらいため、ITO粉末の表面に吸
着した状態で保持され、上記の反発抑制作用を発揮し続
ける。
Further, since a fluorine-containing inert organic liquid is hardly dissolved in a general organic solvent, even if the impregnated ITO powder is dispersed in a resin solution, it is difficult to dissolve in a resin or an organic solvent. , And is held in a state of being adsorbed on the surface of the ITO powder, and continues to exert the above-described repulsion suppressing action.

【0035】さらに、フッ素含有不活性有機液体は、反
応性がきわめて低いことから、樹脂、溶媒、あるいはI
TO粉末自体と反応することがなく、塗膜の電気的およ
び光学的性質に悪影響を及ぼさない。しかも、フッ素含
有不活性有機液体はITO粉末同士の反発を抑えるが、
ITO粉末の分散性に影響を与えることはない。
Further, since the fluorine-containing inert organic liquid has extremely low reactivity, it is difficult to use a resin, a solvent,
It does not react with the TO powder itself and does not adversely affect the electrical and optical properties of the coating. Moreover, the fluorine-containing inert organic liquid suppresses repulsion between ITO powders,
It does not affect the dispersibility of the ITO powder.

【0036】一方、フッ素含有不活性有機液体は、沸点
が適当なものを選択することにより、塗布後の乾燥また
は加熱中に実質的に完全に蒸発させて塗膜から除去する
ことができる。塗布後もフッ素含有不活性有機液体が塗
膜中に残留すると、塗膜の電気的および光学的性質が低
下する。
On the other hand, by selecting a fluorine-containing inert organic liquid having an appropriate boiling point, the fluorine-containing inert organic liquid can be substantially completely evaporated during drying or heating after coating to be removed from the coating film. If the fluorine-containing inert organic liquid remains in the coating after application, the electrical and optical properties of the coating deteriorate.

【0037】このように、フッ素含有不活性有機液体
は、ITO粉末同士の反発抑制が望ましい溶液状態にあ
る間は、塗膜に悪影響を及ぼさずにこの反発抑制作用を
有効に発揮し続け、硬化過程で除去されるので、最終的
に形成された導電膜の特性は良好に保持されるのであ
る。その結果、ITO粉末が密に充填し、電気特性 (特
に導電性) と光学特性 (特に透明性) がいずれも改善さ
れた導電膜が形成されるのである。この作用はフッ素含
有不活性有機液体に特有のものであり、炭化水素系の液
体では、この低表面張力、低反応性、高揮発性の全てを
与えることはできない。
As described above, while the fluorine-containing inert organic liquid is in a solution state in which the repulsion of the ITO powders is desired to be suppressed, the fluorine-containing inert organic liquid does not adversely affect the coating film and continues to exert the repulsion suppressing effect effectively. Since it is removed in the process, the characteristics of the finally formed conductive film are well maintained. As a result, a conductive film that is densely filled with the ITO powder and has improved electrical characteristics (particularly, conductivity) and optical characteristics (particularly, transparency) is formed. This effect is peculiar to the fluorine-containing inert organic liquid, and a hydrocarbon-based liquid cannot provide all of this low surface tension, low reactivity, and high volatility.

【0038】より低抵抗、高光透過率の導電膜を得たい
場合には、基板上の導電膜を熱加圧することができる。
この熱加圧処理は、膜が変形能を有している間に、基板
ごと行う。従って、樹脂種によっても異なるが、乾燥後
であって熱硬化もしくは紫外線照射の前、熱硬化中もし
くは紫外線照射中、または基板上に導電膜を形成した後
(即ち、熱硬化もしくは紫外線照射後) のいずれかに行
うことができる。例えば、熱硬化性樹脂の場合には、乾
燥後に熱加圧することによって、熱加圧と熱硬化とを同
時に達成することもできる。
When it is desired to obtain a conductive film having a lower resistance and a higher light transmittance, the conductive film on the substrate can be heated and pressed.
This heat-pressing process is performed for the entire substrate while the film has deformability. Therefore, although it depends on the type of resin, after drying and before thermosetting or ultraviolet irradiation, during thermosetting or ultraviolet irradiation, or after forming a conductive film on a substrate
(That is, after heat curing or irradiation with ultraviolet rays). For example, in the case of a thermosetting resin, hot pressing and thermosetting can be achieved simultaneously by hot pressing after drying.

【0039】熱加圧の方法は特に制限されないが、熱ス
チールロールによる圧延、ホットプレスによる加圧成形
等が挙げられる。熱加圧条件は、基板材料の耐熱性や耐
圧性、要求する塗膜特性等によって変わるため、特に限
定されない。例えば、熱ロールによる圧延の場合には、
温度80〜150 ℃、ロールの線圧力 300〜600 kg/cm2程度
が、ホットプレス法の場合には温度 100〜180 ℃、圧力
20〜50 kg/cm2 程度が望ましい。
The method of hot pressing is not particularly limited, and examples thereof include rolling with a hot steel roll and press forming with a hot press. The conditions of the heat and pressure are not particularly limited because they vary depending on the heat resistance and pressure resistance of the substrate material, required coating film characteristics, and the like. For example, in the case of rolling by a hot roll,
Temperature 80 to 150 ° C., linear pressure 300 to 600 kg / cm 2 about roles, temperature 100 to 180 ° C. in the case of hot pressing, the pressure
About 20-50 kg / cm 2 is desirable.

【0040】熱加圧により、膜中のITO粒子同士が機
械的により密に充填され、ITO粒子が互いに接近す
る。その結果、電気特性が向上し、また塗膜表面の平滑
化が進むことにより光学特性も上昇する。従って、一般
に圧力が高いほど、膜特性は向上する。
Due to the heat and pressure, the ITO particles in the film are mechanically and more densely packed, and the ITO particles approach each other. As a result, the electrical characteristics are improved, and the optical characteristics are also increased due to the smoothing of the coating film surface. Thus, in general, the higher the pressure, the better the film properties.

【0041】本発明による導電膜形成用組成物は、塗
布、スクリーン印刷等により基板上に透明導電膜を形成
できることから、比較的耐熱性の低い樹脂基板にも適用
でき、導電膜の大面積化や連続的な大量生産を容易に実
現できる。本発明の組成物を用いて形成した透明導電膜
は、膜厚、組成物中のITO含有量を調製することによ
って、表面抵抗値で 102〜103 Ω/□のオーダー、光透
過率で80〜90%の範囲において、用途に応じて調整でき
る。
Since the composition for forming a conductive film according to the present invention can form a transparent conductive film on a substrate by coating, screen printing or the like, the composition can be applied to a resin substrate having relatively low heat resistance, and the area of the conductive film can be increased. And continuous mass production can be easily realized. The transparent conductive film formed by using the composition of the present invention has a surface resistance on the order of 10 2 to 10 3 Ω / □ and a light transmittance by adjusting the film thickness and the ITO content in the composition. In the range of 80 to 90%, it can be adjusted according to the application.

【0042】[0042]

【実施例】以下に実施例によって本発明を具体的に説明
する。実施例で用いたITO粉末は、いずれも(In+Sn)
に対するSnの割合が5モル%、平均一次粒子径が0.05μ
mのものであった。
The present invention will be specifically described below with reference to examples. The ITO powders used in the examples were all (In + Sn)
5 mol% of Sn to the average primary particle diameter is 0.05μ
m.

【0043】[0043]

【実施例1】ジューサーミキサーにITO粉末95.0gを
入れ、激しく攪拌して流動状態に保持しながら、ペルフ
ルオロアルキル基を有するアミン型化合物である (株)
トーケムプロダクツ製のEF−L174 (ペルフルオロトリブ
チルアミン) 5.0 gを滴下した。滴下終了後、さらに3
分間攪拌を続けることによって、フッ素含有不活性有機
液体を含浸させたITO粉末を得た。
Example 1 95.0 g of ITO powder was put into a juicer mixer, and while maintaining a fluid state with vigorous stirring, an amine type compound having a perfluoroalkyl group was used.
5.0 g of EF-L174 (perfluorotributylamine) manufactured by Tochem Products was added dropwise. After dropping, 3 more
By continuing stirring for minutes, an ITO powder impregnated with a fluorine-containing inert organic liquid was obtained.

【0044】一方、還流管、温度計、滴下ロート、およ
び攪拌機を備えたフラスコに、キシレン60gを仕込み、
85℃に昇温した後、スチレン20g、アクリル酸メチル2
0.0g、モノ(2−メタクロイルオキシエチレン) アッシ
ドホスフェート 1.2gおよびアゾビスイソブチロニトリ
ル 1.0gからなる混合物を5時間かけて加えた後、12時
間反応させて、不揮発分40重量%、樹脂の重量平均分子
量220,000 、酸価5.5 の樹脂液を得た。
On the other hand, a flask equipped with a reflux tube, a thermometer, a dropping funnel and a stirrer was charged with 60 g of xylene,
After the temperature was raised to 85 ° C, 20 g of styrene and methyl acrylate 2
A mixture consisting of 0.0 g, 1.2 g of mono (2-methacryloyloxyethylene) acid phosphate and 1.0 g of azobisisobutyronitrile was added over 5 hours, and the mixture was reacted for 12 hours. A resin solution having a weight average molecular weight of the resin of 220,000 and an acid value of 5.5 was obtained.

【0045】この樹脂液50.0g、前記ペルフルオロアル
キル基を有するアミン型化合物を含浸させたITO粉末
80.0g、ブタノール/キシレンの重量比が5:5である
混合溶媒 120.0gおよびガラスビーズ 250gを500 ccの
容器に入れ、ペイントシェーカーで粒ゲージにより分散
状態を確認しながら5時間練合した。
50.0 g of this resin liquid, ITO powder impregnated with the amine compound having a perfluoroalkyl group
80.0 g, 120.0 g of a mixed solvent having a butanol / xylene weight ratio of 5: 5, and 250 g of glass beads were placed in a 500 cc container, and kneaded for 5 hours while checking the dispersion state with a particle shaker using a paint shaker.

【0046】練合後、ガラスビーズを取り除き、ITO
粒子が樹脂液に均一に分散した粘稠な液状の導電膜形成
用組成物を得た。その後、アプリケーターを用いてこの
液状組成物をPETフィルム上に塗布し、100 ℃で1時
間乾燥し、PETフィルム上に3μmの厚さの透明導電
膜を作成した。
After kneading, the glass beads were removed, and ITO was removed.
A viscous liquid conductive film forming composition in which particles were uniformly dispersed in a resin liquid was obtained. Thereafter, the liquid composition was applied on a PET film using an applicator, and dried at 100 ° C. for 1 hour to form a transparent conductive film having a thickness of 3 μm on the PET film.

【0047】[0047]

【実施例2】表面処理用のフッ素含有不活性有機液体と
して、ペルフルオロアルキル基を有するエーテル型化合
物である、 (株) トーケムプロダクツ製のEF-L102 3.0
gを使用し、ITO粉末の量を97.0gに変更した以外
は、実施例1と同様の操作を行って、フッ素含有不活性
有機液体を含浸したITO粉末を得た。
Example 2 As a fluorine-containing inert organic liquid for surface treatment, an ether type compound having a perfluoroalkyl group, EF-L1023.0 manufactured by Tochem Products Co., Ltd.
g, and the amount of ITO powder was changed to 97.0 g, and the same operation as in Example 1 was performed to obtain an ITO powder impregnated with a fluorine-containing inert organic liquid.

【0048】次に、キシレン124 ccに第一鉱業製薬
(株) 製の界面活性剤 SAS-13 を 1.2g加えて溶解さ
せ、この中に先のフッ素含有不活性有機液体を含浸させ
たITO粉末を60g添加して、ホモジナイザーにより12
0 rpm で約30分間混合攪拌し、ITO粉末が分散した分
散液を作製した。
Next, 124 ml of xylene was added to Daiichi Mining
1.2 g of a surfactant SAS-13 manufactured by Co., Ltd. was added and dissolved, and 60 g of the ITO powder impregnated with the above-mentioned fluorine-containing inert organic liquid was added thereto.
The mixture was mixed and stirred at 0 rpm for about 30 minutes to prepare a dispersion in which the ITO powder was dispersed.

【0049】これとは別に、ヘキサン120 ccに三菱化成
(株) 製の安定剤2000E を 0.3g溶解させ、これにカネ
カ M1008 (平均分子量800 の塩化ビニル−5wt%酢酸ビ
ニル共重合体) 21.8gを溶解させて樹脂液を調製した。
Separately from this, Mitsubishi Kasei was replaced with 120 cc of hexane.
0.3 g of Stabilizer 2000E manufactured by Kaneka Corporation was dissolved, and 21.8 g of Kaneka M1008 (vinyl chloride-5 wt% vinyl acetate copolymer having an average molecular weight of 800) was dissolved therein to prepare a resin solution.

【0050】上記ITO粉末分散液と樹脂液とを、ホモ
ジナイザーにより5000 rpmで約4時間練合し、ITO粒
子が樹脂液中に均一に分散した粘稠な液状の導電膜形成
用組成物を得た。この液状組成物をアプリケーターを用
いてPETフィルム上に塗布し、80℃で3時間乾燥し、
PETフィルム上に3μmの厚さの透明導電膜を作成し
た。
The ITO powder dispersion and the resin solution are kneaded with a homogenizer at 5000 rpm for about 4 hours to obtain a viscous liquid conductive film forming composition in which ITO particles are uniformly dispersed in the resin solution. Was. This liquid composition was applied on a PET film using an applicator and dried at 80 ° C. for 3 hours.
A transparent conductive film having a thickness of 3 μm was formed on the PET film.

【0051】[0051]

【実施例3】表面処理用フッ素含有不活性有機液体とし
て、ペルフルオロアルキル基を有するアルコール型化合
物である (株) トーケムプロダクツ製のトリフルオロエ
タノール 0.9gを使用し、ITO粉末の量を99.1gに変
更した以外は、実施例1と同様の操作を行って、フッ素
含有不活性有機液体を含浸したITO粉末を得た。
Example 3 As a fluorine-containing inert organic liquid for surface treatment, 0.9 g of trifluoroethanol manufactured by Tochem Products Co., Ltd., which is an alcohol compound having a perfluoroalkyl group, was used, and the amount of ITO powder was 99.1 g. The procedure was the same as that of Example 1 except that the ITO powder was impregnated with a fluorine-containing inert organic liquid.

【0052】一方、熱硬化性樹脂として東京ペイント
(株) 製エポキシ樹脂30.0gをメタノール80.0gに溶解
して樹脂液を調製し、この樹脂液中に上記の表面処理し
たITO粉末70gを添加して、実施例1と同様の操作に
より、ITO粉末が樹脂液に均一に分散した粘稠な液状
の導電膜形成用組成物を得た。この液状組成物をアプリ
ケーターを用いてガラス板上に塗布し、100 ℃で2時間
乾燥し、ガラス板上に3μmの厚さの透明導電膜を作成
した。
On the other hand, as a thermosetting resin, Tokyo Paint
A resin solution was prepared by dissolving 30.0 g of Epoxy Resin Co., Ltd. in 80.0 g of methanol, and 70 g of the surface-treated ITO powder was added to the resin solution. A viscous liquid conductive film forming composition in which the powder was uniformly dispersed in the resin liquid was obtained. The liquid composition was applied on a glass plate using an applicator, and dried at 100 ° C. for 2 hours to form a 3 μm-thick transparent conductive film on the glass plate.

【0053】[0053]

【実施例4】表面処理用フッ素含有不活性有機液体とし
てクロロフルオロカーボン系の1,1,2-トリクロロ−2,2,
1-トリフルオロエタン (フロン113) 2.0gを使用し、I
TO粉末の量を98.0gに変更した以外は、実施例1と同
様の操作を行って、フッ素含有不活性有機液体を含浸し
たITO粉末を得た。
Example 4 As a fluorine-containing inert organic liquid for surface treatment, a chlorofluorocarbon-based 1,1,2-trichloro-2,2,2
Using 2.0 g of 1-trifluoroethane (Freon 113),
An ITO powder impregnated with a fluorine-containing inert organic liquid was obtained in the same manner as in Example 1 except that the amount of the TO powder was changed to 98.0 g.

【0054】一方、エポキシアクリレート系紫外線硬化
性樹脂 [大日本インキ (株) 製ユニディックV-5500] 3
0.0g、上記の表面処理したITO粉末70.0g、および
アセトン100 gを実施例1と同様に練合し、ITO粉末
が樹脂液中に均一に分散した粘稠な液状の導電膜形成用
組成物を得た。この液状組成物をアプリケーターを用い
てPETフィルム上に塗布し、300 W高圧水銀灯 [ウシ
オ電機 (株) 製 UMA-3012-N4型] を用いて紫外線を30秒
間照射することにより、PETフィルム上に2μmの厚
さの透明導電膜を作成した。
On the other hand, an epoxy acrylate UV curable resin [Unidick V-5500 manufactured by Dainippon Ink and Chemicals, Inc.] 3
0.0 g, the above-mentioned surface-treated ITO powder 70.0 g, and acetone 100 g were kneaded in the same manner as in Example 1, and the ITO powder was uniformly dispersed in a resin solution to form a viscous liquid conductive film forming composition. I got The liquid composition is applied on a PET film using an applicator, and irradiated with ultraviolet rays for 30 seconds using a 300 W high-pressure mercury lamp [UMA-3012-N4 type manufactured by Ushio Inc.] to apply the liquid composition on the PET film. A transparent conductive film having a thickness of 2 μm was formed.

【0055】[0055]

【実施例5】表面処理用フッ素含有不活性有機液体とし
て芳香族フッ素化物であるヘキサフルオロベンゼン 5.0
gを使用し、ITO粉末の量を95.0gに変更した以外
は、実施例4と同様の操作を行い、紫外線硬化性樹脂液
中にITO粉末が均一に分散した粘稠な液状の導電膜形
成用組成物を得た。その後、実施例4と同様の操作によ
りPETフィルム上に2μmの厚さの透明導電膜を作成
した。
Example 5 As a fluorine-containing inert organic liquid for surface treatment, an aromatic fluorinated substance, hexafluorobenzene 5.0
g and the amount of ITO powder was changed to 95.0 g, and the same operation as in Example 4 was performed to form a viscous liquid conductive film in which the ITO powder was uniformly dispersed in the ultraviolet curable resin liquid. A composition for use was obtained. Thereafter, a transparent conductive film having a thickness of 2 μm was formed on the PET film by the same operation as in Example 4.

【0056】[0056]

【比較例1】ITO粉末をそのまま使用した以外は実施
例1と全く同じ操作を行った。
Comparative Example 1 The same operation as in Example 1 was performed except that the ITO powder was used as it was.

【0057】[0057]

【比較例2】ITO粉末をそのまま使用した以外は実施
例2と全く同じ操作を行った。
Comparative Example 2 The same operation as in Example 2 was performed except that the ITO powder was used as it was.

【0058】[0058]

【実施例6】ロール表面がハードクロムメッキされた直
径50 mm の2本のスチールロールを、処理速度が10cm/
秒となるように回転速度を設定し、このスチールロール
間に実施例1で得た透明導電膜を有するPETフィルム
をセットした。このPETフィルムを、スチールロール
温度60℃、線圧力400 kgf/cmの条件焼結体でロール圧延
して熱加圧処理した。
Example 6 Two 50 mm diameter steel rolls having hard chrome plating on the roll surface were processed at a processing speed of 10 cm /
The rotation speed was set so as to be seconds, and the PET film having the transparent conductive film obtained in Example 1 was set between the steel rolls. This PET film was roll-rolled with a sintered body under the conditions of a steel roll temperature of 60 ° C. and a linear pressure of 400 kgf / cm, and was subjected to hot pressing.

【0059】[0059]

【実施例7】実施例2で得た透明導電膜を有するPET
フィルムを、厚み3mmのポリ塩化ビニル樹脂板に載せて
から、表面を研磨バフ仕上げした2枚の鏡面板の間に挟
み、温度150 ℃、圧力40 kgf/cm2でホットプレスするこ
とにより熱加圧処理した。
Embodiment 7 PET having the transparent conductive film obtained in Embodiment 2
The film, after placing the polyvinyl chloride resin plate having a thickness of 3 mm, sandwiched surface two mirror plates polished buffed, temperature 0.99 ° C., thermal pressure treatment by hot pressing at a pressure 40 kgf / cm 2 did.

【0060】[0060]

【比較例3】比較例1で得た透明導電膜を有するPET
フィルムを、実施例6と同様の操作で圧延することによ
り熱加圧処理した。
Comparative Example 3 PET having the transparent conductive film obtained in Comparative Example 1
The film was hot-pressed by rolling in the same manner as in Example 6.

【0061】前記の各実施例および比較例で得た透明導
電膜について、その全光透過率を日本分光 (株) 製の U
BEST55型分光光度計で、ヘーズをスガ試験機 (株) 製の
SMカラーコンピューターで、そして表面抵抗値を三菱油
化 (株) 製のローレスタ APMCP-T400 表面抵抗測定器で
それぞれ測定した。表1に試験結果を示す。
With respect to the transparent conductive films obtained in the above Examples and Comparative Examples, the total light transmittance was measured by U
Haze is measured by Suga Test Machine Co., Ltd. with a BEST55 spectrophotometer.
The surface resistance was measured with an SM color computer, and the surface resistance was measured with a Loresta APMCP-T400 surface resistance meter manufactured by Mitsubishi Yuka Corporation. Table 1 shows the test results.

【0062】[0062]

【表1】 [Table 1]

【0063】[0063]

【発明の効果】実施例で用いた本発明の透明導電膜形成
用組成物は、ITO粉末を樹脂液中に分散させる前に予
めフッ素含有不活性有機液体で表面処理しておいたた
め、ITO粉末が塗膜中で密に充填するようになる結
果、未処理のITO粉末を使用した比較例に比べて著し
く低抵抗の導電性に優れた透明導電膜を形成することが
できる。また、この透明導電膜は、ヘーズ値が大幅に低
下し、全光透過率が高く、電気特性のみならず光学特性
も向上している。
The composition for forming a transparent conductive film of the present invention used in the examples had been surface-treated with a fluorine-containing inert organic liquid before dispersing the ITO powder in the resin solution. As a result, a transparent conductive film having extremely low resistance and excellent conductivity can be formed as compared with the comparative example using untreated ITO powder. In addition, the transparent conductive film has a greatly reduced haze value, a high total light transmittance, and improved optical characteristics as well as electrical characteristics.

【0064】また、フッ素含有不活性有機液体によるI
TO粉末の表面処理により、ITO粉末の分散性が向上
するので、実施例1、3〜5に見られるように、分散剤
を併用しなくてもITO粉末を樹脂液中に分散させるこ
とが可能となる。さらに、形成された透明導電膜を熱加
圧処理すると、電気特性および光学特性の一層の向上が
得られる。
In addition, I by a fluorine-containing inert organic liquid
Since the dispersibility of the ITO powder is improved by the surface treatment of the TO powder, it is possible to disperse the ITO powder in the resin liquid without using a dispersant as shown in Examples 1, 3 to 5. Becomes Further, when the formed transparent conductive film is subjected to a heat and pressure treatment, the electric characteristics and the optical characteristics can be further improved.

フロントページの続き (72)発明者 萩原 正弘 埼玉県大宮市北袋町1丁目297番地 三 菱マテリアル株式会社 中央研究所内 (72)発明者 関口 昌宏 埼玉県大宮市北袋町1丁目297番地 三 菱マテリアル株式会社 中央研究所内 (56)参考文献 特開 昭63−211514(JP,A) 特開 平6−340829(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01B 13/00 H01B 1/22 H01B 5/14 Continued on the front page (72) Inventor Masahiro Hagiwara 1-297 Kitabukuro-cho, Omiya-shi, Saitama Prefecture Mitsui Materials Co., Ltd. Central Research Laboratory (72) Inventor Masahiro Sekiguchi 1-297 Kitabukuro-cho, Omiya-shi, Saitama Mitsui Materials Co., Ltd. (56) References JP-A-63-211514 (JP, A) JP-A-6-340829 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) H01B 13 / 00 H01B 1/22 H01B 5/14

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 錫を含有する酸化インジウム粉末が樹脂
液中に分散している導電膜形成用組成物であって、前記
酸化インジウム粉末が、粉末に対して 0.1〜5重量%の
量のフッ素含有不活性有機液体で予め表面処理されたも
のであることを特徴とする導電膜形成用組成物。
1. A composition for forming a conductive film, comprising a tin-containing indium oxide powder dispersed in a resin liquid, wherein the indium oxide powder has a fluorine content of 0.1 to 5% by weight based on the powder. A composition for forming a conductive film, which has been surface-treated in advance with an inert organic liquid.
【請求項2】 前記表面処理された酸化インジウム粉末
を、組成物の不揮発分の15〜80重量%の量で含有する、
請求項1記載の導電膜形成用組成物。
2. The composition according to claim 1, wherein the surface-treated indium oxide powder is contained in an amount of 15 to 80% by weight of a nonvolatile content of the composition.
The composition for forming a conductive film according to claim 1.
【請求項3】 前記樹脂液が、樹脂を極性溶媒と非極性
溶媒との混合溶媒に溶解させた溶液であることを特徴と
する、請求項1または2記載の導電膜形成用組成物。
3. The conductive film forming composition according to claim 1, wherein the resin solution is a solution obtained by dissolving a resin in a mixed solvent of a polar solvent and a non-polar solvent.
【請求項4】 請求項1ないし3のいずれか1項に記載
の導電膜形成用組成物を基板上に印刷または塗布し、次
いで乾燥、熱硬化、および/または紫外線照射により基
板上に導電膜を形成することを特徴とする、導電膜形成
方法。
4. The conductive film-forming composition according to claim 1, which is printed or coated on a substrate, and then dried, thermally cured, and / or irradiated with ultraviolet light to form a conductive film on the substrate. Forming a conductive film.
【請求項5】 請求項4記載の方法において、乾燥後で
あって熱硬化もしくは紫外線照射の前、熱硬化中もしく
は紫外線照射中、または基板上に導電膜を形成した後、
基板上の膜を熱加圧処理する、導電膜形成方法。
5. The method according to claim 4, wherein after drying and before heat curing or UV irradiation, during heat curing or UV irradiation, or after forming a conductive film on the substrate,
A method for forming a conductive film, wherein a film on a substrate is subjected to a thermal pressure treatment.
JP07057288A 1995-03-16 1995-03-16 Composition and method for forming conductive film Expired - Lifetime JP3129140B2 (en)

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