JP2852134B2 - バンプ形成方法 - Google Patents

バンプ形成方法

Info

Publication number
JP2852134B2
JP2852134B2 JP3047490A JP4749091A JP2852134B2 JP 2852134 B2 JP2852134 B2 JP 2852134B2 JP 3047490 A JP3047490 A JP 3047490A JP 4749091 A JP4749091 A JP 4749091A JP 2852134 B2 JP2852134 B2 JP 2852134B2
Authority
JP
Japan
Prior art keywords
wire
bump
aluminum pad
ball
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP3047490A
Other languages
English (en)
Other versions
JPH04266040A (ja
Inventor
勉 青木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP3047490A priority Critical patent/JP2852134B2/ja
Priority to US07/835,378 priority patent/US5263246A/en
Publication of JPH04266040A publication Critical patent/JPH04266040A/ja
Application granted granted Critical
Publication of JP2852134B2 publication Critical patent/JP2852134B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67138Apparatus for wiring semiconductor or solid state device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/11Manufacturing methods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L24/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/0401Bonding areas specifically adapted for bump connectors, e.g. under bump metallisation [UBM]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/05599Material
    • H01L2224/056Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/05617Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
    • H01L2224/05624Aluminium [Al] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/11Manufacturing methods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/11Manufacturing methods
    • H01L2224/113Manufacturing methods by local deposition of the material of the bump connector
    • H01L2224/1133Manufacturing methods by local deposition of the material of the bump connector in solid form
    • H01L2224/1134Stud bumping, i.e. using a wire-bonding apparatus
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
    • H01L2224/13001Core members of the bump connector
    • H01L2224/13099Material
    • H01L2224/131Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/13138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/13144Gold [Au] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/4501Shape
    • H01L2224/45012Cross-sectional shape
    • H01L2224/45015Cross-sectional shape being circular
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48475Connecting portions connected to auxiliary connecting means on the bonding areas, e.g. pre-ball, wedge-on-ball, ball-on-ball
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/485Material
    • H01L2224/48505Material at the bonding interface
    • H01L2224/48599Principal constituent of the connecting portion of the wire connector being Gold (Au)
    • H01L2224/486Principal constituent of the connecting portion of the wire connector being Gold (Au) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/48617Principal constituent of the connecting portion of the wire connector being Gold (Au) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950 °C
    • H01L2224/48624Aluminium (Al) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/85009Pre-treatment of the connector or the bonding area
    • H01L2224/85051Forming additional members, e.g. for "wedge-on-ball", "ball-on-wedge", "ball-on-ball" connections
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/852Applying energy for connecting
    • H01L2224/85201Compression bonding
    • H01L2224/85205Ultrasonic bonding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L24/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00013Fully indexed content
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01005Boron [B]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01013Aluminum [Al]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01029Copper [Cu]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01033Arsenic [As]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01039Yttrium [Y]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01078Platinum [Pt]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49147Assembling terminal to base
    • Y10T29/49149Assembling terminal to base by metal fusion bonding

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Wire Bonding (AREA)

Description

【発明の詳細な説明】
【0001】
【産業上の利用分野】本発明はTAB用ウェハのバンプ
形成方法に関し、特に狭ピッチインナーリード対応のバ
ンプ形成方法に関する。
【0002】
【従来の技術】従来、この種のバンプ形成方法は、ウェ
ハ上の電極に金メッキを行う金バンプ、銅メッキを行う
銅バンプが実施されていたが、資材費が高いという欠点
があり、低コスト化に対応する技術として、標準の金線
ボンダーを利用したボールバンプ方法が提案されて来て
いる。図6にボールバンプした状態を示す平面図、図7
にその側面図を示す。ボールバンプは、ボンダーのスパ
ークロッドで金線ワイヤー先端にボールを形成した後、
ウェハ3のアルミパッド2上に金ボール11を圧着し、
ワイヤーを引きちぎる方式である。拡散工程でのバンプ
工程が不要となるため、TATが短かくなり、多種のウ
ェハサイズに対応できるという汎用性も有り、資材費が
他のバンプ形成方法に比べて低いということで近年注目
されている方法である。
【0003】
【発明が解決しようとする課題】この従来のボールバン
プ方法では、金線ワイヤーにボールを形成するため、ボ
ールを形成した時点でのボール径は、ワイヤー径の約
2.5倍の大きさになる。さらに、そのボールをアルミ
パッド上に圧着すると、図6に示すように、ワイヤー径
の約3.5倍のつぶし径となる。従って、チップの微細
化にともない、アルミ電極間を狭ピッチ化したいが、上
記の理由により、約120μ程度が限界となっている。
これに対し、ワイヤー径を細線化するという手段もある
が、細線にボールを形成する方法は、スパーク電圧の制
御も難しく、安定要素が欠ける。さらに、細線化で加工
コストが見合うのは、20μが限界であり、その場合の
つぶし径は約70μとなり、ボールバンプでの狭ピッチ
化の限界は、約100μということになる。
【0004】本発明の目的は、前記課題を解決したバン
プ形成方法を提供することにある。
【0005】
【課題を解決するための手段】前記目的を達成するた
め、本発明に係るバンプ形成方法は、TAB用ウェハに
バンプを形成する方法において、アルミパッドを細長く
構成し、アルミパッド内でワイヤ−の一端をアルミパッ
ドにウェッジボンディングし、下方向にワイヤ−高さを
コントロ−ルしてワイヤ−の他端をアルミパッドにウェ
ッジボンディングし、ワイヤ−の部分をバンプとして用
いるものである。
【0006】
【0007】
【作用】金属ワイヤーをアルミパッド上でウェッジボン
ディングを行い、必要量圧縮した後に、クランプによっ
て金属ワイヤーを引きちぎる方式を備えており、アルミ
パッド上でのつぶし幅をワイヤー径の1.5倍以下にす
ることを可能とする。
【0008】
【実施例】次に本発明について図面を参照して説明す
る。
【0009】(実施例1)図1は、本発明によりバンプ
形成されたウェハを示す断面図、図2は、バンプ形成後
の1個のアルミパッドを示す平面図、図3(a)〜
(d)は、本発明のバンプ形成方法を工程順に示す図、
図4は、本発明の装置を示す平面図である。
【0010】図3に示すように、ウェハ3のパッド上に
ウェッジ5を用いてワイヤー7の先端部をウェッジボン
ディングし、アルミパッド2上にウェッジボンディング
した後クランプ6によってワイヤー7をつまみながら上
昇させると、アルミパッド2上に図2に示すようなワイ
ヤーのつぶし部分が残る。4はダイシングラインであ
る。ウェッジボンディングのため、つぶし部長さAは、
ワイヤー径Dの約2倍、つぶし部幅Bは、ワイヤー径の
約1.5倍以下に制限できる。従って、ワイヤー径φ2
0μを使用すれば、アルミパッド2を□40μ程度に設
定でき、アルミパッド2間の狭ピッチ化を可能にし、イ
ンナーリードピッチを100μ以下に設定できる。
【0011】図4は、ウェハ3上にウェッジボンディン
グによりバンプ形成を実施している状態であるが、ウェ
ッジボンディングを実施するためにUSホーン8と、ボ
ンディング方向を合わせるためのXYθステージ9と、
位置決めローラ10を有する。
【0012】(実施例2)図5は、本発明の実施例2を
示す図である。本実施例においては、アルミパッド2間
を狭ピッ化して、アルミパッド2を細長く構成してい
る。アルミパッド2内でウェッジボンディングを実施し
ているが、つぶし部分ではなく、ワイヤー7の部分をバ
ンプとして利用する方法である。一般のボールホルダー
を使って、アルミパッド内でボンディングを行うと、ワ
イヤーの立ち上がり部分ができてしまうため、均一なバ
ンプ高さの設定が不可能となる。ウェッジボンディング
の場合は、下方向にワイヤー高さをコントロールするの
は容易であることから、本例が可能となる。アルミパッ
ド長さEも、ワイヤー径φ20μなら160μ程度に制
限できる。
【0013】
【発明の効果】以上説明したように本発明は、金属ワイ
ヤーをアルミパッド上でウェッジボンディングを行い、
必要量だけを残すことができるため、従来のバンプ形成
方法よりもアルミパッドの極小化、及びパッド間の狭ピ
ット化を可能にできる。それにより、半導体チップを高
機能化、縮小化できるという効果を有する。
【図面の簡単な説明】
【図1】本発明に係るバンプ形成後のウェハを示す断面
図である。
【図2】バンプ形成後のアルミパッドを示す平面図であ
る。
【図3】バンプ形成方法の工程順を示す図である。
【図4】本発明の装置を示す平面図である。
【図5】本発明の実施例2によるバンプ形成後のアルミ
パッドを示す平面図である。
【図6】従来のボールバンプ形成方法のアルミパッドを
示す平面図である。
【図7】従来例によるアルミパッドの側面図である。
【符号の説明】
1 バンプ 2 アルミパッド 3 ウェハ 4 ダイシングライン 5 ウェッジ 6 クランプ 7 ワイヤー 8 USホーン 9 XYθステージ 10 位置決めローラ 11 金ボール

Claims (1)

    (57)【特許請求の範囲】
  1. 【請求項1】 TAB用ウェハにバンプを形成する方法
    において、アルミパッドを細長く構成し、アルミパッド
    内でワイヤ−の一端をアルミパッドにウェッジボンディ
    ングし、下方向にワイヤ−高さをコントロ−ルしてワイ
    ヤ−の他端をアルミパッドにウェッジボンディングし、
    ワイヤ−の部分をバンプとして用いることを特徴とする
    バンプ形成方法。
JP3047490A 1991-02-20 1991-02-20 バンプ形成方法 Expired - Fee Related JP2852134B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP3047490A JP2852134B2 (ja) 1991-02-20 1991-02-20 バンプ形成方法
US07/835,378 US5263246A (en) 1991-02-20 1992-02-14 Bump forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3047490A JP2852134B2 (ja) 1991-02-20 1991-02-20 バンプ形成方法

Publications (2)

Publication Number Publication Date
JPH04266040A JPH04266040A (ja) 1992-09-22
JP2852134B2 true JP2852134B2 (ja) 1999-01-27

Family

ID=12776560

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3047490A Expired - Fee Related JP2852134B2 (ja) 1991-02-20 1991-02-20 バンプ形成方法

Country Status (2)

Country Link
US (1) US5263246A (ja)
JP (1) JP2852134B2 (ja)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5917707A (en) 1993-11-16 1999-06-29 Formfactor, Inc. Flexible contact structure with an electrically conductive shell
US5820014A (en) 1993-11-16 1998-10-13 Form Factor, Inc. Solder preforms
US20020053734A1 (en) 1993-11-16 2002-05-09 Formfactor, Inc. Probe card assembly and kit, and methods of making same
US5891745A (en) * 1994-10-28 1999-04-06 Honeywell Inc. Test and tear-away bond pad design
US5537738A (en) * 1995-02-10 1996-07-23 Micron Display Technology Inc. Methods of mechanical and electrical substrate connection
US8033838B2 (en) 1996-02-21 2011-10-11 Formfactor, Inc. Microelectronic contact structure
US5994152A (en) 1996-02-21 1999-11-30 Formfactor, Inc. Fabricating interconnects and tips using sacrificial substrates
US5731244A (en) * 1996-05-28 1998-03-24 Micron Technology, Inc. Laser wire bonding for wire embedded dielectrics to integrated circuits
US5945065A (en) * 1996-07-31 1999-08-31 Tanaka Denshi Kogyo Method for wedge bonding using a gold alloy wire
JP3425510B2 (ja) * 1996-09-27 2003-07-14 松下電器産業株式会社 バンプボンダー形成方法
JP3634566B2 (ja) * 1997-06-06 2005-03-30 ローム株式会社 樹脂パッケージ型半導体装置
US6169331B1 (en) * 1998-08-28 2001-01-02 Micron Technology, Inc. Apparatus for electrically coupling bond pads of a microelectronic device
JP2000133672A (ja) * 1998-10-28 2000-05-12 Seiko Epson Corp 半導体装置及びその製造方法、回路基板並びに電子機器
US7271497B2 (en) * 2003-03-10 2007-09-18 Fairchild Semiconductor Corporation Dual metal stud bumping for flip chip applications
US7563648B2 (en) * 2003-08-14 2009-07-21 Unisem (Mauritius) Holdings Limited Semiconductor device package and method for manufacturing same
DE102004034821A1 (de) * 2004-07-19 2006-03-16 Infineon Technologies Ag Halbleiter und Verfahren zu dessen Herstellung
US20100102429A1 (en) * 2008-10-24 2010-04-29 Great Team Backend Foundry, Inc. Flip-chip package structure with block bumps and the wedge bonding method thereof
DE102020117641A1 (de) * 2020-07-03 2022-01-05 Hesse Gmbh Drahtführungsmodul und Ultraschall-Drahtbonder hiermit

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3460238A (en) * 1967-04-20 1969-08-12 Motorola Inc Wire severing in wire bonding machines
US3689983A (en) * 1970-05-11 1972-09-12 Gen Motors Corp Method of bonding
US3747198A (en) * 1971-08-19 1973-07-24 Gen Electric Tailless wedge bonding of gold wire to palladium-silver cermets
US3718272A (en) * 1972-05-01 1973-02-27 Gen Motors Corp Bonding tip
US3954217A (en) * 1974-09-30 1976-05-04 Orthodyne Electronics Method and apparatus for bonding and breaking leads to semiconductors
US4597520A (en) * 1984-09-06 1986-07-01 Biggs Kenneth L Bonding method and means
JPH0695518B2 (ja) * 1985-11-14 1994-11-24 日本電気株式会社 金バンプ形成法
JPS62176138A (ja) * 1986-01-29 1987-08-01 Toshiba Corp ワイヤボンデイング装置
US4771930A (en) * 1986-06-30 1988-09-20 Kulicke And Soffa Industries Inc. Apparatus for supplying uniform tail lengths
GB8624513D0 (en) * 1986-10-13 1986-11-19 Microelectronics & Computer Single point bonding method
JPS63119552A (ja) * 1986-11-07 1988-05-24 Sharp Corp Lsiチツプ
US4955523A (en) * 1986-12-17 1990-09-11 Raychem Corporation Interconnection of electronic components
JPS63173345A (ja) * 1987-01-12 1988-07-16 Nec Kansai Ltd バンプ電極形成方法
JPH0770559B2 (ja) * 1987-09-14 1995-07-31 オムロン株式会社 実装用接合金属の形成装置
JP2682006B2 (ja) * 1988-05-13 1997-11-26 松下電器産業株式会社 バンプ形成方法
JPH0212919A (ja) * 1988-06-30 1990-01-17 Nec Kansai Ltd バンプ電極の形成方法
JPH0262055A (ja) * 1988-08-26 1990-03-01 Matsushita Electric Ind Co Ltd バンプ形成方法とそれに用いられるボンディングウェッジ
JP2532615B2 (ja) * 1988-10-20 1996-09-11 松下電器産業株式会社 バンプ形成方法
DE3912580C2 (de) * 1989-04-17 1997-08-21 F&K Delvotec Bondtechnik Gmbh Bondstempel

Also Published As

Publication number Publication date
JPH04266040A (ja) 1992-09-22
US5263246A (en) 1993-11-23

Similar Documents

Publication Publication Date Title
JP2852134B2 (ja) バンプ形成方法
EP0895281A1 (en) Two-step projecting bump for semiconductor chip and method for forming the same
JPH0951011A (ja) 半導体チップのワイヤボンディング方法
JP2631013B2 (ja) バンプ形成方法
JP3049515B2 (ja) ワイヤボンデイング方法
JP3455126B2 (ja) ワイヤボンデイング方法
JP2500655B2 (ja) ワイヤ―ボンディング方法及びその装置
JP3128717B2 (ja) バンプ形成方法
JP3202193B2 (ja) ワイヤボンディング方法
JPH0530058B2 (ja)
JP3322642B2 (ja) 半導体装置の製造方法
JP2914337B2 (ja) ワイヤボンディング装置
JP3753685B2 (ja) ワイヤボンディング方法
JPH10199913A (ja) ワイヤボンディング方法
JP3233194B2 (ja) ワイヤボンディング方法
JPH06181243A (ja) ワイヤーボンディング装置
JP2978852B2 (ja) 半導体装置のワイヤボンディング接続方法
JP3084634B2 (ja) 半導体装置のバンプ形成方法
JPH02277251A (ja) ワイヤボンディング方法および装置
JP2976645B2 (ja) バンプ形成方法
JPH11102925A (ja) バンプ形成方法
JPH09148358A (ja) ワイヤボンディングダメージ防止用キャピラリー
JPH04277642A (ja) ワイヤーボンディング方法
JP4318533B2 (ja) ボールバンプ形成用リボン
JPH05235002A (ja) バンプ形成方法

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees