JP2664216C - - Google Patents
Info
- Publication number
- JP2664216C JP2664216C JP2664216C JP 2664216 C JP2664216 C JP 2664216C JP 2664216 C JP2664216 C JP 2664216C
- Authority
- JP
- Japan
- Prior art keywords
- vacuum processing
- processing chamber
- gas
- sample
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000007789 gas Substances 0.000 claims description 24
- 239000011261 inert gas Substances 0.000 claims description 11
- 239000000428 dust Substances 0.000 description 13
- 229910001873 dinitrogen Inorganic materials 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 9
- 239000000758 substrate Substances 0.000 description 4
- 230000000875 corresponding Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 238000004380 ashing Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 235000021410 healthy eating index Nutrition 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Family
ID=
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