JP3112271B2 - オゾン発生器及びその製造方法 - Google Patents
オゾン発生器及びその製造方法Info
- Publication number
- JP3112271B2 JP3112271B2 JP02007142A JP714290A JP3112271B2 JP 3112271 B2 JP3112271 B2 JP 3112271B2 JP 02007142 A JP02007142 A JP 02007142A JP 714290 A JP714290 A JP 714290A JP 3112271 B2 JP3112271 B2 JP 3112271B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- quartz
- ozone
- ozone generator
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 title claims description 56
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 64
- 239000010453 quartz Substances 0.000 claims description 55
- 239000010410 layer Substances 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 9
- 239000001301 oxygen Substances 0.000 claims description 9
- 229910052760 oxygen Inorganic materials 0.000 claims description 9
- 239000007789 gas Substances 0.000 claims description 8
- 239000000853 adhesive Substances 0.000 claims description 5
- 230000001070 adhesive effect Effects 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 3
- 239000011241 protective layer Substances 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 54
- 239000004065 semiconductor Substances 0.000 description 11
- 239000012535 impurity Substances 0.000 description 8
- 238000005498 polishing Methods 0.000 description 8
- 125000004429 atom Chemical group 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 239000004568 cement Substances 0.000 description 6
- 238000001816 cooling Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000003989 dielectric material Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000012809 cooling fluid Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- -1 for example Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000006385 ozonation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/10—Preparation of ozone
- C01B13/11—Preparation of ozone by electric discharge
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2201/00—Preparation of ozone by electrical discharge
- C01B2201/10—Dischargers used for production of ozone
- C01B2201/12—Plate-type dischargers
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2201/00—Preparation of ozone by electrical discharge
- C01B2201/30—Dielectrics used in the electrical dischargers
- C01B2201/34—Composition of the dielectrics
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2201/00—Preparation of ozone by electrical discharge
- C01B2201/70—Cooling of the discharger; Means for making cooling unnecessary
- C01B2201/74—Cooling of the discharger; Means for making cooling unnecessary by liquid
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S422/00—Chemical apparatus and process disinfecting, deodorizing, preserving, or sterilizing
- Y10S422/907—Corona or glow discharge means
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/298,077 US4970056A (en) | 1989-01-18 | 1989-01-18 | Ozone generator with improved dielectric and method of manufacture |
| US298,077 | 1995-06-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02289402A JPH02289402A (ja) | 1990-11-29 |
| JP3112271B2 true JP3112271B2 (ja) | 2000-11-27 |
Family
ID=23148921
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP02007142A Expired - Fee Related JP3112271B2 (ja) | 1989-01-18 | 1990-01-18 | オゾン発生器及びその製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US4970056A (enExample) |
| JP (1) | JP3112271B2 (enExample) |
| DE (1) | DE4000783A1 (enExample) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2907439B2 (ja) * | 1989-05-09 | 1999-06-21 | 松下電器産業株式会社 | ファインセラミック沿面放電体 |
| US5316639A (en) * | 1989-06-05 | 1994-05-31 | Sachiko Okazaki | Dielectric material used for an ozone generator and a method of forming a film to the dielectric material |
| US5516493A (en) * | 1991-02-21 | 1996-05-14 | Bell; Maxwell G. | Method and apparatus for producing ozone by corona discharge |
| US5236672A (en) * | 1991-12-18 | 1993-08-17 | The United States Of America As Represented By The United States Environmental Protection Agency | Corona destruction of volatile organic compounds and toxics |
| US5549874A (en) * | 1992-04-23 | 1996-08-27 | Ebara Corporation | Discharge reactor |
| US5417936A (en) * | 1992-06-08 | 1995-05-23 | Nippon Ozone Co., Ltd. | Plate-type ozone generator |
| WO1995002472A1 (en) * | 1993-07-16 | 1995-01-26 | Fusion Systems Corporation | Post treatment of a coated substrate with a gas containing excited halogen to remove residues |
| CA2104355C (en) * | 1993-08-18 | 1997-06-17 | Ion I. Inculet | Method and apparatus for ozone generation and treatment of water |
| JP2983153B2 (ja) * | 1994-04-28 | 1999-11-29 | 三菱電機株式会社 | オゾン発生装置 |
| JPH0859210A (ja) * | 1994-08-24 | 1996-03-05 | Ebara Corp | オゾン発生装置 |
| US5637279A (en) * | 1994-08-31 | 1997-06-10 | Applied Science & Technology, Inc. | Ozone and other reactive gas generator cell and system |
| US5512254A (en) * | 1994-12-27 | 1996-04-30 | Landgraf; Peter C. | Floating dielectric plate |
| DE19503200A1 (de) * | 1995-02-02 | 1996-08-08 | Schoenenberg Rolf Prof Dipl In | Vorrichtung zur Ozonerzeugung mit durchschlagsicherem Dielektrikum und geringem Energiebedarf |
| US5641461A (en) * | 1996-01-26 | 1997-06-24 | Ferone; Daniel A. | Ozone generating apparatus and cell therefor |
| US5776553A (en) * | 1996-02-23 | 1998-07-07 | Saint Gobain/Norton Industrial Ceramics Corp. | Method for depositing diamond films by dielectric barrier discharge |
| US6082294A (en) * | 1996-06-07 | 2000-07-04 | Saint-Gobain Industrial Ceramics, Inc. | Method and apparatus for depositing diamond film |
| US5820828A (en) * | 1996-06-28 | 1998-10-13 | Ferone; Daniel A. | Modular ozone distributing system |
| GB9912503D0 (en) * | 1999-05-28 | 1999-07-28 | Ozone Ind Ltd | An ozone generator |
| US20010046459A1 (en) * | 1999-09-21 | 2001-11-29 | St. Onge Benedict B. | High efficiency ozone generator |
| EP1488454B1 (en) * | 2001-02-16 | 2013-01-16 | Ignis Innovation Inc. | Pixel driver circuit for an organic light emitting diode |
| JP2002292273A (ja) * | 2001-04-02 | 2002-10-08 | Canon Inc | プラズマ反応装置及びプラズマ反応方法 |
| EP1436229A1 (en) * | 2001-09-10 | 2004-07-14 | Hag-Joo Lee | Water discharge in a dielectric barrier discharge system to generate an ozonated water |
| US7029637B2 (en) | 2003-01-09 | 2006-04-18 | H203, Inc. | Apparatus for ozone production, employing line and grooved electrodes |
| US7468135B2 (en) * | 2003-01-25 | 2008-12-23 | Engineered Solutions, Inc. | Portable tank wastewater treatment system and method |
| US7718067B2 (en) * | 2005-05-19 | 2010-05-18 | Aero-Stream, Llc | Septic system remediation method and apparatus |
| CN101881465B (zh) * | 2009-05-08 | 2012-05-16 | 清华大学 | 电子点火装置 |
| CN101880030B (zh) * | 2009-05-08 | 2012-06-13 | 清华大学 | 臭氧发生装置 |
| US8568664B2 (en) * | 2009-09-17 | 2013-10-29 | Ralph M. Francis, Jr. | Modular quad cell electro-mechanical ozone generation device |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2822327A (en) * | 1955-03-31 | 1958-02-04 | Gen Electric | Method of generating ozone |
| US3996474A (en) * | 1967-01-04 | 1976-12-07 | Purification Sciences, Inc. | Corona generator apparatus |
| US3607709A (en) * | 1969-03-13 | 1971-09-21 | Air And Water Purification Inc | Ozone generator |
| JPS51103095A (ja) * | 1975-03-08 | 1976-09-11 | Nippon Denshi Zairyo Kk | Ozonhatsuseiki |
| DE8028253U1 (de) * | 1980-10-23 | 1984-04-26 | Ahlbrandt, Andreas, Dipl.-Ing., 6420 Lauterbach | Vorrichtung zum Behandeln der Oberfläche von Gegenständen durch elektrische Sprühentladung |
| JPS58115004A (ja) * | 1981-12-29 | 1983-07-08 | Mitsubishi Electric Corp | 無声放電形オゾン発生装置 |
| DE3247374A1 (de) * | 1982-12-22 | 1984-07-05 | Bruno Bachhofer | Ozonerzeuger mit plattenfoermigen hochspannungs-elektroden |
| JPS60260402A (ja) * | 1984-06-04 | 1985-12-23 | Mitsubishi Electric Corp | 無声放電形オゾン発生装置 |
| JPS61275107A (ja) * | 1985-05-30 | 1986-12-05 | Nippon Ozon Kk | オゾン発生装置 |
| US4774062A (en) * | 1987-01-13 | 1988-09-27 | Alten Corporation | Corona discharge ozonator |
-
1989
- 1989-01-18 US US07/298,077 patent/US4970056A/en not_active Expired - Lifetime
-
1990
- 1990-01-12 DE DE4000783A patent/DE4000783A1/de active Granted
- 1990-01-18 JP JP02007142A patent/JP3112271B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02289402A (ja) | 1990-11-29 |
| US4970056A (en) | 1990-11-13 |
| DE4000783A1 (de) | 1990-07-26 |
| DE4000783C2 (enExample) | 1992-02-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |