JP2825977B2 - 大形高純度石英ガラス板、その製造方法及び製造装置 - Google Patents

大形高純度石英ガラス板、その製造方法及び製造装置

Info

Publication number
JP2825977B2
JP2825977B2 JP6505171A JP50517194A JP2825977B2 JP 2825977 B2 JP2825977 B2 JP 2825977B2 JP 6505171 A JP6505171 A JP 6505171A JP 50517194 A JP50517194 A JP 50517194A JP 2825977 B2 JP2825977 B2 JP 2825977B2
Authority
JP
Japan
Prior art keywords
glass tube
quartz glass
tube
heating
notch
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP6505171A
Other languages
English (en)
Japanese (ja)
Inventor
吉明 伊勢
一男 浅島
信一 大越
博至 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Quartz Products Co Ltd
Original Assignee
Shin Etsu Quartz Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=14042458&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP2825977(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Shin Etsu Quartz Products Co Ltd filed Critical Shin Etsu Quartz Products Co Ltd
Application granted granted Critical
Publication of JP2825977B2 publication Critical patent/JP2825977B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B23/00—Re-forming shaped glass
    • C03B23/04—Re-forming tubes or rods
    • C03B23/047—Re-forming tubes or rods by drawing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B23/00—Re-forming shaped glass
    • C03B23/02—Re-forming glass sheets
    • C03B23/037—Re-forming glass sheets by drawing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B23/00—Re-forming shaped glass
    • C03B23/04—Re-forming tubes or rods
    • C03B23/06—Re-forming tubes or rods by bending
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/08—Quartz
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/09—Tube

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
JP6505171A 1992-07-31 1992-07-31 大形高純度石英ガラス板、その製造方法及び製造装置 Expired - Lifetime JP2825977B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP1992/000976 WO1994003404A1 (en) 1992-07-31 1992-07-31 Quartz glass plate large in size and high in purity, and method and device for making said plate

Publications (1)

Publication Number Publication Date
JP2825977B2 true JP2825977B2 (ja) 1998-11-18

Family

ID=14042458

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6505171A Expired - Lifetime JP2825977B2 (ja) 1992-07-31 1992-07-31 大形高純度石英ガラス板、その製造方法及び製造装置

Country Status (7)

Country Link
US (1) US5683483A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP (1) EP0607433B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JP2825977B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR (2) KR970009008B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE69227521T3 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
TW (1) TW309511B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
WO (1) WO1994003404A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996033950A1 (en) * 1995-04-28 1996-10-31 Mitsubishi Chemical Corporation Processes for producing synthetic quartz powder and producing shaped quartz glass
DE69816758T2 (de) * 1997-05-20 2004-06-03 Heraeus Quarzglas Gmbh & Co. Kg Synthetisches quarzglas zur verwendung in uv-strahlung und verfahren zu seiner herstellung
US6783898B2 (en) 1999-02-12 2004-08-31 Corning Incorporated Projection lithography photomask blanks, preforms and method of making
US6782716B2 (en) 1999-02-12 2004-08-31 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6682859B2 (en) 1999-02-12 2004-01-27 Corning Incorporated Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass
US6319634B1 (en) 1999-03-12 2001-11-20 Corning Incorporated Projection lithography photomasks and methods of making
US6242136B1 (en) 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6265115B1 (en) 1999-03-15 2001-07-24 Corning Incorporated Projection lithography photomask blanks, preforms and methods of making
EP1088789A3 (en) * 1999-09-28 2002-03-27 Heraeus Quarzglas GmbH & Co. KG Porous silica granule, its method of production and its use in a method for producing quartz glass
US7797966B2 (en) 2000-12-29 2010-09-21 Single Crystal Technologies, Inc. Hot substrate deposition of fused silica
US20070059533A1 (en) * 2005-09-12 2007-03-15 Burdette Steven R Thermal reflow of glass and fused silica body
JP2010192679A (ja) * 2009-02-18 2010-09-02 Shinetsu Quartz Prod Co Ltd 石英ガラス製ウエハー処理槽及びその製造方法
RU2433090C1 (ru) * 2010-05-19 2011-11-10 Федеральное государственное унитарное предприятие "Научно-производственное предприятие "Исток" (ФГУП "НПП "Исток") Способ изготовления листового стекла из полого стеклянного цилиндра
CN102826751B (zh) * 2012-09-17 2014-11-05 东海县圣达石英制品有限公司 一种低羟基黑色石英管及其制备方法
PL3287421T3 (pl) * 2015-04-24 2021-05-17 Nipro Corporation Sposób wytwarzania medycznego pojemnika szklanego, oraz urządzenie do piaskowania ogniowego wyposażone w mechanizm obrotowy

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1283333A (en) * 1918-03-07 1918-10-29 William G Shaw Process for forming glass sheets.
GB257590A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1925-08-27 1927-03-24 Societe Anonyme Des Manufactures Des Glaces Et Produits Chimiques De St. Gobain, Chauny Et Cirey
FR20600E (fr) * 1970-07-22 1918-07-02 Philippe Adolphe Cauet Bras et avant-bras artificiels articulés et leur dispositif de commande
DE2443556C3 (de) † 1974-09-11 1982-05-06 Corning Ltd., Sunderland, Durham Vorrichtung zum Biegen von Glas
DE3226451C2 (de) * 1982-07-15 1984-09-27 Heraeus Quarzschmelze Gmbh, 6450 Hanau Verfahren zur Herstellung von schlierenfreien, blasenfreien und homogenen Quarzglasplatten und Vorrichtung zur Durchführung des Verfahrens
JPS62235223A (ja) * 1986-04-03 1987-10-15 Toshiba Ceramics Co Ltd 高珪酸ガラス部材の製造方法および製造装置
JPH0441148Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) † 1986-12-15 1992-09-28
KR950014690B1 (ko) † 1988-02-22 1995-12-13 닛뽄 덴기 가라스 가부시기가이샤 박판(薄板)글라스의 제조방법 및 장치

Also Published As

Publication number Publication date
WO1994003404A1 (en) 1994-02-17
EP0607433B2 (en) 2003-03-05
KR970009008B1 (ko) 1997-06-03
DE69227521T2 (de) 1999-07-15
DE69227521T3 (de) 2003-12-24
EP0607433A4 (en) 1995-03-01
DE69227521D1 (de) 1998-12-10
EP0607433A1 (en) 1994-07-27
US5683483A (en) 1997-11-04
EP0607433B1 (en) 1998-11-04
KR940702469A (ko) 1994-08-20
TW309511B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1997-07-01

Similar Documents

Publication Publication Date Title
JP2825977B2 (ja) 大形高純度石英ガラス板、その製造方法及び製造装置
US6209354B1 (en) Method of preparing silica glass article
TWI555709B (zh) 形成玻璃片的設備與方法
US8312740B2 (en) Thermal reflow of glass and fused silica body
CN104854044A (zh) 除去玻璃片周围部分的方法和设备
KR940011122B1 (ko) 유리모재의 화염연마방법
CN213141821U (zh) 一种石英玻璃棒火焰抛光和退火的装置
JP5114409B2 (ja) 高シリカ材料から成る構成材を接合する溶着方法とその方法を実施する装置
EP3686165B1 (en) High-strength welding process for making heavy glass preforms with large cross sectional areas
JP3201708B2 (ja) 高均質な光学用石英ガラス成形体の製造方法
US3656925A (en) Method and apparatus for joining two glass parts or articles
JP2005272234A (ja) 光ファイバ用ガラス母材の加工方法及び加工装置
JP2000319031A (ja) 光ファイバプリフォームの火炎研磨方法
JP4760137B2 (ja) 石英ガラスの成形方法
JP2003146687A (ja) 光ファイバ母材の製造方法
JP3418679B2 (ja) 光ファイバ母材の加工装置及び加工方法
JP4964401B2 (ja) シリカガラス板の製造方法
JP2003286041A (ja) シリカ板及びシリカ板の製造方法
JPH0387020A (ja) 半導体熱処理用石英ガラス部材及びその製造方法
Hentschel et al. 4.2 Conventional Production of Zerodur®
JPH044258B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP2553791C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH02184530A (ja) 合成石英ガラスの製造方法とその装置

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080911

Year of fee payment: 10

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080911

Year of fee payment: 10

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090911

Year of fee payment: 11

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090911

Year of fee payment: 11

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100911

Year of fee payment: 12

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100911

Year of fee payment: 12

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110911

Year of fee payment: 13

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120911

Year of fee payment: 14

EXPY Cancellation because of completion of term