JP2812346B2 - Liquid crystal display device and method of manufacturing the same - Google Patents

Liquid crystal display device and method of manufacturing the same

Info

Publication number
JP2812346B2
JP2812346B2 JP1207792A JP1207792A JP2812346B2 JP 2812346 B2 JP2812346 B2 JP 2812346B2 JP 1207792 A JP1207792 A JP 1207792A JP 1207792 A JP1207792 A JP 1207792A JP 2812346 B2 JP2812346 B2 JP 2812346B2
Authority
JP
Japan
Prior art keywords
wiring
liquid crystal
active matrix
display device
crystal display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1207792A
Other languages
Japanese (ja)
Other versions
JPH05203986A (en
Inventor
光孝 森本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP1207792A priority Critical patent/JP2812346B2/en
Publication of JPH05203986A publication Critical patent/JPH05203986A/en
Application granted granted Critical
Publication of JP2812346B2 publication Critical patent/JP2812346B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136259Repairing; Defects
    • G02F1/136263Line defects
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136259Repairing; Defects
    • G02F1/136272Auxiliary lines

Landscapes

  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Thin Film Transistor (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明はアクティブマトリクス液
晶表示装置に関し、特にアクティブマトリクスアレイ基
板における表示領域周辺の配線部の構造に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an active matrix liquid crystal display device, and more particularly to a structure of a wiring portion around a display area in an active matrix array substrate.

【0002】[0002]

【従来の技術】近年、ガラス等の大型基板表面に形成し
たスイッチング素子を持つ表示エレメントアレイよりな
るアクティブマトリクス液晶パネルが実用化され、CR
Tに代わる薄型軽量表示装置として脚光を浴びている。
2. Description of the Related Art In recent years, an active matrix liquid crystal panel comprising a display element array having switching elements formed on the surface of a large substrate such as glass has been put into practical use.
It has been spotlighted as a thin and lightweight display device replacing T.

【0003】アクティブマトリクス液晶表示装置はアク
ティブマトリクスアレイ基板を有し、これには、マトリ
クス状に配置されるスイッチング用アクティブ素子と液
晶駆動透明電極とよりなる表示セル、ならびにそれらを
結ぶ複数のゲート配線、絶縁膜を介してゲート配線に直
交する複数の信号配線が搭載される。このようなアクテ
ィブマトリクスアレイ基板は、半導体薄膜、絶縁性薄膜
や導電性薄膜をガラス基板の片側表面全体に堆積、パタ
ーン化することを順次繰返すことで形成される。
[0003] The active matrix liquid crystal display device includes an active matrix array substrate, including, become more display cell and switching the active elements and the liquid crystal drive transparent electrodes arranged in a matrix, and a plurality of gate wirings connecting them In addition, a plurality of signal wirings orthogonal to the gate wiring via the insulating film are mounted. Such an active matrix array substrate is formed by sequentially repeating deposition and patterning of a semiconductor thin film, an insulating thin film, and a conductive thin film on one entire surface of a glass substrate.

【0004】[0004]

【発明が解決しようとする課題】このような従来のアク
ティブマトリクスアレイ基板の配線部の構造では、例え
ば基板であるガラスと配線を構成する金属薄膜、あるい
は金属配線とそれを覆う絶縁膜などとの熱膨脹係数の差
や、金属膜内部応力などに起因して配線金属構成原子の
一部が移動する。このような現象を、この技術分野で
は、ストレスマイグレーションと呼んでいる。このスト
レスマイグレーションにより、配線が断線を起こす場合
がある。また、配線パターン形成工程における欠陥導入
や、段差構造部における金属膜の段差被覆性の不良に起
因する配線の断線もある。断線した配線は最終的には線
状の表示欠陥として表れ不良となる。このような欠陥
は、表示画面の面積が拡大し配線が長くなればなるほど
発生確率が増大する。結果として、歩留りの低下をきた
し、生産性の観点で大きな問題になる。
In such a structure of a wiring portion of a conventional active matrix array substrate, for example, a glass substrate and a metal thin film forming wiring, or a metal wiring and an insulating film covering the same, are formed. Some of the constituent atoms of the wiring metal move due to the difference in the thermal expansion coefficient and the internal stress of the metal film. Such a phenomenon is called stress migration in this technical field. This stress migration may cause disconnection of the wiring. In addition, there is also a disconnection of the wiring due to the introduction of a defect in the wiring pattern forming step or the poor step coverage of the metal film in the step structure. The broken wiring eventually appears as a linear display defect and becomes defective. The probability of occurrence of such a defect increases as the area of the display screen increases and the length of the wiring increases. As a result, the yield is reduced, which is a major problem from the viewpoint of productivity.

【0005】また、表示欠陥の有無を判定する検査工程
は、アクティブマトリクスアレイ基板形成工程の途中で
は困難であり、通常は対向基板(カラー表示の液晶では
カラーフィルタ基板)と重ね合わせて両基板間に液晶を
封入するパネル化工程以後に実施される。即ち、付加価
値が増大した状態にまで至ったのち検査することにな
り、例えば上記線状の表示欠陥の有るパネルが発見され
てもその時点で廃棄処分することになり、多大な損失に
なる。このため、アクティブマトリクスアレイ基板上の
表示部外の周辺領域に、補修用の補助配線とその外部へ
の接続端子とを設けた配線構造が提案されている(例え
ば、米国特許第4,688,896号明細書や米国特許
第4,840,459号明細書参照)。
An inspection step for determining the presence or absence of a display defect is difficult during the active matrix array substrate forming step. Usually, the inspection step is performed by overlapping the counter substrate (a color filter substrate in a color display liquid crystal) between the two substrates. This is performed after the panel forming step of enclosing the liquid crystal in the panel. In other words, the inspection is performed after the added value has been increased. For example, even if a panel having the above-mentioned linear display defect is found, the panel is discarded at that point, resulting in a large loss. Therefore, a wiring structure has been proposed in which an auxiliary wiring for repair and a connection terminal to the outside thereof are provided in a peripheral area outside the display section on the active matrix array substrate (for example, US Pat. No. 4,688, 896 and U.S. Pat. No. 4,840,459).

【0006】米国特許の例では、ゲート配線あるいは信
号配線の駆動電気信号の入力端子の反対側、即ち開放端
側の表示領域外の配線延在部にそれに直交する補修用の
補助配線とその外部への接続端子とを設けている。ゲー
ト配線あるいは信号配線に断線が生じた場合には当該配
線の開放端側で補助配線との交差点を短絡させ、補助配
線の外部接続端子から断線した配線駆動電気信号を同時
供給して表示欠陥を補修するものである。
In the example of the United States patent, a repair auxiliary wiring orthogonal to the gate wiring or the wiring extension part outside the display area on the side opposite to the input terminal of the drive electric signal of the signal wiring and the outside thereof is provided. And a connection terminal. If a break occurs in the gate wiring or the signal wiring, the intersection with the auxiliary wiring is short-circuited on the open end side of the wiring, and the broken wiring drive electric signal is simultaneously supplied from the external connection terminal of the auxiliary wiring to cause a display defect. It will be repaired.

【0007】しかしながら、米国特許の例では、数百
本、場合によっては数千本にもおよぶ配線群の中から個
々の不良パネル毎に不特定の場所に発生する断線した配
線の駆動信号を選択し、パネル外に一旦取り出し迂回
し、改めて補助配線の外部接続端子から供給することに
なる。したがって、駆動回路LSIを搭載した基板側の
100〜200μmピッチの微細な間隔の端子群とアク
ティブマトリクスアレイ基板側の配線入力端子群とを位
置合せし、数十個から百個以上も同時に一括して重ね合
わせ接続するモジュール化工程では、任意に特定の駆動
信号を取り出し、迂回し、補助配線の外部接続端子に供
給することは実質的に困難で、大量生産に適用するのは
事実上不可能である。
However, in the example of the US patent, a drive signal for a broken wire generated at an unspecified location for each defective panel is selected from a group of hundreds, and sometimes thousands, of wires. Then, it is once taken out of the panel, bypassed, and supplied again from the external connection terminal of the auxiliary wiring. Therefore, the terminal group having a fine pitch of 100 to 200 μm on the substrate side on which the drive circuit LSI is mounted and the wiring input terminal group on the active matrix array substrate side are aligned, and several tens to hundreds or more are simultaneously packaged. It is practically impossible to extract a specific drive signal arbitrarily, bypass it, and supply it to the external connection terminal of the auxiliary wiring in the modularization process of overlapping and connecting, and it is practically impossible to apply it to mass production It is.

【0008】したがって、本発明の目的は、上記従来の
アクティブマトリクスアレイ基板の配線部の断線の補修
方法の問題を回避しうる配線構造をもつアクティブマト
リクス液晶表示装置を提供することにある。
Accordingly, an object of the present invention is to provide an active matrix liquid crystal display device having a wiring structure capable of avoiding the problem of the above-mentioned conventional method of repairing a disconnection of a wiring portion of an active matrix array substrate.

【0009】[0009]

【課題を解決するための手段】本発明に係る液晶表示装
置は、アクティブマトリクスアレイ基板上に、平行して
延在する第1の配線群と、前記基板全面を覆う層間絶縁
膜と、当該絶縁膜上に前記第1の配線群に直交する方向
に平行して延在する第2の配線群と、を具備する。
According to the present invention, there is provided a liquid crystal display device comprising: a first wiring group extending in parallel on an active matrix array substrate; an interlayer insulating film covering the entire surface of the substrate; A second wiring group extending in parallel with a direction orthogonal to the first wiring group on the film.

【0010】本発明によれば、表示領域外かつ対向基板
枠外において前記第1の配線群と前記第2の配線群の一
方若しくはそれら双方の入力端子側並びに開放端側延在
部と前記絶縁膜を介して絶縁された形で直交する補修用
の補助配線を少なくとも1本以上具備し、前記第1の配
線群あるいは前記第2の配線群の入力端子側並びに開放
端側延在部の配線と前記補助配線との交差部近傍にそれ
ぞれの配線の延びる方向と異なる方向へ突出した短絡用
配線パターンと、下層側短絡配線パターン上の絶縁膜に
設けられた開口部とを具備したことを特徴とする液晶表
示装置が得られる。
According to the invention, one or both of the first wiring group and the second wiring group on the input terminal side and the open end side extending portion outside the display region and outside the counter substrate frame and the insulating film comprising at least one or more auxiliary wires for repairing orthogonal in a form insulated through said first distribution
It with the lines or the second wiring group of the input terminal side and the open end extending portion of the wire near the intersection of the auxiliary line
For short-circuit protruding in a direction different from the direction in which each wiring extends
Wiring pattern and insulating film on the lower layer short-circuit wiring pattern
And a liquid crystal display device having the opening provided .

【0011】また、本発明によれば、局部化学気相成長
による金属膜堆積により、アクティブマトリクス基板上
の配線と補助配線との任意の交差部近傍の突出部におい
て両者を電気的に短絡することを特徴とする液晶表示装
置の製造方法が得られる。
Further , according to the present invention, there is provided a method for local chemical vapor deposition.
Metal film deposition on active matrix substrate
At the protruding part near any intersection between the wiring and the auxiliary wiring
Liquid crystal display device characterized in that both are electrically short-circuited by
A method of manufacturing the device is obtained.

【0012】[0012]

【実施例】次に、本発明の実施例について図面を参照し
て説明する。
Next, embodiments of the present invention will be described with reference to the drawings.

【0013】(実施例1) 図1は本発明の第1の実施例によるアクティブマトリク
ス液晶表示装置を構成するアクティブマトリクスアレイ
基板の配線部の平面図である。
Embodiment 1 FIG. 1 is a plan view of a wiring portion of an active matrix array substrate constituting an active matrix liquid crystal display device according to a first embodiment of the present invention.

【0014】図示のアクティブマトリクスアレイ基板で
は、ガラス基板表面にスイッチングトランジスタ(図示
せず)のゲート配線となる第1の配線102と、第1の
配線102を含め基板全体を覆う層間絶縁膜(図示せ
ず)、および第1の配線102に直交し信号配線となる
第2の配線105が形成されている。第1の配線102
と第2の配線105の各々の交差部にはスイチングトラ
ンジスタと画素透明電極(図示せず)とよりなる表示セ
ルが配置されている。対向基板外形106より外側に相
当するアクティブマトリクスアレイ基板上には補助配線
107が形成されている。更に、断線108が発生した
第1の配線の両端で、補助配線と交差する2点で第1の
配線と補助配線とを短絡109する構造である。
In the illustrated active matrix array substrate, a first wiring 102 serving as a gate wiring of a switching transistor (not shown) is formed on a surface of a glass substrate, and an interlayer insulating film (see FIG. 1) covering the entire substrate including the first wiring 102 is provided. (Not shown), and a second wiring 105 which is orthogonal to the first wiring 102 and serves as a signal wiring is formed. First wiring 102
A display cell composed of a switching transistor and a pixel transparent electrode (not shown) is disposed at the intersection of each of the first and second wirings 105. The auxiliary wiring 107 is formed on the active matrix array substrate corresponding to the outside of the outer shape 106 of the counter substrate. Further, at both ends of the first wiring where the disconnection 108 has occurred, the first wiring and the auxiliary wiring are short-circuited 109 at two points crossing the auxiliary wiring.

【0015】補助配線により断線修復した配線の時定数
(伝搬遅延時間)は、断線のない正常な配線のそれに比
べて必ず大きくなる。また、各配線を駆動する駆動回路
(図示せず)は、正常な配線と断線修復した配線との区
別を行うことはできない。したがって、補助配線部の抵
抗の抵抗値および容量の容量値を低減するため、補助配
線部には低抵抗率の材料を選択し、パターン配置の最適
設計を行う必要がある。さらに、駆動回路の駆動能力に
十分な余裕を持たせておくことが望ましい。
The time constant (propagation delay time) of a wiring repaired by disconnection by the auxiliary wiring is always larger than that of a normal wiring without disconnection. Further, a drive circuit (not shown) that drives each wiring cannot distinguish between a normal wiring and a wiring whose wiring has been repaired. Therefore, in order to reduce the resistance value of the resistance of the auxiliary wiring portion and the capacitance value of the capacitance, it is necessary to select a material having a low resistivity for the auxiliary wiring portion and perform an optimal design of the pattern arrangement. Further, it is desirable that the driving capability of the driving circuit has a sufficient margin.

【0016】補助配線の数は、救済すべき断線本数の生
産段階での出現率、補修工程のコスト、補助配線に必要
な周辺領域の面積などに関係する。
The number of auxiliary wirings is related to the appearance rate of the number of disconnected wires to be relieved at the production stage, the cost of the repair process, the area of the peripheral area required for the auxiliary wirings, and the like.

【0017】補助配線と断線した配線とを短絡する方法
については、種々の方法が考えられる。その方法の一つ
に、例えば、補助配線と断線した配線との交差部にレー
ザ光を照射し層間絶縁膜を破壊する方法がある。この方
法をレーザ照射法と呼ぶ。また、別の方法として、図3
に示される方法もある。
Various methods are conceivable for short-circuiting the auxiliary wiring and the disconnected wiring. As one of the methods, for example, there is a method in which an intersection of an auxiliary wiring and a disconnected wiring is irradiated with laser light to break an interlayer insulating film. This method is called a laser irradiation method. As another method, FIG.
There is also a method shown in

【0018】図3を参照すると、補助配線307と配線
302とが交差する交差部近傍に短絡専用のパターン
(後述する)および絶縁膜開口304を予め設けてお
く。すなわち、短絡専用パタ−ンとして、補助配線30
7からその延びる方向と異なる方向へ突出した突起部3
11と、配線302からその延びる方向と異なる方向へ
突出した突起部312とを予め設けておく。そして、
絡必要部分を局部化学気相成長による金属堆積薄膜31
0によって補助配線307と配線302とを、突起部3
11、突起部312、および突起部312上に設けられ
た絶縁膜開口304を介して短絡する。この方法を短絡
法と呼ぶ。この短絡法では、上記レーザ照射法に比較し
て、補助配線や断線して配線を損傷する可能性が極めて
小さい。
Referring to FIG. 3, a pattern dedicated to short-circuiting is provided near the intersection of the auxiliary wiring 307 and the wiring 302.
(To be described later) and an insulating film opening 304 are provided in advance. That is, the auxiliary wiring 30 is provided as a short-circuit-only pattern.
7 protruding in a direction different from the direction in which it extends
11 and a direction different from the direction in which the wiring 302 extends.
A protruding projection 312 is provided in advance. Then, the portion required for short-circuiting is deposited on the metal deposited thin film 31 by local chemical vapor deposition.
The auxiliary wiring 307 and the wiring 302 by 0, projections 3
11, the projection 312, and the projection 312
Short circuit through the insulating film opening 304 . This method is called a short circuit method. In this short-circuit method, the possibility of damaging the wiring due to the auxiliary wiring or disconnection is extremely small as compared with the laser irradiation method.

【0019】(実施例2) 図2は本発明の第2の実施例によるアクティブマトリク
ス液晶表示装置を構成するアクティブマトリクスアレイ
基板の配線部の平面図である。
Embodiment 2 FIG. 2 is a plan view of a wiring portion of an active matrix array substrate constituting an active matrix liquid crystal display device according to a second embodiment of the present invention.

【0020】上述した第1の実施例では、補助配線が表
示領域外周を一周しており、第1 線用と第2の配線
用との区別が無かった。これに対し、第2の実施例で
は、補助配線を表示領域外周を半周する形に配置し、第
1配線用の補助配線207aと第2配線用の補助配線2
07bとに区別している。このような第2の実施例の構
造では、補助配線1本当りに必要な周辺領域の面積が、
第1の実施例のそれの半分で済む。
[0020] In the first embodiment described above, the auxiliary wiring has been around the display region periphery, the distinction between a for the first wiring and the second wiring was not. On the other hand, in the second embodiment, the auxiliary wiring is arranged so as to extend around the outer periphery of the display area by half, and the auxiliary wiring 207a for the first wiring and the auxiliary wiring 2 for the second wiring are arranged.
07b. In the structure of the second embodiment, the area of the peripheral region required for one auxiliary wiring is as follows.
Only half that of the first embodiment is required.

【0021】[0021]

【発明の効果】以上説明したように、本発明によれば、
断線した配線の両端部2箇所を補助配線に短絡すること
のみで、線状の表示欠陥を修復できる。また、表示欠陥
の修復は、パネル化後の状態は勿論、周辺に駆動回路基
板を付けた状態でも可能である。さらに、断線位置に応
じて特定の駆動信号を取り出し、迂回し、補助配線の外
部接続端子に別途供給する必要がないので、モジュール
化工程に検査や修正工程などの特別な追加工程は一切必
要としない。
As described above, according to the present invention,
The linear display defect can be repaired only by short-circuiting two places at both ends of the disconnected wiring to the auxiliary wiring. The display defect can be repaired not only after the panel is formed but also when a driving circuit board is attached to the periphery. Furthermore, since there is no need to extract a specific drive signal according to the disconnection position, bypass it, and supply it separately to the external connection terminal of the auxiliary wiring, there is no need for any special additional processes such as inspection and repair processes in the modularization process do not do.

【0022】その結果、低コストかつ高歩留りで、アク
ティブマトリクス液晶表示装置を製造できる。
As a result, an active matrix liquid crystal display device can be manufactured at low cost and with high yield.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1の実施例によるアクティブマトリ
クス液晶表示装置を構成するアクティブマトリクスアレ
イ基板の配線部の平面図である。
FIG. 1 is a plan view of a wiring portion of an active matrix array substrate constituting an active matrix liquid crystal display device according to a first embodiment of the present invention.

【図2】本発明の第2の実施例によるアクティブマトリ
クス液晶表示装置を構成するアクティブマトリクスアレ
イ基板の配線部の平面図である。
FIG. 2 is a plan view of a wiring portion of an active matrix array substrate constituting an active matrix liquid crystal display device according to a second embodiment of the present invention.

【図3】本発明のアクティブマトリクスアレイ基板の短
絡方法を説明するための図で、(a)は平面図、(b)
は図3(a)のa−a´断面図である。
3A and 3B are views for explaining a method of short-circuiting the active matrix array substrate according to the present invention, wherein FIG. 3A is a plan view and FIG.
FIG. 3 is a sectional view taken along line aa ′ of FIG.

【符号の説明】[Explanation of symbols]

102 第1配線 105 第2配線 106 対向基板外形 107 補助配線 108 断線部 109 短絡点 202 第1配線 205 第2配線 206 対向基板外形 207a、07b 補助配線 208 断線部 209 短絡点 301 ガラス基板 303 層間絶縁膜 304 絶縁膜開口 310 堆積薄膜311,312 突起部 102 first wiring 105 and the second wiring 106 opposing board outline 107 auxiliary wiring 108 disconnecting section 109 short-circuit point 202 first wiring 205 second wiring 206 opposing board outline 207a, 2 07b auxiliary wiring 208 disconnecting section 209 short-circuit point 301 a glass substrate 303 layers Insulating film 304 Insulating film opening 310 Deposited thin films 311 and 312 Projection

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 アクティブマトリクスアレイ基板上に、
平行して延在する第1の配線群と、前記基板全面を覆う
層間絶縁膜と、当該絶縁膜上に前記第1の配線群に直交
する方向に平行して延在する第2の配線群と、表示領域
外かつ対向基板枠外において前記第1の配線群と前記第
2の配線群の一方若しくはそれら双方の入力端子側並び
に開放端側延在部と前記絶縁膜を介して絶縁された形で
直交する補修用の補助配線を少なくとも1本以上具備
るアクティブマトリクス液晶表示装置において、 前記第1の配線群あるいは前記第2の配線群の 入力端子
側並びに開放端側延在部の配線と前記補助配線との交差
部近傍にそれぞれの配線の延びる方向と異なる方向へ突
出した短絡用配線パターンと、下層側短絡配線パターン
上の絶縁膜に設けられた開口部とを具備したことを特徴
とする液晶表示装置。
1. An active matrix array substrate comprising:
A first wiring group extending in parallel, an interlayer insulating film covering the entire surface of the substrate, and a second wiring group extending on the insulating film in parallel with a direction orthogonal to the first wiring group If, insulated through the first one or the insulating film thereof and the input terminal side and the open end extending portion of both of the second wiring group and the wiring group in Table示領outside and a counter substrate outside the frame It is provided at least one or more auxiliary wires for repairing orthogonal form
Intersection of the active matrix liquid crystal display device, and the first wiring group or the second wiring group of the input terminal side and the open end extending portion of the wiring and the auxiliary wiring that
In the direction different from the direction in which each wiring extends
The short-circuit wiring pattern and the lower-layer short-circuit wiring pattern
A liquid crystal display device comprising: an opening provided in the upper insulating film .
【請求項2】 局部化学気相成長による金属膜堆積によ
り、アクティブマトリクス基板上の配線と補助配線との
任意の交差部近傍の突出部において両者を電気的に短絡
することを特徴とする液晶表示装置の製造方法
2. The method according to claim 1, wherein the metal film is deposited by local chemical vapor deposition.
Between the wiring on the active matrix substrate and the auxiliary wiring.
Both are electrically shorted at the protrusion near any intersection
A method of manufacturing a liquid crystal display device.
JP1207792A 1992-01-27 1992-01-27 Liquid crystal display device and method of manufacturing the same Expired - Lifetime JP2812346B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1207792A JP2812346B2 (en) 1992-01-27 1992-01-27 Liquid crystal display device and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1207792A JP2812346B2 (en) 1992-01-27 1992-01-27 Liquid crystal display device and method of manufacturing the same

Publications (2)

Publication Number Publication Date
JPH05203986A JPH05203986A (en) 1993-08-13
JP2812346B2 true JP2812346B2 (en) 1998-10-22

Family

ID=11795526

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1207792A Expired - Lifetime JP2812346B2 (en) 1992-01-27 1992-01-27 Liquid crystal display device and method of manufacturing the same

Country Status (1)

Country Link
JP (1) JP2812346B2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5767929A (en) * 1995-09-21 1998-06-16 Advanced Display Inc. Liquid crystal display apparatus with shorting ring
KR101058094B1 (en) * 2004-12-10 2011-08-24 삼성전자주식회사 Array substrate, display device and repair method having same
JP4841438B2 (en) 2004-12-14 2011-12-21 シャープ株式会社 Liquid crystal display device and defect correcting method for liquid crystal display device
JP2006171576A (en) * 2004-12-17 2006-06-29 Toshiba Matsushita Display Technology Co Ltd Liquid crystal display device and method of manufacturing the same
JP5099988B2 (en) * 2005-08-08 2012-12-19 株式会社ジャパンディスプレイセントラル Liquid crystal display
WO2007097074A1 (en) 2006-02-24 2007-08-30 Sharp Kabushiki Kaisha Active matrix substrate, display, television receiver, method for producing active matrix substrate and method for forming gate insulation film
CN101356557B (en) 2006-02-24 2011-01-12 夏普株式会社 Active matrix substrate, display device and television receiver
TWI363241B (en) * 2007-07-16 2012-05-01 Au Optronics Corp Lower substrate for an fpd
WO2017037953A1 (en) * 2015-09-04 2017-03-09 堺ディスプレイプロダクト株式会社 Liquid crystal display device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62283320A (en) * 1986-05-31 1987-12-09 Toshiba Corp Electronic connecting device
JPH02156227A (en) * 1988-12-07 1990-06-15 Sharp Corp Display electrode substrate of active matrix display device

Also Published As

Publication number Publication date
JPH05203986A (en) 1993-08-13

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