JP2567988Y2 - 液体材料ガス化供給装置 - Google Patents
液体材料ガス化供給装置Info
- Publication number
- JP2567988Y2 JP2567988Y2 JP1990067353U JP6735390U JP2567988Y2 JP 2567988 Y2 JP2567988 Y2 JP 2567988Y2 JP 1990067353 U JP1990067353 U JP 1990067353U JP 6735390 U JP6735390 U JP 6735390U JP 2567988 Y2 JP2567988 Y2 JP 2567988Y2
- Authority
- JP
- Japan
- Prior art keywords
- pressure
- liquid material
- bubbler tank
- carrier gas
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000011344 liquid material Substances 0.000 title claims description 49
- 238000002309 gasification Methods 0.000 title claims description 16
- 239000012159 carrier gas Substances 0.000 claims description 36
- 239000004065 semiconductor Substances 0.000 claims description 21
- 238000004519 manufacturing process Methods 0.000 claims description 17
- 229920006395 saturated elastomer Polymers 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims description 5
- 230000002159 abnormal effect Effects 0.000 claims description 2
- 230000005587 bubbling Effects 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- OEYOHULQRFXULB-UHFFFAOYSA-N arsenic trichloride Chemical compound Cl[As](Cl)Cl OEYOHULQRFXULB-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990067353U JP2567988Y2 (ja) | 1990-06-26 | 1990-06-26 | 液体材料ガス化供給装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990067353U JP2567988Y2 (ja) | 1990-06-26 | 1990-06-26 | 液体材料ガス化供給装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0426527U JPH0426527U (cg-RX-API-DMAC7.html) | 1992-03-03 |
| JP2567988Y2 true JP2567988Y2 (ja) | 1998-04-08 |
Family
ID=31600852
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990067353U Expired - Lifetime JP2567988Y2 (ja) | 1990-06-26 | 1990-06-26 | 液体材料ガス化供給装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2567988Y2 (cg-RX-API-DMAC7.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003220326A (ja) * | 2002-01-29 | 2003-08-05 | Nippon Soda Co Ltd | 物質投入管理方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0040540B1 (en) * | 1980-05-20 | 1987-01-21 | J.C. Schumacher Company | Chemical vapor delivery system and method for controlling the flow of vapor in a chemical vapor delivery system |
| JPS63182816A (ja) * | 1987-01-26 | 1988-07-28 | Sumitomo Electric Ind Ltd | 気相成長法による半導体製造装置 |
-
1990
- 1990-06-26 JP JP1990067353U patent/JP2567988Y2/ja not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003220326A (ja) * | 2002-01-29 | 2003-08-05 | Nippon Soda Co Ltd | 物質投入管理方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0426527U (cg-RX-API-DMAC7.html) | 1992-03-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4940067B2 (ja) | 低温液体を移送するための装置 | |
| US5160542A (en) | Apparatus for vaporizing and supplying organometal compounds | |
| EP0969342B1 (en) | Fluid supply apparatus | |
| US4980204A (en) | Metal organic chemical vapor deposition method with controlled gas flow rate | |
| US4904547A (en) | Fuel-cell device | |
| US4545801A (en) | Raw material supply device | |
| KR960043020A (ko) | 반도체 제조장치 및 로드록 실 산소 농도의 제어방법과 자연 산화막의 생성방법 | |
| JP4393677B2 (ja) | 液体材料気化方法および装置並びに制御バルブ | |
| JPH0429313A (ja) | 半導体結晶の製造装置 | |
| RU2008132506A (ru) | Реактор высокого давления с псевдоожиженным слоем для получения гранулированного поликристаллического кремния | |
| CN110528085A (zh) | 一种控制源瓶压力的控制装置及方法 | |
| JP2567988Y2 (ja) | 液体材料ガス化供給装置 | |
| KR900007465B1 (ko) | 교호로 공급하는 가스원으로부터 이용관에 가스를 공급하고 가스원의 고압가스로 직접 제어되는 가스 공급장치 | |
| US5487783A (en) | Method and apparatus for preventing rupture and contamination of an ultra-clean APCVD reactor during shutdown | |
| JPS57143421A (en) | Switching method for bottom blowing gas | |
| JP2006089811A (ja) | 気相結晶作成装置 | |
| EP0333968A3 (en) | Improved pressure adjusting device for controlling the liquid gas flow rate | |
| JP3477236B2 (ja) | 圧力制御方法及び反応処理装置 | |
| JPS6255949B2 (cg-RX-API-DMAC7.html) | ||
| JPS5774593A (en) | Method and device for controlling accumulation and releasing of heat by metallic hydride | |
| JP2010285298A (ja) | 窒化物半導体の製造装置および窒化物半導体の製造方法 | |
| JPS5826656B2 (ja) | ３−５ ゾクカゴウブツハンドウタイエピタキシヤルセキソウケツシヨウノ セイゾウホウホウ | |
| JPH0383898A (ja) | 逆流防止機構付き有機金属原料供給装置 | |
| JPH0413513Y2 (cg-RX-API-DMAC7.html) | ||
| KR200145599Y1 (ko) | 압력조절장치 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |