JPH0713197A - Matrix type wiring substrate and liquid crystal display device formed by using the same - Google Patents

Matrix type wiring substrate and liquid crystal display device formed by using the same

Info

Publication number
JPH0713197A
JPH0713197A JP15041093A JP15041093A JPH0713197A JP H0713197 A JPH0713197 A JP H0713197A JP 15041093 A JP15041093 A JP 15041093A JP 15041093 A JP15041093 A JP 15041093A JP H0713197 A JPH0713197 A JP H0713197A
Authority
JP
Japan
Prior art keywords
signal line
repair
signal lines
wiring
liquid crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15041093A
Other languages
Japanese (ja)
Inventor
Kazuki Inoue
一樹 井上
Shigeki Watamura
茂樹 綿村
Masayuki Yokomizo
政幸 横溝
Kenichi Niki
憲一 仁木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd, Mitsubishi Electric Corp filed Critical Asahi Glass Co Ltd
Priority to JP15041093A priority Critical patent/JPH0713197A/en
Publication of JPH0713197A publication Critical patent/JPH0713197A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To provide the substrate which enables the repair of the display defects in intersected points even if there are plural shorting points on the same signal line and necessitates shorter turning around of repair wirings by forming the wirings for repair at each intersected point in the intersected points of display pixel regions. CONSTITUTION:The repair wirings 15 are formed of thin films, etc., consisting of aluminum, etc., in the same manner as for signal lines 2a, 2b and both ends are formed on the upper layer of the signal line 2a so as to overlap partly on the signal line 2a. The repair wiring 2a bypasses the intersected point 16. The signal line 2a is cut at both ends of the shorting part to break down the insulating film in the overlapping part of the wiring 15 for repair and the signal line 2a if the signal lines 2a, 2b are shorted in the intersected point 16. The signal line 2a is thus connected via the repair wiring 15. Consequently, input signals are applied form the signal lines 2a, 2b in an ordinary manner to the TFT 12 corresponding to the intersected point 16 and further the respective TFTs on the signal lines 2a, 2b.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、マトリックス型表示装
置やCCD装置などに用いられるマトリックス型配線基
板およびそれを用いた液晶表示装置に関する。さらに詳
しくは、マトリックス状に配線された信号ラインの交差
部で生じる短絡(ショート)を修復するためのリペア用
配線が設けられたマトリックス型配線基板およびそれを
用いた液晶表示装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a matrix type wiring board used for a matrix type display device, a CCD device and the like and a liquid crystal display device using the same. More specifically, the present invention relates to a matrix type wiring board provided with repair wiring for repairing a short circuit (short circuit) generated at the intersection of signal lines arranged in a matrix, and a liquid crystal display device using the same.

【0002】[0002]

【従来の技術】図4は従来のリペア用配線を有するマト
リックス型配線基板の説明図である。図4において、1
は表面にTFTなどの液晶駆動素子などが形成されたガ
ラス基板、2a、2bはそれぞれガラス基板1上にそれ
ぞれ複数本形成された信号ライン、3は信号ライン2a
または2bに各種信号を加えるための信号入力端子、4
は従来のリペア用配線であり、信号ライン2a、2bと
はシリコンチッ化(SiN)膜などからなる絶縁膜(図
示せず)を介して形成されているため、通常は信号ライ
ンと導通していない。24は液晶表示装置の表示領域であ
り、これは表示画素によって構成されているため、表示
画素領域とも呼ばれる。
2. Description of the Related Art FIG. 4 is an explanatory view of a matrix type wiring board having a conventional repair wiring. In FIG. 4, 1
Is a glass substrate on the surface of which liquid crystal driving elements such as TFTs are formed, 2a and 2b are signal lines formed on the glass substrate 1, respectively, and 3 is a signal line 2a.
Or a signal input terminal for adding various signals to 2b, 4
Is a conventional repair wiring and is normally connected to the signal lines 2a and 2b because it is formed via an insulating film (not shown) made of a silicon nitride (SiN) film or the like. Absent. Reference numeral 24 denotes a display area of the liquid crystal display device, which is also called a display pixel area because it is composed of display pixels.

【0003】前記リペア用配線4は、信号ライン2a、
2bの上層で、かつ、表示画素領域24の外側にループ状
に1本または複数本設けられている。
The repair wiring 4 includes a signal line 2a,
One or more loops are provided on the upper layer of 2b and outside the display pixel region 24.

【0004】前記液晶表示装置においては、通常、信号
ライン2aと信号ライン2bはこれらのあいだに絶縁膜
を介して形成されているため、これらに加えられた入力
信号は互いに混信することはない。しかし、図4の交差
部5の絶縁膜の異常により信号ライン2aと信号ライン
2bとが電気的にショートすると両者の信号が混信する
ため、この交差部5に対応する画素および信号ライン2
a、2b上の画素には表示欠陥が生じ、表示領域24には
縦横に線状の表示不良が現われる。
In the liquid crystal display device, since the signal line 2a and the signal line 2b are usually formed with an insulating film between them, the input signals applied to them do not interfere with each other. However, if the signal line 2a and the signal line 2b are electrically short-circuited due to an abnormality in the insulating film at the intersection 5 in FIG.
Display defects occur in the pixels on a and 2b, and linear display defects appear vertically and horizontally in the display area 24.

【0005】この電気的ショートを取り除くために、従
来では以下のような方法が採られている。すなわち、ま
ず図4の波線6a、6bにレーザ光を照射し信号ライン
2aを交差部5から電気的にカットする。これで信号ラ
イン2aと信号ライン2bとの電気的ショートは取り除
かれるが、このままでは信号ライン2aの波線6bより
も先の部分には信号入力端子3から入力された信号が届
かないため液晶表示装置に欠陥が残ってしまう。この問
題を解決するために、図4の信号ライン2aとリペア用
配線4との交差部7a、7bにさらにレーザ光が照射さ
れる。レーザ光により、リペア用配線4と信号ライン2
aとのあいだの絶縁膜は破壊され、リペア用配線4と信
号ライン2aは電気的にショートする。これにより信号
入力端子3から加えられた入力信号はリペア用配線4を
回り込んで信号ライン2aの波線6bよりも先の部分に
到達するため、通常の表示動作を行うことができる。
In order to remove this electrical short, the following method has been conventionally used. That is, first, the wavy lines 6a and 6b in FIG. 4 are irradiated with laser light to electrically cut the signal line 2a from the intersection 5. Although the electrical short between the signal line 2a and the signal line 2b is removed by this, the signal input from the signal input terminal 3 does not reach the portion of the signal line 2a beyond the wavy line 6b, as it is. Will be left with defects. In order to solve this problem, laser light is further applied to the intersections 7a and 7b between the signal line 2a and the repair wiring 4 in FIG. Repair wire 4 and signal line 2 by laser light
The insulating film between a and a is destroyed, and the repair wiring 4 and the signal line 2a are electrically short-circuited. As a result, the input signal applied from the signal input terminal 3 wraps around the repair wiring 4 and reaches the portion of the signal line 2a that is ahead of the wavy line 6b, so that a normal display operation can be performed.

【0006】[0006]

【発明が解決しようとする課題】しかし、たとえば図4
の交差部8aと交差部8bのように同一の信号ライン上
に複数のショート箇所があったばあい、ショートを取り
除くために信号ラインをレーザカットしてしまうと、リ
ペア用配線4を用いても交差部8aと交差部8bとのあ
いだの信号ラインには入力信号を届かせることができな
い。さらに、リペア用配線4は表示画素領域24を取り囲
むように形成されているので、使用時には長く信号をひ
き回すことになりインピーダンスの面で電気的に不利で
あるという問題がある。
However, for example, as shown in FIG.
If there are a plurality of short-circuited points on the same signal line such as the intersection 8a and the intersection 8b, if the signal line is laser cut to remove the short-circuit, the repair wiring 4 is used. The input signal cannot reach the signal line between the intersection 8a and the intersection 8b. Further, since the repair wiring 4 is formed so as to surround the display pixel region 24, a signal will be laid around for a long time during use, and there is a problem in that it is electrically disadvantageous in terms of impedance.

【0007】本発明はかかる問題を解消するためになさ
れたもので、同一の信号ライン上に複数のショート箇所
があるばあいでも交差部の表示欠陥を修復することがで
き、かつリペア用配線のひき回しが短くてすむマトリッ
クス型配線基板およびそれを用いた液晶表示装置を提供
することを目的とする。
The present invention has been made in order to solve the above problem, and it is possible to repair a display defect at an intersection even when there are a plurality of short-circuited points on the same signal line, and to repair wiring. It is an object of the present invention to provide a matrix type wiring board which requires only a short wiring and a liquid crystal display device using the same.

【0008】[0008]

【課題を解決するための手段】本発明のマトリックス型
配線基板は、絶縁基板上に互いに交差する2組の信号ラ
インを有し、少なくとも一方の組の信号ラインの前記交
差する部分にそれぞれ該信号ラインを迂回するリペア用
配線が設けられ、該リペア用配線の両端部は絶縁膜を介
して前記信号ラインと重なるように形成されていること
を特徴とする。
A matrix type wiring board of the present invention has two sets of signal lines intersecting each other on an insulating substrate, and the signal lines are respectively provided at the intersecting portions of at least one set of signal lines. A repair wiring that bypasses the line is provided, and both ends of the repair wiring are formed so as to overlap with the signal line through an insulating film.

【0009】また、本発明の液晶表示装置は、電極膜が
形成された2枚の透明基板に液晶材料が挟持されてなる
液晶表示装置であって、該2枚の透明基板の少なくとも
一方に前記マトリックス型配線基板が用いられているも
のである。
Further, the liquid crystal display device of the present invention is a liquid crystal display device in which a liquid crystal material is sandwiched between two transparent substrates having an electrode film formed thereon, and at least one of the two transparent substrates has the above-mentioned structure. A matrix type wiring board is used.

【0010】[0010]

【作用】本発明のマトリックス型配線基板によれば、リ
ペア用配線が表示画素領域の交差部において交差部ごと
に形成されているため、信号ライン間のショート箇所が
同一の信号ライン上にあっても各ショート箇所近傍の信
号ラインをレーザなどでカットし、かつ、レーザなどで
リペア用配線との交差部の絶縁膜を破壊し、リペア用配
線と信号ラインを溶接することにより、ショート箇所を
個別に修復できる。さらに、本発明のリペア用配線は信
号ラインの極微小な交差部のみを迂回しているため、入
力信号の不必要な電気的ひき回しがほとんどなく、イン
ピーダンスは増えない。したがって本発明のマトリック
ス型配線基板を一方の基板に用いて液晶表示装置を構成
したばあい、インピーダンスの増加に起因する表示ムラ
が生じない。
According to the matrix type wiring board of the present invention, since the repair wiring is formed at each intersection at the intersection of the display pixel regions, the short-circuited portions between the signal lines are on the same signal line. In addition, by cutting the signal line near each short point with a laser, etc. and destroying the insulating film at the intersection with the repair wiring with a laser etc. and welding the repair wiring and the signal line, the short points can be individually separated. Can be repaired. Further, since the repair wiring of the present invention bypasses only the extremely small intersections of the signal lines, there is almost no unnecessary electrical routing of the input signal, and the impedance does not increase. Therefore, when a liquid crystal display device is constructed by using the matrix type wiring board of the present invention as one of the boards, display unevenness due to an increase in impedance does not occur.

【0011】[0011]

【実施例】つぎに、本発明のマトリックス型配線基板を
図面を参照しながら説明する。図1は本発明のマトリッ
クス型配線基板の一実施例の表示画素の1つを示した要
部拡大平面図、図2はレーザ照射による図1のマトリッ
クス型配線基板のリペア用配線と信号ラインとの接続の
原理を示した断面説明図、図3は同一の信号ラインに複
数のショート箇所があったばあいの図1のマトリックス
型配線基板のリペア用配線の使用法を示した説明図であ
る。図1には、マトリックス型配線基板の構成の一例と
して、たとえばガラス基板1の表面に形成されたマトリ
ックス配線および画素が示されている。2a、2bは図
4に示したものと同一の信号ライン、9は信号ライン2
aと一体形成されたゲート電極、10は信号ライン2bと
一体形成されたソース電極、11はドレイン電極でありゲ
ート電極9、ソース電極10とともに各画素のスイッチン
グ素子であるTFT12を構成している。13はたとえば液
晶材料などの表示材料に電圧を印加するためのITOな
どからなる画素電極、14は表示性能を向上するために画
素電極13と信号ライン2aとのあいだに付加された付加
容量用の電極(以下、Cs電極という)であり、TFT
12、画素電極13とともに一つの表示画素を構成する。15
はリペア用配線であり、信号ライン2a、2bとは絶縁
膜(図示せず)によって電気的に絶縁されている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, a matrix type wiring board of the present invention will be described with reference to the drawings. FIG. 1 is an enlarged plan view of an essential part showing one of the display pixels of an embodiment of the matrix type wiring board of the present invention, and FIG. 2 shows repair wiring and signal lines of the matrix type wiring board of FIG. 1 by laser irradiation. 3 is a cross-sectional explanatory view showing the principle of connection of FIG. 3, and FIG. 3 is an explanatory view showing how to use the repair wiring of the matrix type wiring board of FIG. 1 when there are a plurality of short-circuited points in the same signal line. FIG. 1 shows a matrix wiring and pixels formed on the surface of a glass substrate 1, for example, as an example of the structure of the matrix wiring substrate. 2a and 2b are the same signal lines as shown in FIG. 4, 9 is the signal line 2
a is a gate electrode integrally formed with a, 10 is a source electrode integrally formed with the signal line 2b, 11 is a drain electrode, and together with the gate electrode 9 and the source electrode 10 constitutes a TFT 12 which is a switching element of each pixel. Reference numeral 13 denotes a pixel electrode made of ITO or the like for applying a voltage to a display material such as a liquid crystal material, and 14 denotes an additional capacitance added between the pixel electrode 13 and the signal line 2a to improve display performance. An electrode (hereinafter referred to as a Cs electrode), and a TFT
12 and the pixel electrode 13 constitute one display pixel. 15
Is a repair wiring and is electrically insulated from the signal lines 2a and 2b by an insulating film (not shown).

【0012】リペア用配線15は、信号ライン2aおよび
2bと同じようにアルミニウムなどからなる薄膜などに
よって形成され、両端が絶縁膜を介して信号ライン2a
と一部重なるように(図1のC参照)信号ライン2aの
上層に形成されている。リペア用配線15は交差部16を迂
回するもので、通常は長くても100μm程度である。具
体的には、たとえば、幅が信号ライン2aおよび2bと
同程度の10〜20μm程度で、両腕の長さAがそれぞれ20
〜30μm程度、胴部の長さBが30〜40μm程度のコ字状
に形成されているが、形状や大きさはとくに限定されな
い。
The repair wiring 15 is formed of a thin film made of aluminum or the like like the signal lines 2a and 2b, and both ends thereof are covered with an insulating film to form the signal line 2a.
Is formed in the upper layer of the signal line 2a so as to partially overlap with (see C in FIG. 1). The repair wiring 15 bypasses the intersection 16 and is usually about 100 μm at the longest. Specifically, for example, the width is about 10 to 20 μm, which is about the same as the signal lines 2a and 2b, and the length A of each arm is 20.
The shape and size are not particularly limited, though the length is about 30 to 30 μm and the length B of the body is about 30 to 40 μm.

【0013】また、前記リペア用配線15は、クロムなど
の金属薄膜またはITOによって形成してもよい。
Further, the repair wiring 15 may be formed of a metal thin film such as chromium or ITO.

【0014】また、リペア用配線15と信号ライン2aと
のあいだに形成される絶縁膜として、シリコンチッ化膜
またはシリコン酸化膜などが採用され、プラズマCVD
法などにより0.2〜0.4μm程度の厚さで形成される。
Further, a silicon nitride film or a silicon oxide film is adopted as an insulating film formed between the repair wiring 15 and the signal line 2a, and plasma CVD is used.
It is formed to a thickness of about 0.2 to 0.4 μm by a method such as a method.

【0015】本発明のマトリックス型配線基板は、少な
くとも一方の信号ラインに交差部を迂回するリペア用配
線15が絶縁膜を介して交差部16ごとに設けられているこ
とに特徴がある。
The matrix type wiring board of the present invention is characterized in that at least one signal line is provided with a repair wiring 15 that bypasses the intersection at each intersection 16 via an insulating film.

【0016】すなわち、信号ライン2aと2bの交差部
16において、信号ライン2a、2bがショートしていな
ければ図1の配線構造の状態で通常の表示動作を行い、
交差部16で、信号ライン2a、2bがショートしている
ばあいには、ショート部分の両側で信号ライン2aを切
断し、リペア用配線15と信号ライン2aとの重なり部分
の絶縁膜を破壊し、リペア用配線15を介して信号ライン
2aを連結する。その結果、ショートした交差部16に対
応するTFT12、さらに信号ライン2a、2b上の各T
FTに対して通常通りに信号ライン2a、2bから入力
信号が与えられ、TFTのスイッチング作用により表示
欠陥を解消するようにしたものである。
That is, the intersection of the signal lines 2a and 2b
At 16, if the signal lines 2a and 2b are not short-circuited, the normal display operation is performed in the state of the wiring structure of FIG.
If the signal lines 2a and 2b are short-circuited at the intersection 16, the signal line 2a is cut on both sides of the short-circuited portion, and the insulating film in the overlapping portion between the repair wiring 15 and the signal line 2a is destroyed. , The signal line 2a is connected through the repair wiring 15. As a result, the TFT 12 corresponding to the shorted intersection 16 and each T on the signal lines 2a and 2b.
An input signal is normally applied to the FT from the signal lines 2a and 2b, and the display defect is eliminated by the switching action of the TFT.

【0017】なお、本実施例ではリペア用配線15が信号
ライン2aの上層に形成された例を示したが、下層に形
成されても同様の効果がえられる。
Although the repair wiring 15 is formed in the upper layer of the signal line 2a in the present embodiment, the same effect can be obtained even if it is formed in the lower layer.

【0018】つぎに信号ライン2a、2bの交差部16の
絶縁膜に異常が生じ、信号ライン2aと2bが電気的に
ショートしたばあいのショート箇所を修復する方法につ
いて、図1〜3を参照しながら具体的に説明する。
Next, referring to FIGS. 1 to 3, for a method of repairing a short-circuited portion when an abnormality occurs in the insulating film at the intersection 16 of the signal lines 2a and 2b and the signal lines 2a and 2b are electrically short-circuited. While explaining concretely.

【0019】まず、信号ライン2aのショートした交差
部16の近傍、たとえば波線部17a、17bをレーザ光の照
射によりカットし、信号ライン間のショート箇所を分離
する。つぎに信号ライン2aの断線を修復するために、
信号ライン2aとリペア用配線15の重なり部分18a、18
bにレーザ光を照射し、信号ライン2aとリペア用配線
15を電気的に接続する。たとえば、図2に示されるよう
に、信号ライン2aとリペア用配線15とのあいだに存在
する絶縁膜25をレーザ光26の照射で破壊することにより
電気的接続がえられる。
First, the vicinity of the shorted intersection 16 of the signal lines 2a, for example, the wavy line portions 17a and 17b are cut by the irradiation of laser light to separate the shorted portions between the signal lines. Next, in order to repair the disconnection of the signal line 2a,
Overlapping portions 18a, 18 of the signal line 2a and the repair wiring 15
b is irradiated with laser light, and the signal line 2a and repair wiring
Connect 15 electrically. For example, as shown in FIG. 2, electrical connection can be obtained by destroying the insulating film 25 existing between the signal line 2a and the repair wiring 15 by irradiation with laser light 26.

【0020】リペア用配線15の長さは長くても100μm
程度であるため、入力信号の不必要なひき回しはほとん
どない。さらに、図3の交差部19a、19bのように同一
の信号ライン2a上に複数のショートが起きたばあいで
も、信号ライン2aの波線20a、20bと波線21a、21b
をレーザカットすると共に、リペア用配線15との重なり
部分22a、22bと23a、23bをレーザ光の照射により接
続することにより個別に表示欠陥を修復できる。
The length of the repair wiring 15 is 100 μm at the longest.
Since there is only a degree, there is almost no unnecessary routing of the input signal. Further, even when a plurality of short circuits occur on the same signal line 2a as at the intersections 19a and 19b in FIG. 3, the wavy lines 20a and 20b and the wavy lines 21a and 21b of the signal line 2a are also included.
The laser light is cut, and the display defects can be individually repaired by connecting the overlapping portions 22a, 22b and 23a, 23b with the repair wiring 15 by irradiating laser light.

【0021】またリペア用配線15をCs電極14の形成と
同じ工程で成膜すれば製造コストの面でもほとんど上昇
しない。
Further, if the repair wiring 15 is formed in the same step as the formation of the Cs electrode 14, the manufacturing cost is hardly increased.

【0022】前述のごとく構成されたマトリックス型配
線基板の表面にチッ化シリコンなどの保護膜およびポリ
イミドなどの配向膜を形成したのち、電極膜および配向
膜などが設けられた他方の絶縁基板と対向させ、2枚の
基板の間隙に液晶材料を充填することにより、アクティ
ブマトリックス型の液晶表示装置がえられる。この液晶
表示装置は、修復された信号ライン上の画素であっても
他の画素と同程度の駆動電圧がえられるため、表示性能
を向上させることができる。
After forming a protective film such as silicon nitride and an alignment film such as polyimide on the surface of the matrix type wiring board constructed as described above, it is opposed to the other insulating substrate provided with the electrode film and the alignment film. By filling the gap between the two substrates with the liquid crystal material, an active matrix type liquid crystal display device is obtained. In this liquid crystal display device, even a pixel on a restored signal line can obtain a driving voltage similar to that of other pixels, and thus display performance can be improved.

【0023】[0023]

【発明の効果】本発明によれば、同一の信号ラインに複
数のショート箇所が発生したばあいでもマトリックス型
配線基板の修復が可能であるため、従来のリペア用配線
を用いたばあいに比べてさらなる歩留りの向上を達成す
ることができる。また、配線の不必要な引回しがないた
め、他の信号ラインとインピーダンスの差がほとんどな
い。したがって前記マトリックス型配線基板を用いて液
晶表示装置を構成すれば、表示性能を向上させることが
できる。
According to the present invention, the matrix type wiring board can be repaired even when a plurality of short-circuited points are generated in the same signal line. Therefore, the yield can be further improved. Moreover, since there is no unnecessary wiring, there is almost no difference in impedance from other signal lines. Therefore, if a liquid crystal display device is constructed using the matrix type wiring board, the display performance can be improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のマトリックス型配線基板の一実施例の
表示画素の一つを示した要部拡大平面図である。
FIG. 1 is an enlarged plan view of an essential part showing one of display pixels of an embodiment of a matrix type wiring board of the present invention.

【図2】レーザ照射による図1のマトリックス型配線基
板のリペア用配線と信号ラインとの接続の原理を示した
断面説明図である。
2 is a cross-sectional explanatory view showing a principle of connection between a repair wiring and a signal line of the matrix type wiring board of FIG. 1 by laser irradiation.

【図3】同一の信号ラインに複数のショート箇所があっ
たばあいの図1のマトリックス型配線基板のリペア用配
線の使用法を示した説明図である。
FIG. 3 is an explanatory view showing a method of using the repair wiring of the matrix type wiring board of FIG. 1 when the same signal line has a plurality of short-circuited portions.

【図4】従来の液晶表示装置のリペア用配線の使用法を
示した説明図である。
FIG. 4 is an explanatory diagram showing how to use a repair wiring of a conventional liquid crystal display device.

【符号の説明】[Explanation of symbols]

1 ガラス基板 2a 信号ライン 2b 信号ライン 15 リペア用配線 16 交差部 25 絶縁膜 1 glass substrate 2a signal line 2b signal line 15 repair wiring 16 intersection 25 insulating film

───────────────────────────────────────────────────── フロントページの続き (72)発明者 横溝 政幸 熊本県菊池郡西合志町御代志997番地 株 式会社アドバンスト・ディスプレイ内 (72)発明者 仁木 憲一 熊本県菊池郡西合志町御代志997番地 株 式会社アドバンスト・ディスプレイ内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Masayuki Yokomizo, 997 Miyoshi, Nishigoshi-cho, Kikuchi-gun, Kumamoto Inside Advanced Display Co., Ltd. (72) Kenichi Niki, 997 Miyoshi, Nishigoshi-cho, Kikuchi-gun, Kumamoto・ In the display

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 絶縁基板上に互いに交差する2組の信号
ラインを有するマトリックス型配線基板であって、少な
くとも一方の組の信号ラインの前記交差する部分にそれ
ぞれ該信号ラインを迂回するリペア用配線が設けられ、
該リペア用配線の両端部は絶縁膜を介して前記信号ライ
ンと重なるように形成されてなるマトリックス型配線基
板。
1. A matrix-type wiring board having two sets of signal lines intersecting with each other on an insulating substrate, and repair wiring for bypassing the signal lines at least at the intersecting portions of at least one set of signal lines. Is provided,
A matrix type wiring board in which both ends of the repair wiring are formed so as to overlap the signal line with an insulating film interposed therebetween.
【請求項2】 電極膜が形成された2枚の透明基板に液
晶材料が挟持されてなる液晶表示装置であって、該2枚
の透明基板の少なくとも一方に請求項1記載のマトリッ
クス型配線基板が用いられてなる液晶表示装置。
2. A liquid crystal display device comprising a liquid crystal material sandwiched between two transparent substrates having electrode films formed thereon, wherein the matrix type wiring substrate according to claim 1 is provided on at least one of the two transparent substrates. A liquid crystal display device using the.
JP15041093A 1993-06-22 1993-06-22 Matrix type wiring substrate and liquid crystal display device formed by using the same Pending JPH0713197A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15041093A JPH0713197A (en) 1993-06-22 1993-06-22 Matrix type wiring substrate and liquid crystal display device formed by using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15041093A JPH0713197A (en) 1993-06-22 1993-06-22 Matrix type wiring substrate and liquid crystal display device formed by using the same

Publications (1)

Publication Number Publication Date
JPH0713197A true JPH0713197A (en) 1995-01-17

Family

ID=15496349

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15041093A Pending JPH0713197A (en) 1993-06-22 1993-06-22 Matrix type wiring substrate and liquid crystal display device formed by using the same

Country Status (1)

Country Link
JP (1) JPH0713197A (en)

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KR100458840B1 (en) * 1997-04-03 2005-09-28 삼성전자주식회사 Repair department of display device
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US6249011B1 (en) 1999-02-26 2001-06-19 Nec Corporation Thin film transistor array with light shield layer
US6352911B1 (en) 1999-02-26 2002-03-05 Nec Corporation Thin-film transistor array and method for producing the same
KR100399256B1 (en) * 1999-02-26 2003-09-26 엔이씨 엘씨디 테크놀로지스, 엘티디. Thin-film transistor array and method for producing the same
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US7924353B2 (en) 2008-04-22 2011-04-12 Au Optronics Corporation Pixel structure and active device array substrate
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