JP2864326B2 - Substrate cleaning equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a semiconductor substrate, substrate such as a glass substrate (hereinafter, simply referred to as "substrate") relates to a substrate cleaning apparatus for cleaning a.

[0002]

As a conventional technique of the prior art substrate cleaning apparatus 12
And those shown in FIG. As shown in FIG. 12, a substrate transfer unit 103 for taking out a substrate 109 from a cassette 108 accommodating a plurality of substrates 109 or loading a plurality of substrates 109 into the cassette 108 and a plurality of substrates 109 are collectively assembled. A substrate cleaning processing unit 105 for cleaning by
The apparatus includes a substrate transfer robot 104 that collectively holds and transfers a plurality of substrates 109 between the substrate transfer unit 103 and the substrate cleaning unit 105. In FIG. 12, reference numeral 111 denotes a cassette mounting table, 114 denotes a rotary driving device, 115 denotes a lower opening of the cassette 108, 116
Is a delivery tool insertion hole, 117 is a board delivery tool, 118
Denotes a substrate mounting portion of the substrate transfer tool. In FIG. 13 , reference numeral 101 denotes a cassette carry-in / out stage, 102 denotes a cassette transfer robot, 106 denotes a substrate drying unit, 107 denotes a cassette cleaning unit, 110 denotes a carry-in position, and 112 denotes a carry-out position.

In this type of substrate cleaning apparatus, unwashed substrate was taken out from the cassette 108 by the substrate transfer unit 103 1
09 substrate cleaning unit 105 to a substrate transfer robot 104
Transported, the substrate 109 was cleaned by the substrate cleaning unit 105
Is transported to the substrate drying unit 106 by the substrate transport robot 104, and the dried substrate 109 that has been dried is transported to the substrate transfer unit 103 by the substrate transport robot 104, where it is stored in the cleaned cassette 108.

In this substrate cleaning apparatus, the substrate transfer robot 104 has a structure in which a pair of substrate chucks 149 are provided on the traveling unit main body 146, and the substrate alignment holding grooves 152 are provided on opposing surfaces 150 of the substrate chuck 149. Transport of the uncleaned substrate 109 and the cleaned substrate 1
09 is transported while holding the substrate 109 in the same substrate alignment holding groove 152. The traveling unit main body 146 can be moved up and down freely.
By the lowering of the 46, the unwashed substrate 109 substrate chuck 1
Cleaning tank 1 of substrate cleaning processing unit 105 while holding at 49
74.

[0005]

The above prior art has the following problems. The transport and transport of the cleaned substrate 109 of unwashed substrate 109, both for and performs to hold the substrate 109 in the same substrate alignment holding groove 152 of the substrate chuck opposing surface 150, the unwashed substrate 109 The adhered contaminants are removed from the cleaned substrate 10 through the substrate alignment holding groove 152.
9 adheres. Therefore, the cleaned substrate 109 is contaminated. Also, in the pretreatment cleaning of the oxidation diffusion step, the already cleaned substrate is cleaned, so that the substrate is somewhat clean and does not have the above-described contamination problem, but holds the wet substrate after cleaning. When the dried substrate is held by the substrate chuck 149, there is a problem that a watermark is attached depending on the type of the substrate. The contamination of the substrate and the attachment of the watermark all lower the product yield.

[0006] leave the unwashed substrate 109 held by the substrate chuck 149, since that is adapted to the immersion into the treatment tank 174 of the substrate cleaning unit 105, contaminants adhering to the substrate chuck 149 is brought into the processing tank 174 It is. In addition, the substrate chuck 149 is moved down to transfer the substrate 109 to and from the substrate transfer tool 117.
9 is required to penetrate deep into the processing bath 174, and the hanging dimension of the substrate chuck 149 is relatively long. Therefore, the substrate chuck 149 easily vibrates during the transfer of the substrate, and the substrate 109 and the substrate alignment holding groove 152 slide. Particles are generated and enter the processing tank 174. For this reason, the inside of the processing tank 174 is contaminated, and the product yield is reduced.

The present invention has been made to solve such inconveniences. According to the first aspect of the present invention, it is possible to prevent contamination of a cleaned substrate by a substrate chuck of a substrate transfer robot or to prevent adhesion of a watermark. Substrate cleaning
It is an object to provide a purification apparatus. Further, in the invention of claim 2, in addition to the above problems, it is possible to prevent contamination of the processing tank that by the substrate chuck of the substrate transport robot substrate
An object of the present invention is to provide a cleaning apparatus.

[0008]

A substrate transfer unit for taking out a substrate from a cassette containing a plurality of substrates or loading a plurality of substrates into the cassette;
A substrate comprising: a substrate cleaning processing unit for cleaning a plurality of substrates at once; and a substrate transfer robot for collectively holding and transporting the plurality of substrates between the substrate transfer unit and the substrate cleaning processing unit. The cleaning device is characterized as follows.

[0009] The substrate transfer robot includes a traveling unit main body,
A pair of left and right arm rotation shafts projecting substantially horizontally from the traveling portion main body, shaft rotation means for rotating the pair of arm rotation shafts, and a substrate chuck fixed to each arm rotation shaft are provided. The pair of substrate chucks have a plurality of sets of chuck opposing surfaces, each set of the chuck opposing surfaces has a plurality of substrate alignment holding grooves, and the substrates are collectively held in a standing and aligned state on the chuck opposing surfaces of each set. In addition, the chuck-facing surface of the substrate chuck is held by the rotation of the arm rotation shaft, and the chuck-facing surface holding the substrate before the cleaning process is performed.
And the chuck-facing surface that holds the cleaned substrate,
It is configured to be switchable.

(Invention of claim 2) In the substrate cleaning apparatus of the invention described in claim 1 , the following means are provided. The substrate transfer unit includes a substrate transfer unit, the substrate transfer unit includes an elevating drive unit that drives the substrate mounting unit that holds the substrate up and down, and the substrate transfer unit holds the substrate mounting unit with the substrate mounting unit. The substrate can be moved up and down between a first substrate transfer position for transferring the substrate to the substrate transfer robot and a substrate storing position for storing the substrate in the cassette. The substrate cleaning unit includes a processing tank, the substrate placement base of the substrate to retain, an elevating drive means for vertically driving the substrate placement base, in the lift driving means, said substrate mounting the substrate was retained by置具, a second substrate transfer position for transferring to the substrate transfer robot, the substrate wash for cleaning process by immersion in the treatment bath
It is configured to be able to move up and down with the cleaning processing position.

[0011]

SUMMARY OF THE INVENTION (Invention of Claim 1) For example, when transporting the unwashed substrate, the substrate is supported by a pair of chucks facing surfaces of the plurality of chucks facing surface of the substrate chuck, cleaned substrate Is transported, the substrate is held on another set of chuck-facing surfaces. In other words, not yet
The conveying of the cleaning substrate and the transfer of the cleaned substrate, selectively chuck facing surface for holding the substrate. Alternatively, the cleaning process
Before and after, that is, when transporting a wet substrate and transporting a dry substrate, the chuck-facing surface for holding the substrate is properly used.

(Invention of Claim 2) In addition to the effect of the invention of Claim 1, the following operation is performed. First, an uncleaned substrate accommodated in a cassette is held by a substrate transfer tool, and is lifted and transferred to a substrate transfer robot. Then, the unwashed substrate is transported to the substrate cleaning unit by the substrate transport robot passes unwashed substrate rises and has processed substrate placement base. Subsequently lowers the substrate placement base, to position the uncleaned board in substrate cleaning position of the processing tank, performs immersed in washing the washing liquid. Then, when the substrate cleaning processing in the processing tank is completed, the processing substrate mounting tool is raised, the cleaned substrate is positioned at the second substrate transfer position, and transferred to the substrate transfer robot. Next, the cleaned substrate is transferred to the first substrate transfer position by the substrate transfer robot, held by the substrate mounting portion of the raised substrate transfer tool, and subsequently lowered to be cleaned. The substrate is placed in the cleaned cassette.

[0013]

[Effect of the Invention] In the conveyance of the cleaned substrate (the claimed invention in claim 1) conveying the unwashed substrate, by switching the chucking surface facing the substrate transfer chuck, Not
It can be contaminants adhering to the cleaning substrate to prevent contamination of the cleaned substrate due to transition to the cleaned substrate via a substrate transfer chuck. Alternatively, before cleaning
Later, that is, by properly using the chuck-facing surface between the wet substrate and the dry substrate, it is possible to effectively prevent the above-described adverse effects due to the watermark. As a result, the yield of products can be increased.

(Invention of claim 2) In addition to the effect of the invention of claim 1, the following effect is obtained. Not washed
By to lift holds the processing substrate placement base of the purification substrate substrate cleaning unit, it is not necessary to immerse the substrate chuck of the substrate transport robot which holds the substrate to the cleaning solution in the processing tank, attached to the substrate chuck No contaminants are brought into the treatment tank. In addition, since there is no need for the substrate chuck to enter the processing bath, the dimensions of the substrate chuck can be shortened, the substrate chuck is less likely to vibrate during the transport of the substrate, and particles generated by sliding between the substrate and the substrate alignment holding groove of the substrate chuck. And the intrusion of particles into the processing tank is reduced. As a result, contamination in the processing tank is reduced, the state of cleaning processing of the substrate is improved, and the yield of products is further increased.

[0015]

An embodiment of the present invention will be described with reference to the drawings.
As shown in FIG. 11, the substrate cleaning apparatus according to this embodiment includes a cassette loading / unloading stage 1, a cassette transport robot 2, a substrate transfer section 3, a substrate transport robot 4, a substrate cleaning section 5, A substrate drying unit 6 and a cassette cleaning unit 7
And The cassette 8 used in this embodiment is provided with a substrate alignment receiving groove inside so that a plurality of substrates 9 can be stored in an upright alignment state. Hereinafter, the configuration of each unit will be described.

In this substrate cleaning apparatus, when a cassette 8 containing an uncleaned substrate 9 is loaded into the loading position 10 of the cassette loading / unloading stage 1 from outside the substrate cleaning processing apparatus, two cassettes 8 are transferred to the cassette. The robot 2 transports the unwashed substrates 9 of the two cassettes 8 from the cassette 8 via a substrate transfer device 17 to be described later. Hand over to 4.

The substrate transfer robot 4 carries the unwashed <br/> substrate 9 received the substrate cleaning unit 5, the substrate cleaning unit 5
In washing, the washed substrate 9 is again dried by conveying the substrate drying unit 6 in the substrate transfer robot 4, transported to the substrate transfer unit 3 in the substrate conveying robot 4 again. On the other hand, an empty cassette 8 taken unwashed substrate 9 by the substrate transfer unit 3 above is washed is transported to the cassette the cleaning unit 7 with the cassette transport robot 2. Then, the cleaned cassette 8 is transferred to the cassette mounting table 1 of the substrate transfer section 3 by the cassette transfer robot 2.
Convey to 1. In the substrate transfer section 3, the cleaned substrate 9 is transferred to the cleaned cassette 8, and the cassette 8 is transported to the unloading position 12 of the cassette loading / unloading stage 1 by the cassette transport robot 2, and from there the outside of the substrate cleaning apparatus. To be carried out.

As described above, in this substrate cleaning apparatus,
The cassette 8 is transported between the cassette loading / unloading stage 1 and the cassette mounting table 11 by the cassette transport robot 2, but the cassette loading / unloading stage 1 takes a loading / unloading posture as shown in FIG. in the cassette 8, accommodated attitude of the substrate 9 of the substrate 9 in the substrate cleaning unit 5
The direction is orthogonal to the cleaning processing posture in plan view. The cassette transport robot 2 uses a mechanism for transporting the cassette 8 by inverting the cassette 8 by 180 ° between the cassette mounting table 11 and the cassette loading / unloading stage 1.

For this reason, before the substrate is washed , the cassette 8 which takes the loading posture at the loading position 10 of the cassette loading / unloading stage 1 is set.
By the cassette transport robot 2
Parallel when transported, will posture accommodating attitude of the unwashed substrate 9 in the cassette 8 on the cassette mounting table 11 is orthogonal in plan view with respect to the cleaning position, in the posture of the left and cleaning attitude substrate 9 The uncleaned substrate 9 cannot be transferred to the substrate transport robot 4 that transports the substrate while holding it in a proper posture. Also, when the cassette 8 is transported from the cassette mounting table 11 to the unloading position 12 of the cassette loading and unloading stage 1 by the cassette transfer robot 2 after the substrate cleaning , the cassette 8 is set to the unloading position at the unloading position 12. It is necessary to keep the cassette 8 on the cassette mounting table 11 180 ° inverted with respect to the unloading attitude, but the cleaned cassette 8 is mounted on the cassette mounting table 11 in such an attitude. in this case, since the substrate housing direction of the cleaned cassette 8 is in a direction orthogonal in plan view with respect to the cleaning position, washing the substrate 9 in a posture of the left
The cleaned substrate 9 cannot be received in the cleaned cassette 8 from the substrate transfer robot 4 that transfers the substrate while maintaining the posture parallel to the cleaning processing posture.

For this reason, in this substrate cleaning apparatus, a turntable 13 is provided on the cassette mounting table 11 of the substrate transfer section 3. The configuration of the substrate transfer unit 3 is as follows. That is, as shown in FIG. 2, two turntables 13 are provided at two cassette mounting positions of the cassette mounting table 11, and this turntable 13 is interlocked and connected to a rotation driving device 14 described later. The turntable 13 is rotated by 90 °. As shown in FIG. 1, a delivery tool insertion hole 16 facing the lower opening 15 of the cassette 8 is formed in the center of the turntable 13, and the substrate delivery tool 17 is set upright below the delivery tool insertion hole 16. And a substrate mounting portion 1 for holding a plurality of substrates 9 in an upright alignment state on the upper end portion of the substrate transfer tool 17.
8 are provided. The board transfer tool 17 is provided with a vertical feed screw shaft 1 that is interlocked with a vertical drive unit 85 (a vertical drive motor).
A plurality of substrates 9 are provided on an elevating table 20 interlockingly connected to the substrate 9, and are held in an upright and aligned state by a substrate placement unit 18 by elevating and lowering a substrate transfer tool 17. A plurality of substrates 9 can be collectively transferred between them.

In the substrate transfer section 3, as shown in FIG. 2, before cleaning the substrate, the cassette transfer robot 2 turns the turntable 1 from the loading position 10 of the cassette loading / unloading stage 1.
The orientation of the cassette 8 that has been transported to 3, and 90 ° direction change by the rotation of a direction of the turntable 13, cleaning of the substrate 9 of the accommodating attitude of the unwashed substrate 9 in the cassette 8 by the substrate cleaning unit 5 and parallel to the processing position, by increasing the shown to board transfer device 17 in FIG. 1, while holding the unwashed <br/> substrate 9 on the substrate platform 18, unwashed substrate above the cassette 8 9 was removed, without rotating the substrate transfer device 17, it passes the unwashed substrate 9 in the cassette 8 to the substrate conveying robot 4.

After the substrate is washed and dried, the cleaned cassette 8 transported from the cassette cleaning section 7 shown in FIG. 11 to the turntable 13 by the cassette transport robot 2 is turned from the position shown in FIG. rotation of a direction by converting 90 ° direction of the table 13, the substrate housing direction and parallel to the cleaning position, as shown in FIG. 1, substrate transfer was positioned below the cleaned cassette 8 instrument 1
7 is raised, and the substrate transport robot 4
In is conveyed by holding the cleaned substrate 9 has, lowers the substrate delivery device 17 in this state, the substrate transfer device 1
The washed substrate 9 is transferred into the washed cassette 8 without rotating the 7. And as shown in FIG.
The cleaned cassette 8 accommodating the cleaned substrate 9 is turned 90 ° by the rotation of the turntable 13 in the direction b, is brought to the posture shown in the figure, and is transported by the cassette transport robot 2 to the unloading position 12 of the cassette loading / unloading stage 1. Then, the cassette 8 assumes the unloading posture at the unloading position 12.

As described above, in the substrate transfer section 3, FIG.
As shown in (1), when the substrate 9 is transferred between the cassette 8 and the substrate transfer robot 4, it is not necessary to rotate the substrate transfer tool 17, so that the substrate held on the substrate mounting portion 18 of the substrate transfer tool 17 is not necessary. The posture of 9 does not shift. In addition, when changing the direction of the substrate 9, the turntable 13 is held while the substrate 9 is stably stored and held in the cassette 8.
Is rotated, so that the rotation speed of the turntable 13 can be set high without fear of a displacement of the posture of the substrate 9.

The specific structure of the turntable 13 of the substrate transfer section 3 and the rotation driving device 14 is as follows. As shown in FIG. 3A, the turntable 13 is mounted on the base plate 21 of the cassette mounting table 11 with the bearing 2.
It is rotatably mounted via 2. A rotary drive device 14 for rotating the turntable 13 uses a rotary drive motor, and a pinion gear 24 fixed to the output shaft 23 is externally fixed to the turntable 13.
5, the rotation angle is set to 90 °, and the turntable 13 is rotated as shown in FIG. 3 (C).

As shown in FIG. 3B, a cassette positioning frame 26 is formed on the turntable 13 along the three sides of the rectangular delivery tool insertion hole 16 in plan view.
And forming a shape, the cassette clamp 27 provided on one remainder of the periphery, are as the cassette 8 can be positioned fixed to the proper correct position on the turntable 13.
In this embodiment, a rotary drive motor is used for the rotary drive device 14. Instead, as shown in FIGS. 3D and 3E, a rotary drive air cylinder is used for the rotary drive device 14. You may. In FIG. 3D, a rack gear 29 is attached to a piston 28 of a rotary drive cylinder, and the rack gear 29 is meshed with a ring gear 25 that is externally fixed to the turntable 13. In FIG. 3E, the piston 28 of the rotary driving air cylinder is pivotally mounted on a ring 30 externally fitted and fixed to the turntable 13.

As shown in FIG. 4A, a box 33 is attached to the upper end of a pipe 32 erected on a pipe support table 31. Is provided on the upper surface. This substrate mounting portion 18
Is composed of an elevating mounting part 38 and a fixed mounting part 39 for holding a plurality of substrates in a standing and aligned state, respectively. The lifting and lowering section 38 is composed of two parts, and the fixed placing section 39 is composed of three parts. The fixed mounting portion 39 has three fixed seats 34 fixed to the center and both sides of the upper surface of the box 33, and the elevating mounting portion 38 has two fixed seats 35 disposed between the fixed seats 34. It is attached.

The elevating seat 35 is fixed to the upper end of an elevating rod 36 penetrating through the pipe 32, and the elevating rod 36 is connected to an elevating drive device 37 attached to the pipe support 31. The lifting drive device 37 uses a lifting cylinder. That is, the two lifting / lowering mounting portions 38 constituting the substrate mounting portion 18 are switched between a rising position protruding above the fixed mounting portion 39 and a lowering position sinking below the fixed mounting portion 39. It is possible. For example, in FIG.
If when the the cassette 8 passes unwashed substrate 9 to the substrate conveying robot 4, and a raised position lifting mounting portion 38, to pass the cleaned substrate 9 from the substrate conveying robot 4 into the cleaned cassette 8 Sets the lifting / lowering mounting portion 38 to the lowered position.

According to the above construction, when the transfer of unwashed substrate 9 is held in the portion 38 mounting the lift is unwashed substrate 9, the cleaning does not touch the fixed mounting portion 39, the fixed mounting portion 39 Not There is no contamination by the contaminants attached to the substrate 9. Then, when the cleaned substrate 9 is delivered, the cleaned substrate 9 is held on the non-contaminated fixed mounting portion 39, so that contamination of the cleaned substrate 9 is prevented. Conversely, passing the unwashed substrate 9 by a fixed mounting portion 39 of the lift mounting portion 38 as a lowered position, it is also possible to pass the cleaned substrate 9 lifting mounting portion 38 as a raised position, in this case Similarly, contamination of the cleaned substrate 9 can be prevented.

The lifting / lowering mounting portion 38 and the fixed mounting portion 39
As shown in FIG. 4 (C), the substrate 9
Major surface direction and substrate alignment holding grooves 90 of the substrate alignment housing groove and the same pitch cassette 8 has a (parallel to the plane in FIG. 4) is provided, also, release opening of the substrate alignment holding groove 90 The upper edge portion 92 is chamfered in a C shape to facilitate holding of the substrate. Further, as shown in FIG. 4B, the two lifting / lowering mounting portions 38 and the three fixed mounting portions 39 are formed by cutting the integrally processed normal substrate mounting portion 18 along a chain line portion. Can be easily manufactured.

As shown in FIG. 4B, the substrate aligning and holding groove 90 having a shape along the outer periphery of the substrate 9 held therein is cut out in the elevating and lowering mounting portion 38 and the fixed mounting portion 39. The substrate alignment holding groove 90 includes a straight portion 95 corresponding to the orientation flat of the substrate 9 and a curved portion 96 other than the straight portion 95. That is, a straight portion 95 corresponding to the orientation flat of the substrate 9 is cut out between the central fixed mounting portion 39 and the elevating mounting portions 38 on both sides thereof, and the outer fixed portion is fixed from the elevating mounting portion 38. Mounting part 3
9, a curved portion 96 is cut out. In other words, since the lifting / lowering mounting portions 38 have the linear portion 95 and the curved portion 96 and the fixed mounting portion 39 has the linear portion 95 and the bending portion 96, the lifting / lowering mounting portion 38 or the fixed mounting portion Even when the substrate 9 is held by any of the mounting portions 39, the rotation of the substrate 9 can be prevented.

In the above embodiment, the substrate transfer device 1
7 is composed of the elevating mounting part 38 and the fixed mounting part 3.
9, the lifting / lowering mounting part 38 moves up and down and the fixed mounting part 3
Although the description has been made assuming that 9 is fixed, both can be configured to be able to move up and down.

As shown in FIG. 5, two board transfer tools 17 are provided to transfer the board 9 between the two cassettes 8 and the board transfer robot 4. The two substrate transfer tools 17 can be shifted in width by a shifter 42. The configuration of the width shifting device 42 is as follows. As shown in FIG. 6A, the two pipe supports 31 are slidably supported by guide rails 43 on the elevating platform 20, and the two pipe supports 31 are connected by a linking link mechanism 44. As shown in FIG. 6 (A), the width-adjusting link mechanism 44 pivotally connects the center of the link arm 83 to a support shaft 82 vertically suspended from the center of the elevating platform 20, and both ends of the link arm 83 and both ends thereof. A link rod 84 is interposed between the pipe support table 31 and the pipe support base 31. And FIG.
As shown in (B), one of the pipe support bases 31 is interlockingly connected to the width shifting drive cylinder 45 attached to the lift 20.

In this width shifting device 42, when the width shifting drive cylinder 45 is reduced, one of the pipe support bases 31 connected thereto moves toward the center of the elevating platform 20 and at the same time via the width shifting link mechanism 44. The other pipe support table 31 also moves toward the center side of the lift table 20, and both substrate transfer tools 17
Is narrowed down. In addition, when the width shifting drive cylinder 45 is extended, both the board transfer tools 17 move away from each other. In the width shifting device 42, as shown in FIG.
Of the pre-cleaning process, when passing from within two cassettes 8 unwashed <br/> substrate 9 of two groups in the substrate conveying robot 4, the respective substrate mounting part 18 of the two pieces of substrate transfer device 17 The group of unwashed substrates 9 is held, and both substrate transfer tools 17 are held.
Are brought closer to each other, and they are transferred to the substrate transfer robot 4 without forming a large gap between the two groups of uncleaned substrates 9. Further, after the substrate cleaning process, when transferring the cleaned substrates 9 for the two cassettes 8 from the substrate transport robot 4 to the two cleaned cassettes 8, the cleaned substrates 9 transported by the substrate transport robot 4 are removed. Then, the two substrate transfer tools 17 that have been shifted in width above the cassette 8 are held by the two substrate mounting portions 18, the two substrate transfer tools 17 are separated, and the cleaned substrates 9 are separated into two groups. Each group is accommodated in two washed cassettes 8.

Next, the configuration of the substrate transfer robot 4 will be described. As shown in FIG. 1, the substrate transfer robot 4 rotates the traveling unit body 46, a pair of left and right arm rotation shafts 47 projecting substantially horizontally from the traveling unit body 46, and rotates the pair of arm rotation shafts 47. A shaft rotating means 48 and a pair of substrate chucks 49 fixed to each arm rotating shaft 47 are provided. In the pair of substrate chucks 49, substrate alignment holding grooves 52 and 53 having the same pitch as the array pitch of the substrate alignment accommodation grooves of the cassette 8 are formed on the pair of chuck opposing surfaces 50 and on the back surfaces of the chuck opposing surfaces 51, respectively. Then, by rotating the arm rotation shaft 47, the substrate chuck 49 can be switched to an inverted U-shaped substrate holding posture in which the pair of chuck opposing surfaces 50 and the opposing chuck opposing surfaces 51 thereof face each other. It is. Note that the arrangement pitch of the substrate alignment holding grooves 52 and 53 on the chuck facing surfaces 50 and 51 does not necessarily have to be the same as the arrangement pitch of the substrate alignment accommodation grooves of the cassette 8, and is 当 該 of the arrangement pitch of the cassette 8. The arrangement pitch may be used. This is because the substrate 9 taken out of the cassette 8 may be converted into half by an arrangement pitch converter or the like.

In the substrate transfer robot 4, when transferring the uncleaned substrate 9, the pair of chuck facing surfaces 50 of the substrate chuck 49 face each other, and when transferring the cleaned substrate 9, the back surface is used. Are switched to a posture in which the chuck facing surfaces 51 face each other. In this way, during transport of the unwashed substrate 9 without substrate alignment holding groove 53 of the back surface of the chuck facing surface 51 is contaminated with contaminants adhering to the unwashed substrate 9, cleaned substrate 9
During the transfer, contamination of the cleaned substrate 9 is prevented.

[0036] The substrate cleaning apparatus according to the present invention,
It can also be applied as a pretreatment cleaning device in the oxidation diffusion step. In this case, the already cleaned substrate is cleaned, so that the substrate is somewhat clean and has no cross-contamination. Rather than prevention, the substrate chuck 49 can be selectively used before and after the cleaning process, that is, for holding a wet substrate and holding a dry substrate, as described later.

The specific structure of the substrate chuck 49 is as follows. As shown in FIG.
Are end plates 5 at both ends of a plate-like chuck body 54.
The arm rotation shaft 47 is inserted and fixed to the center of the chuck body 54 and the center of the end plate 55. A pair of reinforcing pipes 59 is provided between the end plates 55.
Are mounted in parallel, and this is inserted into the chuck body 54 and fixed. As shown in FIG. 7B, both the substrate alignment holding grooves 52 and 53 of the chuck body 54 are formed in an arc shape along the peripheral edge of the substrate 9. Further, as shown in FIG. 7C, the release edges 57 of the substrate alignment holding grooves 52 and 53 are chamfered in a C-shape. This substrate chuck 4
Reference numeral 9 denotes a substrate alignment holding groove 5 as shown in FIGS.
A groove forming pipe 58 around which 2 and 53 are provided at an equal pitch may be externally fitted to the reinforcing pipe 59. In this case, by screwing the end plate 55 to the reinforcing pipe 59, the groove forming pipe 58 can be pinched and fixed between both end plates 55.

As shown in FIG. 8A, a pair of shaft rotation motors is used for the shaft rotation means 48 for rotating the arm rotation shaft 47. The motor for rotating the shaft is fixed to the traveling unit main body 46, the arm rotating shaft 47 is connected to each output shaft 60 by a shaft joint 61, and the two arm rotating shafts 47 are individually rotated and linked. A travel drive motor is used as the travel drive means 62 of the travel section body 46. This traveling drive motor is fixed to a fixed machine frame 63,
A drive pulley 65 is attached to the output shaft 64, and an interlock belt 66 is wound between an idle pulley (not shown) pivotally attached to the fixed machine frame 63 and the drive pulley 65.
The traveling unit body 46 is attached to the main body. FIG. 8B
As shown in FIG. 7, the traveling unit main body 46 is slidably mounted on a guide rail 67 provided on the fixed machine frame 63.

As shown in FIG. 8C, the substrate transfer robot 4 uses a single shaft rotation motor for the shaft rotation means 48 and engages a reversing gear 69 with a driving gear 68 attached to an output shaft 60 thereof. The input gear 70 attached to one arm rotation shaft 47 may mesh with the drive gear 68, and the input gear 71 attached to the other arm rotation shaft 47 may mesh with the reversing gear 69. FIG.
As shown in (D), the traveling drive motor, which is the traveling drive means 62, is attached to the traveling section body 46, and the pinion gear 72 attached to the output shaft 64 meshes with the rack gear 73 attached to the fixed machine frame 63. The main body 46 may be self-propelled.

FIGS. 9A to 9D show a substrate chuck 49.
The following shows a modified example. The modification shown in FIG. 7A takes into consideration the case where the substrate chuck 49 is selectively used for holding a dry substrate and holding a wet substrate, and is provided at both upper and lower ends of the chuck main body 54 in FIG. Liquid stopping groove 54a running in the front-back direction
Is formed by recessing. According to this modification, when the substrate 9 after the immersion processing is held in the substrate cleaning processing unit 5 described later, the droplets adhering to the substrate 9 cause the substrate alignment holding grooves 53
And is introduced into the liquid stopping groove 54a. Therefore,
When the dry substrate 9 is held by the other pair of chuck-facing surfaces 50, the liquid retaining groove 54a is positioned above the liquid retaining groove 54a. To prevent the liquid from flowing down and to prevent it from adhering to the dry substrate 9. The liquid retaining groove 54a is formed similarly in the modified examples of FIGS. 9 (B) to 9 (D).

A modified example of FIG.
7A is constituted by a rod member having a substantially rectangular cross section instead of the plate member in FIG. 7A. The arm rotation shafts 47 are separated from each other by an actuator 47a described later, and the arm rotation shaft 47 is rotated. Chuck facing surfaces 50a and 50b
Is configured to be switched. 9C, the chuck main body 54 is configured to hold the substrate 9 at the center instead of the chuck main body 54 shown in FIG. 9B, and the other points are the same as those of FIG. 9B. It is configured similarly. Further, in the modification of FIG. 9D, the chuck body 54
9C is constituted by a rod member having a substantially triangular cross section in place of that of FIG. 9C, and three sets of chuck opposing surfaces 50a, 50b, and 50c are switched. It is configured in.

FIG. 10 is a perspective view showing a means for separating and rotating the arm rotation shaft 47. As shown in FIG. 10, the pair of arm rotating shafts 47 are respectively provided on a pair of left and right bases 46b, 46b, and each base 46b is mounted on the traveling unit body 46 by a pair of left and right actuators 48b, 48b. A pair of front and rear guide rails 67b provided at
Is provided so as to be movable along. Other points are the same as those in FIG.

The substrate cleaning processing unit 5 is shown in FIGS.
As shown in FIG. 1, three processing tanks 74 are provided, and these processing tanks 74 are configured as overflow tanks that enable so-called single bath processing. Each processing tank 74 is provided with a processing substrate mounting tool 75 for supporting the substrate 9. The processing substrate mounting tool 75 can be moved up and down in conjunction with an elevating drive means 76 shown in FIG. 2 or FIG. That is, as shown in FIG. 1, the position at which the substrate 9 held on the substrate mounting portion 18 of the substrate transfer tool 17 in the substrate transfer portion 3 is transferred to the substrate transfer robot 4 is defined as a first substrate transfer position 77. A position where the substrate 9 held by the processing substrate mounting tool 75 of each processing tank 74 is transferred to the substrate transfer robot 4 is a second substrate transfer position 78 (in FIG. 1, the center processing tank 74 is illustrated). ), The substrate 9 held here is moved to the second substrate transfer position 78 and the processing tank 74
It can be moved up and down between a substrate cleaning processing position 79 where the cleaning processing is performed by immersing the substrate in the inside. The substrate transfer robot 4 is configured to travel between a first substrate transfer position 77 and a second substrate transfer position 78.

In the above-described embodiment, the substrate transfer robot 4 travels only in the horizontal direction along the pair of guide rails 67. However, the substrate transfer unit 3 and the substrate cleaning unit 5
According to such an arrangement, it is also possible to move between the first substrate transfer position and the second substrate transfer position in biaxial or triaxial directions including the vertical direction. The traveling in this specification is a concept including such a movement in a biaxial or triaxial direction.

[0045] In the substrate cleaning unit 5, the unwashed substrate 9 that has been conveyed by the substrate conveying robot 4, elevated delivery to the processing substrate platform 75 has, lowers the substrate placement portion 75, unwashed the substrate 9 is positioned in substrate cleaning position 79 of the treatment tank 74, performs a cleaning process by immersion in the cleaning liquid 80. When the cleaning processing of the substrate in the processing tank 74 is completed, the processing substrate mounting portion 75 is raised and delivered to the substrate transfer robot 4. Thus, the unwashed substrate 9 of the substrate cleaning unit 5
By holding the processing substrate platform 75 of the lift, it is not necessary to immerse the substrate chuck 49 of the substrate transfer robot 4 for holding a substrate 9 in the cleaning liquid 80 of the processing tank 74, attached to the substrate chuck 49 Contaminants in treatment tank 7
4 will not be brought inside. In addition, since there is no need for the substrate chuck 49 to enter the processing bath 74, the hanging dimension of the substrate chuck 49 can be reduced, the substrate chuck 49 is less likely to vibrate during the transport of the substrate, and the substrate 9 and the substrate chuck 49 are aligned and held. Generation of particles due to sliding with the grooves 52 and 53 is reduced, and intrusion of particles into the processing tank 74 is reduced.

Hereinafter, a series of operations of the present embodiment will be briefly described. First, two cassettes 8 accommodating a plurality of unwashed substrates W are loaded at the loading position 1 of the cassette loading / unloading stage 1.
0. The cassette transfer robot 2 is
The individual cassettes 8 are transferred onto the turntable 13 of the substrate transfer section 3. After the turntable 13 rotates 90 °,
The substrate transfer tool 17 moves up to take out the substrate 9 from the cassette C. In this case, the substrate placement portion 18 of the substrate sorting device 17 is switched to the mounting portion 38 lifting and holding the unwashed substrate, to prevent contamination of the cleaned substrate.

The substrate transport robot 4 receives the uncleaned substrate 9 taken out of the cassette 8 and transports it to the substrate cleaning section 5. In this case, to prevent contamination of the cleaned substrate, selectively using the chuck facing surfaces 50, 51 of the substrate transport robot 4 of the substrate chuck 49 in the unwashed substrate and cleaned substrate as described above, the contamination of the cleaned substrate To prevent. In the substrate cleaning section 5, the substrate 9 transported by the substrate transport robot 4 is received by the processing substrate mounting tool 75, and is sequentially immersed in a predetermined substrate processing tank 74 to perform a cleaning process on the substrate surface. The cleaned substrate W is transported to the substrate drying unit 6 by the substrate transport robot 4. In the substrate drying unit 6, the transported substrate 9 is received by a lifter (not shown) similar to the substrate transfer tool 17, and is subjected to a drying process in a centrifugal dryer 61.

On the other hand, during the substrate cleaning process, the cassette transport robot 2 transports the two empty cassettes 8 to the cassette cleaning section 7. In the cassette cleaning section 7, the two cassettes 8 that have been transported are separated by a cassette lifter (not shown).
, Immersed in the cassette washing tank to perform the washing process, drained after the washing, and drained the heater (not shown).
Dry with. That is, by performing the cleaning processing of the substrate 9 and the cleaning processing of the cassette 8 in parallel, the processing efficiency is improved as a whole.

The cassette transfer robot 2 transfers the dried cassette 8 to the turntable 13 of the substrate transfer section 3 again. The dried substrate 7 is transferred to the substrate transfer robot 4
Is transferred to the substrate transfer section 3 by the The substrate transfer section 3 stores the cleaned substrate 9 in the cleaned cassette 8 via the substrate transfer tool 17. In this case, the substrate placement portion 18 of the substrate sorting device 17 is switched to the fixed mounting portion 39 holds the cleaned substrate, to prevent contamination of the cleaned substrate. The cassette transport robot 2 transports the two cassettes 8 containing the substrates 9 to the unloading section 12 of the cassette loading / unloading stage 1. Thus, a series of operations is completed.

[0050] The substrate cleaning apparatus according to the present invention,
As described above, it can be applied as a pretreatment cleaning device in the oxidation diffusion step. In this case, since contamination of the substrate does not matter, the lifting and lowering portion 3 of the substrate transfer tool 17 is not used.
Switching between 8 and the fixed mounting section 39 is unnecessary. Rather, it is necessary to use the chuck facing surfaces 50 and 51 of the substrate chuck 49 properly before and after the cleaning process and before and after the drying, that is, when holding a dry substrate and when holding a wet substrate. This is because, depending on the type of the substrate, when it comes into contact with the substrate chuck 49 wet in a dry state, a stain called a watermark may occur. By properly using the chuck opposing surfaces 50 and 51 as described above, the occurrence of a watermark can be prevented. Note that even if the substrate is held by the wet substrate chuck before the cleaning process, the influence of the watermark does not cause any problem. After that, the cleaning process is performed.

[Brief description of the drawings]

FIG. 1 is a vertical sectional front view of a substrate cleaning apparatus according to an embodiment of the present invention.

FIG. 2 is a plan view of the substrate cleaning apparatus of FIG. 1;

3A and 3B are explanatory views of a turntable used in the substrate cleaning apparatus of FIG. 1, wherein FIG. 3A is a longitudinal sectional view, FIG. 3B is a plan view, and FIG. 3C is FIG. (D) is a view corresponding to FIG. (C) of a first modification of the rotation drive mechanism of the turntable, and FIG. (E) is a second modification of the rotation drive mechanism of the turntable. It is a figure (C) equivalent figure of an example.

4A and 4B are views for explaining a substrate delivery tool used in the substrate cleaning apparatus of FIG. 1, wherein FIG. 4A is a longitudinal sectional view and FIG.
Is an explanatory view of a production example of a substrate mounting portion of the substrate transfer device, and FIG. 2C is a partial cross-sectional view of the substrate mounting portion.

FIG. 5 is a sectional view taken along line VV of FIG. 1;

FIGS. 6A and 6B are explanatory views of a width-adjusting link mechanism used in the substrate cleaning apparatus of FIG. 1, wherein FIG. 6A is a longitudinal sectional view and FIG.

FIGS. 7A and 7B are views for explaining a substrate chuck of a substrate transfer robot used in the substrate cleaning apparatus of FIG. 1, wherein FIG. 7A is a perspective view and FIG. 7B is a line BB of FIG. (C) is a cross-sectional view taken along the line CC of FIG. (B), (D) is a vertical cross-sectional view of a modified example of the substrate chuck, and (E) is a cross-sectional view of FIG. It is EE sectional drawing.

8A and 8B are diagrams illustrating a substrate chuck rotating mechanism and a traveling mechanism of a traveling unit body of the substrate transfer robot used in the substrate cleaning apparatus of FIG. 1, wherein FIG. 8A is a perspective view, and FIG. (A), FIG. (C) is a perspective view of a modification, and (D) is a side view of FIG. (C).

FIGS. 9A, 9B, 9C, and 9D are front views showing modifications of the substrate chuck, respectively.

FIG. 10 is a perspective view corresponding to FIG. 8 (A) showing a separating and rotating mechanism of the substrate chuck shown in FIGS. 9 (B), 9 (C) and 9 (D).

FIG. 11 is a perspective view of the substrate cleaning apparatus of FIG. 1;

FIG. 12 is a diagram corresponding to FIG. 1 of a conventional substrate cleaning apparatus.

FIG. 13 is a plan view of the substrate cleaning apparatus of FIG.

[Description of Signs] 3 ... Substrate transfer unit, 4 ... Substrate transfer robot, 5 ... Substrate cleaning processing unit, 8 ... Cassette, 9 ... Substrate, 17 ... Substrate delivery tool, 18 ... Substrate placement unit, 46: traveling unit body, 47: arm rotating shaft, 48: shaft rotating means, 49: substrate chuck, 5
0 · 51 · · · chuck opposing surface, 52 · 53 · · · substrate alignment holding groove, 62 · · · traveling drive device, 74 · · · processing tank, 75 · · · processing substrate mounting tool, 76 · lifting drive means for processing substrate mounting tool, 77
... first substrate transfer position, 78 ... second substrate transfer position, 79 ... substrate cleaning processing position, 81 ... substrate accommodation position,
85 ... means for driving up and down the substrate delivery tool.

 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-2-228048 (JP, A) JP-A-63-184350 (JP, A) JP-A-2-76227 (JP, A) JP-A-2- 143545 (JP, A)

Claims (2)

(57) [Claims] 1. A substrate transfer unit for taking out a substrate from a cassette containing a plurality of substrates or loading a plurality of substrates into the cassette, and a substrate cleaning processing unit for cleaning a plurality of substrates collectively. When, in the substrate cleaning apparatus comprising; and a substrate transport robot for transporting holds together to a plurality of substrates between the substrate transfer unit and the substrate cleaning section, the substrate transfer robot, the travel unit A main body, a pair of left and right arm rotation shafts projecting substantially horizontally from the traveling unit main body, shaft rotation means for rotating the pair of arm rotation shafts, and a substrate chuck fixed to each arm rotation shaft. The pair of substrate chucks have a plurality of sets of chuck opposing surfaces, each set of the chuck opposing surfaces has a plurality of substrate alignment holding grooves, and collectively hold the substrates in a standing and aligned state on each set of the chuck opposing surfaces. To be configured Together, by rotation of the arm rotation axis chuck facing surface of the substrate chuck cleaning pretreatment
The chuck-facing surface that holds the substrate and the cleaned substrate
A substrate cleaning apparatus characterized in that it can be switched between a holding surface and a chuck-facing surface . 2. A substrate transfer unit for taking out a substrate from a cassette accommodating a plurality of substrates via a substrate transfer tool or loading a plurality of substrates into the cassette, and a substrate cleaning unit for cleaning a plurality of substrates collectively. A processing unit, a substrate cleaning processing apparatus comprising: a substrate transfer robot that collectively holds and transfers a plurality of substrates between the substrate transfer unit and the substrate cleaning processing unit; A traveling unit body, a pair of left and right arm rotation shafts projecting substantially horizontally from the traveling unit body, shaft rotation means for rotating the pair of arm rotation shafts, and a substrate chuck fixed to each arm rotation shaft. The pair of substrate chucks has a plurality of sets of chuck opposing surfaces, each set of the chuck opposing surfaces has a plurality of substrate alignment holding grooves, and the substrates are collectively arranged in a standing and aligned state on each set of the chuck opposing surfaces. Security Together configured to, the chuck facing surface of the substrate chuck by the rotation of the arm rotational shaft, the cleaning process
Chuck facing surface and washing treated group that holds the front of the substrate
The substrate transfer tool of the substrate transfer unit is configured to be switchable to a chuck-facing surface that holds the plate, and includes a lifting drive device that drives the substrate placement unit that holds the substrate up and down. A first substrate transfer position for transferring the substrate held by the substrate mounting portion to the substrate transfer robot and a substrate storing position for storing the substrate in the cassette; cleaning unit includes a processing tank, comprising: a substrate placement base of the substrate to retain, an elevating drive means for vertically driving the substrate placement base, in the lift driving means, said substrate placement base in that the substrate was retained and vertically movable structure between the second substrate transfer position for transferring to the substrate transfer robot, the substrate cleaning position for cleaning by immersion in the treatment bath substrate cleaning, wherein Management apparatus.