JPH07102177A - Electrically conductive film-forming composition - Google Patents

Electrically conductive film-forming composition

Info

Publication number
JPH07102177A
JPH07102177A JP5248902A JP24890293A JPH07102177A JP H07102177 A JPH07102177 A JP H07102177A JP 5248902 A JP5248902 A JP 5248902A JP 24890293 A JP24890293 A JP 24890293A JP H07102177 A JPH07102177 A JP H07102177A
Authority
JP
Japan
Prior art keywords
resin
parts
weight
resin solution
ito
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5248902A
Other languages
Japanese (ja)
Other versions
JP3321931B2 (en
Inventor
Masahito Murouchi
聖人 室内
Toshiharu Hayashi
年治 林
Akira Nishihara
明 西原
Masaoki Ishihara
真興 石原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Toryo KK
Mitsubishi Materials Corp
Original Assignee
Dai Nippon Toryo KK
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Toryo KK, Mitsubishi Materials Corp filed Critical Dai Nippon Toryo KK
Priority to JP24890293A priority Critical patent/JP3321931B2/en
Priority to DE4447726A priority patent/DE4447726B4/en
Priority to DE4435376A priority patent/DE4435376B4/en
Priority to US08/317,363 priority patent/US5504133A/en
Priority to KR1019940025782A priority patent/KR0180249B1/en
Publication of JPH07102177A publication Critical patent/JPH07102177A/en
Priority to KR1019980030093A priority patent/KR100190465B1/en
Application granted granted Critical
Publication of JP3321931B2 publication Critical patent/JP3321931B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To provide a composition capable of forming such electrically conductive films of low electrical resistance and high transparency as to be 10<2>-10<4>OMEGA in surface resistivity, >=80% in light transmittance and <=6% in haze. CONSTITUTION:A resin 0.5-15mgKOH/g in acid value and/or 0.5-40wt.% in polyalkylene glycol chain content and 8000-150000 in weight-average molecular weight is dissolved in a mixture of a polar solvent (e.g. alcohol) and a nonpolar solvent (e.g. xylene) to prepare a resin solution 5-50wt.% in solid content, and 15-60wt.% of indium oxide powder containing 1 15mol% of tin is then dispersed in 40-85wt.% of this resin solution, thus obtaining the objective composition for forming electrically conductive films.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、電子写真記録、透明電
極、帯電防止、熱線反射、面発熱体等の分野において利
用可能な導電膜形成用組成物に関する。便宜上、以下の
説明では、要求性能の最も厳しい透明電極の分野を例と
して取りあげる。本発明の組成物は、絶縁体上に塗布或
いは印刷することにより、透明な電極回路を容易に形成
することができる。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a conductive film-forming composition which can be used in the fields of electrophotographic recording, transparent electrodes, antistatic, heat ray reflection, surface heating elements and the like. For the sake of convenience, in the following description, the field of the transparent electrode having the most demanding performance will be taken as an example. A transparent electrode circuit can be easily formed by applying or printing the composition of the present invention on an insulator.

【0002】[0002]

【従来の技術】酸化物半導体透明膜は、一般に可視光に
対して高い透過率を示し、低抵抗かつ膜強度が強いため
に、液晶ディスプレイなどの透明電極や太陽電池の窓材
料、熱線反射膜、帯電防止膜など多方面に利用されてい
る。このような酸化物半導体の代表例に、錫を含有する
酸化インジウム (以下ITOという) がある。
2. Description of the Related Art Oxide semiconductor transparent films generally have a high transmittance for visible light, and have low resistance and strong film strength. Therefore, transparent electrodes for liquid crystal displays, window materials for solar cells, heat ray reflective films, etc. It is used in various fields such as antistatic film. A typical example of such an oxide semiconductor is indium oxide containing tin (hereinafter referred to as ITO).

【0003】従来の透明導電膜の形成方法としては、絶
縁体上に金属または無機物(特にITO)を真空蒸着、
スパッタリング、イオンプレーティングなどにより付着
させる方法、金属化合物溶液を基板上に塗布して乾燥後
焼成する方法、ITOを分散剤で処理した後に樹脂溶液
中に分散させた分散液を塗料またはインクとして塗布ま
たは印刷する方法等が知られている。
As a conventional method for forming a transparent conductive film, a metal or an inorganic material (especially ITO) is vacuum-deposited on an insulator,
A method of attaching by sputtering, ion plating, etc., a method of coating a metal compound solution on a substrate and drying and baking it, a method of treating ITO with a dispersant, and then applying a dispersion liquid dispersed in a resin solution as a paint or ink. Or a method of printing is known.

【0004】蒸着やスパッタリングは、従来より最も広
く用いられている膜形成方法であるが、電極の大面積化
に限界がある上、異常放電によるターゲットの劣化や成
膜時の付着効率の低さなどから、ITOの有効利用効率
が40〜55%と非常に低い。また、エッチング法により回
路を描く場合には、基板に付着したITOの大半が取り
除かれるという無駄や、設備費が高価であるという欠点
もある。
Vapor deposition and sputtering have been the most widely used film forming methods in the past, but there is a limit to the increase in the area of electrodes, and the target deterioration due to abnormal discharge and the low adhesion efficiency during film formation. Therefore, the effective use efficiency of ITO is very low at 40-55%. Further, when a circuit is drawn by an etching method, there is a disadvantage that most of the ITO attached to the substrate is removed and the facility cost is high.

【0005】金属化合物溶液を基板上に塗布して乾燥後
に焼成する方法は、焼成温度が高いため、基板の材質が
限定されるほか、1コート1ベークでは適当な膜特性が
得にくいという欠点もある。
In the method of coating a metal compound solution on a substrate and baking it after drying, since the baking temperature is high, the material of the substrate is limited, and there is also a drawback that it is difficult to obtain appropriate film characteristics with one coat and one bake. is there.

【0006】ITO粉末を湿潤剤や顔料分散剤等で表面
処理した後に樹脂溶液中に分散させるか、或いは分散剤
と樹脂を含有する非極性溶媒中にITO粉末を分散さ
せ、得られた分散液を塗料またはインクとして使用して
導電膜を形成する方法は、ITO表面に分散剤や樹脂が
密に吸着し、ITOの分散性を向上させると共に、IT
O粒子どうしの凝集を防ぐ効果をもたらす。しかも、ス
クリーン印刷などの手法により回路を直接描けるため、
材料の無駄がない。
A dispersion obtained by subjecting ITO powder to a resin solution after surface treatment with a wetting agent or a pigment dispersant, or by dispersing the ITO powder in a nonpolar solvent containing a dispersant and a resin. In the method of forming a conductive film by using as a paint or ink, a dispersant or resin is closely adsorbed on the ITO surface to improve the dispersibility of ITO and
The effect of preventing the agglomeration of O particles is brought about. Moreover, since the circuit can be drawn directly by a technique such as screen printing,
There is no waste of material.

【0007】[0007]

【発明が解決しようとする課題】しかし、一般に分散剤
や樹脂のような高分子物質は絶縁体として作用するた
め、ITO表面に高分子が密に吸着すると、絶縁層が形
成され、低抵抗化が困難となる。また、高分子の吸着に
よりITOの分散性を向上させても、ITO自体の比重
が高いために、貯蔵中にITOが沈降してハードケーキ
を生じるなど、塗料およびインクの貯蔵時の経時安定性
にも問題がある。
However, since a polymer substance such as a dispersant or a resin generally acts as an insulator, when the polymer is densely adsorbed on the ITO surface, an insulating layer is formed to reduce the resistance. Will be difficult. Further, even if the dispersibility of ITO is improved by adsorption of a polymer, the ITO itself has a high specific gravity, so that ITO precipitates during storage to form a hard cake. There is also a problem.

【0008】本発明の目的は、上記問題点を解消し、耐
熱性の低い樹脂基板にも適用でき、低抵抗かつ光透過率
の高い導電膜を形成でき、貯蔵時の経時安定性に優れた
導電膜形成用組成物を提供することにある。
The object of the present invention is to solve the above-mentioned problems, to be applicable to a resin substrate having a low heat resistance, to form a conductive film having a low resistance and a high light transmittance, and being excellent in stability with time during storage. It is to provide a composition for forming a conductive film.

【0009】[0009]

【課題を解決するための手段】本発明者らは、ITOと
の親和性の強い極性溶媒と親和性の弱い非極性溶媒との
混合有機溶媒を使用し、この混合有機溶媒中に酸性官能
基またはポリアルキレングリコール鎖の少なくとも一方
を有した樹脂を溶解させ、得られた溶液にITOを分散
させることにより、上記目的が達成できることを究明し
た。
The present inventors have used a mixed organic solvent of a polar solvent having a strong affinity with ITO and a nonpolar solvent having a weak affinity, and an acidic functional group is contained in the mixed organic solvent. Alternatively, it was determined that the above object can be achieved by dissolving a resin having at least one of polyalkylene glycol chains and dispersing ITO in the obtained solution.

【0010】本発明の要旨は、酸性官能基またはポリア
ルキレングリコール鎖の少なくとも一方を有する樹脂お
よび極性溶媒と非極性溶媒との混合有機溶媒からなる樹
脂溶液中に、錫を含有する酸化インジウム(ITO)粉
末を分散させた導電膜形成用組成物である。この樹脂の
重量平均分子量は8000〜150000であり、酸性官能基を有
する場合には酸価が0.5〜15mgKOH/g であり、ポリアル
キレングリコール鎖を含有する場合にはその含有量が0.
5〜40重量%である。
The gist of the present invention is to provide tin-containing indium oxide (ITO) in a resin solution consisting of a resin having at least one of an acidic functional group and a polyalkylene glycol chain and a mixed organic solvent of a polar solvent and a non-polar solvent. ) A conductive film-forming composition in which a powder is dispersed. This resin has a weight average molecular weight of 8,000 to 150,000, an acid value of 0.5 to 15 mg KOH / g when it has an acidic functional group, and a content of 0 when it contains a polyalkylene glycol chain.
It is 5 to 40% by weight.

【0011】好適態様においては、ITO粉末は、Inに
対するSn含有量が1〜15モル%、平均一次粒子径が0.2
μm以下の範囲にある超微粒子であり、樹脂溶液の不揮
発分が5〜50重量%であり、混合有機溶媒の極性溶媒と
非極性溶媒の重量比が、 0.5/9.5〜7/3 の範囲にある。
In a preferred embodiment, the ITO powder has an Sn content with respect to In of 1 to 15 mol% and an average primary particle size of 0.2.
Ultrafine particles in the range of μm or less, the nonvolatile content of the resin solution is 5 to 50% by weight, and the weight ratio of the polar solvent to the nonpolar solvent of the mixed organic solvent is in the range of 0.5 / 9.5 to 7/3. is there.

【0012】本発明に用いるITO粒子は、Inに対する
Snの含有量が1〜15モル%で、平均一次粒子径が 0.2μ
m以下の超微粒子からなるものが好ましく、本発明の組
成物(塗料またはインク)中に15〜60重量%の量で使用
することができる。残り40〜85重量%が樹脂溶液であ
る。
The ITO particles used in the present invention are based on In
Sn content is 1 to 15 mol% and average primary particle size is 0.2μ
It is preferably composed of ultrafine particles of m or less, and can be used in an amount of 15 to 60% by weight in the composition (paint or ink) of the present invention. The remaining 40 to 85% by weight is the resin solution.

【0013】ITOとの親和性が強い極性溶媒として
は、メタノール、エタノール、ブタノール、ジアセトン
アルコール、ジエチレングリコール、ブチルカルビトー
ル、イソホロンおよびシクロヘキサノン等の水酸基およ
び/またはケトン基を有する溶媒(即ち、1価または多
価アルコールおよび/またはケトン系溶媒)が使用でき
る。
As the polar solvent having a strong affinity with ITO, a solvent having a hydroxyl group and / or a ketone group such as methanol, ethanol, butanol, diacetone alcohol, diethylene glycol, butyl carbitol, isophorone and cyclohexanone (that is, monovalent) Alternatively, polyhydric alcohols and / or ketone solvents) can be used.

【0014】ITOとの親和性が弱い非極性溶媒として
は、キシレン、トルエン等の芳香族系炭化水素、シクロ
ヘキサン等の脂環式炭化水素、ヘキサン、オクタン等の
脂肪族炭化水素などの炭化水素類が挙げられる。
Non-polar solvents having a weak affinity for ITO include aromatic hydrocarbons such as xylene and toluene, alicyclic hydrocarbons such as cyclohexane, and hydrocarbons such as aliphatic hydrocarbons such as hexane and octane. Is mentioned.

【0015】本発明では、少なくとも1種ずつの極性溶
媒と非極性溶媒とからなる混合有機溶媒を使用する。極
性溶媒と非極性溶媒とは相溶性のよい組合せが望まし
い。この2種の溶媒の混合割合は、極性溶媒/非極性溶
媒の重量比で 0.5/9.5〜7/3 の範囲内が好ましい。
In the present invention, a mixed organic solvent containing at least one polar solvent and a nonpolar solvent is used. It is desirable that the polar solvent and the nonpolar solvent have a good compatibility. The mixing ratio of these two kinds of solvents is preferably in the range of 0.5 / 9.5 to 7/3 by weight ratio of polar solvent / nonpolar solvent.

【0016】極性溶媒の割合が高すぎると、溶媒とIT
Oとの親和性が強すぎ、ITOと高分子(樹脂)との吸
着が不十分となって、ITO粒子間に強い凝集構造が形
成され、導電膜の光透過率やインク・塗料の貯蔵安定性
が低下する。また、非極性溶媒の割合が高すぎると、溶
媒とITOとの親和性が弱くなってITOへの高分子の
吸着が多くなり、ITOの分散性が向上する反面、粒子
表面に絶縁層が形成され、低抵抗化が困難となる。
If the proportion of polar solvent is too high, the solvent and IT
The affinity with O is too strong, the adsorption of ITO and polymer (resin) becomes insufficient, and a strong aggregate structure is formed between ITO particles, and the light transmittance of the conductive film and storage stability of ink and paint are stable. Sex decreases. On the other hand, if the proportion of the non-polar solvent is too high, the affinity between the solvent and ITO is weakened and the adsorption of the polymer on ITO increases, and the dispersibility of ITO improves, while an insulating layer is formed on the particle surface. Therefore, it becomes difficult to reduce the resistance.

【0017】本発明で使用する樹脂は重量平均分子量が
8000〜150000のアクリル、アルキド、ポリアミド、ポリ
エステル、ポリカーボネート樹脂等が好ましく、特に好
ましいのはアクリル、およびポリエステル樹脂である。
The resin used in the present invention has a weight average molecular weight of
Acrylic, alkyd, polyamide, polyester, and polycarbonate resins of 8,000 to 150,000 are preferable, and acrylic and polyester resins are particularly preferable.

【0018】樹脂中に酸性官能基を含む場合、酸性官能
基は酸価が0.5〜15mgKOH/g 、好ましくは 1.0〜10mgKO
H/g となる割合で存在させる。好ましい酸性官能基とし
てはカルボキシル基、リン酸基、スルホン酸基等であ
る。
When the resin contains an acidic functional group, the acidic functional group has an acid value of 0.5 to 15 mgKOH / g, preferably 1.0 to 10 mgKO.
It is present at a rate of H / g. Preferable acidic functional groups are carboxyl group, phosphoric acid group, sulfonic acid group and the like.

【0019】また、樹脂中にポリアルキレングリコール
鎖を有する場合、ポリアルキレングリコール鎖の含有量
は0.5〜40重量%、好ましくは 2.0〜30重量%の範囲内
とする。好ましいポリアルキレングリコール鎖の例には
ポリエチレングリコール、ポリプロピレングリコール、
ポリエチレングリコールアルキルエーテル、ポリエチレ
ングリコールフェニルエーテル、ポリエチレングリコー
ルアルキルフェニルエーテル、ポリプロピレングリコー
ルアルキルエーテル、ポリプロピレングリコールフェニ
ルエーテル、ポリプロピレングリコールアルキルフェニ
ルエーテル、ポリエチレングリコールアルキルアミン、
ポリエチレングリコールアルキルアミド、ポリエチレン
グリコールグリシジルエーテル、などがある。
When the resin has a polyalkylene glycol chain, the content of the polyalkylene glycol chain is in the range of 0.5 to 40% by weight, preferably 2.0 to 30% by weight. Examples of preferred polyalkylene glycol chains include polyethylene glycol, polypropylene glycol,
Polyethylene glycol alkyl ether, polyethylene glycol phenyl ether, polyethylene glycol alkyl phenyl ether, polypropylene glycol alkyl ether, polypropylene glycol phenyl ether, polypropylene glycol alkyl phenyl ether, polyethylene glycol alkyl amine,
Polyethylene glycol alkylamide, polyethylene glycol glycidyl ether, and the like.

【0020】本発明で使用する樹脂は、酸性官能基を有
するモノマーおよび/またはポリアルキレングリコール
鎖を有するモノマーを共重合成分として使用することに
より、常法により製造することができる。例えば、アク
リル樹脂の場合、酸性官能基含有モノマーとしては、ア
クリル酸、メタクリル酸、クロトン酸、2−メタクリロ
イルオキシエチルコハク酸、2−メタクリロイルオキシ
エチルフタル酸などの不飽和カルボン酸、モノ(2−
(メタ)アクロイルオキシエチル)アシッドホスフェー
ト、ジフェニル−2−(メタ)アクロイルオキシエチル
ホスフェート等のリン酸(メタ)アクリル酸エステルお
よび2−スルホエステル(メタ)アクリレートが、また
ポリアルキレングリコール含有モノマーとしては、前記
のポリアルキレングリコールのモノアクリル酸エステル
もしくはモノメタクリル酸エステルが使用できる。
The resin used in the present invention can be produced by a conventional method by using a monomer having an acidic functional group and / or a monomer having a polyalkylene glycol chain as a copolymerization component. For example, in the case of acrylic resin, examples of the acidic functional group-containing monomer include unsaturated carboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, 2-methacryloyloxyethylsuccinic acid and 2-methacryloyloxyethylphthalic acid, mono (2-
(Meth) acryloyloxyethyl) acid phosphate, diphenyl-2- (meth) acryloyloxyethyl phosphate and other phosphoric acid (meth) acrylic acid esters and 2-sulfoester (meth) acrylates, and polyalkylene glycol-containing monomers As the above, the above-mentioned monoacrylic acid ester or monomethacrylic acid ester of polyalkylene glycol can be used.

【0021】樹脂の重量平均分子量が150000よりも大き
いか、酸価が15mgKOH/g よりも大きくなると、ITO表
面への樹脂吸着量が増加し、表面抵抗値は高くなる。重
量平均分子量が8000よりも小さくなると、樹脂は顔料分
散剤として作用して、ITO表面に密に吸着する。この
結果、ITOの分散性は向上し光透過率は高くなるが、
表面抵抗値はやはり高くなってしまう。酸価が0.5mgKO
H/g よりも小さい場合には、ITO表面への樹脂吸着が
不十分となりITOの分散性が低下し、光透過率が低下
する。
If the weight average molecular weight of the resin is greater than 150,000 or the acid value is greater than 15 mgKOH / g, the amount of resin adsorbed on the ITO surface increases and the surface resistance value increases. When the weight average molecular weight is less than 8000, the resin acts as a pigment dispersant and is closely adsorbed on the ITO surface. As a result, the dispersibility of ITO improves and the light transmittance increases, but
The surface resistance value is still high. Acid value is 0.5mg KO
If it is less than H / g, the resin adsorption to the ITO surface becomes insufficient and the dispersibility of ITO decreases, resulting in a decrease in light transmittance.

【0022】ポリアルキレングリコール鎖の含有量が40
重量%よりも大きい場合には、樹脂の極性が強まるため
にITOの分散不良が生じ、光透過率が低下する。ま
た、 0.5重量%よりも小さい場合にはITOの分散性が
著しく低下するために光透過率が低下する。
The content of polyalkylene glycol chain is 40
If it is more than 10% by weight, the polarity of the resin is strengthened, resulting in poor dispersion of ITO, resulting in a decrease in light transmittance. On the other hand, if it is less than 0.5% by weight, the dispersibility of ITO is remarkably lowered, and the light transmittance is lowered.

【0023】本発明の導電膜形成用組成物は、前記樹脂
を前記混合溶媒に溶解して樹脂溶液を調整し、この樹脂
溶液にITO粉末を分散させることにより製造すること
ができる。ITO粉末の分散は、常法によりペイントシ
ェーカー、ボールミル、セントリミル、サンドグライン
ドミル等によって行うことができる。この樹脂組成物を
塗料またはインクとして適当な基板上に塗布またはスク
リーン印刷し、必要であれば加熱して、乾燥(および硬
化) させると、透明導電膜が形成される。
The conductive film-forming composition of the present invention can be produced by dissolving the resin in the mixed solvent to prepare a resin solution, and dispersing ITO powder in the resin solution. The ITO powder can be dispersed by a conventional method using a paint shaker, a ball mill, a centri mill, a sand grind mill, or the like. A transparent conductive film is formed by applying or screen-printing this resin composition as a paint or ink on an appropriate substrate, and heating (and curing) if necessary.

【0024】本発明の導電膜形成用組成物は、樹脂、I
TO、混合有機溶媒の他に、必要に応じて硬化触媒、湿
潤剤、分散剤、酸化防止剤、レベリング剤等の添加剤を
さらに含有することができる。
The conductive film forming composition of the present invention comprises a resin, I
In addition to TO and a mixed organic solvent, additives such as a curing catalyst, a wetting agent, a dispersant, an antioxidant, and a leveling agent can be further contained if necessary.

【0025】[0025]

【作用】本発明の導電膜形成用組成物は、酸性官能基ま
たはポリアルキレングリコール鎖の少なくとも一方を有
した樹脂および極性溶媒と非極性溶媒との混合有機溶媒
からなる樹脂溶液中に、ITO粉末を分散させたもので
ある。この組成物を、塗料として塗布するか、あるいは
インクとして印刷することにより、絶縁基板上に導電膜
回路を形成することができる。
The composition for forming a conductive film of the present invention comprises an ITO powder in a resin solution containing a resin having at least one of an acidic functional group and a polyalkylene glycol chain and a mixed organic solvent of a polar solvent and a nonpolar solvent. Is dispersed. A conductive film circuit can be formed on an insulating substrate by applying this composition as a paint or printing as an ink.

【0026】酸性官能基を含有する樹脂の場合には、樹
脂中にカルボキシル基、リン酸基、スルホン酸基等の酸
性官能基がペンダント等として導入されることにより、
ITO粉末表面の結晶水や自由水との間で相互作用が起
こり、樹脂自体がプロトン伝導体となって、体積抵抗値
が低下し、さらに樹脂の酸性官能基がITO表面の吸着
サイトに吸着して、ITO粒子どうしの凝集を阻止し、
ITOが一次粒子にまで微細化される。
In the case of a resin containing an acidic functional group, by introducing an acidic functional group such as a carboxyl group, a phosphoric acid group or a sulfonic acid group as a pendant into the resin,
Interaction occurs between the water of crystallization and free water on the surface of the ITO powder, the resin itself becomes a proton conductor, the volume resistance value decreases, and the acidic functional groups of the resin are adsorbed on the adsorption sites on the ITO surface. Prevents the ITO particles from aggregating,
ITO is reduced to primary particles.

【0027】一方、ポリアルキレングリコール鎖を含有
する樹脂の場合には、酸性官能基とは異なり、空気中の
水分やITO粉末の結晶水及び自由水の有無にかかわら
ず、ポリアルキレングリコール鎖によって樹脂全体にイ
オン伝導性が生じるため、樹脂自体の体積抵抗値も低下
する。また、分散性は酸性官能基よりも弱いが、ポリア
ルキレングリコール鎖の親水基により、親水性の強いI
TO粉末が一次粒子近傍にまで微粒化される。その微粒
化された粒子表面に樹脂の吸着が起こる。
On the other hand, in the case of a resin containing a polyalkylene glycol chain, unlike an acidic functional group, a resin containing a polyalkylene glycol chain is used regardless of the presence of water in the air or water of crystallization of ITO powder and free water. Since the ion conductivity is generated as a whole, the volume resistance value of the resin itself is also lowered. In addition, although the dispersibility is weaker than that of the acidic functional group, the hydrophilic group of the polyalkylene glycol chain causes strong hydrophilicity I.
The TO powder is atomized to near the primary particles. Adsorption of resin occurs on the surface of the atomized particles.

【0028】樹脂が酸性官能基とポリアルキレングリコ
ール鎖の両者を含有する場合には、両者の作用があいま
って、効果は一層顕著になる。
When the resin contains both an acidic functional group and a polyalkylene glycol chain, the effects of both are combined and the effect becomes more remarkable.

【0029】さらに、極性の異なる混合溶媒を用いるこ
とにより、ITO表面への樹脂吸着量および吸着した樹
脂の拡がりのコントロールが可能となり、ITO表面に
部分的に樹脂を吸着させられる。ITO粒子表面は樹脂
で完全に被覆されていず、ITO粒子間の被覆されてい
ない部分に弱い橋かけが形成される。そしてこの弱い橋
かけは、攪拌等により容易に切断され、ITOの微粒子
状態への再分散が起こる。
Further, by using a mixed solvent having different polarities, the amount of resin adsorbed on the ITO surface and the spread of the adsorbed resin can be controlled, and the resin can be partially adsorbed on the ITO surface. The surface of the ITO particles is not completely covered with the resin, and weak crosslinks are formed in the uncoated portions between the ITO particles. Then, this weak bridge is easily cut by stirring or the like, and redispersion of ITO into a fine particle state occurs.

【0030】従って、貯蔵時にはITO粒子間に形成さ
れた弱い橋かけのためITOが安定化され、沈降が起こ
らず、塗料やインクの貯蔵時の経時安定性が向上する。
そして、塗布、印刷時にはITO粒子間の橋かけが切断
され、かなり粘稠であるにもかかわらずニュートニアン
としての挙動を示すために平滑な膜が得られる。
Therefore, during storage, the ITO is stabilized due to the weak crosslinks formed between the ITO particles, sedimentation does not occur, and the temporal stability during storage of the paint or ink is improved.
Then, during coating and printing, the bridges between the ITO particles are cut, and a smooth film is obtained because it behaves as a Newtonian despite being quite viscous.

【0031】また、乾燥・硬化過程においては、ITO
粒子の樹脂に被覆されていない部分どうしの接近および
樹脂の伝導性により導電部が生じ、低抵抗化が実現す
る。さらに、ITO粒子の分散性の向上により、低ヘー
ズで高光透過率である、透明性に優れた導電膜が得られ
る。本発明による導電膜形成用組成物は、塗布、スクリ
ーン印刷などにより基板上に透明導電膜を形成できるこ
とから、比較的耐熱性の低い樹脂にも用いられ、連続的
な大量生産および大面積化の実現が可能である。本発明
の組成物を用いることにより膜の特性は、表面抵抗値で
102〜104 Ω/□のオーダー、光透過率で80〜90%の範
囲内において調整できる。
In the drying / curing process, ITO is used.
A conductive portion is generated due to the proximity of the portions of the particles that are not covered with the resin and the conductivity of the resin, and a reduction in resistance is realized. Further, by improving the dispersibility of the ITO particles, a conductive film having low haze, high light transmittance, and excellent transparency can be obtained. The conductive film forming composition according to the present invention can form a transparent conductive film on a substrate by coating, screen printing, etc., and thus is also used for a resin having relatively low heat resistance, which enables continuous mass production and large area production. Realization is possible. By using the composition of the present invention, the characteristics of the film are
It can be adjusted in the order of 10 2 to 10 4 Ω / □ and within the range of 80 to 90% in light transmittance.

【0032】樹脂がポリアルキレングリコール鎖を有せ
ず、酸性官能基を有している場合には、一般に表面抵抗
値が 103Ω/□のオーダー、光透過率が85%以上であ
る。樹脂が酸性官能基を有しておらず、ポリアルキレン
グリコール鎖を有すると、表面抵抗値が 102Ω/□のオ
ーダー、光透過率が80%以上となり、表面抵抗値は下が
るが、光透過率は減少する。酸価が0.5〜15mgKOH/g で
ありかつポリアルキレングリコール鎖も有している場合
には、表面抵抗値が 102Ω/□のオーダー、光透過率が
85%以上、と両者共に良好な結果が得られる。従って、
必要とする抵抗値や光透過率の水準に応じて酸価やポリ
アルキレングリコール鎖の量を選択すればよい。
When the resin does not have a polyalkylene glycol chain and has an acidic functional group, the surface resistance value is generally on the order of 10 3 Ω / □ and the light transmittance is 85% or more. If the resin does not have an acidic functional group and has a polyalkylene glycol chain, the surface resistance value will be on the order of 10 2 Ω / □, the light transmittance will be 80% or more, and the surface resistance value will decrease, but the light transmission The rate will decrease. When the acid value is 0.5 to 15 mgKOH / g and it also has a polyalkylene glycol chain, the surface resistance value is on the order of 10 2 Ω / □ and the light transmittance is
A good result is obtained for both, at 85% or more. Therefore,
The acid value and the amount of polyalkylene glycol chain may be selected according to the required resistance value and light transmittance level.

【0033】[0033]

【実施例】以下に実施例によって本発明を具体的に説明
する。なお、実施例中、部は特に指定のない限り重量部
であり、酸価の単位(mgKOH/g)は省略した。また、実施
例で使用したITOは、いずれもInに対するSnの含有量
5モル%、平均一次粒子径0.05μmの粉末であり、ポリ
エステル樹脂溶液の溶媒はブタノールとキシレンの混合
溶媒でブタノール/キシレンの重量比は2/8であっ
た。
EXAMPLES The present invention will be specifically described below with reference to examples. In the examples, parts are parts by weight unless otherwise specified, and the unit of acid value (mgKOH / g) is omitted. The ITO used in the examples is a powder having a Sn content of 5 mol% with respect to In and an average primary particle diameter of 0.05 μm, and the solvent of the polyester resin solution is a mixed solvent of butanol and xylene. The weight ratio was 2/8.

【0034】(実施例1)還流管、温度計、滴下ロートお
よび攪拌機を備えたフラスコにキシレン60部を仕込み、
90℃に昇温した後、スチレン20部、アクリル酸メチル1
9.5部、アクリル酸0.5部およびアゾビスイソブチロニ
トリル2部からなる混合物を4時間かけて加えた後、10
時間反応させて、不揮発分41重量%、樹脂の重量平均分
子量が 10000、酸価が9.7 の樹脂溶液を得た。この樹脂
溶液50.0部、ITO80.0部、ブタノール/キシレンの重
量比が4/6である混合溶媒 120.0部およびガラスビー
ズ250.0 部を 500ccの容器に入れ、ペイントシェーカー
で粒ゲージにより分散状態を確認しながら5時間練合し
た。練合後ガラスビーズを取り除き、ITO粒子が樹脂
溶液に均一に分散した粘稠性の液状物を得た。
Example 1 A flask equipped with a reflux tube, a thermometer, a dropping funnel and a stirrer was charged with 60 parts of xylene.
After heating to 90 ℃, 20 parts of styrene, methyl acrylate 1
After adding a mixture consisting of 9.5 parts, 0.5 part of acrylic acid and 2 parts of azobisisobutyronitrile over 4 hours,
The reaction was carried out for a time to obtain a resin solution having a nonvolatile content of 41% by weight, a resin weight average molecular weight of 10,000 and an acid value of 9.7. 50.0 parts of this resin solution, 80.0 parts of ITO, 120.0 parts of a mixed solvent having a butanol / xylene weight ratio of 4/6 and 250.0 parts of glass beads were placed in a 500cc container, and the dispersion state was confirmed by a particle shaker with a paint shaker. While kneading for 5 hours. After kneading, the glass beads were removed to obtain a viscous liquid material in which ITO particles were uniformly dispersed in the resin solution.

【0035】その後、アプリケーターを用いて粘稠性の
液状物をPETフィルム上に塗布し、100 ℃で1時間乾
燥し、PETフィルム上に2μmの厚さの透明被膜を作
製した。
Then, a viscous liquid material was applied onto a PET film using an applicator and dried at 100 ° C. for 1 hour to form a transparent coating film having a thickness of 2 μm on the PET film.

【0036】(実施例2)実施例1と同様な方法でキシレ
ン60部、スチレン20部、アクリル酸メチル19.95 部、ア
クリル酸0.05部およびアゾビスイソブチロニトリル0.6
部から、不揮発分40重量%、樹脂の重量平均分子量1000
00、酸価1.0の樹脂溶液を得た。この樹脂溶液を用いて
実施例1と同様にして練合と塗布を行い、PETフィル
ム上に2μm厚の透明被膜を作製した。
Example 2 In the same manner as in Example 1, 60 parts of xylene, 20 parts of styrene, 19.95 parts of methyl acrylate, 0.05 part of acrylic acid and 0.6 part of azobisisobutyronitrile.
Part, nonvolatile content 40% by weight, resin weight average molecular weight 1000
A resin solution having an acid value of 00 and an acid value of 1.0 was obtained. Using this resin solution, kneading and coating were carried out in the same manner as in Example 1 to prepare a 2 μm thick transparent coating film on the PET film.

【0037】(実施例3)実施例1と同様な方法でキシレ
ン60部、スチレン20部、アクリル酸メチル19.2部、モノ
(2−メタクロイルオキシエチル)アシッドホスフェー
ト 0.8部およびアゾビスイソブチロニトリル1.0部か
ら、不揮発分41重量%、樹脂の重量平均分子量 50000、
酸価5.6 の樹脂溶液を得た。この樹脂溶液を用いて実施
例1と同様にして練合と塗布を行い、PETフィルム上
に2μm厚の透明被膜を作製した。
Example 3 In the same manner as in Example 1, 60 parts of xylene, 20 parts of styrene, 19.2 parts of methyl acrylate, 0.8 part of mono (2-methacryloyloxyethyl) acid phosphate and azobisisobutyronitrile. From 1.0 parts, non-volatile content 41% by weight, weight average molecular weight of the resin 50000,
A resin solution having an acid value of 5.6 was obtained. Using this resin solution, kneading and coating were carried out in the same manner as in Example 1 to prepare a 2 μm thick transparent coating film on the PET film.

【0038】(実施例4)不揮発分60重量%、重量平均分
子量 65000、酸価7のポリエステル樹脂溶液30.0部、I
TO80.0部、ブタノール/キシレンの重量比が4/6で
ある混合溶媒 140.0部を用いて実施例1と同様にして練
合と塗布を行い、PETフィルム上に2μm厚の透明被
膜を作製した。
Example 4 Non-volatile content 60% by weight, weight average molecular weight 65,000, acid value 7 polyester resin solution 30.0 parts, I
Kneading and coating were carried out in the same manner as in Example 1 using 80.0 parts of TO and 140.0 parts of a mixed solvent having a butanol / xylene weight ratio of 4/6 to prepare a transparent film having a thickness of 2 μm on a PET film. .

【0039】(比較例1)実施例1と同様な方法でキシレ
ン60部、スチレン20部、アクリル酸メチル19.5部、アク
リル酸0.5部およびアゾビスイソブチロニトリル3部か
ら、不揮発分42重量%、樹脂の重量平均分子量5000、酸
価9.7 の樹脂溶液を得た。この樹脂溶液を用いて実施例
1と同様にして練合と塗布を行い、PETフィルム上に
2μm厚の透明被膜を作製した。
Comparative Example 1 In the same manner as in Example 1, from 60 parts of xylene, 20 parts of styrene, 19.5 parts of methyl acrylate, 0.5 part of acrylic acid and 3 parts of azobisisobutyronitrile, a nonvolatile content of 42 parts was obtained. A resin solution having a weight percentage of 5,000, a resin weight average molecular weight of 5,000 and an acid value of 9.7 was obtained. Using this resin solution, kneading and coating were carried out in the same manner as in Example 1 to prepare a 2 μm thick transparent coating film on the PET film.

【0040】(比較例2)実施例1と同様な方法でキシレ
ン60部、スチレン20部、アクリル酸メチル19.95 部、ア
クリル酸0.01部およびアゾビスイソブチロニトリル0.6
部から、不揮発分40重量%、樹脂の重量平均分子量1000
00、酸価0.2の樹脂溶液を得た。この樹脂溶液を用いて
実施例1と同様にして練合と塗布を行い、PETフィル
ム上に2μm厚の透明被膜を作製した。
Comparative Example 2 In the same manner as in Example 1, 60 parts of xylene, 20 parts of styrene, 19.95 parts of methyl acrylate, 0.01 part of acrylic acid and 0.6 of azobisisobutyronitrile.
Part, nonvolatile content 40% by weight, resin weight average molecular weight 1000
A resin solution having an acid value of 00 and an acid value of 0.2 was obtained. Using this resin solution, kneading and coating were carried out in the same manner as in Example 1 to prepare a 2 μm thick transparent coating film on the PET film.

【0041】(比較例3)実施例1と同様な方法でキシレ
ン60部、スチレン20部、アクリル酸メチル19.2部、モノ
(2−メタクロイルオキシエチレン)アシッドホスフェ
ート0.8部およびアゾビスイソブチロニトリル0.3部か
ら、不揮発分40重量%、樹脂の重量平均分子量200000、
酸価5.6 の樹脂溶液を得た。この樹脂溶液を用いて実施
例1と同様にして練合と塗布を行い、PETフィルム上
に2μm厚の透明被膜を作製した。
Comparative Example 3 In the same manner as in Example 1, 60 parts of xylene, 20 parts of styrene, 19.2 parts of methyl acrylate, 0.8 part of mono (2-methacryloyloxyethylene) acid phosphate and azobisisobutyrate were used. From 0.3 parts of ronitrile, non-volatile content 40% by weight, weight average molecular weight of the resin 200,000,
A resin solution having an acid value of 5.6 was obtained. Using this resin solution, kneading and coating were carried out in the same manner as in Example 1 to prepare a 2 μm thick transparent coating film on the PET film.

【0042】(比較例4)不揮発分40重量%、樹脂の平均
分子量49000 、酸価0.3のポリエステル樹脂溶液に変更
した以外は、実施例4と同様にして粘稠性の液状物を
得、PETフィルム上に2μm厚の透明被膜を作製し
た。
(Comparative Example 4) A viscous liquid material was obtained in the same manner as in Example 4 except that a polyester resin solution having a nonvolatile content of 40% by weight, an average molecular weight of the resin of 49000 and an acid value of 0.3 was used. A transparent coating having a thickness of 2 μm was formed on the PET film.

【0043】(実施例5)実施例1と同様な方法でキシレ
ン60部、スチレン20部、アクリル酸メチル19.0部、メト
キシポリエチレングリコールメタクリレート( 分子量 4
96 )1.0部およびアゾビスイソブチロニトリル2.0部か
ら、不揮発分41重量%、樹脂の重量平均分子量10000 、
ポリアルキレングリコール鎖含有量2.0重量%の樹脂溶
液を得た。この樹脂溶液を用いて実施例1と同様にして
練合と塗布を行い、PETフィルム上に2μm厚の透明
被膜を作製した。
Example 5 By the same method as in Example 1, 60 parts of xylene, 20 parts of styrene, 19.0 parts of methyl acrylate, methoxy polyethylene glycol methacrylate (molecular weight 4
96) 1.0 part and 2.0 parts of azobisisobutyronitrile, non-volatile content 41% by weight, resin weight average molecular weight 10000,
A resin solution having a polyalkylene glycol chain content of 2.0% by weight was obtained. Using this resin solution, kneading and coating were carried out in the same manner as in Example 1 to prepare a 2 μm thick transparent coating film on the PET film.

【0044】(実施例6)実施例1と同様な方法でキシレ
ン60部、スチレン20部、アクリル酸メチル19.0部、メト
キシポリエチレングリコールメタクリレート1.0部およ
びアゾビスイソブチロニトリル0.6部から、不揮発分40
重量%、樹脂の重量平均分子量100000、ポリアルキレン
グリコール鎖含有量2.0重量%の樹脂溶液を得た。この
樹脂溶液を用いて実施例1と同様にして練合と塗布を行
い、PETフィルム上に2μm厚の透明被膜を作製し
た。
Example 6 In the same manner as in Example 1, from 60 parts of xylene, 20 parts of styrene, 19.0 parts of methyl acrylate, 1.0 part of methoxypolyethylene glycol methacrylate and 0.6 parts of azobisisobutyronitrile. , Nonvolatile content 40
A resin solution having a weight% of the resin, a weight average molecular weight of the resin of 100,000 and a polyalkylene glycol chain content of 2.0% by weight was obtained. Using this resin solution, kneading and coating were carried out in the same manner as in Example 1 to prepare a 2 μm thick transparent coating film on the PET film.

【0045】(実施例7)実施例1と同様な方法でキシレ
ン60部、スチレン20部、アクリル酸メチル5.0部、メト
キシポリエチレングリコールメタクリレート15部および
アゾビスイソブチロニトリル0.6部から、不揮発分40重
量%、樹脂の重量平均分子量100000、ポリアルキレング
リコール鎖含有量30重量%の樹脂溶液を得た。この樹脂
溶液を用いて実施例1と同様にして練合と塗布を行い、
PETフィルム上に2μm厚の透明被膜を作製した。
Example 7 In the same manner as in Example 1, from 60 parts of xylene, 20 parts of styrene, 5.0 parts of methyl acrylate, 15 parts of methoxypolyethylene glycol methacrylate and 0.6 part of azobisisobutyronitrile, a nonvolatile A resin solution having a content of 40% by weight, a weight average molecular weight of the resin of 100,000 and a polyalkylene glycol chain content of 30% by weight was obtained. Using this resin solution, kneading and coating are carried out in the same manner as in Example 1,
A 2 μm thick transparent coating was prepared on the PET film.

【0046】(比較例5)実施例1と同様な方法でキシレ
ン60部、スチレン20部、アクリル酸メチル19.0部、メト
キシポリエチレングリコールメタクリレート1.0部およ
びアゾビスイソブチロニトリル3部から、不揮発分42重
量%、樹脂の重量平均分子量5000、ポリアルキレングリ
コール鎖含有量2.0重量%の樹脂溶液を得た。この樹脂
溶液を用いて実施例1と同様にして練合と塗布を行い、
PETフィルム上に2μm厚の透明被膜を作製した。
Comparative Example 5 In the same manner as in Example 1, from 60 parts of xylene, 20 parts of styrene, 19.0 parts of methyl acrylate, 1.0 part of methoxypolyethylene glycol methacrylate and 3 parts of azobisisobutyronitrile, non-volatile A resin solution having a content of 42% by weight, a resin weight average molecular weight of 5000, and a polyalkylene glycol chain content of 2.0% by weight was obtained. Using this resin solution, kneading and coating are carried out in the same manner as in Example 1,
A 2 μm thick transparent coating was prepared on the PET film.

【0047】(比較例6)実施例1と同様な方法でキシレ
ン60部、スチレン20部、アクリル酸メチル19.0部、メト
キシポリエチレングリコールメタクリレート1.0 部およ
びアゾビスイソブチロニトリル0.3部から、不揮発分40
重量%、樹脂の重量平均分子量200000、ポリアルキレン
グリコール鎖含有量2.0重量%の樹脂溶液を得た。この
樹脂溶液を用いて実施例1と同様にして練合と塗布を行
い、PETフィルム上に2μm厚の透明被膜を作製し
た。
Comparative Example 6 In the same manner as in Example 1, from 60 parts of xylene, 20 parts of styrene, 19.0 parts of methyl acrylate, 1.0 part of methoxypolyethylene glycol methacrylate and 0.3 part of azobisisobutyronitrile, a nonvolatile content was obtained. Min 40
A resin solution having a weight percentage of 200, a weight average molecular weight of the resin of 200,000 and a polyalkylene glycol chain content of 2.0 wt% was obtained. Using this resin solution, kneading and coating were carried out in the same manner as in Example 1 to prepare a 2 μm thick transparent coating film on the PET film.

【0048】(比較例7)実施例1と同様な方法でキシレ
ン60部、スチレン20部、アクリル酸メチル20部およびア
ゾビスイソブチロニトリル0.6部から、不揮発分42重量
%、樹脂の重量平均分子量100000の樹脂溶液を得た。こ
の樹脂溶液を用いて実施例1と同様にして練合と塗布を
行い、PETフィルム上に2μm厚の透明被膜を作製し
た。
Comparative Example 7 In the same manner as in Example 1, from 60 parts of xylene, 20 parts of styrene, 20 parts of methyl acrylate and 0.6 part of azobisisobutyronitrile, a nonvolatile content of 42% by weight was calculated. A resin solution having a weight average molecular weight of 100,000 was obtained. Using this resin solution, kneading and coating were carried out in the same manner as in Example 1 to prepare a 2 μm thick transparent coating film on the PET film.

【0049】(比較例8)実施例1と同様な方法でキシレ
ン60部、スチレン10部、アクリル酸メチル10部、ポリエ
チレングリコールモノメタクリレート20部およびアゾビ
スイソブチロニトリル0.6部から、不揮発分40重量%、
樹脂の重量平均分子量100000、ポリアルキレングリコー
ル鎖含有量50重量%の樹脂溶液を得た。この樹脂溶液を
用いて実施例1と同様にして練合と塗布を行い、PET
フィルム上に2μm厚の透明被膜を作製した。
(Comparative Example 8) In the same manner as in Example 1, from 60 parts of xylene, 10 parts of styrene, 10 parts of methyl acrylate, 20 parts of polyethylene glycol monomethacrylate and 0.6 part of azobisisobutyronitrile, a nonvolatile content was obtained. 40% by weight,
A resin solution having a resin weight average molecular weight of 100,000 and a polyalkylene glycol chain content of 50% by weight was obtained. Using this resin solution, kneading and coating were performed in the same manner as in Example 1, and PET was used.
A 2 μm thick transparent coating was prepared on the film.

【0050】(比較例9)溶媒をキシレン単独に変更した
以外は、実施例5と同様にして練合と塗布を行い、PE
Tフィルム上に2μm厚の透明被膜を作製した。
Comparative Example 9 Kneading and coating were carried out in the same manner as in Example 5 except that the solvent was changed to xylene alone.
A 2 μm thick transparent coating was prepared on the T film.

【0051】(比較例10)溶媒をブタノール単独に変更し
た以外は、実施例5と同様にして練合と塗布を行い、P
ETフィルム上に2μm厚の透明被膜を作製した。
(Comparative Example 10) Kneading and coating were conducted in the same manner as in Example 5 except that the solvent was changed to butanol alone.
A 2 μm thick transparent coating was prepared on the ET film.

【0052】(実施例8)実施例1と同様な方法でキシレ
ン60部、スチレン14.5部、アクリル酸メチル10.0部、ア
クリル酸0.5部、メトキシポリエチレングリコールメタ
クリレート15部およびアゾビスイソブチロニトリル2.0
部から、不揮発分44重量%、樹脂の重量平均分子量1000
0 、酸価9.7 、ポリアルキレングリコール鎖含有量30重
量%の樹脂溶液を得た。この樹脂溶液を用いて実施例1
と同様にして練合と塗布を行い、PETフィルム上に2
μm厚の透明被膜を作製した。
Example 8 By the same method as in Example 1, 60 parts of xylene, 14.5 parts of styrene, 10.0 parts of methyl acrylate, 0.5 part of acrylic acid, 15 parts of methoxypolyethylene glycol methacrylate and azobisisobutyronitrile. 2.0
Part, nonvolatile content 44% by weight, resin weight average molecular weight 1000
A resin solution having an acid value of 0, an acid value of 9.7 and a polyalkylene glycol chain content of 30% by weight was obtained. Example 1 using this resin solution
Kneading and coating are performed in the same manner as above, and 2 on the PET film.
A transparent coating having a thickness of μm was prepared.

【0053】(実施例9)実施例1と同様な方法でキシレ
ン60部、スチレン14.95 部、アクリル酸メチル10.0部、
アクリル酸0.05部、メトキシポリエチレングリコールメ
タクリレート15部およびアゾビスイソブチロニトリル0.
6部から、不揮発分40重量%、樹脂の重量平均分子量10
0000、酸価1.0、ポリアルキレングリコール鎖含有量30
重量%の樹脂溶液を得た。この樹脂溶液を用いて実施例
1と同様にして練合と塗布を行い、PETフィルム上に
2μm厚の透明被膜を作製した。
Example 9 By the same method as in Example 1, 60 parts of xylene, 14.95 parts of styrene, 10.0 parts of methyl acrylate,
Acrylic acid 0.05 parts, methoxy polyethylene glycol methacrylate 15 parts and azobisisobutyronitrile 0.
From 6 parts, nonvolatile content 40% by weight, resin weight average molecular weight 10
0000, acid value 1.0, polyalkylene glycol chain content 30
A wt% resin solution was obtained. Using this resin solution, kneading and coating were carried out in the same manner as in Example 1 to prepare a 2 μm thick transparent coating film on the PET film.

【0054】(実施例10)実施例1と同様な方法でキシレ
ン60部、スチレン20部、アクリル酸メチル18.95 部、ア
クリル酸0.05部、ポリエチレングリコールモノメタクリ
レート1.0部およびアゾビスイソブチロニトリル0.6部
から、不揮発分40重量%、樹脂の重量平均分子量10000
0、酸価1.0 、ポリアルキレングリコール鎖含有量2.0
重量%の樹脂溶液を得た。この樹脂溶液を用いて実施例
1と同様にして練合と塗布を行い、PETフィルム上に
2μm厚の透明被膜を作製した。
Example 10 In the same manner as in Example 1, 60 parts of xylene, 20 parts of styrene, 18.95 parts of methyl acrylate, 0.05 part of acrylic acid, 1.0 part of polyethylene glycol monomethacrylate and azobisisobutyronitrile. From 0.6 parts, nonvolatile content 40% by weight, resin weight average molecular weight 10000
0, acid value 1.0, polyalkylene glycol chain content 2.0
A wt% resin solution was obtained. Using this resin solution, kneading and coating were carried out in the same manner as in Example 1 to prepare a 2 μm thick transparent coating film on the PET film.

【0055】(実施例11)樹脂中におけるポリエチレング
リコール鎖の含有量が5重量%、不揮発分60重量%、重
量平均分子量 30000、酸価5のポリエステル樹脂30部、
ITO 80.0 部、ブタノール/キシレンの重量比が4/
6である混合溶媒 140.0部を用いて実施例1と同様にし
て練合と塗布を行い、PETフィルム上に2μm厚の透
明被膜を作製した。
Example 11 30 parts of a polyester resin having a polyethylene glycol chain content of 5% by weight, a nonvolatile content of 60% by weight, a weight average molecular weight of 30,000 and an acid value of 5 in the resin,
80.0 parts ITO, butanol / xylene weight ratio 4 /
Kneading and coating were carried out in the same manner as in Example 1 using 140.0 parts of the mixed solvent of No. 6 to prepare a transparent coating film having a thickness of 2 μm on the PET film.

【0056】(比較例11)実施例1と同様な方法でキシレ
ン60部、スチレン14.5部、アクリル酸メチル10.0部、ア
クリル酸0.5部、メトキシポリエチレングリコールメタ
クリレート15部およびアゾビスイソブチロニトリル3.0
部から、不揮発分42重量%、樹脂の重量平均分子量500
0、酸価9.7 、ポリアルキレングリコール鎖含有量30重
量%の樹脂溶液を得た。この樹脂溶液を用いて実施例1
と同様にして練合と塗布を行い、PETフィルム上に2
μm厚の透明被膜を作製した。
Comparative Example 11 By the same method as in Example 1, 60 parts of xylene, 14.5 parts of styrene, 10.0 parts of methyl acrylate, 0.5 part of acrylic acid, 15 parts of methoxypolyethylene glycol methacrylate and azobisisobutyronitrile. 3.0
Part, nonvolatile content 42% by weight, resin weight average molecular weight 500
A resin solution having 0, an acid value of 9.7 and a polyalkylene glycol chain content of 30% by weight was obtained. Example 1 using this resin solution
Kneading and coating are performed in the same manner as above, and 2 on the PET film.
A transparent coating having a thickness of μm was prepared.

【0057】(比較例12)実施例1と同様な方法でキシレ
ン60部、スチレン14.99 部、アクリル酸メチル10.0部、
アクリル酸0.01部、メトキシポリエチレングリコールメ
タクリレート15部およびアゾビスイソブチロニトリル0.
6部から、不揮発分41重量%、樹脂の重量平均分子量10
0000、酸価0.2、ポリアルキレングリコール鎖含有量30
重量%の樹脂溶液を得た。この樹脂溶液を用いて実施例
1と同様にして練合と塗布を行い、PETフィルム上に
2μm厚の透明被膜を作製した。
Comparative Example 12 In the same manner as in Example 1, 60 parts of xylene, 14.99 parts of styrene, 10.0 parts of methyl acrylate,
0.01 parts acrylic acid, 15 parts methoxy polyethylene glycol methacrylate and azobisisobutyronitrile 0.
From 6 parts, non-volatile content 41% by weight, resin weight average molecular weight 10
0000, acid value 0.2, polyalkylene glycol chain content 30
A wt% resin solution was obtained. Using this resin solution, kneading and coating were carried out in the same manner as in Example 1 to prepare a 2 μm thick transparent coating film on the PET film.

【0058】(比較例13)実施例1と同様な方法でキシレ
ン60部、スチレン10部、アクリル酸メチル9.5部、アク
リル酸0.5部、メトキシポリエチレングリコールメタク
リレート20部およびアゾビスイソブチロニトリル0.6 部
から、不揮発分41重量%、樹脂の重量平均分子量10000
0、酸価9.7 、ポリアルキレングリコール鎖含有量50重
量%の樹脂溶液を得た。この樹脂溶液を用いて実施例1
と同様にして練合と塗布を行い、PETフィルム上に2
μm厚の透明被膜を作製した。
Comparative Example 13 In the same manner as in Example 1, 60 parts of xylene, 10 parts of styrene, 9.5 parts of methyl acrylate, 0.5 part of acrylic acid, 20 parts of methoxypolyethylene glycol methacrylate and azobisisobutyronitrile. From 0.6 parts, nonvolatile content 41% by weight, resin weight average molecular weight 10000
A resin solution having 0, an acid value of 9.7 and a polyalkylene glycol chain content of 50% by weight was obtained. Example 1 using this resin solution
Kneading and coating are performed in the same manner as above, and 2 on the PET film.
A transparent coating having a thickness of μm was prepared.

【0059】(比較例14)実施例1と同様な方法でキシレ
ン60部、スチレン14.5部、アクリル酸メチル10部、アク
リル酸0.5部、メトキシポリエチレングリコールメタク
リレート15部およびアゾビスイソブチロニトリル0.3部
から、不揮発分41重量%、樹脂の重量平均分子量20000
0、酸価9.7 、ポリアルキレングリコール鎖含有量30重
量%の樹脂溶液を得た。この樹脂溶液を用いて実施例1
と同様にして練合と塗布を行い、PETフィルム上に2
μm厚の透明被膜を作製した。
Comparative Example 14 By the same method as in Example 1, 60 parts of xylene, 14.5 parts of styrene, 10 parts of methyl acrylate, 0.5 part of acrylic acid, 15 parts of methoxypolyethylene glycol methacrylate and azobisisobutyronitrile. From 0.3 parts, non-volatile content 41% by weight, resin weight average molecular weight 20000
A resin solution having 0, an acid value of 9.7 and a polyalkylene glycol chain content of 30% by weight was obtained. Example 1 using this resin solution
Kneading and coating are performed in the same manner as above, and 2 on the PET film.
A transparent coating having a thickness of μm was prepared.

【0060】(比較例15)樹脂中におけるポリエチレング
リコール鎖の含有量が5重量%、不揮発分60重量%、重
量平均分子量40000 、酸価0.2のポリエステル樹脂30
部、ITO 80.0部、ブタノール/キシレンの重量比が
4/6である混合溶媒 140.0部を用いて実施例1と同様
にして練合と塗布を行い、PETフィルム上に2μm厚
の透明被膜を作製した。
(Comparative Example 15) A polyester resin having a polyethylene glycol chain content of 5% by weight, a nonvolatile content of 60% by weight, a weight average molecular weight of 40,000 and an acid value of 0.2.
Parts, 80.0 parts of ITO, and 140.0 parts of a mixed solvent having a butanol / xylene weight ratio of 4/6 are kneaded and applied in the same manner as in Example 1 to form a transparent film having a thickness of 2 μm on a PET film. did.

【0061】前記の各実施例および比較例で得た透明被
膜について、その全光線透過率を日本分光 (株) の UBE
ST 55 型分光光度計で、ヘーズをスガ試験機 (株) 製の
SMカラーコンピューターで、そして表面抵抗値を三菱油
化 (株) 製のローレスタAP MCP-T400 表面抵抗測定器で
それぞれ測定した。表1に試験結果を示す。また、実施
例で得たITO粉末が分散した粘稠性液状物は、いずれ
も室温で1ヵ月間放置した後、ディスパーの攪拌により
容易に元の分散状態に戻った。
The total light transmittances of the transparent coatings obtained in each of the above Examples and Comparative Examples were measured by UBE of JASCO Corporation.
The ST 55 type spectrophotometer was used to measure haze from Suga Test Instruments Co., Ltd.
The surface resistance was measured with an SM color computer and with a Loresta AP MCP-T400 surface resistance measuring instrument manufactured by Mitsubishi Petrochemical Co., Ltd., respectively. Table 1 shows the test results. The viscous liquids in which the ITO powders obtained in Examples were dispersed were allowed to stand for 1 month at room temperature and then easily returned to the original dispersion state by stirring with a disper.

【0062】[0062]

【表1】 [Table 1]

【0063】[0063]

【発明の効果】本発明に従って、使用樹脂の重量平均分
子量が8000〜150000であり、樹脂の酸性官能基による酸
価が0.5〜15mgKOH/g および/または樹脂中のポリアル
キレングリコール鎖の含有量が0.5〜40重量%の範囲内
である樹脂とITO粉末および極性溶媒/非極性溶媒の
有機混合溶媒とを用いた導電膜形成用組成物から透明導
電膜を作製すると、表面抵抗値が 102〜104 Ω/□のオ
ーダー、光透過率が80%以上、ヘーズが6%以下の、低
抵抗で透明性に優れた導電膜が得られる。特に、樹脂の
酸価が0.5〜15mgKOH/g 、かつポリアルキレングリコー
ル鎖の含有量が0.5〜40重量%である時には、表面抵抗
値が 102Ω/□のオーダー、光透過率が85%以上、ヘー
ズが3%以下と特性が一層向上する。また、この組成物
は貯蔵時の経時安定性も良好であった。
According to the present invention, the resin used has a weight average molecular weight of 8000 to 150,000, an acid value of 0.5 to 15 mg KOH / g due to the acidic functional group of the resin, and / or the content of a polyalkylene glycol chain in the resin. When a transparent conductive film is prepared from a conductive film-forming composition using a resin having an amount in the range of 0.5 to 40% by weight, an ITO powder, and an organic mixed solvent of a polar solvent / nonpolar solvent, the surface resistance value is Of the order of 10 2 to 10 4 Ω / □, a light transmittance of 80% or more and a haze of 6% or less, and a conductive film having low resistance and excellent transparency can be obtained. Particularly, when the acid value of the resin is 0.5 to 15 mgKOH / g and the content of the polyalkylene glycol chain is 0.5 to 40% by weight, the surface resistance value is on the order of 10 2 Ω / □, the light transmittance is Of 85% or more and haze of 3% or less further improve the characteristics. In addition, this composition had good stability over time during storage.

【0064】従って、本発明の組成物により形成された
透明導電膜は、液晶などの透明電極や太陽電池の窓材
料、赤外線反射膜、帯電防止膜など広範囲な分野に優れ
た効果を発揮することができる。
Therefore, the transparent conductive film formed by the composition of the present invention exhibits excellent effects in a wide range of fields such as transparent electrodes such as liquid crystals, window materials for solar cells, infrared reflective films and antistatic films. You can

フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 // G02F 1/1343 (72)発明者 西原 明 埼玉県大宮市北袋町1丁目297番地 三菱 マテリアル株式会社中央研究所内 (72)発明者 石原 真興 栃木県宇都宮市山本町134−163Continuation of the front page (51) Int.Cl. 6 Identification number Reference number within the agency FI Technical display location // G02F 1/1343 (72) Inventor Akira Nishihara 1-297 Kitabukuro-cho, Omiya-shi, Saitama Mitsubishi Materials Corporation Central In the laboratory (72) Inventor Maoki Ishihara 134-163 Yamamotocho, Utsunomiya City, Tochigi Prefecture

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 酸性官能基を有する樹脂および極性溶媒
と非極性溶媒との混合有機溶媒からなる樹脂溶液中に、
錫を含有する酸化インジウム粉末を分散させた導電膜形
成用組成物であって、前記樹脂の酸価が0.5〜15mgKOH/
g 、その重量平均分子量が8000〜150000である、導電膜
形成用組成物。
1. A resin solution comprising a resin having an acidic functional group and a mixed organic solvent of a polar solvent and a nonpolar solvent,
A composition for forming a conductive film in which an indium oxide powder containing tin is dispersed, wherein the acid value of the resin is 0.5 to 15 mgKOH /
g, a composition for forming a conductive film having a weight average molecular weight of 8,000 to 150,000.
【請求項2】 ポリアルキレングリコール鎖を有する樹
脂および極性溶媒と非極性溶媒との混合有機溶媒からな
る樹脂溶液中に、錫を含有する酸化インジウム粉末を分
散させた導電膜形成用組成物であって、前記樹脂のポリ
アルキレングリコール鎖含有量が0.5〜40重量%、その
重量平均分子量が8000〜150000である、導電膜形成用組
成物。
2. A composition for forming a conductive film, wherein indium oxide powder containing tin is dispersed in a resin solution comprising a resin having a polyalkylene glycol chain and a mixed organic solvent of a polar solvent and a nonpolar solvent. A composition for forming a conductive film, wherein the resin has a polyalkylene glycol chain content of 0.5 to 40 wt% and a weight average molecular weight of 8000 to 150,000.
【請求項3】 酸性官能基とポリアルキレングリコール
鎖の両者を有する樹脂および極性溶媒と非極性溶媒との
混合有機溶媒からなる樹脂溶液中に、錫を含有する酸化
インジウム粉末を分散させた導電膜形成用組成物であっ
て、前記樹脂の酸価が0.5〜15mgKOH/g 、ポリアルキレ
ングリコール鎖含有量が0.5〜40重量%、重量平均分子
量が8000〜150000である、導電膜形成用組成物。
3. A conductive film in which tin-containing indium oxide powder is dispersed in a resin solution composed of a resin having both an acidic functional group and a polyalkylene glycol chain and a mixed organic solvent of a polar solvent and a non-polar solvent. A composition for forming, wherein the resin has an acid value of 0.5 to 15 mgKOH / g, a polyalkylene glycol chain content of 0.5 to 40% by weight, and a weight average molecular weight of 8000 to 150,000. Composition.
【請求項4】 前記錫を含有する酸化インジウム粉末
は、Inに対するSn含有量が1〜15モル%、平均一次粒子
径が0.2μm以下の超微粒子であって、前記樹脂溶液の
不揮発分が5〜50重量%であり、前記混合有機溶媒の極
性溶媒と非極性溶媒の重量比が 0.5/9.5〜7/3 の範囲に
ある、請求項1〜3のいずれかに記載の導電膜形成用組
成物。
4. The indium oxide powder containing tin is ultrafine particles having an Sn content of 1 to 15 mol% with respect to In and an average primary particle diameter of 0.2 μm or less, and the nonvolatile content of the resin solution is 5 to 50% by weight, and the weight ratio of the polar solvent to the nonpolar solvent of the mixed organic solvent is in the range of 0.5 / 9.5 to 7/3, for forming a conductive film according to claim 1. Composition.
JP24890293A 1993-10-05 1993-10-05 Composition for forming conductive film Expired - Lifetime JP3321931B2 (en)

Priority Applications (6)

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JP24890293A JP3321931B2 (en) 1993-10-05 1993-10-05 Composition for forming conductive film
DE4447726A DE4447726B4 (en) 1993-10-05 1994-10-04 Compsn. for forming a conductive film
DE4435376A DE4435376B4 (en) 1993-10-05 1994-10-04 Composition for forming conductive films
US08/317,363 US5504133A (en) 1993-10-05 1994-10-04 Composition for forming conductive films
KR1019940025782A KR0180249B1 (en) 1993-10-05 1994-10-05 Composition for forming conductive films
KR1019980030093A KR100190465B1 (en) 1993-10-05 1998-07-27 Composition for forming conductive films

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
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Publication Number Publication Date
JPH07102177A true JPH07102177A (en) 1995-04-18
JP3321931B2 JP3321931B2 (en) 2002-09-09

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* Cited by examiner, † Cited by third party
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JP2009259674A (en) * 2008-04-18 2009-11-05 Toray Ind Inc Paste composition and conductive composition using same
JP2010087478A (en) * 2008-08-08 2010-04-15 Mitsubishi Materials Corp Composite film for super straight type solar cell and method of manufacturing the same
US8921688B2 (en) 2007-09-12 2014-12-30 Mitsubishi Materials Corporation Composite film for superstrate solar cell having conductive film and electroconductive reflective film formed by applying composition containing metal nanoparticles and comprising air pores of preset diameter in contact surface
JP2016131905A (en) * 2015-01-15 2016-07-25 花王株式会社 Polymer dispersant for inorganic pigment
CN114883025A (en) * 2022-05-05 2022-08-09 株洲火炬安泰新材料有限公司 Low-resistance high-transmittance ITO conductive film

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8921688B2 (en) 2007-09-12 2014-12-30 Mitsubishi Materials Corporation Composite film for superstrate solar cell having conductive film and electroconductive reflective film formed by applying composition containing metal nanoparticles and comprising air pores of preset diameter in contact surface
JP2009259674A (en) * 2008-04-18 2009-11-05 Toray Ind Inc Paste composition and conductive composition using same
JP2010087478A (en) * 2008-08-08 2010-04-15 Mitsubishi Materials Corp Composite film for super straight type solar cell and method of manufacturing the same
JP2016131905A (en) * 2015-01-15 2016-07-25 花王株式会社 Polymer dispersant for inorganic pigment
CN114883025A (en) * 2022-05-05 2022-08-09 株洲火炬安泰新材料有限公司 Low-resistance high-transmittance ITO conductive film
CN114883025B (en) * 2022-05-05 2023-08-22 株洲火炬安泰新材料有限公司 ITO conductive film with low resistance and high transmittance

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